JP2000241798A - Active matrix type liquid crystal display device and its drive method (reset drive) - Google Patents

Active matrix type liquid crystal display device and its drive method (reset drive)

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Publication number
JP2000241798A
JP2000241798A JP4452499A JP4452499A JP2000241798A JP 2000241798 A JP2000241798 A JP 2000241798A JP 4452499 A JP4452499 A JP 4452499A JP 4452499 A JP4452499 A JP 4452499A JP 2000241798 A JP2000241798 A JP 2000241798A
Authority
JP
Japan
Prior art keywords
scanning line
liquid crystal
substrate
reset
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4452499A
Other languages
Japanese (ja)
Other versions
JP3515410B2 (en
Inventor
Yujiro Hara
雄二郎 原
Hisao Fujiwara
久男 藤原
Takeshi Ito
伊藤  剛
Haruhiko Okumura
治彦 奥村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
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Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP4452499A priority Critical patent/JP3515410B2/en
Publication of JP2000241798A publication Critical patent/JP2000241798A/en
Application granted granted Critical
Publication of JP3515410B2 publication Critical patent/JP3515410B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Liquid Crystal (AREA)
  • Liquid Crystal Display Device Control (AREA)
  • Control Of Indicators Other Than Cathode Ray Tubes (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a device having high contrast and rapid response/wide view angle that 'step response' is not made, and without lowering luminance an increase in power consumption the increase in a display defect due to a short circuit between wiring and to provide its drive method. SOLUTION: This device is provided with plural first scanning lines 2 arranged parallel onto a first substrate, plural second scanning lines 3 arranged between adjacent wiring of plural first scanning lines 2, plural signal lines 1 arranged so as to intersect with the scanning lines 2 and 3, a second substrate arranged parallel to the first substrate, a liquid crystal layer held between the first substrate and the second substrate, a signal writing TFT element 4 and a resetting TFT element 5. Then, the TFT 4 is connected between the first scanning line 2 and the signal line 1 and between the first scanning line 2 and a pixel electrode, and is controlled by the elected first scanning line 2, and the TFT 5 is connected between the second scanning line 2 and the pixel electrode and between the second scanning line 3 and the first scanning line 2 of the preceding stage of the first scanning line 2, and is controlled by the elected second scanning line 3.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は強誘電性液晶・反強
誘電性液晶を用いたアクティブマトリクス型液晶表示装
置およびその駆動方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an active matrix type liquid crystal display device using a ferroelectric liquid crystal and an antiferroelectric liquid crystal, and a driving method thereof.

【0002】[0002]

【従来の技術】スイツチング素子としてTFT(薄膜ト
ランジスタ)を用いたアクティブマトリクス型液晶表示
装置(TFT−LCD)において、TN(ツイステッド
ネマチック)液晶よりも速い応答速度および広い視野角
を実現するため、液晶材料として強誘電性液晶や反強誘
電性液晶を用いる方式がいくつか検討されている。
2. Description of the Related Art In an active matrix type liquid crystal display (TFT-LCD) using a TFT (thin film transistor) as a switching element, a liquid crystal material is required to realize a faster response speed and a wider viewing angle than a TN (twisted nematic) liquid crystal. Some methods using a ferroelectric liquid crystal or an antiferroelectric liquid crystal have been studied.

【0003】強誘電性液晶や反強誘電性液晶のような自
発分極を有する液晶(より一般的には、カイラルスメク
ティックC相あるいはその副次相の液晶)をTFTで駆
動すると、液晶の応答時間が書込み時間より大きい場合
に、反電場により保持電圧が低下する現象が起こること
が知られている(Hartmann: J.Appl.
Phys. 66, 1132(1989))。この保
持電圧の低下は、いわゆる書込み不足であり、実効印加
電圧の低下をもたらし、コントラスト比を低下させるの
で、実用上大きな問題となる。
When a liquid crystal having spontaneous polarization such as a ferroelectric liquid crystal or an antiferroelectric liquid crystal (more generally, a liquid crystal of a chiral smectic C phase or its sub phase) is driven by a TFT, the response time of the liquid crystal is reduced. Is longer than the writing time, it is known that a phenomenon in which the holding voltage decreases due to the anti-electric field occurs (Hartmann: J. Appl.
Phys. 66, 1132 (1989)). This decrease in the holding voltage is a so-called insufficient writing, causes a decrease in the effective applied voltage, and lowers the contrast ratio, which is a serious problem in practical use.

【0004】もう一つの問題として、あるフレームを境
に信号電圧の絶対値が変化した場合に、「ステップ応
答」、すなわち数フレームにわたって明暗を繰り返しな
がら定常の透過光量に落ち着くという現象が発生する
(Verhulst et al.: IDRC'94
digest, 377(1994))ことも知られ
ている。
[0004] As another problem, when the absolute value of the signal voltage changes at a certain frame, a "step response", that is, a phenomenon in which the transmitted light amount settles to a steady light amount while repeating light and dark over several frames ( Verhulst et al .: IDRC '94.
Digest, 377 (1994)).

【0005】低電圧駆動や常温よりもやや低い温度での
駆動において充分高速で、応答時間が書込み時間より短
い液晶材料を用いれば上記問題は解決するが、現状では
その条件を満たす液晶材料は存在しない。今後も特に低
温域での高速化の実現は疑問視されている。また、液晶
表示装置は、さらに大画面化・高精細化が求められてく
るが、それには必然的に1水平期間の短縮が伴う。した
がって、液晶材料の改善のみでこの問題を解決するのは
困難である。
The above problem can be solved by using a liquid crystal material which is sufficiently fast in driving at a low voltage or at a temperature slightly lower than room temperature, and has a response time shorter than the writing time. do not do. The realization of high speed especially in the low temperature region is questioned in the future. Further, the liquid crystal display device is required to have a larger screen and higher definition, but this necessarily involves shortening one horizontal period. Therefore, it is difficult to solve this problem only by improving the liquid crystal material.

【0006】「ステップ応答」の解決策としては、書込
み直前に0Vを書込むリセット動作をする方法が知られ
ている。この方法としては、TFTまたはTFD(薄膜
ダイオード)を用いた方法等が発表されているが、これ
らの方法は書込み時間の一部をリセット動作に充ててい
る。このため、「ステップ応答」は解決するが、ライン
数を減らさない限り、実質的な書込み時間は短くなる。
このため、コントラストは充分に向上しない。
As a solution to the "step response", a method of performing a reset operation of writing 0 V immediately before writing is known. As this method, a method using a TFT or a TFD (thin film diode) has been disclosed, but these methods allocate a part of the writing time to the reset operation. Therefore, although the "step response" is solved, the actual write time is reduced unless the number of lines is reduced.
For this reason, the contrast is not sufficiently improved.

【0007】また、高精細化で書込み時間が短くなった
場合に、書込み時間がリセット動作のためにさらに短く
なることから、書込み不足が深刻になってくる。TFD
を用いれば、他のラインの書込み中にリセット動作を行
うことも可能であるが、TFDでは表示素子全体の素子
特性のバラツキが抑えにくいという問題があり、実用化
には不適当である。このように、従来の液晶材料やリセ
ット方法では、反電場によるコントラスト低下および
「ステップ応答」を解決することができない。
Further, when the writing time is shortened due to the high definition, the writing time is further shortened due to the reset operation, and the insufficient writing becomes serious. TFD
Although it is possible to perform a reset operation during writing of another line by using, the TFD has a problem that it is difficult to suppress variations in element characteristics of the entire display element, and is not suitable for practical use. As described above, the conventional liquid crystal material and the reset method cannot solve the contrast reduction and the “step response” due to the anti-electric field.

【0008】上記のような問題を解決するために、信号
書込み用のTFTとは別にリセット用のTFTを画素電
極に接続し、信号書込み用のTFTを選択するタイミン
グより前にリセット用TFTを選択して画素電極の電位
をリセットすることにより、実質的な書込み時間を短く
しないままにリセットを行なう、という方法が考えられ
る。
In order to solve the above problem, a reset TFT is connected to the pixel electrode separately from the signal writing TFT, and the reset TFT is selected before the timing of selecting the signal writing TFT. By resetting the potential of the pixel electrode, the reset can be performed without substantially shortening the writing time.

【0009】信号書込み用のTFTとは別のTFTを用
いてリセットを行なうための画素構造としては、リセッ
ト用のTFTを制御するための走査線を信号書込み用の
TFTを制御するための走査線の前段の走査線と兼用す
る構造や、リセット用のTFTを制御するための走査線
を信号書込み用のTFTを制御するための走査線とは別
に設ける構造が考えられている(奥村ら、公開特許 特
開平9−265112など)。これらについて図面を用
いて説明する。
The pixel structure for resetting using a TFT different from the signal writing TFT includes a scanning line for controlling the reset TFT and a scanning line for controlling the signal writing TFT. And a structure in which a scanning line for controlling a reset TFT is provided separately from a scanning line for controlling a signal writing TFT (Okumura et al., Published Japanese Patent Laid-Open No. 9-265112). These will be described with reference to the drawings.

【0010】図8は第一の従来例の構造を表す、第一の
基板上に形成された回路図である。この構造において
は、リセット用走査線を、信号書込み用走査線2の前段
の走査線7と兼用している。画素電極6は信号書込み用
TFT4及びリセット用TFT5と接続され、Cs線1
0との間に補助容量(Cs)9を形成している。
FIG. 8 is a circuit diagram showing a structure of a first conventional example formed on a first substrate. In this structure, the reset scanning line is also used as the scanning line 7 preceding the signal writing scanning line 2. The pixel electrode 6 is connected to the signal writing TFT 4 and the reset TFT 5, and the Cs line 1
A storage capacitor (Cs) 9 is formed between the storage capacitor and the storage capacitor.

【0011】この構造における走査線の駆動波形は図9
に示す通りになる。ここで、11は信号書込み用走査線
2の前に選択される走査線7の駆動波形を、12は信号
書込み用走査線2の駆動波形を表す。ここにTfram
eは1フレーム時間を表し、書き換えレートが60Hz
の場合は16.7msとなる。また、Tgonは1水平
時間を表し、信号書込み用走査線2の数で1フレーム時
間を割った時間となる。Vgonは信号線1に印加され
た電圧を画素電極6に書込むために信号書込み用のTF
T4を選択する期間に信号書込み用走査線2に印加され
る電圧を、Vgoffはその他の期間に信号書込み用走
査線2に印加される電圧を表す。また、Cs線10に印
加されている電圧VCsは第二の基板上に形成された共
通電極に印加された電位Vcomとの差が1V以下であ
る。
The driving waveform of the scanning line in this structure is shown in FIG.
It becomes as shown in. Here, reference numeral 11 denotes a driving waveform of the scanning line 7 selected before the scanning line 2 for signal writing, and reference numeral 12 denotes a driving waveform of the scanning line 2 for signal writing. Here Tfram
e represents one frame time, and the rewriting rate is 60 Hz.
Is 16.7 ms. Tgon represents one horizontal time, which is a time obtained by dividing one frame time by the number of signal writing scanning lines 2. Vgon is a signal writing TF for writing the voltage applied to the signal line 1 to the pixel electrode 6.
Vgoff represents the voltage applied to the signal writing scanning line 2 during the period of selecting T4, and Vgoff represents the voltage applied to the signal writing scanning line 2 during the other period. The difference between the voltage VCs applied to the Cs line 10 and the potential Vcom applied to the common electrode formed on the second substrate is 1 V or less.

【0012】この構造ではリセット用走査線を信号書込
み用走査線2の前段の走査線7と兼用しており、走査線
2の前段の走査線7が選択されている期間にリセット用
のTFT5によりCs線10の電位VCsが画素電極6
に書込まれ、リセット動作が行われる。この場合、リセ
ットを行なう期間は1水平時間Tgonと等しくなる。
このため、高精細化で1水平時間が短くなった場合、リ
セット時間が十分に確保できず、不完全なリセットしか
行なえないため、ステップ応答を完全に解消することは
困難である。
In this structure, the reset scanning line is also used as the scanning line 7 preceding the scanning line 2 for writing the signal, and the reset TFT 5 is used during the period in which the scanning line 7 preceding the scanning line 2 is selected. The potential VCs of the Cs line 10 is
And a reset operation is performed. In this case, the resetting period is equal to one horizontal time Tgon.
For this reason, if one horizontal time is shortened due to high definition, the reset time cannot be sufficiently secured, and only an incomplete reset can be performed. Therefore, it is difficult to completely eliminate the step response.

【0013】図10は第二の従来例の構造を表す回路図
である。この構造においては、リセット用走査線3は信
号書込み用走査線2とほぼ平行に形成されている。画素
電極6は信号書込み用TFT4及びリセット用TFT5
と接続され、Cs線10との間に補助容量(Cs)9を
形成している。また、Cs線10には第二の基板上に形
成された共通電極に印加された電位Vcomとほぼ同
じ、あるいは0.5〜1V程度高い電位VCsが印加さ
れている。
FIG. 10 is a circuit diagram showing the structure of the second conventional example. In this structure, the reset scanning line 3 is formed substantially parallel to the signal writing scanning line 2. The pixel electrode 6 is composed of a signal writing TFT 4 and a reset TFT 5
To form a storage capacitor (Cs) 9 with the Cs line 10. Further, a potential VCs that is substantially the same as the potential Vcom applied to the common electrode formed on the second substrate or is higher by about 0.5 to 1 V is applied to the Cs line 10.

【0014】この構造における走査線の駆動波形は図1
1に示す通りになる。ここで、11は信号書込み用走査
線2の前に選択される走査線7の駆動波形を、12は信
号書込み用走査線2の駆動波形を、13はリセット用走
査線3の駆動波形を表す。Vronはリセット用TFT
5を選択する期間Tronにリセット用走査線3に印加
される電圧を、Vroffはその他の期間にリセット用
走査線3に印加される電圧を表す。リセット用TFT5
が選択されている期間Tronにリセット用のTFT5
によりCs線10の電位VCsが画素電極6に書込ま
れ、リセット動作が行われるが、リセット用TFT5が
選択されている期間Tronは1水平時間より長く取る
ことができるために、信号書込み用TFT4により信号
を書込む前に画素電位6をCs線10の電位VCsに等
しくすることができ、ステップ応答を無くすようにリセ
ットをできる。一方で、第一の従来例と比較して信号書
込み用走査線2、リセット用走査線3、Cs線10が全
て独立であり、配線の数が増えるために光の透過できる
面積の割合である開口率が減少するため、輝度が低下
し、バックライトの消費電力が増大する、あるいは配線
間のショートによる表示不良が生じやすくなる、などの
問題が生じる。
The driving waveform of the scanning line in this structure is shown in FIG.
As shown in FIG. Here, 11 denotes a driving waveform of the scanning line 7 selected before the signal writing scanning line 2, 12 denotes a driving waveform of the signal writing scanning line 2, and 13 denotes a driving waveform of the reset scanning line 3. . Vron is the reset TFT
5, a voltage applied to the reset scanning line 3 during the period Tron, and Vroff represents a voltage applied to the reset scanning line 3 during the other periods. Reset TFT5
During the period in which is selected, the reset TFT 5
, The potential VCs of the Cs line 10 is written to the pixel electrode 6 and the reset operation is performed. However, since the period Tron during which the reset TFT 5 is selected can be longer than one horizontal time, the signal writing TFT 4 Thus, before writing a signal, the pixel potential 6 can be made equal to the potential VCs of the Cs line 10, and reset can be performed so as to eliminate the step response. On the other hand, as compared with the first conventional example, the scanning line for signal writing 2, the scanning line for resetting 3, and the Cs line 10 are all independent, and the ratio of the area through which light can be transmitted because the number of wirings is increased. Since the aperture ratio is reduced, the brightness is reduced, the power consumption of the backlight is increased, or a display failure due to a short circuit between wirings is likely to occur.

【0015】[0015]

【発明が解決しようとする課題】本発明の目的は、強誘
電性液晶や反強誘電性液晶を用いたアクティブマトリク
ス型液晶表示装置において、輝度低下や消費電力の増
大、配線間のショートによる表示不良の増大を伴うこと
なく、高コントラストが得られ、「ステップ応答」の見
られない高速応答・広視野角の液晶表示装置を提供する
ことである。
SUMMARY OF THE INVENTION It is an object of the present invention to provide an active matrix type liquid crystal display device using a ferroelectric liquid crystal or an antiferroelectric liquid crystal, in which the luminance is reduced, the power consumption is increased, and a display due to a short circuit between wirings. An object of the present invention is to provide a liquid crystal display device having a high response speed and a wide viewing angle in which a high contrast can be obtained without increasing a defect and a "step response" is not observed.

【0016】[0016]

【課題を解決するための手段】本発明は、第一の基板
と、前記第一の基板上に平行に配置された複数の第一の
走査線と、前記複数の第一の走査線の隣接する配線の間
に配置された複数の第二の走査線と、前記複数の第一の
走査線及び複数の第二の走査線と交わるように配置され
た複数の信号線と、前記第一の基板と平行に配置された
第二の基板と、前記第二の基板上に形成された共通電極
と、前記第一の基板と前記第二の基板の間に挟持された
液晶層と、信号書込み用TFT素子と、リセット用TF
T素子とを有し、前記信号書込み用TFTは前記第一の
走査線と、前記信号線と画素電極との間に接続され、選
択された第一の走査線によって制御され、前記リセット
用TFTは前記第二の走査線と、前記画素電極と前記第
一の走査線の前段の第一の走査線との間に接続され、選
択された第二の走査線によって制御されることを特徴と
するアクティブマトリクス型液晶表示装置を提供する。
According to the present invention, there is provided a first substrate, a plurality of first scanning lines arranged in parallel on the first substrate, and a plurality of first scanning lines adjacent to the plurality of first scanning lines. A plurality of second scanning lines arranged between the wirings, and a plurality of signal lines arranged to intersect the plurality of first scanning lines and the plurality of second scanning lines; and A second substrate disposed in parallel with the substrate, a common electrode formed on the second substrate, a liquid crystal layer sandwiched between the first substrate and the second substrate, and signal writing. TFT element for reset and TF for reset
A T element, wherein the signal writing TFT is connected between the first scanning line and the signal line and the pixel electrode, and is controlled by the selected first scanning line, and the reset TFT Is connected between the second scanning line, the pixel electrode and a first scanning line preceding the first scanning line, and is controlled by a selected second scanning line. An active matrix type liquid crystal display device is provided.

【0017】また、本発明は、前記第一の走査線が選択
される期間の前に、前記信号書込み用TFTと前記画素
電極を介して接続された前記リセット用TFTを制御す
る前記第二の走査線が選択され、前記第二の走査線の次
段の走査線が選択される期間には前記第一の走査線に印
加される電位と前記第二の基板上に形成された共通電極
に印加される電位の差は1V以下であることを特徴とし
た請求項1に記載のアクティブマトリクス型液晶表示装
置の駆動方法を提供する。
Further, the invention is characterized in that before the period in which the first scanning line is selected, the second TFT for controlling the reset TFT connected to the signal writing TFT via the pixel electrode is provided. A scanning line is selected, and during a period in which a scanning line next to the second scanning line is selected, a potential applied to the first scanning line and a common electrode formed on the second substrate are applied. 2. The method according to claim 1, wherein the difference between the applied potentials is 1 V or less.

【0018】本発明において、前記液晶層がカイラルス
メクティツクC相あるいはその副次相の液晶を含有する
場合に特に大きな効果を発揮する。
In the present invention, a particularly great effect is exhibited when the liquid crystal layer contains a liquid crystal of a chiral smectic C phase or a subphase thereof.

【0019】[0019]

【発明の実施の形態】以下、本発明の実施形態について
図面を参照して具体的に説明する。
Embodiments of the present invention will be specifically described below with reference to the drawings.

【0020】本発明において、特定の走査線の選択中
(信号書込み時間中)に同時に以後に選択される走査線
のリセット動作を行うことにより、信号書込み時間をリ
セット時間に充てることなく充分に確保することができ
ると共に、ライン数を滅らすことなく維持することがで
きる。これにより、充分な書込時間の確保により、コン
トラストを向上させることができ、高精細化が可能とな
る。また、リセット時間を信号書込み時間と独立に長く
取ることができ、「ステップ応答」の問題も解消する。
In the present invention, the signal writing time is sufficiently secured without devoting to the reset time by performing the reset operation of the subsequently selected scanning line during the selection of the specific scanning line (during the signal writing time). And the number of lines can be maintained without loss. Thereby, by ensuring a sufficient writing time, the contrast can be improved, and high definition can be achieved. In addition, the reset time can be made longer independently of the signal writing time, and the problem of "step response" can be solved.

【0021】図1は第一の実施例の構造を表す回路図で
ある。この構造においては、リセット用走査線3は信号
書込み用走査線2とほぼ平行に形成されている。信号書
込み用TFT4は信号書込み用走査線2と、信号線1と
画素電極6との間に接続され、信号書込み用走査線2に
よって制御され、リセット用TFT5はリセット用走査
線3と、画素電極6と信号書込み用走査線2の前段の走
査線7との間に接続され、リセット用走査線3によって
制御される。画素電極6と信号書込み用走査線2の前段
の走査線7との間には補助容量(Cs)9が形成されて
いる。
FIG. 1 is a circuit diagram showing the structure of the first embodiment. In this structure, the reset scanning line 3 is formed substantially parallel to the signal writing scanning line 2. The signal writing TFT 4 is connected between the signal writing scanning line 2, the signal line 1 and the pixel electrode 6 and controlled by the signal writing scanning line 2, and the reset TFT 5 is connected to the reset scanning line 3 and the pixel electrode 6. 6 is connected between the scanning line 7 before the signal writing scanning line 2 and is controlled by the reset scanning line 3. A storage capacitor (Cs) 9 is formed between the pixel electrode 6 and the scanning line 7 in the preceding stage of the signal writing scanning line 2.

【0022】この構造における走査線の駆動波形は図2
に示す通りになる。ここで、11は信号書込み用走査線
2の前に選択される走査線7の駆動波形を、12は信号
書込み用走査線2の駆動波形を、13はリセット用走査
線3の駆動波形を、14はリセット用走査線3の次に選
択される走査線8の駆動波形を表す。ここにTfram
eは1フレーム時間を表し、書き換えレートが60Hz
の場合は16.7msとなる。また、Tgonは1水平
時間を表し、信号書込み用走査線2の数で1フレーム時
間を割った時間となる。Vronはリセット用TFT5
を選択する期間Tronにリセット用走査線3に印加さ
れる電圧を、Vroffはその他の期間に走査線3に印
加される電圧を表す。また、Vgonは信号線1に印加
された電圧を画素電極6に書込むために信号書込み用の
TFT4を選択する期間に信号書込み用走査線2に印加
される電圧を、Vrはリセット用走査線3の次段の走査
線8が選択される期間に信号書込み用走査線2に印加さ
れる電圧を、Vgoffはその他の期間に信号書込み用
走査線2に印加される電圧を表す。リセット用走査線3
の次段の走査線が選択される期間に信号書込み用走査線
2に印加される電圧Vrと第二の基板上に形成された共
通電極に印加された電位Vcomとの差は1V以下であ
る。
The driving waveform of the scanning line in this structure is shown in FIG.
It becomes as shown in. Here, 11 is a driving waveform of the scanning line 7 selected before the scanning line 2 for signal writing, 12 is a driving waveform of the scanning line 2 for signal writing, 13 is a driving waveform of the scanning line 3 for resetting, Reference numeral 14 denotes a driving waveform of the scanning line 8 selected after the reset scanning line 3. Here Tfram
e represents one frame time, and the rewriting rate is 60 Hz.
Is 16.7 ms. Tgon represents one horizontal time, which is a time obtained by dividing one frame time by the number of signal writing scanning lines 2. Vron is the reset TFT5
Represents the voltage applied to the reset scanning line 3 during the period Tron, and Vroff represents the voltage applied to the scanning line 3 during other periods. Vgon denotes a voltage applied to the signal writing scanning line 2 during a period when the signal writing TFT 4 is selected in order to write the voltage applied to the signal line 1 to the pixel electrode 6, and Vr denotes a reset scanning line. The voltage applied to the signal writing scanning line 2 during the period in which the scanning line 8 at the stage following the third is selected, and Vgoff represents the voltage applied to the signal writing scanning line 2 during the other periods. Reset scan line 3
The difference between the voltage Vr applied to the signal writing scanning line 2 and the potential Vcom applied to the common electrode formed on the second substrate during the period when the next scanning line is selected is 1 V or less. .

【0023】リセット用TFT5が選択されている期間
Tronにリセット用のTFT5により信号書込み用走
査線2の前段の走査線7の電位Vrが画素電極6に書込
まれ、リセット動作が行われるが、リセット用TFT5
が選択されている期間Tronは1水平時間より長く取
ることができるために、信号書込み用TFT4により信
号を書込む前に画素電位6を信号書込み用走査線2の前
段の走査線7の電位Vrに等しくすることができる。リ
セット用TFT5が選択される期間が終了した直後に、
リセット用TFT5の寄生容量により画素電位6は下が
るが、その大きさは通常1V以下である。下がった後の
画素電位6が第二の基板上に形成された共通電極に印加
された電位Vcomと等しくなるようにVrを選べば、
ステップ応答を無くすようにリセットをすることが可能
である。
During a period Tron during which the reset TFT 5 is selected, the potential Vr of the scanning line 7 preceding the signal writing scanning line 2 is written to the pixel electrode 6 by the reset TFT 5, and the reset operation is performed. Reset TFT5
Can be taken longer than one horizontal time, the pixel potential 6 is changed to the potential Vr of the scanning line 7 before the signal writing scanning line 2 before the signal is written by the signal writing TFT 4. Can be equal to Immediately after the period in which the reset TFT 5 is selected ends,
The pixel potential 6 drops due to the parasitic capacitance of the reset TFT 5, but the magnitude is usually 1 V or less. If Vr is selected such that the pixel potential 6 after dropping becomes equal to the potential Vcom applied to the common electrode formed on the second substrate,
It is possible to reset so as to eliminate the step response.

【0024】本発明に対応するアレイ構成としては、図
3および図4に示すような構成が挙げられる。図3はア
レイ構成全体を示す概略図であり、図4は図3に示すア
レイ構成の画素部拡大図である。信号書込み用の走査線
とリセット用の走査線の引出し方向は向かい合う方向の
方が走査線の駆動素子との接続をする際に配線の交差部
が少なくなるために望ましいが、同じ方向に引出しても
構わない。
As an array configuration corresponding to the present invention, there is a configuration as shown in FIGS. FIG. 3 is a schematic diagram showing the entire array configuration, and FIG. 4 is an enlarged view of a pixel portion of the array configuration shown in FIG. It is desirable that the direction in which the scanning line for signal writing and the scanning line for resetting are drawn out face each other because the number of intersections of the wirings is reduced when connecting the scanning line to the driving element. No problem.

【0025】本発明においては、液晶材料としてカイラ
ルスメクティツクC相あるいはその副次相の液晶(例え
ば、強誘電性液晶、反強誘電性液晶)を用いる場合に大
きな効果が得られる。これは、液晶の持つ自発分極の反
転に伴う反転電流が抑えられるからである。ただし、他
の表示方式の液晶表示素子にも適用することが可能であ
る。ここで、カイラルスメクティツクC相の副次相と
は、強誘電相(Sc*)、反強誘電相(Sc*)、フ
ェリ誘電相(Scγ*)、その他の相(Scα*、Sc
β*、FI、FI、AF、Sc等)を意味する。
In the present invention, a great effect can be obtained when a liquid crystal of a chiral smectic C phase or a sub-phase thereof (for example, a ferroelectric liquid crystal or an antiferroelectric liquid crystal) is used as a liquid crystal material. This is because the reversal current accompanying the reversal of the spontaneous polarization of the liquid crystal is suppressed. However, the present invention can be applied to a liquid crystal display element of another display method. Here, the secondary phases of the chiral smectic C phase include a ferroelectric phase (Sc *), an antiferroelectric phase (Sc A *), a ferrielectric phase (Scγ *), and other phases (Scα *, Sc).
β *, FI H, FI L , AF, meaning the Sc I, etc.).

【0026】本発明において、基板としては、ガラス基
板、プラスチック基板、樹脂フィルム等を用いることが
でき、配向膜、電極、スペーサ、シール材等の材料とし
ては通常液晶表示装置に用いられているものを用いるこ
とができる。
In the present invention, a glass substrate, a plastic substrate, a resin film, or the like can be used as the substrate, and the materials such as an alignment film, an electrode, a spacer, and a sealant are those commonly used in liquid crystal display devices. Can be used.

【0027】次に、本発明の効果を明確にするために行
った実施例について説明する。(実施例1)図1に示す
回路図で表され、図3及び図4で示されるアレイ構成を
有する液晶表示装置を作製した。アレイの信号線の本数
は1024×3本、信号書込み用走査線の本数は768
本のXGAとした。このとき、液晶材料として、自発分
極150nC/cm、応答時間100μs、飽和電圧
5Vの無閾値型反強誘電性液晶A(Fukuda:As
ia Display,95 digest:61(1
995))を用い、能動素子としてはTFTを用い、T
FTの駆動系としては最大印加電圧±6V、信号書込み
用走査線の選択時間Tgonは21μsのXGAのもの
を用いた。このアレイにおいて、画素部のうち光を透過
する部分の割合を表す開口率は60%であり、セルの光
透過率は8%であった。
Next, an embodiment performed to clarify the effect of the present invention will be described. (Example 1) A liquid crystal display device represented by the circuit diagram shown in FIG. 1 and having the array configuration shown in FIGS. 3 and 4 was manufactured. The number of signal lines in the array is 1024 × 3, and the number of scanning lines for signal writing is 768.
XGA of the book. At this time, a thresholdless antiferroelectric liquid crystal A (Fukuda: As) having a spontaneous polarization of 150 nC / cm 2 , a response time of 100 μs, and a saturation voltage of 5 V was used as a liquid crystal material.
ia Display, 95 digest: 61 (1
995)), using a TFT as the active element,
As an FT drive system, an XGA with a maximum applied voltage of ± 6 V and a selection time Tgon of a signal writing scanning line of 21 μs was used. In this array, the aperture ratio, which represents the proportion of the light transmitting portion of the pixel portion, was 60%, and the light transmittance of the cell was 8%.

【0028】この液晶表示装置について、図2に示した
駆動波形で駆動を行い、リセット動作を含む駆動をおこ
なった。なお、リセット電圧はコモン電圧より0.5V
高い電圧とし、リセット用走査線を選択する時間Trは
信号書込み用走査線の選択時間Tgonの5倍となる、
105μsとした。その結果、コントラスト比50:1
が得られ、ステップ応答による残像は認められなかっ
た。(比較例1)図11に示す回路図で示されるアレイ
構成を有する液晶表示装置を作製した。なお、液晶材
料、能動素子、および駆動系は実施例1と同様とした。
この液晶表示装置について、図12に示すような、前ラ
インの選択時と同時にリセット動作を含む駆動を行っ
た。この結果、コントラスト比15:1と低く、ステッ
プ応答による残像が認められた。(比較例2)図13に
示す回路図で示されるアレイ構成を有する液晶表示装置
を作製した。なお、液晶材料、能動素子、および駆動系
は実施例1と同様とした。この液晶表示装置について、
図12に示すような、前ラインの選択時と同時にリセッ
ト動作を含む駆動を行った。
This liquid crystal display device was driven by the driving waveforms shown in FIG. 2, and was driven including a reset operation. The reset voltage is 0.5 V from the common voltage.
A time Tr for selecting a reset scanning line with a high voltage is five times the selection time Tgon for the signal writing scanning line.
105 μs. As a result, the contrast ratio is 50: 1.
Was obtained, and no afterimage due to the step response was observed. Comparative Example 1 A liquid crystal display device having an array configuration shown in the circuit diagram of FIG. 11 was manufactured. The liquid crystal material, active element, and drive system were the same as in Example 1.
The liquid crystal display device was driven including a reset operation simultaneously with the selection of the previous line as shown in FIG. As a result, the contrast ratio was as low as 15: 1, and an afterimage due to the step response was observed. Comparative Example 2 A liquid crystal display device having an array configuration shown in the circuit diagram of FIG. 13 was manufactured. The liquid crystal material, active element, and drive system were the same as in Example 1. About this liquid crystal display device,
Driving including a reset operation was performed simultaneously with the selection of the previous line as shown in FIG.

【0029】この液晶表示装置について、図14に示し
た駆動波形で駆動を行い、リセット動作を含む駆動をお
こなった。なお、リセット用走査線を選択する時間Tr
は信号書込み用走査線の選択時間Tgonの5倍とな
る、105μsとした。その結果、コントラスト比5
0:1が得られ、ステップ応答による残像は認められな
かった。一方で、このアレイにおいて、画素部のうち光
を透過する部分の割合を表す開口率は45%であり、セ
ルの光透過率は6%であった。これにより、バックライ
トの消費電力が30%以上増加した。(実施例2)図5
に示す回路図で表され、図6で示されるアレイ構成を有
する液晶表示装置を作製した。なお、液晶材料、能動素
子、および駆動系は実施例1と同様とした。このアレイ
において、画素部のうち光を透過する部分の割合を表す
開口率は68%であり、セルの光透過率は9%であっ
た。
This liquid crystal display device was driven by the driving waveforms shown in FIG. 14, and was driven including a reset operation. The time Tr for selecting the reset scan line is Tr
Is 105 μs, which is five times the selection time Tgon of the scanning line for signal writing. As a result, the contrast ratio 5
0: 1 was obtained, and no afterimage due to the step response was observed. On the other hand, in this array, the aperture ratio indicating the ratio of the light transmitting portion in the pixel portion was 45%, and the light transmittance of the cell was 6%. As a result, the power consumption of the backlight increased by 30% or more. (Embodiment 2) FIG.
A liquid crystal display device having an array configuration represented by a circuit diagram shown in FIG. The liquid crystal material, active element, and drive system were the same as in Example 1. In this array, the aperture ratio, which represents the ratio of the light transmitting portion of the pixel portion, was 68%, and the light transmittance of the cell was 9%.

【0030】この液晶表示装置について、図2に示した
駆動波形で駆動を行い、リセット動作を含む駆動をおこ
なった。なお、リセット電圧はコモン電圧より0.5V
高い電圧とし、リセット用走査線を選択する時間Trは
信号書込み用走査線の選択時間Tgonの5倍となる、
105μsとした。その結果、コントラスト比40:1
が得られ、ステップ応答による残像は認められなかっ
た。
This liquid crystal display device was driven by the drive waveforms shown in FIG. 2 and was driven including a reset operation. The reset voltage is 0.5 V from the common voltage.
A time Tr for selecting a reset scanning line with a high voltage is five times the selection time Tgon for the signal writing scanning line.
105 μs. As a result, the contrast ratio is 40: 1.
Was obtained, and no afterimage due to the step response was observed.

【0031】[0031]

【発明の効果】以上説明したように、本発明によれば、
強誘電性液晶や反強誘電性液晶を用いたアクティブマト
リクス型液晶表示装置において、輝度低下や消費電力の
増大、配線間のショートによる表示不良の増大を伴うこ
となく、高コントラストが得られ、「ステップ応答」の
見られない高速応答・広視野角の液晶表示装置が得られ
る。
As described above, according to the present invention,
In an active matrix type liquid crystal display device using a ferroelectric liquid crystal or an antiferroelectric liquid crystal, high contrast can be obtained without a decrease in luminance, an increase in power consumption, and an increase in display failure due to a short circuit between wirings. A liquid crystal display device having a high-speed response and a wide viewing angle in which no "step response" is observed can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例1における液晶表示装置の画素
部回路図である。
FIG. 1 is a circuit diagram of a pixel portion of a liquid crystal display device according to a first embodiment of the present invention.

【図2】本発明の実施例1における液晶表示装置の駆動
方法を説明するための図である。
FIG. 2 is a diagram for explaining a driving method of the liquid crystal display device according to the first embodiment of the present invention.

【図3】本発明の実施例1のアレイ構成全体を示す概略
図である。
FIG. 3 is a schematic diagram showing the entire array configuration according to the first embodiment of the present invention.

【図4】本発明の実施例1のアレイの画素部の図であ
る。
FIG. 4 is a diagram of a pixel unit of the array according to the first embodiment of the present invention.

【図5】本発明の実施例2における液晶表示装置の画素
部回路図である。
FIG. 5 is a circuit diagram of a pixel portion of a liquid crystal display device according to a second embodiment of the present invention.

【図6】本発明の実施例2のアレイの画素部の図であ
る。
FIG. 6 is a diagram of a pixel portion of an array according to a second embodiment of the present invention.

【図7】本発明の実施例3における液晶表示装置の駆動
方法を説明するための図である。
FIG. 7 is a diagram illustrating a method for driving a liquid crystal display device according to a third embodiment of the present invention.

【図8】第一の従来例を表す回路図である。FIG. 8 is a circuit diagram illustrating a first conventional example.

【図9】第一の従来例の駆動方法を説明するための図で
ある。
FIG. 9 is a diagram for explaining a driving method of a first conventional example.

【図10】第二の従来例を表す回路図である。FIG. 10 is a circuit diagram illustrating a second conventional example.

【図11】第二の従来例の駆動方法を説明するための図
である。
FIG. 11 is a diagram illustrating a driving method according to a second conventional example.

【符号の説明】[Explanation of symbols]

1…信号線 2…信号書込み用走査線 3…リセット用走査線 4…信号書込み用TFT 5…リセット用TFT 6…画素電極 7…信号書込み用走査線2の前に選択される走査線 8…リセット用走査線3の次に選択される走査線 9…補助容量(Cs) 10…Cs線 11…信号書込み用走査線2の前に選択される走査線7
の駆動波形 12…信号書込み用走査線2の駆動波形 13…リセット用走査線3の駆動波形 14…リセット用走査線3の次に選択される走査線8の
駆動波形
REFERENCE SIGNS LIST 1 signal line 2 signal writing scanning line 3 reset scanning line 4 signal writing TFT 5 reset TFT 6 pixel electrode 7 scanning line selected before signal writing scanning line 8 8 A scanning line selected after the reset scanning line 9 9... Auxiliary capacitance (Cs) 10... A Cs line 11... A scanning line 7 selected before the signal writing scanning line 2.
12 ... Drive waveform of signal writing scanning line 2 13 ... Driving waveform of reset scanning line 3 14 ... Driving waveform of scanning line 8 selected next to reset scanning line 3

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) G09G 3/20 642 G09G 3/36 3/36 G02F 1/136 500 (72)発明者 伊藤 剛 神奈川県横浜市磯子区新磯子町33番地 株 式会社東芝生産技術研究所内 (72)発明者 奥村 治彦 神奈川県横浜市磯子区新磯子町33番地 株 式会社東芝生産技術研究所内 Fターム(参考) 2H092 GA13 GA18 JA24 JB23 JB43 NA05 QA13 QA14 2H093 NA15 NA16 NA43 NB13 NC34 NC35 ND04 ND13 ND32 NE03 NF19 NF20 NH15 5C006 AA11 AC02 AC11 AC22 AF42 BA11 BB15 BC03 BC06 FA00 FA24 FA47 5C080 AA10 BB05 DD03 DD26 EE25 FF11 JJ01 JJ03 JJ04 ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) G09G 3/20 642 G09G 3/36 3/36 G02F 1/136 500 (72) Inventor Tsuyoshi Ito Yokohama, Kanagawa 33, Shinisogo-cho, Isogo-ku, Toshiba, Japan Toshiba Production Technology Research Institute (72) Inventor Haruhiko Okumura 33, Shinisogo-cho, Isogo-ku, Yokohama-shi, Kanagawa Prefecture F-term in Toshiba Production Technology Research Lab. JA24 JB23 JB43 NA05 QA13 QA14 2H093 NA15 NA16 NA43 NB13 NC34 NC35 ND04 ND13 ND32 NE03 NF19 NF20 NH15 5C006 AA11 AC02 AC11 AC22 AF42 BA11 BB15 BC03 BC06 FA00 FA24 FA47 5C080 AA10 BB05 DD03 JJ01 EE03 EE25

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 第一の基板と、前記第一の基板上に平行
に配置された複数の第一の走査線と、前記複数の第一の
走査線の隣接する配線の間に配置された複数の第二の走
査線と、前記複数の第一の走査線及び複数の第二の走査
線と交わるように配置された複数の信号線と、前記第一
の基板と平行に配置された第二の基板と、前記第二の基
板上に形成された共通電極と、前記第一の基板と前記第
二の基板の間に挟持された液晶層と、信号書込み用TF
T素子と、リセット用TFT素子とを有し、 前記信号書込み用TFTは前記第一の走査線と、前記信
号線と画素電極との間に接続され、選択された第一の走
査線によって制御され、前記リセット用TFTは前記第
二の走査線と、前記画素電極と前記第一の走査線の前段
の第一の走査線との間に接続され、選択された第二の走
査線によって制御されることを特徴とするアクティブマ
トリクス型液晶表示装置。
1. A first substrate, a plurality of first scanning lines disposed in parallel on the first substrate, and a plurality of first scanning lines disposed between adjacent wirings of the plurality of first scanning lines. A plurality of second scanning lines, a plurality of signal lines arranged so as to intersect the plurality of first scanning lines and the plurality of second scanning lines, and a plurality of signal lines arranged in parallel with the first substrate. A second substrate, a common electrode formed on the second substrate, a liquid crystal layer sandwiched between the first substrate and the second substrate, and a signal writing TF.
A T element and a reset TFT element, wherein the signal writing TFT is connected between the first scanning line and the signal line and the pixel electrode, and is controlled by the selected first scanning line. The reset TFT is connected between the second scanning line, the pixel electrode and a first scanning line preceding the first scanning line, and is controlled by a selected second scanning line. An active matrix type liquid crystal display device characterized in that:
【請求項2】 前記第一の走査線が選択される期間の前
に、前記信号書込み用TFTと前記画素電極を介して接
続された前記リセット用TFTを制御する前記第二の走
査線が選択され、前記第二の走査線の次段の走査線が選
択される期間には前記第一の走査線に印加される電位と
前記第二の基板上に形成された共通電極に印加される電
位の差は1V以下であることを特徴とした請求項1に記
載のアクティブマトリクス型液晶表示装置の駆動方法。
2. Prior to a period in which the first scanning line is selected, the second scanning line that controls the reset TFT connected via the pixel electrode and the signal writing TFT is selected. And a potential applied to the first scanning line and a potential applied to a common electrode formed on the second substrate during a period in which a scanning line next to the second scanning line is selected. 2. The driving method of an active matrix type liquid crystal display device according to claim 1, wherein the difference is 1 V or less.
【請求項3】 前記液晶層は、カイラルスメクティック
C相或いはその副次相の液晶を含有する請求項1あるい
は2に記載のアクティブマトリクス型液晶表示装置の駆
動方法。
3. The driving method of an active matrix type liquid crystal display device according to claim 1, wherein the liquid crystal layer contains liquid crystal of a chiral smectic C phase or a sub phase thereof.
JP4452499A 1999-02-23 1999-02-23 Active matrix type liquid crystal display device and driving method thereof (reset driving) Expired - Fee Related JP3515410B2 (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1295553C (en) * 2001-09-26 2007-01-17 卡西欧计算机株式会社 Field-sequential type liquid-crystal displaying device adopting active matrix liquid-crystal displaying element
JP2007316453A (en) * 2006-05-29 2007-12-06 Sony Corp Image display device
WO2010021210A1 (en) * 2008-08-18 2010-02-25 シャープ株式会社 Active matrix substrate, liquid crystal panel, liquid crystal display device, liquid crystal display unit, television receiver
TWI386740B (en) * 2007-06-01 2013-02-21 Chimei Innolux Corp Liquid crystal display device and image display method thereof
US8797244B2 (en) 2008-02-20 2014-08-05 Samsung Display Co., Ltd. Display device and method of driving the same
KR101542401B1 (en) 2009-03-05 2015-08-07 삼성디스플레이 주식회사 Liquid crystal display and the driving method thereof

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1295553C (en) * 2001-09-26 2007-01-17 卡西欧计算机株式会社 Field-sequential type liquid-crystal displaying device adopting active matrix liquid-crystal displaying element
JP2007316453A (en) * 2006-05-29 2007-12-06 Sony Corp Image display device
TWI386740B (en) * 2007-06-01 2013-02-21 Chimei Innolux Corp Liquid crystal display device and image display method thereof
US8797244B2 (en) 2008-02-20 2014-08-05 Samsung Display Co., Ltd. Display device and method of driving the same
WO2010021210A1 (en) * 2008-08-18 2010-02-25 シャープ株式会社 Active matrix substrate, liquid crystal panel, liquid crystal display device, liquid crystal display unit, television receiver
US8471972B2 (en) 2008-08-18 2013-06-25 Sharp Kabushiki Kaisha Active matrix substrate, liquid crystal panel, liquid crystal display device, liquid crystal display unit, television receiver
KR101542401B1 (en) 2009-03-05 2015-08-07 삼성디스플레이 주식회사 Liquid crystal display and the driving method thereof

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