JP2000222789A - Optical recording medium - Google Patents

Optical recording medium

Info

Publication number
JP2000222789A
JP2000222789A JP11022113A JP2211399A JP2000222789A JP 2000222789 A JP2000222789 A JP 2000222789A JP 11022113 A JP11022113 A JP 11022113A JP 2211399 A JP2211399 A JP 2211399A JP 2000222789 A JP2000222789 A JP 2000222789A
Authority
JP
Japan
Prior art keywords
layer
transparent dielectric
dielectric layer
optical recording
ratio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11022113A
Other languages
Japanese (ja)
Inventor
Hirotaka Tanaka
浩貴 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP11022113A priority Critical patent/JP2000222789A/en
Publication of JP2000222789A publication Critical patent/JP2000222789A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To increase adhesion property between a transparent resin substrate and a transparent dielectric layer and to obtain a higher Kerr rotation enhancement effect by successively laminating an optical recording layer and a reflection layer on a transparent resin substrate, and forming a transparent dielectric layer consisting of SiaCbOcNd on at least one interface of the optical recording layer. SOLUTION: A first transparent dielectric layer 2 and a second transparent dielectric layer 4 consists of SiaCbOcNd (wherein a=37 to 47 atom.%, b=3 to 9 atom.%, c=6 to 18 atom.% and d=26 to 54 atom.%, satisfying a+b+c+d=100 atom.%). By mixing a rather small proportion of C and O to Si in this structure, the production of SiNx can be suppressed, and C, O on the surface of the transparent resin substrate and Si, C, O in the transparent dielectric layer make covalent bonds to improve the adhesion property. The first transparent dielectric layer 2 and the second transparent dielectric layer 4 are formed by using a target essentially comprising Si and by a reactive sputtering method in a mixture gas of CO2 and N2.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、ディスク状の透明
樹脂基板上に相変化型の光記録層、光磁気記録層等が設
けられ、相変化による反射率の変化やカー効果等の磁気
光学効果によって情報を再生する光記録媒体に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a disk-shaped transparent resin substrate on which a phase-change type optical recording layer, a magneto-optical recording layer and the like are provided. The present invention relates to an optical recording medium for reproducing information by an effect.

【0002】[0002]

【従来の技術】従来、光記録媒体の一種である光磁気記
録媒体は、プラスチック等からなるディスク状の透明樹
脂基板上に、サイアロン(Si,Al,O,Nの非晶質
膜),Si3 4 ,SiO2 等の第一透明誘電体層、T
bFe,TbFeCo,GdFeCo,GdTbFeC
o等からなる少なくとも1層の光磁気記録層、第一透明
誘電体層と同様の組成である第二透明誘電体層、Al,
Au,Pt,Al−Ti合金等からなる反射層から構成
されたものが提案されている。
2. Description of the Related Art Conventionally, a magneto-optical recording medium, which is a kind of optical recording medium, is composed of sialon (amorphous film of Si, Al, O, N), Si on a disk-shaped transparent resin substrate made of plastic or the like. 3 N 4 , SiO 2, etc., first transparent dielectric layer, T
bFe, TbFeCo, GdFeCo, GdTbFeC
o, etc., at least one magneto-optical recording layer, a second transparent dielectric layer having the same composition as the first transparent dielectric layer, Al,
There have been proposed ones comprising a reflective layer made of Au, Pt, Al-Ti alloy or the like.

【0003】前記第一,第二透明誘電体層は、光磁気記
録層に入射した再生用の光が光磁気記録層で反射されカ
ー効果によって反射光の偏光方向が回転する際に、第
一,第二透明誘電体層で反射光を多重反射させることに
よってカー回転角を増大させC/N比等を向上させる、
所謂カー回転角エンハンスメント効果を高めるために設
けられる。また、第一,第二透明誘電体層は、酸化によ
り腐食し易い光磁気記録層を保護し、酸化防止の目的で
設けている。
[0003] The first and second transparent dielectric layers are used when the reproducing light incident on the magneto-optical recording layer is reflected by the magneto-optical recording layer and the direction of polarization of the reflected light is rotated by the Kerr effect. Multiply-reflecting the reflected light on the second transparent dielectric layer to increase the Kerr rotation angle and improve the C / N ratio, etc.
It is provided to enhance the so-called car rotation angle enhancement effect. The first and second transparent dielectric layers are provided for the purpose of protecting the magneto-optical recording layer which is easily corroded by oxidation and preventing oxidation.

【0004】このような光磁気記録媒体において、例え
ば、基板上に窒化シリコン系のエンハンス膜を成膜した
ものにおいて、前記エンハンス膜の組成式がSix y
z(A原子%<x<49原子%でAは10x+y=4
87を満たすxの値、37原子%<y<57原子%、0
原子%<z<18原子%)であり、その屈折率が2.0
〜2.15であることにより、ピンホール密度や内部応
力が低く、基板との密着性が良好なエンハンス膜となる
というものが提案されている(従来例1:特許第268
8505号公報参照)。
In such a magneto-optical recording medium, for example, in what was deposited enhance film of silicon nitride on the substrate, the composition formula of the enhancing film is Si x N y
O z (A atomic% <x <49 atomic% and A is 10x + y = 4
X value satisfying 87, 37 atomic% <y <57 atomic%, 0
Atomic% <z <18 atomic%) and the refractive index is 2.0
It has been proposed that an enhanced film having a low pinhole density and internal stress and a good adhesion to a substrate can be obtained when the ratio is 2.15 to 2.15 (conventional example 1: Japanese Patent No. 268).
No. 8505).

【0005】また、従来例2として、プラスチック基板
上に非晶質金属垂直磁化膜、透光性非磁性体層を積層し
たものにおいて、透光性非磁性体層を33〜65原子%
の炭素を含有した炭化珪素で形成することにより、透光
性非磁性体層のプラスチック基板に対する密着力が高め
られ、レーザ光に対する反射防止効果が大きくなり再生
及び記録時の出力が増大するものが公知である(特開昭
62−157346号公報参照)。
[0005] Further, as a conventional example 2, in the case where an amorphous metal perpendicular magnetization film and a light-transmitting non-magnetic material layer are laminated on a plastic substrate, the light-transmitting non-magnetic material layer is 33 to 65 atomic%.
By forming the light-transmitting nonmagnetic layer with a plastic substrate, the adhesion of the light-transmitting nonmagnetic layer to the plastic substrate is increased, the antireflection effect on laser light is increased, and the output during reproduction and recording is increased. It is known (see JP-A-62-157346).

【0006】従来例3として、磁性層の片面又は両面
に、H,F,C,N,Oのうちから選んだ少なくとも1
種の元素を50at%以下混入したアモルファスSi層
をカー回転角増大層として設けることにより、アモルフ
ァスSi層の光吸収率が減少しカー回転角が増大するも
のが知られている(特開昭60−163247号公報参
照)。
As a third conventional example, at least one of H, F, C, N, and O selected on one or both surfaces of the magnetic layer.
It is known that by providing an amorphous Si layer containing at least 50 at% of a certain element as a Kerr rotation angle increasing layer, the light absorption rate of the amorphous Si layer is reduced and the Kerr rotation angle is increased (Japanese Patent Application Laid-Open No. 60-1985). 163247).

【0007】[0007]

【発明が解決しようとする課題】しかしながら、上記従
来例1では、エンハンス膜中の酸素が隣接する磁性層中
に侵入し易く、磁性層が酸化されてC/N比等の特性が
劣化していた。
However, in the above-mentioned conventional example 1, oxygen in the enhanced film easily penetrates into the adjacent magnetic layer, and the magnetic layer is oxidized to deteriorate the characteristics such as the C / N ratio. Was.

【0008】また、従来例2は、炭化水素ガス中で炭化
珪素ターゲットを用いてスパッタリング法により成膜し
ているが、透光性非磁性体層中に水素が混入することに
なり、その結果光吸収係数は減少するが水素により屈折
率が低下するため、高いカー回転角エンハンスメント効
果が得られなかった。
Further, in Conventional Example 2, a film is formed by a sputtering method using a silicon carbide target in a hydrocarbon gas. However, hydrogen is mixed into the light-transmitting nonmagnetic layer, and as a result, Although the light absorption coefficient was reduced, the refractive index was lowered by hydrogen, so that a high Kerr rotation angle enhancement effect could not be obtained.

【0009】従来例3では、Hを混入させた場合はHに
より屈折率が低下するため、高いカー回転角エンハンス
メント効果が得られず、Fを混入した場合は磁性層を腐
食させる原因となる。また、Cを混入させた場合、屈折
率が1.5近くまで低下するためカー回転角エンハンス
メント効果が得られず、Oを混入させる場合、Oの含有
率が高くなると磁性層の酸化が促進される。Nを混入す
ると、密着性が低下するといった問題があり、H,F,
C,N,O等をSiに対して如何なる組み合わせ及び組
成比でもって混入させれば、上記各問題点を解決できる
か言及されていない。
In the conventional example 3, when H is mixed, the refractive index is reduced by H, so that a high Kerr rotation angle enhancement effect cannot be obtained, and when F is mixed, it causes corrosion of the magnetic layer. Further, when C is mixed, the refractive index decreases to near 1.5, so that the Kerr rotation angle enhancement effect cannot be obtained. When O is mixed, the oxidation of the magnetic layer is promoted when the O content increases. You. When N is mixed, there is a problem that the adhesiveness is deteriorated.
There is no mention of what combination and composition ratio of C, N, O, etc. to Si can solve the above problems.

【0010】従って、本発明は上記事情に鑑みて完成さ
れたものであり、その目的は透明樹脂基板と透明誘電体
層との密着性が高く、高いカー回転角エンハンスメント
効果が得られ、また光磁気記録層の酸化防止性に対して
も有効なものとすることにある。
Accordingly, the present invention has been completed in view of the above circumstances, and has as its object the purpose of achieving high adhesion between a transparent resin substrate and a transparent dielectric layer, achieving a high Kerr rotation angle enhancement effect, and improving optical performance. Another object is to make the magnetic recording layer effective for preventing oxidation.

【0011】[0011]

【課題を解決するための手段】本発明の光記録媒体は、
透明樹脂基板上に光記録層と反射層を順次積層した光記
録媒体であって、前記光記録層の少なくとも一方の界面
にSia b c d(a=37〜47at(原子)
%,b=3〜9at%,c=6〜18at%,d=26
〜54at%,a+b+c+d=100at%)から成
る透明誘電体層を設けたことを特徴とする。
The optical recording medium of the present invention comprises:
An optical recording medium sequentially laminated between the optical recording layer and a reflective layer on the transparent resin substrate, Si a at least one interface of the optical recording layer C b O c N d (a = 37~47at ( atoms)
%, B = 3 to 9 at%, c = 6 to 18 at%, d = 26
(At +54 at%, a + b + c + d = 100 at%).

【0012】本発明は上記構成により、Siに対し比較
的小量のC,Oを混入させることでSiNX の生成が抑
制され、透明樹脂基板表面のC,Oと透明誘電体層中の
Si,C,Oとが共有結合することになり、密着性が向
上する。また、本発明の透明誘電体層は高い屈折率を有
しているので、高いカー回転角エンハンスメント効果が
得られる。
According to the present invention, the generation of SiN x is suppressed by mixing a relatively small amount of C and O into Si, and C and O on the surface of the transparent resin substrate and Si in the transparent dielectric layer are mixed. , C, and O are covalently bonded, and the adhesion is improved. Further, since the transparent dielectric layer of the present invention has a high refractive index, a high Kerr rotation angle enhancement effect can be obtained.

【0013】本発明において、好ましくは、前記透明誘
電体層において、単原子として存在する炭素原子の比を
C1、酸素と単結合した炭素原子の比をC2、二酸化炭
素として存在する炭素原子の比をC3とすると、C1=
0〜20at%、C2=80〜100at%、C3=0
〜20at%、C1+C2+C3=100at%であ
る。
In the present invention, preferably, in the transparent dielectric layer, the ratio of carbon atoms existing as single atoms is C1, the ratio of carbon atoms singly bonded to oxygen is C2, and the ratio of carbon atoms existing as carbon dioxide is Is C3, C1 =
0-20 at%, C2 = 80-100 at%, C3 = 0
2020 at%, C1 + C2 + C3 = 100 at%.

【0014】上記構成により、透明樹脂基板と透明誘電
体層との密着性、C/N比、カー回転角が更に向上す
る。
According to the above configuration, the adhesion between the transparent resin substrate and the transparent dielectric layer, the C / N ratio, and the Kerr rotation angle are further improved.

【0015】[0015]

【発明の実施の形態】本発明の光記録媒体について以下
に説明する。図1は本発明の光磁気記録媒体Mの部分断
面図であり、同図において、1はポリカーボネート,ポ
リアセタール,ポリメチルメタクリレート等のプラスチ
ックからなる透明樹脂基板(以下、基板と略す)、2は
第一透明誘電体層、3はCr,Fe,Co,Ni,Cu
等の遷移金属元素とNd,Sm,Gd,Tb,Dy,H
o等の希土類元素との非晶質合金、例えばTbFe,T
bFeCo,GdFeCo,GdTbFeCo等の少な
くとも1層の磁性層から成る光磁気記録層、4は第一透
明誘電体層2と同様のものから成る第二透明誘電体層、
5はAl,Au,Pt,Al−Ti合金等からなる反射
層である。前記第一,第二透明誘電体層2,4は、光磁
気記録層3の少なくとも一方の界面に設層されていれば
良い。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The optical recording medium of the present invention will be described below. FIG. 1 is a partial sectional view of a magneto-optical recording medium M according to the present invention. In FIG. 1, reference numeral 1 denotes a transparent resin substrate (hereinafter abbreviated as a substrate) made of plastic such as polycarbonate, polyacetal, and polymethyl methacrylate; One transparent dielectric layer, 3 is Cr, Fe, Co, Ni, Cu
And transition metal elements such as Nd, Sm, Gd, Tb, Dy, H
amorphous alloys with rare earth elements such as o, for example, TbFe, T
a magneto-optical recording layer comprising at least one magnetic layer such as bFeCo, GdFeCo, GdTbFeCo, 4 a second transparent dielectric layer comprising the same as the first transparent dielectric layer 2,
Reference numeral 5 denotes a reflection layer made of Al, Au, Pt, an Al—Ti alloy, or the like. The first and second transparent dielectric layers 2 and 4 may be provided on at least one interface of the magneto-optical recording layer 3.

【0016】本発明の第一透明誘電体層2と第二透明誘
電体層4は、Sia b c d (a=37〜47at
(原子)%,b=3〜9at%,c=6〜18at%,
d=26〜54at%,a+b+c+d=100at
%)からなる。
The first transparent dielectric layer 2 and the second transparent dielectric layer 4 of the present invention, Si a C b O c N d (a = 37~47at
(Atomic)%, b = 3 to 9 at%, c = 6 to 18 at%,
d = 26 to 54 at%, a + b + c + d = 100 at
%).

【0017】そして、aが37at%未満では屈折率の
低下によりC/N比が低下し、47at%を超えると第
一透明誘電体層2と第二透明誘電体層4の内部応力が増
大し透明樹脂基板1が反り易くなる。bが3at%未満
では、透明樹脂基板1との密着性が低下し、9at%を
超えると屈折率の低下によりC/N比が低下する。
When a is less than 37 at%, the C / N ratio decreases due to a decrease in the refractive index, and when a exceeds 47 at%, the internal stress in the first transparent dielectric layer 2 and the second transparent dielectric layer 4 increases. The transparent resin substrate 1 is easily warped. When b is less than 3 at%, the adhesion to the transparent resin substrate 1 is reduced, and when b is more than 9 at%, the C / N ratio is reduced due to a decrease in the refractive index.

【0018】また、cが6at%未満では透明樹脂基板
1との密着性が低下し、18at%を超えると光磁気記
録層3が酸化されC/N比が低下する。dについて、2
6at%未満では第一透明誘電体層2と第二透明誘電体
層4の内部応力が増大し透明樹脂基板1が反り易くな
り、54at%を超えると屈折率の低下によりC/N比
が低下する。
When c is less than 6 at%, the adhesion to the transparent resin substrate 1 is reduced, and when c exceeds 18 at%, the magneto-optical recording layer 3 is oxidized and the C / N ratio is lowered. For d, 2
If it is less than 6 at%, the internal stress in the first transparent dielectric layer 2 and the second transparent dielectric layer 4 increases, and the transparent resin substrate 1 is easily warped. If it exceeds 54 at%, the C / N ratio decreases due to a decrease in the refractive index. I do.

【0019】また、第一透明誘電体層2及び第二透明誘
電体層4の厚さは、100〜1000Åが良く、100
Å未満では第一透明誘電体層2が薄くなり過ぎ、基板1
を通過する水や酸素により耐食性が劣化する。1000
Åを超えると媒体M全体の反射率が高くなり過ぎ、入射
レーザ光の損失が増大するため高出力のレーザ光源が必
要になる。
The first transparent dielectric layer 2 and the second transparent dielectric layer 4 preferably have a thickness of 100 to 1000 °,
If it is less than Å, the first transparent dielectric layer 2 becomes too thin and the substrate 1
Corrosion resistance is degraded by water and oxygen passing through. 1000
If Å is exceeded, the reflectance of the entire medium M becomes too high, and the loss of incident laser light increases, so that a high-power laser light source is required.

【0020】本発明の第一透明誘電体層2及び第二透明
誘電体層4は、以下のようにして成膜する。Siを主成
分とするターゲットを用いて、CO2 とN2 の混合ガス
中で反応性スパッタリング法により成膜する。この場
合、成膜速度の大きいDC(直流)スパッタリングが好
ましく、そしてターゲット材料としてはSiC等の絶縁
体ではなく導電性を有するSiを主成分とするターゲッ
トが良く、また雰囲気ガスとしては酸化を促進する酸素
ガスよりもCO2 とN2 の混合ガスが好ましい。CO2
は成膜時に発生するプラズマ中において、そのO2 が解
離することは少なく、そのため磁性層が酸化されること
が殆どない。
The first transparent dielectric layer 2 and the second transparent dielectric layer 4 of the present invention are formed as follows. A film is formed by a reactive sputtering method in a mixed gas of CO 2 and N 2 using a target containing Si as a main component. In this case, DC (direct current) sputtering with a high film-forming rate is preferable, and a target mainly composed of conductive Si instead of an insulator such as SiC is preferable as a target material, and oxidation is promoted as an atmosphere gas. A mixed gas of CO 2 and N 2 is preferred over an oxygen gas. CO 2
In the plasma generated during the film formation, the the O 2 dissociates less, therefore the magnetic layer is it is hardly oxidized.

【0021】また、CO2 を使用することで基板1と第
一,第二透明誘電体層2,4との密着性が高まるが、そ
れは基板1表面のC,OとSiCONのC,Oとが共有
結合することによる。即ち、通常はO=C=Oという2
つの結合手で結合した(2重結合した)CO2 が、プラ
ズマ中でC,O間の2つの結合手が1つになり、図2の
ようにラジカルな状態となり、基板1表面のC,OとS
iCONのC,Oとの間に入り込み共有結合させること
で、密着性を高めているものと考えられる。
Further, the substrate 1 and the first by using CO 2, although the adhesion is improved between the second transparent dielectric layers 2 and 4, it C surface of the substrate 1, the O and SiCON C, and O By a covalent bond. That is, 2 = O = C = O
The CO 2 bonded by two bonds (double bonded) becomes two radicals between C and O in the plasma and becomes a radical state as shown in FIG. O and S
It is considered that the adhesiveness is enhanced by penetrating and covalently bonding between C and O of iCON.

【0022】本発明において、第一透明誘電体層2及び
第二透明誘電体層4について、単原子として存在する炭
素原子の比をC1、酸素と単結合した炭素原子の比をC
2、二酸化炭素として存在する炭素原子の比をC3とす
ると、C1=0〜20at%、C2=80〜100at
%、C3=0〜20at%、C1+C2+C3=100
at%であることが好ましい。
In the present invention, for the first transparent dielectric layer 2 and the second transparent dielectric layer 4, the ratio of carbon atoms existing as single atoms is C1, and the ratio of carbon atoms which are single-bonded to oxygen is C1.
2. Assuming that the ratio of carbon atoms existing as carbon dioxide is C3, C1 = 0 to 20 at% and C2 = 80 to 100 at.
%, C3 = 0 to 20 at%, C1 + C2 + C3 = 100
It is preferably at%.

【0023】C1が20at%を超えると、解離した酸
素が多くなり、光磁気記録層3を酸化しC/N比が劣化
する。C3が20at%を超えると、SiとNが直接共
有結合する割合が増加するため、第一透明誘電体層2及
び第二透明誘電体層4中のSi,C,Oと基板1のC,
Oが共有結合する割合が低下し、密着性が劣化する。C
2が80at%未満では、炭素原子及び酸素原子が1本
の結合手で結合した状態のもの、即ちラジカルな炭素原
子及び酸素原子が少なくなり、基板1のC,Oと第一透
明誘電体層2及び第二透明誘電体層4のSi,C,Oと
が共有結合する割合が減少し、密着性が劣化することに
なる。
If C1 exceeds 20 at%, the amount of dissociated oxygen increases, oxidizing the magneto-optical recording layer 3 and deteriorating the C / N ratio. When C3 exceeds 20 at%, the ratio of direct covalent bonding between Si and N increases, so that Si, C, O in the first transparent dielectric layer 2 and the second transparent dielectric layer 4 and C, C,
The rate at which O is covalently bonded decreases, and the adhesiveness deteriorates. C
2 is less than 80 at%, the carbon and oxygen atoms are bonded by one bond, that is, the number of radical carbon and oxygen atoms is reduced, and C, O and the first transparent dielectric layer of the substrate 1 are reduced. The ratio of covalent bonding between Si, C, and O of the second and second transparent dielectric layers 4 is reduced, and the adhesion is deteriorated.

【0024】また、C1,C2,C3は、X線光電子分
光分析法(X-Ray Photoelectron Spectroscopyで、通称
ESCA)で測定することができる。
C1, C2 and C3 can be measured by X-ray photoelectron spectroscopy (so-called ESCA).

【0025】上記実施形態では、光磁気記録層3が1層
のものについて説明したが、光磁気記録層3が2層以上
あるものについても本発明は適用できる。例えば、基板
1側から、記録層、記録補助層、制御層、初期化層の4
層を基本的に有し、室温から制御層のキュリー温度、記
録層のキュリー温度、記録補助層のキュリー温度、初期
化層のキュリー温度の順に大きくなり、室温で記録層の
保磁力が最も大きく、次いで記録補助層、制御層、初期
化層の順に保磁力が大きいことにより、ダイレクトオー
バーライト(重ね書きによる書き換え)が可能なもので
あっても良い。このようなダイレクトオーバーライト可
能なものの場合、磁性層の数が多く、各磁性層が薄くか
つそれらの機能役割が異なるため、酸化防止に対する保
護がきわめて重要であり、本発明の透明誘電体層は保護
層として有効である。
In the above embodiment, the case where the magneto-optical recording layer 3 has one layer has been described. However, the present invention can be applied to a case where the magneto-optical recording layer 3 has two or more layers. For example, from the substrate 1 side, a recording layer, a recording auxiliary layer, a control layer, and an initialization layer
Basically, the temperature increases from room temperature to the Curie temperature of the control layer, the Curie temperature of the recording layer, the Curie temperature of the recording auxiliary layer, and the Curie temperature of the initialization layer, and the coercive force of the recording layer is the largest at room temperature. Then, direct overwriting (rewriting by overwriting) may be possible because the coercive force is larger in the order of the recording auxiliary layer, the control layer, and the initialization layer. In the case of such a direct overwrite-capable device, since the number of magnetic layers is large, each magnetic layer is thin and their functional roles are different, protection against oxidation prevention is extremely important, and the transparent dielectric layer of the present invention is It is effective as a protective layer.

【0026】また、上記ダイレクトオーバーライト可能
なものにおいて、室温で磁化が消失するか水平磁化にな
ることにより室温で記録層と記録補助層との交換結合力
を制御する交換結合力調整層を、記録層と記録補助層と
の間に設けてもよい。また、基板1と記録層との間に、
読出し専用の読出層を設けてC/N比を高めることもで
きる。
In the above-mentioned direct overwrite-capable recording medium, an exchange coupling force adjusting layer for controlling the exchange coupling force between the recording layer and the recording auxiliary layer at room temperature by losing the magnetization at room temperature or becoming horizontal magnetization is provided. It may be provided between the recording layer and the recording auxiliary layer. Also, between the substrate 1 and the recording layer,
A read-only read layer may be provided to increase the C / N ratio.

【0027】更に、従来、基板1上に光磁気記録層3、
反射層5の順で積層して、基板1の裏面側から再生用の
レーザ光を入射していたが、本発明は基板1上に反射層
5、光磁気記録層3の順で積層し、光磁気記録層3側か
ら再生用のレーザ光を入射するものにも適用できる。こ
の場合、第一透明誘電体層2及び第二透明誘電体層4の
厚さは、100〜400Åが良く、100Å未満では第
一透明誘電体層2が薄くなり過ぎ耐食性が劣化する。4
00Åを超えると入射レーザ光による熱が発散し難くな
り、レーザ光出力が最適値から相対的に大きくなり、そ
の結果C/N比等が劣化する。
Further, conventionally, a magneto-optical recording layer 3,
Although the laser beam for reproduction was incident on the back surface side of the substrate 1 by laminating the reflective layer 5 in this order, the present invention laminates the reflective layer 5 and the magneto-optical recording layer 3 on the substrate 1 in this order. The present invention can also be applied to a case where a reproduction laser beam is incident from the magneto-optical recording layer 3 side. In this case, the thickness of the first transparent dielectric layer 2 and the second transparent dielectric layer 4 is preferably from 100 to 400 °, and if it is less than 100 °, the first transparent dielectric layer 2 becomes too thin and the corrosion resistance deteriorates. 4
If it exceeds 00 °, the heat generated by the incident laser light is unlikely to radiate, and the laser light output becomes relatively large from the optimum value, and as a result, the C / N ratio and the like deteriorate.

【0028】本発明において、光磁気記録層3等の各層
を基板1の両面に積層する(この場合、反射層5、光磁
気記録層3の順で積層する)、又は片面に各層を積層し
た2枚の基板1を貼り付けることにより、2倍の記録密
度としても良い。
In the present invention, each layer such as the magneto-optical recording layer 3 is laminated on both surfaces of the substrate 1 (in this case, the reflective layer 5 and the magneto-optical recording layer 3 are laminated in this order), or each layer is laminated on one surface. The recording density may be doubled by attaching two substrates 1 together.

【0029】上記実施形態においては光磁気記録媒体に
ついて説明したが、本発明は、GeTe,GeSbTe
等の温度により結晶質と非晶質に相変化可能な相変化型
の光記録層を有する光記録媒体にも適用できる。また、
相変化型に限らず、透明樹脂基板上に、光学的に情報を
記録再生可能な光記録層と反射層を形成したものであれ
ば、本発明を適用できる。
In the above embodiment, the magneto-optical recording medium has been described, but the present invention is not limited to GeTe, GeSbTe.
The present invention can also be applied to an optical recording medium having a phase-change type optical recording layer that can be changed into a crystalline state and an amorphous state by such temperatures. Also,
The present invention is not limited to the phase change type, and the present invention can be applied as long as an optical recording layer and a reflective layer capable of optically recording and reproducing information are formed on a transparent resin substrate.

【0030】かくして、本発明は、基板と透明誘電体層
との密着性が高く、高いカー回転角エンハンスメント効
果が得られ、また光磁気記録層の酸化防止に対しても有
効なものが得られるという作用効果を有する。
Thus, according to the present invention, a substrate having a high adhesion between the substrate and the transparent dielectric layer, a high Kerr rotation angle enhancement effect can be obtained, and a material effective for preventing oxidation of the magneto-optical recording layer can be obtained. It has the function and effect.

【0031】尚、本発明は上記の実施形態に限定される
ものではなく、本発明の要旨を逸脱しない範囲内で種々
の変更は何等差し支えない。
It should be noted that the present invention is not limited to the above embodiment, and various changes may be made without departing from the scope of the present invention.

【0032】[0032]

【実施例】本発明の実施例を以下に説明する。Embodiments of the present invention will be described below.

【0033】(実施例)図1の光磁気記録媒体Mを以下
のように構成した。ポリカーボネートからなるディスク
状の基板1を約100℃でベークして、静止対向型の直
流スパッタリング装置内に設置し、所定の真空度まで排
気し、基板1の一主面にSia b cd からなり厚
さ400Åの第一透明誘電体層2、Gd12Dy18Fe70
からなる厚さ300Åの光磁気記録層3、Sia b
c d からなり厚さ300Åの第二透明誘電体層4、A
lからなる厚さ1000Åの反射層を順次成膜した。こ
のような光磁気記録媒体Mにおいて、第一,第二透明誘
電体層2,4の組成を変化させた場合の密着性、再生時
のC/N比、屈折率n、カー回転角(θk)を測定した
結果を表1に示す。
(Embodiment) The magneto-optical recording medium M of FIG. 1 was constructed as follows. The substrate 1 disc-shaped made of polycarbonate and baked at about 100 ° C., was placed in a DC sputtering apparatus stationary opposed type, evacuated to a predetermined degree of vacuum, Si on one main surface of the substrate 1 a C b O c the first transparent dielectric layer 2 having a thickness of 400Å consist N d, Gd 12 Dy 18 Fe 70
Thickness 300Å consisting magneto-optical recording layer 3, Si a C b O
c N second transparent dielectric layer having a thickness of 300Å consist d 4, A
The reflective layers having a thickness of 1000 ° were sequentially formed. In such a magneto-optical recording medium M, the adhesiveness when the composition of the first and second transparent dielectric layers 2 and 4 is changed, the C / N ratio during reproduction, the refractive index n, the Kerr rotation angle (θk ) Are shown in Table 1.

【0034】[0034]

【表1】 [Table 1]

【0035】表1において、C1〜C3はESCA法に
より測定し、θkはカー回転角測定装置により測定した
ものである。ESCA法について具体的に説明すると、
測定装置内を真空にしてSia b c d の固体のサ
ンプルを置き、X線をサンプルに照射したときに光電効
果により発生した光電子の運動エネルギーを測定し、光
電子の束縛エネルギーを求め、その束縛エネルギーのス
ペクトルの位置とピーク強度からサンプルの構成元素、
構成元素の含有量、構成元素の化学的結合状態を知るこ
とができる。
In Table 1, C1 to C3 are measured by the ESCA method, and θk is measured by a Kerr rotation angle measuring device. To explain the ESCA method specifically,
And the inside of the measuring device to vacuum every sample of Si a C b O c N d solid, photoelectron kinetic energy generated by the photoelectric effect measured when irradiated with X-rays in the sample, determine the binding energy of the photoelectrons , The constituent elements of the sample from its binding energy spectrum position and peak intensity,
It is possible to know the content of the constituent elements and the state of chemical bonding of the constituent elements.

【0036】また、密着性の評価は、製造後に80℃で
相対湿度90%の雰囲気中に500時間設置したとき
に、第一透明誘電体層2又は第二透明誘電体層4に剥離
や気泡が全く生じなかったものを100%とし、剥離や
気泡が生じた場合、単位面積(10mm×10mm)に
おいて剥離や気泡の占有面積を差し引いた面積を%で示
すことで行った。
The adhesion was evaluated by peeling or bubbles on the first transparent dielectric layer 2 or the second transparent dielectric layer 4 after the device was placed in an atmosphere at 80 ° C. and a relative humidity of 90% for 500 hours. In the case where peeling or air bubbles were generated, the area obtained by subtracting the area occupied by the peeling or air bubbles in a unit area (10 mm × 10 mm) was indicated by%.

【0037】本発明のNO.1〜3では、成膜時の雰囲
気ガスがCO2 であり、CとOの組成比が1:2になっ
ているのはCO2 のCとOの結合が分離していないこと
を示している。一方、比較例のNO.7〜18では、C
とOの組成比は成膜時の雰囲気ガスをCO2 とO2 とし
その混合比を調整する、又はSiターゲット上にSiC
チップを載せて制御した。
According to the NO. In 1-3, the atmosphere gas at the time of film formation was CO 2 , and the composition ratio of C and O was 1: 2, indicating that the bond between C and O in CO 2 was not separated. I have. On the other hand, NO. In 7-18, C
The composition ratio of O and O is set to CO 2 and O 2 as the atmosphere gas at the time of film formation, and the mixing ratio is adjusted.
The chip was mounted and controlled.

【0038】表1に示すように、本発明のNO.1〜7
では、密着性、C/N比、屈折率n、θk共に高い値を
示し、比較例のNO.8〜25では、密着性、C/N
比、屈折率n、θkの一種以上のパラメータが劣化し
た。
As shown in Table 1, the NO. 1-7
Shows high values in all of the adhesiveness, C / N ratio, refractive index n, and θk. 8 to 25, adhesion, C / N
One or more parameters of the ratio, refractive index n, and θk deteriorated.

【0039】特に、C1が20at%以下のNO.1,
4,5とC1が20at%を超えているNO.10とを
比較すると、NO.10の方がC/N比が劣化した。ま
た、C3が20at%以下のNO.1,2,3とC3が
20at%を超えているNO.9とを比較すると、N
O.9の方が密着性が劣化した。そして、C2が80a
t%以上のNO.1,6とC2が80at%未満のN
O.8とを比較すると、NO.8の方が密着性が劣化し
た。
In particular, NO. 1,
NO.4, 5 and C1 exceeding 20 at%. No. 10 when compared with NO. In the case of No. 10, the C / N ratio was deteriorated. In addition, the NO. NO.1, 2, 3, and C3 exceeding 20 at%. 9 and N
O. In No. 9, the adhesion deteriorated. And C2 is 80a
NO. N in which 1,6 and C2 are less than 80 at%
O. No. 8 in comparison with NO. In the case of No. 8, the adhesion deteriorated.

【0040】また、Siが47at%を超えNが26a
t%未満のNO.20と、Siが47at%でNが26
at%のNO.1とを比較すると、NO.20のものは
基板1が内部応力により変形し、密着性が劣化した。
Further, when Si exceeds 47 at% and N is 26 a
NO. 20 and Si is 47 at% and N is 26
at% of NO. Compared with NO. In the case of No. 20, the substrate 1 was deformed by the internal stress, and the adhesion was deteriorated.

【0041】Oが18at%を超えているNO.25
と、Oが18at%のNO.7とを比較すると、NO.
25では光磁気記録層3が酸化されC/N比が劣化し
た。
NO. In which O exceeds 18 at%. 25
And O. of 18 at% NO. 7 in comparison with NO.
In No. 25, the magneto-optical recording layer 3 was oxidized and the C / N ratio deteriorated.

【0042】Cが3at%未満のNO.22及びCが9
at%を超えているNO.23と、Cが6at%のN
O.2とを比較すると、NO.22では密着性が低下
し、NO.23ではnが低下しC/N比が劣化した。
When C. is less than 3 at%, NO. 22 and C are 9
NO. 23 and N at 6 at% C
O. Compared with NO. In the case of NO. In No. 23, n decreased and C / N ratio deteriorated.

【0043】Siが37at%未満でNが54at%を
超えているNO.21と、Siが37at%でNが54
at%のNO.3とを比較すると、NO.21のものは
C/N比が低下した。
NO.3 containing less than 37 at% of Si and more than 54 at% of N. 21 and Si is 37 at% and N is 54
at% of NO. No. 3 in comparison with NO. In the case of No. 21, the C / N ratio was lowered.

【0044】Oが6at%未満のNO.24と、Oが6
at%のNO.3とを比較すると、NO.24のものは
密着性が低下した。
When NO is less than 6 at%. 24 and O 6
at% of NO. No. 3 in comparison with NO. 24 exhibited poor adhesion.

【0045】[0045]

【発明の効果】本発明は、光記録層の少なくとも一方の
界面にSia b c d (a=37〜47at%,b
=3〜9at%,c=6〜18at%,d=26〜54
at%,a+b+c+d=100at%)から成る透明
誘電体層を設けたことにより、Siに対し比較的小量の
C,Oを混入させることでSiNX の生成が抑制され、
また透明樹脂基板表面のC,Oと透明誘電体層中のS
i,C,Oとが共有結合することになり、密着性が向上
する。また、本発明の透明誘電体層は高い屈折率を有し
ているので、高いカー回転角エンハンスメント効果が得
られ、その結果C/N比及びカー回転角が改善されると
いう作用効果を有する。
According to the present invention, at least one interface of the optical recording layer Si a C b O c N d (a = 37~47at%, b
= 3-9at%, c = 6-18at%, d = 26-54
At%, a + b + c + d = 100 at%), a relatively small amount of C and O is mixed with Si to suppress generation of SiN x .
Also, C, O on the surface of the transparent resin substrate and S,
Since i, C, and O are covalently bonded, the adhesion is improved. Further, since the transparent dielectric layer of the present invention has a high refractive index, a high Kerr rotation angle enhancement effect is obtained, and as a result, the C / N ratio and the Kerr rotation angle are improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の光磁気記録媒体Mの部分断面図であ
る。
FIG. 1 is a partial sectional view of a magneto-optical recording medium M of the present invention.

【図2】ラジカルな状態で結合している炭素と酸素の分
子構造式である。
FIG. 2 is a molecular structural formula of carbon and oxygen bonded in a radical state.

【符号の説明】[Explanation of symbols]

1:透明樹脂基板 2:第一透明誘電体層 3:光磁気記録層 4:第二透明誘電体層 5:反射層 1: transparent resin substrate 2: first transparent dielectric layer 3: magneto-optical recording layer 4: second transparent dielectric layer 5: reflective layer

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】透明樹脂基板上に光記録層と反射層を積層
した光記録媒体であって、前記光記録層の少なくとも一
方の界面にSia b c d (a=37〜47at
(原子)%,b=3〜9at%,c=6〜18at%,
d=26〜54at%,a+b+c+d=100at
%)から成る透明誘電体層を設けたことを特徴とする光
記録媒体。
1. A optical recording medium formed by laminating an optical recording layer and a reflective layer on the transparent resin substrate, Si a at least one interface of the optical recording layer C b O c N d (a = 37~47at
(Atomic)%, b = 3 to 9 at%, c = 6 to 18 at%,
d = 26 to 54 at%, a + b + c + d = 100 at
%) Provided with a transparent dielectric layer comprising:
【請求項2】前記透明誘電体層において、単原子として
存在する炭素原子の比をC1、酸素と単結合した炭素原
子の比をC2、二酸化炭素として存在する炭素原子の比
をC3とすると、C1=0〜20at%、C2=80〜
100at%、C3=0〜20at%、C1+C2+C
3=100at%である請求項1記載の光記録媒体。
2. In the transparent dielectric layer, the ratio of carbon atoms present as single atoms is C1, the ratio of carbon atoms singly bonded to oxygen is C2, and the ratio of carbon atoms present as carbon dioxide is C3. C1 = 0-20at%, C2 = 80-
100at%, C3 = 0-20at%, C1 + C2 + C
2. The optical recording medium according to claim 1, wherein 3 = 100 at%.
JP11022113A 1999-01-29 1999-01-29 Optical recording medium Pending JP2000222789A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11022113A JP2000222789A (en) 1999-01-29 1999-01-29 Optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11022113A JP2000222789A (en) 1999-01-29 1999-01-29 Optical recording medium

Publications (1)

Publication Number Publication Date
JP2000222789A true JP2000222789A (en) 2000-08-11

Family

ID=12073844

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11022113A Pending JP2000222789A (en) 1999-01-29 1999-01-29 Optical recording medium

Country Status (1)

Country Link
JP (1) JP2000222789A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008527426A (en) * 2005-01-03 2008-07-24 ミラディア インク Method and structure for forming an integrated spatial light modulator
US7494700B2 (en) 2004-03-03 2009-02-24 Nec Corporation Optical information recording medium and method of manufacturing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7494700B2 (en) 2004-03-03 2009-02-24 Nec Corporation Optical information recording medium and method of manufacturing the same
JP2008527426A (en) * 2005-01-03 2008-07-24 ミラディア インク Method and structure for forming an integrated spatial light modulator

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