JP2000111252A - Vacuum dryer - Google Patents

Vacuum dryer

Info

Publication number
JP2000111252A
JP2000111252A JP30162298A JP30162298A JP2000111252A JP 2000111252 A JP2000111252 A JP 2000111252A JP 30162298 A JP30162298 A JP 30162298A JP 30162298 A JP30162298 A JP 30162298A JP 2000111252 A JP2000111252 A JP 2000111252A
Authority
JP
Japan
Prior art keywords
chamber
dried
rectifying plate
opening
current plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP30162298A
Other languages
Japanese (ja)
Inventor
Soichi Matsuo
壮一 松尾
Yasuaki Suzuki
庸哲 鈴木
Akira Amada
晶 甘田
Masaharu Kanazawa
正晴 金沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP30162298A priority Critical patent/JP2000111252A/en
Publication of JP2000111252A publication Critical patent/JP2000111252A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To shorten a drying time of a material to be dried and to upgrade a surface state after drying by enabling a straightening plate to be set at a predetermined angle to a horizontal direction. SOLUTION: In the vacuum dryer 1, a straightening plate 4 can be regulated so that an angle θ formed to a horizontal direction falls within a range of 85 to 90 deg.. An opening/closing member 3 is opened, a rear surface (non-coated surface) side of a material S is dropped from an opening O of a chamber 2 so as to be opposed to a surface 4a of the plate 4, supported to a substrate support member 6, and its attitude is stabilized by a substrate guide member 7, and hence the material S can be set to a substantially vertical state. Thus, the material S can be dried in the state that the support member is always not brought into contact with a rear surface to a center side and no deflection occurs irrespective of surface adhering or the like. Accordingly, the adhering of the material S is altered, its preparing time can be shortened. The surface state after drying the material to be dried becomes excellent.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は真空乾燥装置に係
り、特に準備時間を含めて乾燥に要する時間の短縮が可
能で、かつ、被乾燥体の乾燥面が良好な真空乾燥装置に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum drying apparatus, and more particularly to a vacuum drying apparatus capable of shortening a time required for drying including a preparation time and having a good drying surface of an object to be dried.

【0002】[0002]

【従来の技術】例えば、LCD用カラーフィルタでは、
ガラス基板にレジスト液等の塗布液を塗布して乾燥し、
フォトリソグラフィー等により所望のパターンの形成が
行われる。塗布液の塗布方式としては、例えば、スピン
塗布方式、ナイフ塗布方式、ロール塗布方式およびビー
ド塗布方式等の種々の塗布方式が用いられている。この
ような何れの塗布方式で塗布した場合でも、パターン形
成工程の前に塗布膜の乾燥工程を経る必要がある。
2. Description of the Related Art For example, in a color filter for LCD,
A coating liquid such as a resist liquid is applied to a glass substrate and dried,
A desired pattern is formed by photolithography or the like. Various coating methods such as a spin coating method, a knife coating method, a roll coating method, and a bead coating method are used as a coating liquid coating method. Regardless of the application method using any of these application methods, it is necessary to go through a drying step of the coating film before the pattern forming step.

【0003】従来、塗布液が塗布されたガラス基板等の
被乾燥体は、オーブンあるいはホットプレートにおいて
加熱乾燥がなされていた。しかし、上記の加熱による方
法は乾燥に要する時間が長く、この結果、上述のような
LCD用カラーフィルタの製造工程では、ガラス基板の
塗布膜の乾燥工程が全工程の律速段階となっていた。
Conventionally, a dried object such as a glass substrate to which a coating liquid has been applied has been dried by heating in an oven or a hot plate. However, the above-described heating method requires a long time for drying. As a result, in the above-described manufacturing process of the color filter for LCD, the drying process of the coating film on the glass substrate is the rate-determining step of all processes.

【0004】そこで、近年、この乾燥工程の時間短縮を
可能とするものとして真空乾燥装置が使用されている。
これは、塗布膜が形成されたガラス基板を真空状態のチ
ャンバー内に置き、溶剤の蒸発速度を飛躍的に高めたも
のである。
Therefore, in recent years, a vacuum drying device has been used as a device capable of shortening the time of the drying step.
In this method, a glass substrate on which a coating film is formed is placed in a vacuum chamber, and the evaporation rate of the solvent is dramatically increased.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、従来の
真空乾燥装置では、チャンバー内でピンを用いて被乾燥
体を水平状態に支持しているので、裏面にピンが当接す
る部位と、ピンが当接しない部位とで、塗布膜の溶剤蒸
発速度に違いが生じ、ピン跡が乾燥後の塗布面に現われ
るという問題があった。このため、支持ピンの位置は、
塗布面にピン跡が現われても品質に影響しない基板の周
辺部や、基板内部の多面付けパターン形成領域外の数か
所に設けられている。しかし、被乾燥体の品種によって
は、基板内部に位置する支持ピンの位置を変更しなけれ
ばならず、そのため準備に時間を要することになり、乾
燥時間の短縮に支障を来していた。また、大面積の1面
付けの場合等、基板の撓みを防止するために基板中央部
に支持ピンを配設せざるを得ず、このため塗布面にピン
跡が現われることが避けられないという問題があった。
However, in the conventional vacuum drying apparatus, since the object to be dried is supported in a horizontal state by using the pins in the chamber, the portions where the pins abut on the back surface are in contact with the pins. There is a problem in that the solvent evaporation rate of the coating film differs between the portions not in contact with each other, and pin marks appear on the coated surface after drying. Therefore, the position of the support pin is
Even if pin marks appear on the coating surface, the quality is not affected, and it is provided at several locations outside the multi-patterned pattern formation region inside the substrate. However, depending on the type of the object to be dried, the positions of the support pins located inside the substrate must be changed, which requires time for preparation, which hinders shortening of the drying time. In addition, in the case of large-area imposition, for example, a support pin must be provided at the center of the substrate in order to prevent bending of the substrate, and it is inevitable that pin marks appear on the application surface. There was a problem.

【0006】本発明は、このような実情に鑑みてなされ
たものであり、被乾燥体の乾燥時間の短縮が可能で、か
つ、乾燥後の被乾燥体の表面状態が極めて良好である真
空乾燥装置を提供することを目的とする。
SUMMARY OF THE INVENTION The present invention has been made in view of such circumstances, and it is possible to shorten the drying time of the object to be dried, and to perform vacuum drying in which the surface state of the object to be dried after drying is extremely good. It is intended to provide a device.

【0007】[0007]

【課題を解決するための手段】上記目的を達成するため
に、第1の発明は、後壁部に排気口を有するとともに、
上面部に搬入出用の開口部を有するチャンバーと、前記
開口部を開閉するための開閉部材と、前記チャンバー内
において前記後壁部に所定の間隔を設けて略平行に配設
された整流板と、該整流板の下端部から前壁部側に突出
するように設けられた基板支持部材と、前記整流板の側
端部から前壁部側に突出するように設けられた複数の基
板案内部材とを備え、前記真空チャンバーは前記整流板
が水平方向に対して85〜90°の角度をなすように設
定可能であるような構成とした。
In order to achieve the above object, a first aspect of the present invention has an exhaust port in a rear wall portion,
A chamber having an opening for loading / unloading on the upper surface, an opening / closing member for opening / closing the opening, and a rectifying plate disposed substantially parallel to the rear wall in the chamber at a predetermined interval. And a substrate support member provided so as to protrude from the lower end portion of the rectifying plate toward the front wall portion, and a plurality of substrate guides provided so as to protrude from the side end portion of the rectifying plate toward the front wall portion side. The vacuum chamber is configured so that the current plate can be set at an angle of 85 to 90 with respect to the horizontal direction.

【0008】また、第2の発明は、後壁部に排気口を有
するとともに、上面部に搬入出用の開口部を有するチャ
ンバーと、前記開口部を開閉するための開閉部材と、前
記チャンバー内において前記後壁部に所定の間隔を設け
て略平行に配設された整流板と、該整流板の下端部から
前壁部側に突出するように設けられた基板支持部材と、
前記整流板の側端部近傍から前壁部側に突出するように
設けられた複数の基板支持ピンとを備え、前記真空チャ
ンバーは前記整流板が水平方向に対して70〜85°の
角度をなすように設定可能であるような構成とした。
According to a second aspect of the present invention, there is provided a chamber having an exhaust port on a rear wall and an opening for carrying in and out on an upper surface, an opening and closing member for opening and closing the opening, A rectifying plate disposed substantially parallel to the rear wall portion at a predetermined interval, and a substrate supporting member provided so as to protrude from the lower end portion of the rectifying plate toward the front wall portion,
A plurality of substrate support pins provided so as to protrude from the vicinity of the side end of the rectifying plate toward the front wall, and the vacuum chamber forms an angle of 70 to 85 ° with respect to a horizontal direction in the vacuum chamber. The configuration is such that it can be set as follows.

【0009】さらに、第3の発明は、後壁部に排気口を
有するとともに、前壁部と後壁部とが離間することによ
り開状態とすることができるチャンバーと、前記チャン
バー内において前記後壁部に所定の間隔を設けて略平行
に配設された整流板と、該整流板の下端部から前壁部側
に突出するように設けられた基板支持部材と、前記整流
板の側端部から前壁部側近傍に突出するように設けられ
た複数の基板支持ピンとを備え、前記真空チャンバーは
前記整流板が水平方向に対して70〜85°の角度をな
すように設定可能であるような構成とした。
Further, a third aspect of the present invention provides a chamber having an exhaust port in a rear wall portion, which can be opened by separating a front wall portion and a rear wall portion from each other; A rectifying plate disposed substantially parallel to the wall at a predetermined interval, a substrate support member provided to project from the lower end of the rectifying plate toward the front wall, and a side end of the rectifying plate A plurality of substrate support pins provided so as to protrude from the portion near the front wall side, and the vacuum chamber can be set such that the rectifying plate forms an angle of 70 to 85 ° with respect to a horizontal direction. Such a configuration was adopted.

【0010】上述のような本発明では、整流板の裏面側
が水平方向に対して85〜90°の角度をなす状態で、
基板案内部材が被乾燥体の側端部を案内保持し、基板支
持部材が被乾燥体の下端を支持するので、被乾燥体は中
心寄りの裏面に支持部材を当接することなく、かつ、撓
みのない状態で乾燥処理が施され、また、整流板の裏面
側が水平方向に対して70〜85°の角度をなす状態
で、基板支持部材が被乾燥体の下端を支持し、基板支持
ピンが被乾燥体の側端部近傍を支持するので、被乾燥体
は中心寄りの裏面に支持部材を当接することなく、か
つ、撓みのほとんどない状態で乾燥処理が施され、整流
板は被乾燥体から後壁部の排気口に至る排気経路を均一
なものとする。
In the present invention as described above, in a state where the back surface side of the current plate forms an angle of 85 to 90 ° with respect to the horizontal direction,
Since the substrate guide member guides and holds the side end of the object to be dried and the substrate support member supports the lower end of the object to be dried, the object to be dried does not abut the support member on the back surface near the center, and is bent. Drying is performed in a state where there is no, and the substrate supporting member supports the lower end of the object to be dried in a state where the back surface side of the current plate is at an angle of 70 to 85 ° with respect to the horizontal direction, and the substrate supporting pins are Since the vicinity of the side end portion of the object to be dried is supported, the object to be dried is subjected to the drying process without abutting the support member on the back surface near the center and with almost no bending, and the current plate is provided with the object to be dried. The exhaust path from the outlet to the exhaust port in the rear wall is made uniform.

【0011】[0011]

【発明の実施の形態】以下、本発明の実施の形態につい
て説明を行う。第1の発明 図1は第1の発明の真空乾燥装置の一実施形態を示す斜
視図であり、図2は図1に示される真空乾燥装置のA−
A線矢視断面図であり、図3は図2に示される真空乾燥
装置の整流板の斜視図である。図1乃至図3において、
本発明の真空乾燥装置1は、チャンバー2と、このチャ
ンバー2内部に設けられた整流板4とを備えている。
Embodiments of the present invention will be described below. The first invention Figure 1 is a perspective view showing one embodiment of a vacuum drying apparatus of the first aspect of the invention, the vacuum drying device 2 is shown in Figure 1 A-
3 is a perspective view of a current plate of the vacuum drying apparatus shown in FIG. 2. 1 to 3,
The vacuum drying apparatus 1 of the present invention includes a chamber 2 and a current plate 4 provided inside the chamber 2.

【0012】チャンバー2は、対向する前壁部2Aと後
壁部2B、底板部2C、対向する側壁部2D,2D、お
よび上面部2Eからなる直方体形状である。上面部2E
には被乾燥体を搬入出するための開口部Oが形成されて
おり、この開口部Oを開放、密閉するための開閉部材3
が回動可能に設置されている。
The chamber 2 has a rectangular parallelepiped shape including opposed front and rear walls 2A and 2B, a bottom plate 2C, opposed side walls 2D and 2D, and an upper surface 2E. Upper part 2E
Is formed with an opening O for carrying in and out the object to be dried, and an opening / closing member 3 for opening and sealing this opening O.
Are rotatably installed.

【0013】整流板4は、後壁部2Bに複数の支持部材
5を介して略平行となるように配設されている。この整
流板4はアルミニウム、SUS、鉄、銅、樹脂等の材料
により形成されたものを使用することができ、整流板4
の面積は、被乾燥体Sの面積と同等以上とすることが好
ましい。また、整流板4の周辺部とチャンバー2の底板
部2C、側壁部2D,2D、上面部2E(開閉部材3)
との距離は、できるだけ均一となるように整流板4を配
設することが好ましい。さらに、整流板4と後壁部2B
との空間は、必要な排気路を確保した上で、装置小型化
のために極力狭く設定することが好ましい。
The current plate 4 is disposed on the rear wall 2B via a plurality of support members 5 so as to be substantially parallel to each other. The current plate 4 may be formed of a material such as aluminum, SUS, iron, copper, or resin.
Is preferably equal to or more than the area of the object S to be dried. Further, the periphery of the current plate 4 and the bottom plate 2C, the side walls 2D, 2D, and the upper surface 2E of the chamber 2 (opening / closing member 3).
It is preferable to dispose the current plate 4 so that the distance from the current plate is as uniform as possible. Further, the current plate 4 and the rear wall 2B
It is preferable to set the space as small as possible after securing a necessary exhaust path and miniaturizing the apparatus.

【0014】この整流板4は、図3に示されるように、
下端部4bから前壁部2A方向に突出するように設けら
れた複数(図示例では2個)の基板支持部材6と、各側
端部4cから前壁部2A方向に突出するように設けられ
た複数(図示例では左右各2個)の基板案内部材7とを
備えている。基板支持部材6は、図2および図3に仮想
線(2点鎖線)で示された被乾燥体Sを支持するための
ものである。また、基板案内部材7は、く字形状の鉤型
をなしており、基板支持部材6に支持された被乾燥体S
を鉤部7aで保持して、被乾燥体Sが前壁部2A方向や
整流板4方向に傾斜するのを防止して、被乾燥体Sを整
流板4の表面4aから所望の距離に離して姿勢を安定さ
せるためのものである。このような基板支持部材6は、
アルミニウム、SUS、鉄、銅、樹脂等の材料により形
成されたものを使用することができ、基板案内部材7
は、上記の材料の中から摩擦等により被乾燥体Sに傷を
与えないような材料を選定して形成されたものを使用で
きる。
As shown in FIG. 3, the current plate 4 is
A plurality (two in the illustrated example) of substrate support members 6 are provided so as to protrude from the lower end 4b in the direction of the front wall 2A, and are provided so as to protrude in the direction of the front wall 2A from each side end 4c. (In the illustrated example, two on each of the left and right sides). The substrate supporting member 6 is for supporting the object to be dried S indicated by a virtual line (two-dot chain line) in FIGS. 2 and 3. Further, the substrate guide member 7 is formed in a hook shape in a rectangular shape, and the substrate S to be dried supported by the substrate support member 6.
Is held by the hooks 7a to prevent the object to be dried S from inclining in the direction of the front wall 2A or the direction of the current plate 4, and separate the object to be dried S from the surface 4a of the current plate 4 at a desired distance. To stabilize the posture. Such a substrate support member 6 includes:
A material formed of a material such as aluminum, SUS, iron, copper, or resin can be used.
A material formed by selecting a material that does not damage the object to be dried S by friction or the like from the above materials can be used.

【0015】また、後壁部2Bには、排気口9が設けら
れている。この排気口9は図示例では1個であり、整流
板4の略中央部に位置するように配設され、整流板4の
表面4a側のチャンバー2内の気体を整流板4の周辺部
から均一に排気(図2に矢印で示される排気経路)でき
るように構成されている。この排気口9の面積は、後壁
部2Bの面積から整流板4の面積を引いた面積と同等以
下であることが好ましい。尚、排気口9は複数であって
もよく、この場合も、整流板4の表面4a側のチャンバ
ー2内の気体を整流板4の周辺部から均一に吸引できる
ような位置に配設する。
An exhaust port 9 is provided in the rear wall 2B. This exhaust port 9 is one in the illustrated example, and is disposed so as to be located substantially at the center of the current plate 4, and the gas in the chamber 2 on the surface 4 a side of the current plate 4 is removed from the peripheral portion of the current plate 4. It is configured to uniformly exhaust (the exhaust path indicated by the arrow in FIG. 2). The area of the exhaust port 9 is preferably equal to or less than the area obtained by subtracting the area of the current plate 4 from the area of the rear wall 2B. Note that a plurality of exhaust ports 9 may be provided. In this case as well, the exhaust ports 9 are arranged at positions where the gas in the chamber 2 on the surface 4 a side of the current plate 4 can be uniformly sucked from the peripheral portion of the current plate 4.

【0016】このような真空乾燥装置1は、整流板4が
水平方向に対してなす角度θを85〜90°の範囲内と
なるように調整可能である。そして、開閉部材3を開状
としてチャンバー2の開口部Oから被乾燥体Sの裏面
(非塗布面)側を整流板4の表面4aに対向するように
降下させて、基板支持部材6に支持させ、基板案内部材
7により姿勢を安定させることにより、被乾燥体Sを略
垂直状態とすることができる。これにより、被乾燥体S
は面付け等に関係なく、常に中心寄りの裏面に支持部材
が当接しない状態で、かつ、撓みのない状態で乾燥処理
を施すことができる。したがって、被乾燥体Sの面付け
が変更されても、準備に要する時間が極めて短いものと
なる。また、被乾燥体Sに対する表面状態を荒らすこと
なく乾燥時間を短縮することが可能となり、被乾燥体の
乾燥後の表面状態も極めて良好なものとなる。整流板4
の水平方向に対する角度θは90°であることが最も好
ましく、85°未満になると被乾燥体Sのチャンバー2
内への昇降による搬入出がやや難しくなる。また、整流
板4の水平方向に対する角度が90°を超えると、被乾
燥体Sの塗布膜が基板案内部材7に常に接触して未硬化
の塗布液が付着し易く、被乾燥体Sへの汚染の原因とな
るので好ましくない。
The vacuum drying apparatus 1 can be adjusted so that the angle θ formed by the current plate 4 with respect to the horizontal direction is in the range of 85 to 90 °. Then, the opening / closing member 3 is opened and the back surface (non-coating surface) side of the dried object S is lowered from the opening O of the chamber 2 so as to face the surface 4 a of the rectifying plate 4, and is supported by the substrate support member 6. By causing the substrate guide member 7 to stabilize the posture, the object S to be dried can be set to a substantially vertical state. Thereby, the object to be dried S
Irrespective of imposition or the like, the drying process can be performed in a state where the support member does not always contact the back surface near the center and in a state where there is no bending. Therefore, even if the imposition of the object to be dried S is changed, the time required for preparation is extremely short. In addition, the drying time can be reduced without deteriorating the surface state of the object S to be dried, and the surface state of the object to be dried after drying becomes extremely good. Current plate 4
Is most preferably 90 °, and if it is less than 85 °, the chamber 2
It is somewhat difficult to carry in and out by moving up and down. Further, when the angle of the current plate 4 with respect to the horizontal direction exceeds 90 °, the coating film of the drying target S is always in contact with the substrate guide member 7 and the uncured coating liquid easily adheres to the drying target S. It is not preferable because it causes contamination.

【0017】尚、チャンバー2の材質は特に制限はな
く、また、内部容積、内部形状等は図示例に限定される
ものではなく、被乾燥体等を考慮して適宜設定すること
ができる。第2の発明 図4は第2の発明の真空乾燥装置の一実施形態を示す斜
視図であり、図5は図4に示される真空乾燥装置のB−
B線矢視断面図であり、図6は図5に示される真空乾燥
装置の整流板の斜視図である。図4乃至図6において、
本発明の真空乾燥装置11は、チャンバー12と、この
チャンバー12内部に設けられた整流板14とを備えて
いる。
The material of the chamber 2 is not particularly limited, and the internal volume, internal shape and the like are not limited to those shown in the figures, and can be appropriately set in consideration of the object to be dried. Second Invention FIG. 4 is a perspective view showing an embodiment of the vacuum drying apparatus of the second invention, and FIG.
6 is a perspective view of a current plate of the vacuum drying apparatus shown in FIG. 5. 4 to 6,
The vacuum drying device 11 of the present invention includes a chamber 12 and a current plate 14 provided inside the chamber 12.

【0018】チャンバー12は、上述の真空乾燥装置1
のチャンバー2と同様に、対向する前壁部12Aと後壁
部12B、底板部12C、対向する側壁部12D,12
D、および上面部12Eからなる直方体形状である。上
面部12Eには被乾燥体を搬入出するための開口部Oが
形成されており、この開口部Oには開閉部材13が回動
可能に設置されている。
The chamber 12 is provided with the above-described vacuum drying apparatus 1.
Like the chamber 2, the front wall portion 12A and the rear wall portion 12B facing each other, the bottom plate portion 12C, and the side wall portions 12D and 12
D and an upper surface portion 12E. An opening O for carrying in and out the object to be dried is formed in the upper surface 12E, and an opening / closing member 13 is rotatably installed in the opening O.

【0019】整流板14は、上述の真空乾燥装置1の整
流板4と同様に、後壁部12Bに複数の支持部材15を
介して略平行となるように配設されている。この整流板
14の面積、整流板14の周辺部とチャンバー12の各
内壁との距離、および、整流板14と後壁部12Bとの
間隔は、上述の真空乾燥装置1の整流板4と同様の範囲
で設定することができる。
The current plate 14 is disposed substantially parallel to the rear wall portion 12B via a plurality of support members 15, similarly to the current plate 4 of the vacuum drying apparatus 1 described above. The area of the current plate 14, the distance between the peripheral portion of the current plate 14 and each inner wall of the chamber 12, and the distance between the current plate 14 and the rear wall portion 12 </ b> B are the same as those of the current plate 4 of the vacuum drying device 1 described above. Can be set in the range.

【0020】上記の整流板14は、図6に示されるよう
に、下端部14bから前壁部12A方向に突出するよう
に設けられた複数(図示例では2個)の基板支持部材1
6と、側端部14c近傍の表面14aから前壁部12A
方向に突出するように設けられた複数(図示例では左右
各5個)の基板支持ピン18とを備えている。基板支持
部材16は、図5および図6に仮想線(2点鎖線)で示
された被乾燥体Sの下端部を支持するためのものであ
る。また、基板支持ピン18は、被乾燥体Sを整流板1
4の表面14aから所望の距離に浮かして保持するため
のものであり、円錐形状、円柱形状、角柱形状等任意の
形状のものとすることができる。基板支持ピン18の配
設位置は、塗布面にピン跡が現われても品質に影響しな
い被乾燥体Sの周辺部となるように設定し、各基板支持
ピン18の間隔は被乾燥体Sの撓み防止(撓み量10m
m以下)の点から200〜300mmの範囲が好まし
い。このような基板支持部材16は、アルミニウム、S
US、鉄、銅、樹脂等の材料により形成されたものを使
用することができる。また、基板支持ピン18は、上記
の材料の中から摩擦等により被乾燥体Sに傷を与えない
ような材料を選定して使用できる。
As shown in FIG. 6, a plurality of (two in the illustrated example) substrate support members 1 provided so as to protrude from the lower end 14b in the direction of the front wall 12A, as shown in FIG.
6 and the front wall 12A from the surface 14a near the side end 14c.
And a plurality of (five in each of the left and right in the illustrated example) provided so as to protrude in the direction. The substrate supporting member 16 is for supporting the lower end portion of the dried object S indicated by a virtual line (two-dot chain line) in FIGS. 5 and 6. In addition, the substrate support pins 18 are used to connect the drying target S to the current plate 1.
4 to hold it at a desired distance from the surface 14a, and may have any shape such as a conical shape, a cylindrical shape, and a prismatic shape. The disposition position of the substrate support pins 18 is set so as to be at the peripheral portion of the object S to be dried, which does not affect the quality even if a pin mark appears on the application surface. Bending prevention (bending amount 10m
m or less) is preferable in the range of 200 to 300 mm. Such a substrate support member 16 is made of aluminum, S
What was formed with materials, such as US, iron, copper, and resin, can be used. The substrate support pin 18 can be selected from the above materials so as not to damage the object S due to friction or the like.

【0021】チャンバー12の後壁部12Bには、1個
の排気口19が整流板14の略中央部に位置するように
設けられており、整流板14の表面14a側のチャンバ
ー12内の気体を整流板14の周辺部から均一に排気
(図5に矢印で示される排気経路)できるように構成さ
れている。尚、排気口19は複数であってもよく、この
場合も、整流板14の表面14a側のチャンバー12内
の気体を整流板14の周辺部から均一に吸引できるよう
な位置に配設する。
One exhaust port 19 is provided in the rear wall 12B of the chamber 12 so as to be located substantially at the center of the current plate 14, and the gas in the chamber 12 on the surface 14a side of the current plate 14 is provided. From the periphery of the current plate 14 (exhaust path indicated by an arrow in FIG. 5). It should be noted that a plurality of exhaust ports 19 may be provided, and in this case as well, the exhaust ports 19 are provided at positions where the gas in the chamber 12 on the surface 14 a side of the current plate 14 can be uniformly sucked from the peripheral portion of the current plate 14.

【0022】このような真空乾燥装置11は、整流板1
4が水平方向に対してなす角度θを70〜85°の範囲
内となるように調整可能である。そして、開閉部材13
を開状としてチャンバー12の開口部Oから、被乾燥体
Sをその裏面(非塗布面)側が整流板14の表面14a
に対向するように搬入し、基板支持部材16および基板
支持ピン18に支持させることにより、被乾燥体Sを保
持することができる。本発明の真空乾燥装置11では、
このように垂直状態からやや傾けた状態で被乾燥体Sを
保持することにより、被乾燥体Sの塗布膜と基板支持部
材等との接触をなくすことができ、基板支持部材等へ未
硬化の塗布液が付着して被乾燥体Sに汚染が生じること
を防止することができる。また、被乾燥体Sは面付け等
に関係なく、常に中心寄りの裏面に支持部材が当接しな
い状態で、かつ、撓みのほとんどない状態で乾燥処理を
施すことができる。したがって、被乾燥体Sの面付けが
変更されても、準備に要する時間が極めて短いものとな
る。また、表面状態を荒らすことなく乾燥時間を短縮す
ることが可能となり、被乾燥体の乾燥後の必要範囲内で
の表面状態も極めて良好なものとなる。上記の整流板1
4の水平方向に対する角度が70°未満になると、複数
の基板保持ピン18によって支持された被乾燥体Sの撓
みが大きくなり、ロボットによるハンドリングが困難と
なり好ましくない。また、整流板14の水平方向に対す
る角度が85°を超えると、何らかの外力によって被乾
燥体Sが前壁部12A方向に倒れる危険性が高くなり好
ましくない。
Such a vacuum drying device 11 includes the current plate 1
4 can be adjusted so that the angle θ with respect to the horizontal direction is in the range of 70 to 85 °. And the opening and closing member 13
Is opened, and the object to be dried S is moved from the opening O of the chamber 12 to the front surface 14a of the current plate 14 on the back surface (non-coating surface) side.
The object to be dried S can be held by being carried in such a manner as to face the substrate and supported by the substrate support member 16 and the substrate support pins 18. In the vacuum drying device 11 of the present invention,
By holding the object to be dried S in such a state that the object to be dried S is slightly inclined from the vertical state, contact between the coating film of the object to be dried S and the substrate supporting member or the like can be eliminated, and the uncured part of the substrate supporting member or the like can be removed. It is possible to prevent the coating liquid from adhering to cause contamination of the dried object S. In addition, the drying target S can be subjected to the drying process in a state where the support member does not always contact the back surface near the center and there is almost no bending regardless of the imposition or the like. Therefore, even if the imposition of the object to be dried S is changed, the time required for preparation is extremely short. In addition, the drying time can be shortened without deteriorating the surface condition, and the surface condition of the object to be dried within a necessary range after drying becomes extremely good. The above-mentioned current plate 1
If the angle of 4 with respect to the horizontal direction is less than 70 °, bending of the dried object S supported by the plurality of substrate holding pins 18 becomes large, and handling by a robot becomes difficult, which is not preferable. On the other hand, if the angle of the current plate 14 with respect to the horizontal direction exceeds 85 °, the danger of the dried object S falling in the direction of the front wall portion 12A due to some external force increases, which is not preferable.

【0023】尚、チャンバー12の材質は特に制限はな
く、また、内部容積、内部形状等は図示例に限定される
ものではなく、被乾燥体等を考慮して適宜設定すること
ができる。第3の発明 図7は第3の発明の真空乾燥装置の一実施形態を示す斜
視図であり、図8は図7に示される真空乾燥装置のC−
C線矢視断面図である。図7および図8において、本発
明の真空乾燥装置21は、チャンバー22と、このチャ
ンバー22内部に設けられた整流板24とを備えてい
る。
The material of the chamber 12 is not particularly limited, and the internal volume, internal shape, and the like are not limited to those shown in the drawings, and can be appropriately set in consideration of the object to be dried. Third Invention FIG. 7 is a perspective view showing an embodiment of the vacuum drying apparatus of the third invention, and FIG.
FIG. 3 is a sectional view taken along line C of FIG. 7 and 8, the vacuum drying apparatus 21 of the present invention includes a chamber 22 and a current plate 24 provided inside the chamber 22.

【0024】チャンバー22は、対向する前壁部22A
と後壁部22B、対向する底板部22Cと上面部22
E、対向する側壁部22D,22Dからなる直方体形状
であり、後壁部22Bに対して他のチャンバー22の構
成部材が矢印a方向に離接可能となっている。
The chamber 22 has a front wall portion 22A opposed thereto.
And the rear wall portion 22B, and the opposed bottom plate portion 22C and the upper surface portion 22
E, a rectangular parallelepiped shape including opposing side wall portions 22D, 22D, and the constituent members of another chamber 22 can be separated from and connected to the rear wall portion 22B in the direction of arrow a.

【0025】整流板24は、上述の真空乾燥装置11の
整流板14と同様の構造となっている。すなわち、整流
板24は後壁部22Bに複数の支持部材25を介して略
平行となるように配設され、下端部24bから前壁部2
2A方向に突出するように設けられた複数(図示例では
2個)の基板支持部材26と、側端部24c近傍の表面
24aから前壁部22A方向に突出するように設けられ
た複数(図示例では左右各5個)の基板支持ピン28と
を備えている。この整流板24の面積、整流板24の周
辺部とチャンバー22の各内壁との距離、および、整流
板24と後壁部22Bとの間隔は、上述の真空乾燥装置
1の整流板4と同様の範囲で設定することができる。基
板支持ピン28の配設間隔等は、上述の真空乾燥装置1
1の整流板14と同様の範囲で設定することができる。
The current plate 24 has the same structure as that of the current plate 14 of the vacuum drying apparatus 11 described above. That is, the current plate 24 is disposed on the rear wall portion 22B so as to be substantially parallel to the rear wall portion 22B via the plurality of support members 25.
A plurality (two in the illustrated example) of the substrate support members 26 provided to protrude in the 2A direction, and a plurality (FIG. 9) provided to protrude in the direction of the front wall 22A from the surface 24a near the side end 24c. In the illustrated example, five (left and right) substrate support pins 28 are provided. The area of the current plate 24, the distance between the peripheral portion of the current plate 24 and each inner wall of the chamber 22, and the distance between the current plate 24 and the rear wall portion 22B are the same as those of the current plate 4 of the vacuum drying apparatus 1 described above. Can be set in the range. The arrangement interval and the like of the substrate support pins 28 are determined by the above-described vacuum drying apparatus 1.
It can be set in the same range as that of the first rectifying plate 14.

【0026】チャンバー22の後壁部22Bには、1個
の排気口29が整流板24の略中央部に位置するように
設けられており、整流板24の表面24a側のチャンバ
ー22内の気体を整流板24の周辺部から均一に排気
(図8に矢印で示される排気経路)できるように構成さ
れている。尚、排気口29は複数であってもよく、この
場合も、整流板24の表面24a側のチャンバー22内
の気体を整流板24の周辺部から均一に吸引できるよう
な位置に配設する。
One exhaust port 29 is provided in the rear wall 22B of the chamber 22 so as to be located substantially at the center of the current plate 24, and the gas inside the chamber 22 on the surface 24a side of the current plate 24 is provided. From the periphery of the current plate 24 (exhaust path indicated by an arrow in FIG. 8). It should be noted that a plurality of exhaust ports 29 may be provided, and also in this case, the exhaust ports 29 are arranged at positions where the gas in the chamber 22 on the surface 24 a side of the current plate 24 can be uniformly sucked from the peripheral portion of the current plate 24.

【0027】このような真空乾燥装置21は、整流板2
4が水平方向に対して70〜85°の角度となるように
調整可能である。そして、後壁部22Bに対して他のチ
ャンバー22の構成部材を離間して開状態(図8に1点
鎖線で示した状態)とし、チャンバー22の開口部か
ら、被乾燥体Sをその裏面(非塗布面)側が整流板24
の表面24aに対向するように搬入し、基板支持部材2
6および基板支持ピン28に支持させることにより、被
乾燥体Sを保持することができる。このように垂直状態
からやや傾けた状態で被乾燥体Sを保持することによ
り、被乾燥体Sの塗布膜と基板支持部材等との接触をな
くすことができ、基板支持部材等へ未硬化の塗布液が付
着して被乾燥体Sに汚染が生じることを防止することが
できる。また、被乾燥体Sは面付け等に関係なく、常に
中心寄りの裏面に支持部材が当接しない状態で、かつ、
撓みのほとんどない状態で乾燥処理を施すことができ
る。したがって、被乾燥体Sの面付けが変更されても、
準備に要する時間が極めて短いものとなる。また、表面
状態を荒らすことなく乾燥時間を短縮することが可能と
なり、被乾燥体の乾燥後における必要範囲内での表面状
態も極めて良好なものとなる。上記の整流板24の水平
方向に対する角度が70°未満になると、複数の基板支
持ピン28によって支持された被乾燥体Sの撓みが大き
くなり、ロボットによるハンドリングが困難となり好ま
しくない。また、整流板24の水平方向に対する角度が
85°を超えると、何らかの外力によって被乾燥体Sが
前壁部22A方向に倒れる危険性が高くなり好ましくな
い。
Such a vacuum drying device 21 includes a current plate 2
4 can be adjusted so as to form an angle of 70 to 85 ° with respect to the horizontal direction. Then, the constituent members of the other chamber 22 are separated from the rear wall portion 22 </ b> B to be in an open state (a state indicated by a dashed line in FIG. 8). (Non-applied surface) side is rectifying plate 24
Of the substrate supporting member 2
The object to be dried S can be held by being supported by the substrate 6 and the substrate support pins 28. By holding the object to be dried S in such a state that the object to be dried S is slightly inclined from the vertical state, contact between the coating film of the object to be dried S and the substrate supporting member or the like can be eliminated, and the uncured part of the substrate supporting member or the like can be removed. It is possible to prevent the coating liquid from adhering to cause contamination of the dried object S. Also, regardless of the imposition or the like, the object to be dried S is always in a state in which the support member does not contact the back surface near the center, and
Drying can be performed in a state where there is almost no bending. Therefore, even if the imposition of the dried object S is changed,
The time required for preparation is extremely short. In addition, the drying time can be shortened without deteriorating the surface condition, and the surface condition within a necessary range after the drying of the object to be dried becomes extremely good. If the angle of the above-mentioned current plate 24 with respect to the horizontal direction is less than 70 °, the bending of the object to be dried S supported by the plurality of substrate support pins 28 becomes large, and handling by a robot becomes difficult, which is not preferable. On the other hand, if the angle of the current plate 24 with respect to the horizontal direction exceeds 85 °, the danger of the dried object S falling in the direction of the front wall portion 22A due to some external force increases, which is not preferable.

【0028】尚、チャンバー22の材質は特に制限はな
く、また、内部容積、内部形状等は図示例に限定される
ものではなく、被乾燥体等を考慮して適宜設定すること
ができる。
The material of the chamber 22 is not particularly limited, and the internal volume, internal shape, and the like are not limited to those shown in the drawings, and can be appropriately set in consideration of the material to be dried.

【0029】本発明では、被乾燥体には特に制限はな
く、ダイコート、グラビアコート、履け塗り、スピンコ
ート等の種々の方式により形成された塗布膜を備えた基
板が対象となり得る。
In the present invention, the object to be dried is not particularly limited, and may be a substrate provided with a coating film formed by various methods such as die coating, gravure coating, shoe coating, and spin coating.

【0030】[0030]

【発明の効果】以上詳述したように、第1の発明によれ
ば整流板の裏面側が水平方向に対して85〜90°の角
度をなす状態で、基板支持部材および基板案内部材のみ
によって被乾燥体が支持されるので、被乾燥体は中心寄
りの裏面に支持部材が当接することがなく、撓みのない
状態で乾燥処理を施すことができ、被乾燥体の乾燥後の
表面状態は支持部材跡のない極めて良好なものとなる。
また、第2および第3の発明では、整流板の裏面側が水
平方向に対して70〜85°の角度をなす状態で、基板
支持部材および基板支持ピンによって被乾燥体が支持さ
れ、この被乾燥体は中心寄りの裏面に支持部材が当接す
ることなく、かつ、上記の傾斜角度では撓みがほとんど
ない状態で乾燥処理を施すことができ、被乾燥体の乾燥
後の表面状態は、品質に影響しない外周部以外には支持
部材跡のない極めて良好なものとなる。そして、本発明
では、従来の真空乾燥装置でみられたような被乾燥体の
面付け等の変更による支持ピンの位置変更作業が不要で
あり、準備時間の大幅な短縮が可能となり、また、大面
積の基板であっても、面付けに関係なく高品質の乾燥が
可能となる。
As described above in detail, according to the first aspect, the rear surface side of the current plate is covered by only the substrate supporting member and the substrate guiding member with the back surface at an angle of 85 to 90 degrees with respect to the horizontal direction. Since the dried body is supported, the body to be dried can be subjected to the drying treatment without bending without the support member being in contact with the back surface near the center, and the surface state of the body to be dried after drying is supported. Very good without any traces of the members.
In the second and third inventions, the object to be dried is supported by the substrate support member and the substrate support pins in a state where the back surface side of the current plate is at an angle of 70 to 85 ° with respect to the horizontal direction. The body can be subjected to the drying process without the support member abutting on the back surface near the center and with little bending at the above-mentioned inclination angle, and the surface condition of the body to be dried after drying affects quality. There is no trace of the supporting member except for the outer peripheral portion which is not so excellent. And, in the present invention, the work of changing the position of the support pin by changing the imposition of the object to be dried as seen in the conventional vacuum drying apparatus is unnecessary, and the preparation time can be greatly reduced. High-quality drying can be performed regardless of the imposition even on a large-area substrate.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の真空乾燥装置の一実施形態を示す概略
斜視図である。
FIG. 1 is a schematic perspective view showing one embodiment of a vacuum drying device of the present invention.

【図2】図1に示される真空乾燥装置のA−A線矢視断
面図である。
FIG. 2 is a sectional view of the vacuum drying apparatus shown in FIG.

【図3】図2に示される本発明の真空乾燥装置の整流板
の斜視図である。
FIG. 3 is a perspective view of a current plate of the vacuum drying apparatus of the present invention shown in FIG. 2;

【図4】本発明の真空乾燥装置の一実施形態を示す概略
斜視図である。
FIG. 4 is a schematic perspective view showing one embodiment of a vacuum drying device of the present invention.

【図5】図4に示される真空乾燥装置のB−B線矢視断
面図である。
5 is a cross-sectional view of the vacuum drying apparatus shown in FIG. 4 taken along line BB.

【図6】図5に示される本発明の真空乾燥装置の整流板
の斜視図である。
FIG. 6 is a perspective view of a current plate of the vacuum drying apparatus of the present invention shown in FIG.

【図7】本発明の真空乾燥装置の一実施形態を示す概略
斜視図である。
FIG. 7 is a schematic perspective view showing one embodiment of a vacuum drying device of the present invention.

【図8】図7に示される真空乾燥装置のC−C線矢視断
面図である。
FIG. 8 is a sectional view of the vacuum drying apparatus shown in FIG.

【符号の説明】[Explanation of symbols]

1,11,21…真空乾燥装置 2,12,22…チャンバー 2A,12A,22A…前壁部 2B,12B,22B…後壁部 2C,12C,22C…底板部 2D,12D,22D…側壁部 2E,12E,22E…上面部 3,13…開閉部材 4,14,24…整流板 6,16,26…基板支持部材 7…基板案内部材 18,28…基板支持ピン 9,19,29…排気口 S…被乾燥体 1, 11, 21 ... vacuum drying apparatus 2, 12, 22 ... chamber 2A, 12A, 22A ... front wall 2B, 12B, 22B ... rear wall 2C, 12C, 22C ... bottom plate 2D, 12D, 22D ... side wall 2E, 12E, 22E: Upper surface part 3, 13: Opening / closing member 4, 14, 24 ... Rectifying plate 6, 16, 26 ... Substrate support member 7: Substrate guide member 18, 28 ... Substrate support pin 9, 19, 29 ... Exhaust Mouth S ... body to be dried

───────────────────────────────────────────────────── フロントページの続き (72)発明者 甘田 晶 東京都新宿区市谷加賀町一丁目1番1号 大日本印刷株式会社内 (72)発明者 金沢 正晴 東京都新宿区市谷加賀町一丁目1番1号 大日本印刷株式会社内 Fターム(参考) 3L113 AA01 AB10 AC23 AC45 AC46 AC49 AC54 AC55 AC63 AC67 AC75 AC76 AC79 BA34 DA08 DA10 DA24  ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Akira Amada 1-1-1, Ichigaya-Kagacho, Shinjuku-ku, Tokyo Inside Dai Nippon Printing Co., Ltd. (72) Inventor Masaharu Kanazawa 1-1-1, Ichigaga-cho, Shinjuku-ku, Tokyo No. 1 Dai Nippon Printing Co., Ltd. F-term (reference) 3L113 AA01 AB10 AC23 AC45 AC46 AC49 AC54 AC55 AC63 AC67 AC75 AC76 AC79 BA34 DA08 DA10 DA24

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 後壁部に排気口を有するとともに、上面
部に搬入出用の開口部を有するチャンバーと、前記開口
部を開閉するための開閉部材と、前記チャンバー内にお
いて前記後壁部に所定の間隔を設けて略平行に配設され
た整流板と、該整流板の下端部から前壁部側に突出する
ように設けられた基板支持部材と、前記整流板の側端部
から前壁部側に突出するように設けられた複数の基板案
内部材とを備え、前記チャンバーは前記整流板が水平方
向に対して85〜90°の角度をなすように設定可能で
あることを特徴とする真空乾燥装置。
1. A chamber having an exhaust port on a rear wall portion and an opening for carrying in and out on an upper surface portion, an opening / closing member for opening and closing the opening portion, and a rear wall portion inside the chamber. A rectifying plate disposed substantially in parallel with a predetermined interval, a substrate supporting member provided to protrude from the lower end of the rectifying plate toward the front wall, and a front end from a side end of the rectifying plate. A plurality of substrate guide members provided so as to protrude toward the wall, and the chamber can be set so that the rectifying plate forms an angle of 85 to 90 ° with respect to a horizontal direction. Vacuum drying equipment.
【請求項2】 後壁部に排気口を有するとともに、上面
部に搬入出用の開口部を有するチャンバーと、前記開口
部を開閉するための開閉部材と、前記チャンバー内にお
いて前記後壁部に所定の間隔を設けて略平行に配設され
た整流板と、該整流板の下端部から前壁部側に突出する
ように設けられた基板支持部材と、前記整流板の側端部
近傍から前壁部側に突出するように設けられた複数の基
板支持ピンとを備え、前記チャンバーは前記整流板が水
平方向に対して70〜85°の角度をなすように設定可
能であることを特徴とする真空乾燥装置。
2. A chamber having an exhaust port on a rear wall portion and an opening for carrying in and out on an upper surface portion, an opening / closing member for opening and closing the opening portion, A rectifying plate disposed substantially in parallel with a predetermined interval, a substrate supporting member provided so as to protrude from the lower end of the rectifying plate to the front wall portion side, and from a vicinity of a side end of the rectifying plate. A plurality of substrate supporting pins provided so as to protrude toward the front wall side, wherein the chamber can be set so that the rectifying plate forms an angle of 70 to 85 ° with respect to a horizontal direction. Vacuum drying equipment.
【請求項3】 後壁部に排気口を有するとともに、前壁
部と後壁部とが離間することにより開状態とすることが
できるチャンバーと、前記チャンバー内において前記後
壁部に所定の間隔を設けて略平行に配設された整流板
と、該整流板の下端部から前壁部側に突出するように設
けられた基板支持部材と、前記整流板の側端部近傍から
前壁部側に突出するように設けられた複数の基板支持ピ
ンとを備え、前記チャンバーは前記整流板が水平方向に
対して70〜85°の角度をなすように設定可能である
ことを特徴とする真空乾燥装置。
3. A chamber having an exhaust port in a rear wall portion, which can be opened by separating the front wall portion and the rear wall portion from each other, and a predetermined distance between the rear wall portion in the chamber. A rectifying plate disposed substantially parallel to the rectifying plate, a substrate support member provided to protrude from the lower end of the rectifying plate toward the front wall, and a front wall from the vicinity of a side end of the rectifying plate. A plurality of substrate support pins provided so as to protrude to the side, and wherein the chamber can be set so that the rectifying plate forms an angle of 70 to 85 ° with respect to a horizontal direction. apparatus.
JP30162298A 1998-10-08 1998-10-08 Vacuum dryer Pending JP2000111252A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30162298A JP2000111252A (en) 1998-10-08 1998-10-08 Vacuum dryer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30162298A JP2000111252A (en) 1998-10-08 1998-10-08 Vacuum dryer

Publications (1)

Publication Number Publication Date
JP2000111252A true JP2000111252A (en) 2000-04-18

Family

ID=17899170

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30162298A Pending JP2000111252A (en) 1998-10-08 1998-10-08 Vacuum dryer

Country Status (1)

Country Link
JP (1) JP2000111252A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009063183A (en) * 2007-09-04 2009-03-26 Shibaura Mechatronics Corp Substrate treatment apparatus
US9881985B2 (en) 2012-02-28 2018-01-30 Boe Technology Group Co., Ltd. OLED device, AMOLED display device and method for manufacturing same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009063183A (en) * 2007-09-04 2009-03-26 Shibaura Mechatronics Corp Substrate treatment apparatus
US9881985B2 (en) 2012-02-28 2018-01-30 Boe Technology Group Co., Ltd. OLED device, AMOLED display device and method for manufacturing same

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