JP2000047019A - Photosensitive film for flattening black matrix substrate for color filter, its production and production of the color filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a photosensitive film for flattening black matrix substrate for color filter, by which the photosensitive resin layer excellent in flatness can be formed, a method for producing it and a method for producing the color filter capable of exhibiting clean images. SOLUTION: The photosensitive film has a photosensitive resin layer which is sandwiched by a film A and a film B (surface flatness; Ra<=0.020 μm, Rmax<=0.06 μm). The method for producing the photosensitive film is composed of coating a photosensitive resin composition on the film A to form the photosensitive resin layer and then laminating the film B on the photosensitive resin layer. The method for producing the color filter is composed of laminating the photosensitive film on a transparent substrate having a black matrix on its one surface while peeling the film B from the photosensitive film so that the photosensitive resin layer is stuck on the surface in which the black matrix is formed, then exposing to an active ray through the transparent film A, and, after removing the film A, forming a picture element on the photosensitive resin layer.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a photosensitive film for flattening a black matrix substrate for a color filter, a method for producing the same, and a method for producing a color filter.

[0002]

2. Description of the Related Art A method of forming a pixel of a color filter includes:
There are various methods such as spin coating method, electrodeposition method, film method, printing method, etc.There is unevenness due to black matrix on the substrate, especially when forming pixels by printing method, it is necessary to form each color pixel Have difficulty. In particular, when the black matrix is a relatively thick resin black matrix, unevenness caused by the black matrix is a great obstacle. Therefore, as a method of flattening such unevenness of the substrate, a method of applying a transparent resin varnish on the substrate several times or several tens of times by a spin coating method has been conventionally used. Also,
There is also a method of further performing buff polishing on a transparent layer formed by spin coating (Japanese Patent Application Laid-Open No. 7-287112). However, these methods have problems that the resin varnish is wasted and the steps are long.

[0003] As an improvement of the above method, a photosensitive film comprising a support film and a transparent photosensitive resin layer is placed on a substrate on which a black matrix is formed so that the transparent photosensitive resin layer faces the substrate. There is a method of flattening the unevenness of the black matrix substrate by performing a step of bonding and then a step of exposing and peeling off the support film and developing it (Japanese Patent Application Laid-Open No. 9-159812).
However, the photosensitive resin layer of the photosensitive film used in such a method is a very thin film having a thickness of 0.5 to 5 μm. Surface roughness occurs in the photosensitive resin layer due to the size of the photosensitive resin layer. The surface roughness appears as pixel defects and blurred images when a color filter is manufactured, and there is a problem that a clear image cannot be obtained.

[0004]

SUMMARY OF THE INVENTION The present invention is used for flattening unevenness due to a black matrix on a black matrix substrate for a color filter with a photosensitive resin layer. It is an object of the present invention to provide a photosensitive film capable of forming a photosensitive resin layer excellent in quality.

Another object of the present invention is to provide a photosensitive film having excellent workability and environmental protection, among the above photosensitive films.

Another object of the present invention is to provide, among the above-mentioned photosensitive films, a photosensitive film which enables formation of a photosensitive resin layer having particularly excellent flatness on a black matrix substrate. And

Further, the present invention is used for flattening unevenness due to a black matrix on a black matrix substrate for a color filter with a photosensitive resin layer, and provides a photosensitive material having excellent flatness without surface roughness on the black matrix substrate. It is an object of the present invention to provide a method for producing a photosensitive film that enables formation of a conductive resin layer.

Another object of the present invention is to provide a method of manufacturing a color filter which enables clear image display without pixel defects or image blur.

Further, the present invention provides a method of manufacturing a color filter which has good flatness, is free from pixel defects and image blur, has no color mixture between adjacent pixels, and enables clear image display. The purpose is to:

[0010]

The present invention relates to a photosensitive film comprising a photosensitive resin layer containing a photosensitive resin composition sandwiched between a film A and a film B.
And film B is R _a is 0.020μm or less, in which R _max is to provide a black matrix substrate planarization photosensitive film for color filter is one having the following surface smoothness 0.06 .mu.m.

The present invention also relates to a black for a color filter, wherein a photosensitive resin composition is applied to one side of a film A, dried to form a photosensitive resin layer, and a film B is laminated on the photosensitive resin layer. in the preparation of the matrix substrate planarization photosensitive film, color filter film a and film B is less R _a is 0.020, R _max is characterized in that those having the following surface smoothness 0.06μm To provide a method for producing a photosensitive film for flattening a black matrix substrate.

Further, the present invention provides a method in which a photosensitive resin layer is adhered to a surface on which a black matrix is formed while peeling off the film B on a transparent substrate having a black matrix on one surface. The transparent resin on the photosensitive resin layer is characterized by irradiating actinic rays through the film to expose the photosensitive resin layer, removing the film A, and forming pixels on the photosensitive resin layer. And a method of manufacturing a color filter.

[0013] Further, the present invention provides a method in which a photosensitive resin layer is adhered to a surface on which a black matrix is formed, while the film B is peeled off, on a transparent substrate having a black matrix on one surface. After exposing the photosensitive resin layer by irradiating an actinic ray through a black matrix substrate, removing the film A, removing the portion of the photosensitive resin layer on the black matrix by development, and then developing It is intended to provide a method for producing a color filter, wherein pixels are formed on a conductive resin layer.

[0014]

BEST MODE FOR CARRYING OUT THE INVENTION The photosensitive resin composition used in the present invention is not particularly limited as long as it has flexibility and tackiness and is cured by irradiation with actinic rays. When used for flattening a black matrix substrate, after exposure of the photosensitive resin layer, when performing development, it is soluble in a developing solution such as a specific organic solvent, acid, or alkali before exposure, and after exposure. Use an insoluble material. For example, from the viewpoint of workability and environmental preservation, (A) a copolymer of acrylic acid or methacrylic acid and an ethylenically unsaturated compound and having a weight average molecular weight of 20,000 to 150,000 and a film-imparting polymer. 50 to 70 parts by weight, (B) 30 to 50 parts by weight of the ethylenically unsaturated compound (provided that the component (A) and the component (B)
The total amount of the components is 100 parts by weight) and a photosensitive resin composition containing 0.1 to 10 parts by weight of a photopolymerization initiator based on 100 parts by weight of the total amount of the components (A) and (B). It is preferable to use

Examples of the film-imparting polymer (component (A)) include copolymers of alkyl acrylate or alkyl methacrylate and acrylic acid or methacrylic acid, alkyl acrylate or alkyl methacrylate and acrylic methacrylate. Copolymers of an acid or methacrylic acid with a vinyl monomer copolymerizable therewith are exemplified.

Examples of the alkyl acrylate include methyl acrylate, ethyl acrylate, butyl acrylate, ethylhexyl acrylate and the like.

Examples of the alkyl methacrylate include:
Methyl methacrylate, ethyl methacrylate, butyl methacrylate, ethylhexyl methacrylate and the like can be mentioned.

The above copolymerizable vinyl monomers include, for example, dimethylaminoethyl acrylate, diethylaminoethyl acrylate, tetrahydrofurfuryl acrylate, 2,2,2-trifluoroethyl acrylate, 2,2,3,3-tetraethyl acrylate Examples thereof include fluoropropyl acrylate, methacrylate, acrylamide, methacrylamide, diacetone acrylamide, styrene, and vinyltoluene corresponding thereto.

The amount of methacrylic acid or acrylic acid copolymerized in the component (A) is 17
It is preferable to copolymerize by 30 to 30% by weight. 17% by weight
If it is less than 30%, the alkali developability tends to be inferior. If it exceeds 30% by weight, the developer resistance after exposure tends to be inferior.

The use of the component (A) improves the coating properties and the film properties of the cured product. The compounding amount is 50 to 70 parts by weight based on 100 parts by weight of the total amount of the components (A) and (B). It is preferable to use a part. If the amount is less than 50 parts by weight, the photosensitivity tends to decrease, and if it exceeds 70 parts by weight, the photocured product tends to become brittle.

The weight average molecular weight (GP) of the component (A)
C in terms of standard polystyrene)
20,000 to 150,000, preferably
It is more preferable to be 40,000 to 80,000.

As the ethylenically unsaturated compound (component (B)), for example, a compound obtained by adding an α, β-unsaturated carboxylic acid to a polyhydric alcohol (γ-chloro-β-hydroxypropyl-β ′) -Acryloyloxyethyl-
o-phthalate, trimethylolpropane diacrylate, trimethylolpropane triacrylate, tetramethylol methane triacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, etc.), 2,2-bis [4-methacryloxy, polyethoxy) phenyl] Compounds obtained by adding α, β-unsaturated carboxylic acid to propane and glycidyl group-containing compounds (trimethylolpropane triglycidyl ether triacrylate, bisphenol A diglycidyl ether diacrylate, etc.), alkyl esters of acrylic acid (methyl acrylate) , Ethyl acrylate, butyl acrylate, 2-ethylhexyl acrylate, etc.), trimethylhexamethylene diisocyanate, dihydric alcohol and 2 Urethane diacrylate obtained by reacting a monovalent acrylic acid monoester, and methacrylate corresponding thereto. These are used alone or in combination of two or more.

The amount of the component (B) is from 30 to 5 based on 100 parts by weight of the total amount of the components (A) and (B).
It is preferably 0 parts by weight. If the amount is less than 30 parts by weight, the photocured product tends to be brittle, and if it exceeds 50 parts by weight, the photosensitivity tends to decrease.

Examples of the photopolymerization initiator (component (C)) include aromatic ketones (benzophenone, N, N'-tetramethyl-4,4'-diaminobenzophenone, 4-methoxy-4'-dimethylaminobenzophenone). , 4,
4'-diethylaminobenzophenone, 2-ethylanthroquinone, phenanthrenequinone, etc.), benzoin ether (benzoin methyl ether, benzoin ethyl ether, benzoin phenyl ether, etc.), benzoin (methyl benzoin, ethyl benzoin, etc.), 2,
4,5-triarylimidazole dimer (2- (o-
(Chlorophenyl) -4,5-diphenylimidazole dimer, 2- (o-chlorophenyl) -4,5-bis (m
-Methoxyphenyl) imidazole dimer, 2- (o-
(Fluorophenyl) -4,5-diphenylimidazole dimer, 2- (o-phenyl) -4,5-diphenylimidazole dimer, 2- (o-methoxyphenyl)-
4,5-diphenylimidazole dimer, 2- (p-methoxyphenyl) -4,5-diphenylimidazole dimer, 2,4-bis (p-methoxyphenyl) -5-phenylimidazole dimer, -(2,4-dimethoxyphenyl) -4,5-diphenylimidazole dimer,
2- (p-methylmercaptophenyl) -4,5-diphenylimidazole dimer and the like. These are used alone or in combination of two or more.

The amount of the component (C) is from 0.1 to 100 parts by weight of the total of the components (A) and (B).
Preferably it is 10 parts by weight. This compounding amount is 0.1
When the amount is less than the weight part, the light sensitivity tends to be insufficient,
If the amount exceeds 0 parts by weight, light absorption on the surface of the photosensitive resin layer at the time of exposure increases, and the photocuring inside tends to be insufficient.

The photosensitive resin composition used in the present invention contains a melamine resin and / or an epoxy resin which thermally reacts with a carboxyl group of a film-imparting polymer in order to enhance the heat curability, by adding the components (A) and ( B) Total amount of components 1
It is preferable to add 1 to 20 parts by weight to 00 parts by weight.

By adding these and heating after exposure and development, the crosslinking density, heat resistance and the like can be significantly improved. As the heating condition, the heating temperature is 130 to
Preferably, the temperature is 200 ° C., and the heating time is 30 to 60.
Minutes.

The film thickness of the photosensitive resin layer in the photosensitive film of the present invention is 0.5 from the viewpoint of photocurability and filter characteristics.
To 5.0 μm, preferably 2.0 to 3.0 μm.
m is more preferable.

The material of the film for sandwiching the photosensitive resin layer used in the present invention is a material having heat resistance and solvent resistance required for the production of the photosensitive film and which can be peeled off from the photosensitive resin layer. There is no particular limitation as long as a known film can be used. For example, a polyethylene terephthalate film, a polyolefin film (a polyethylene film, a polypropylene film, or the like), a polyester film, or the like can be used. These films may contain 1 to 30% by weight of a filler such as calcium carbonate for preventing unwinding.

The surface of the two films used in the present invention
The smoothness is R_aIs 0.020 μm or less, preferably 0.1 μm.
015 μm or less, R_maxIs 0.06 μm or less, preferably
Must be 0.04 μm or less. here,
R_aIs the average value of the surface roughness, and R_maxIs the largest surface
It is a value of roughness. R_aAnd R_maxIs JIS B 060
Measure according to 1. Randomly from the film surface
At least 5 points extracted (one measurement length is 2.5
mm) and measure the maximum value of the surface roughness as R _maxage,
The arithmetic mean of the surface roughness of at least five points is R_aAnd
For example, Kosaka Laboratory Co., Ltd. Surfcoder SE-
It can be easily obtained by using 30D
You. The surface smoothness of these films is R_aIs 0.02μ
m or R_aIs less than 0.02 μm
R_maxExceeds 0.06 μm, the photosensitive resin layer
Black matrix base that is rough and has excellent flatness
The board cannot be obtained. A fan with excellent surface smoothness
Films, for example, use fillers in film production.
It can be manufactured by minimizing the amount
You.

Commercially available films having the above-mentioned surface smoothness include, for example, Tetron Film M5 manufactured by Teijin Limited.
R (trade name), DuPont Mylar 92D (trade name)
And the like.

In the present invention, it is preferable to use a transparent film as the film A, for example, a polyethylene terephthalate film having excellent transparency. By sticking the photosensitive resin layer on the black matrix substrate without removing the transparent film A and exposing from the film A, it is possible to prevent oxidation and damage of the photosensitive resin layer surface at the time of exposure, A black matrix substrate having excellent flatness can be obtained.

The thickness of the film A is preferably from 5 to 100 μm from the viewpoint of coating properties, workability, resolution and the like.
More preferably, it is 5 to 30 μm.

The thickness of the film B is preferably from 5 to 100 μm from the viewpoint of coatability and workability, and is preferably from 20 to 30 μm.
More preferably, it is μm.

The photosensitive film of the present invention is prepared, for example, by coating a photosensitive resin composition on one side of a film A according to the method of the present invention, and drying to form a photosensitive resin layer. It can be manufactured by laminating the film B on the surface. Of course, as the film A and the film B, _Ra is 0.020 μm or less, preferably 0.01 μm or less.
A film having 5 μm or less and R _max of 0.06 μm or less, preferably 0.04 μm or less is used.

The method for coating the photosensitive resin composition on one side of the film A is not particularly limited and can be carried out by a conventional method. For example, the photosensitive resin composition is dissolved in an organic solvent and applied. Examples of the method include a method of applying a working liquid to the film A by a gravure coating method, a knife coating method, a lorry coating method, a slate coating method, or the like. In particular, a reverse coating method using a gravure coater is preferable from the viewpoint of uniformity of the coating film. Examples of the organic solvent include toluene, acetone, methyl ethyl ketone, methyl isobutyl ketone, methyl cellosolve, ethyl cellosolve, chloroform, methylene chloride, dimethylformamide, methanol, ethanol and the like.
Used alone or in combination of two or more.

The drying can be carried out, for example, by applying a coating solution to the film A and then heating it using a dryer. The heating temperature is preferably from 60 to 150 ° C, more preferably from 80 to 120 ° C. If the heating temperature is lower than 60 ° C., a large amount of the organic solvent tends to remain in the photosensitive resin layer, and if it exceeds 150 ° C., the photosensitive resin layer tends to be discolored. Heating time is 20
The time is preferably from 10 seconds to 10 minutes, more preferably from 1 minute to 5 minutes. If the heating time is less than 20 seconds, a large amount of the organic solvent tends to remain in the photosensitive resin layer, and if it exceeds 10 minutes, the photosensitive resin layer tends to be discolored.

After forming the photosensitive resin layer on the film A in this manner, the film B is laminated on the photosensitive resin layer to obtain the photosensitive film of the present invention.

By using the photosensitive film of the present invention, a photosensitive resin layer is stuck on a black matrix substrate, exposed and developed if necessary, unevenness due to the black matrix on the black matrix substrate can be eliminated. Thus, a black matrix substrate having excellent flatness can be obtained.

The first method for producing the color filter of the present invention is a method using a black matrix substrate whose surface is flattened as described above, and the present invention is applied to a transparent substrate having a black matrix on one surface. While peeling off the film B of the photosensitive film, the photosensitive resin layer is adhered to the surface on which the black matrix is formed and adhered, and irradiated with actinic rays through the transparent film A on the photosensitive resin layer. After exposing the photosensitive resin layer and removing the film A, pixels are formed on the photosensitive resin layer.

As the transparent substrate, for example, a glass substrate provided with an ITO electrode is preferably used. Examples of the black matrix include a chrome black matrix formed by chromium evaporation, a resin black matrix formed of a resin material containing a black colorant, and the like.

As the photosensitive film, a photosensitive resin layer having a thickness equal to or larger than the thickness of the black matrix is used. Usually, the thickness of the photosensitive resin layer is slightly reduced due to contraction or development due to curing at the time of exposure. Therefore, the photosensitive resin layer is 1 to 5 μm thicker than the thickness of the black matrix.
m, the thickness of the photosensitive resin layer from the substrate surface after exposure is the same as the thickness of the black matrix, or 0.1 to 0.5 μm, preferably 0.2 to 0.3 μm, greater than the thickness of the black matrix. It is preferable to make it thicker.

When the photosensitive resin layer is adhered to the black matrix substrate while the photosensitive film is peeled off the film B and bonded to the black matrix substrate, the photosensitive resin layer is heated and pressed against the substrate. Preferably. The heating temperature of the photosensitive resin layer is usually
The pressure is preferably from 90 to 130 ° C., and the pressing pressure is usually preferably from 1.0 to 10 kgf / cm ² . When a roll is used, a roll heated to 90 to 130 ° C. is used, and the roll speed is set to a linear speed of 2 to 10 m / m.
It is preferably set to in. In order to further improve the adhesion between the photosensitive resin layer and the black matrix substrate, it is preferable that the black matrix substrate is also preliminarily heated. As a method of performing such thermocompression bonding,
A method using a laminator generally used when laminating a photosensitive film is preferred.

FIG. 1 is a schematic view showing one embodiment of the method for producing the first color filter of the present invention, and FIG. 1 (a) shows a state after the laminating step of the present invention as described above. Is shown. The photosensitive resin layer 2 is closely adhered to the surface of the black matrix substrate on which the black matrix 4 is formed. In this method, the photosensitive resin layer 2
A transparent film is used as the film A remaining without being peeled from the film. The thickness of the photosensitive resin layer 2 on the black matrix substrate is larger than the thickness of the black matrix 4 and covers the upper surface of the black matrix 4 to form a flat upper surface.

Next, as shown in FIG. 1B, the photosensitive resin layer 2 is entirely exposed by irradiation with actinic rays 5 through a transparent film A. As the actinic ray, known actinic rays can be used, and usually, light having a wavelength of 300 to 450 nm is used. As a light source, a carbon arc lamp, a mercury vapor arc lamp, a xenon arc lamp, or the like is used. When the photosensitive resin composition suitable for the present invention is used, the exposure amount is usually preferably from 10 to 200 mJ / cm ² .

After the exposure, by removing the film A, as shown in FIG. 1 (c), the unevenness due to the black matrix is eliminated by the photosensitive resin layer 2, and a black matrix substrate having a flat surface is obtained. The photosensitive resin layer 2 on the black matrix substrate slightly shrinks and becomes thin as a result of curing by exposure.

Next, by forming predetermined colored pixels in a predetermined arrangement such as a mosaic pattern on the exposed photosensitive resin layer on the black matrix substrate, a color filter is obtained. In FIG. 1D, a red pixel R, a green pixel G, and a blue pixel B are formed on a flat photosensitive resin layer (2). The method for forming the pixel is not particularly limited, and the pixel can be formed by a known method such as a spin coating method, an electrodeposition method, a film method, and a printing method.

In the second method for producing a color filter of the present invention, the photosensitive resin layer of the present invention is applied to a transparent substrate having a black matrix on one surface while the photosensitive resin layer is peeled off while the film B is peeled off. The photosensitive resin layer is exposed to active light through a black matrix substrate to expose the photosensitive resin layer, the film A is removed, and a portion of the photosensitive resin layer on the black matrix is developed. , And forming pixels on the developed photosensitive resin layer. This method is particularly suitable for forming a pixel by a printing method.

FIG. 2 is a schematic view for explaining the second method. FIG. 2A shows a state in which the photosensitive film of the present invention is peeled off and adhered to a black matrix substrate. Is shown. FIG. 2B shows a subsequent exposure step, in which the active resin 5 is irradiated to the photosensitive resin layer 2 via the transparent substrate 3 unlike the first method. In this method, the black matrix 4 serves as a mask, and the film A after exposure is shown in FIG.
In (c), the portion of the photosensitive resin layer 2 on the black matrix 4 remains uncured.

After removing the film A, development is performed. The developer is not particularly limited as long as it is safe and stable and has good operability. When the photosensitive resin composition preferable for the present invention is used, examples thereof include an organic solvent such as chlorocene, toluene and acetone, and an aqueous solution of an alkali such as sodium hydroxide and sodium carbonate. It is preferable to use an alkaline aqueous solution because it has little effect on the environment. The developing method is not particularly limited, and a known developing method can be used. For example, a dip method, a paddle method, a high-pressure spray method, brushing, scrubbing and the like can be mentioned, and a high-pressure spray method is preferable in terms of good resolution.

FIG. 2E shows the black matrix substrate after development, and the cured photosensitive resin layer 2 remaining after development has a portion in contact with the black matrix 4 which is slightly thicker than other portions. Has become. This is a phenomenon caused by diffraction of actinic rays at the time of exposure and contraction of the exposed portion of the photosensitive resin layer at the time of curing.

Next, for example, as shown in FIG.
Pixels (R, G, B) are formed on the photosensitive resin layer 2 on the black matrix substrate to form a color filter.
This second manufacturing method is particularly suitable for forming pixels by a printing method such as screen printing. That is, in the printing method, ink having optical characteristics necessary for each color pixel is placed on the photosensitive resin layer 2 for each color by transfer or the like to form pixels, but the periphery of the photosensitive resin layer 2 is slightly different from that of the other pixels. Since it is thicker than the portion, the ink of each pixel does not protrude above the black matrix 4 and the adjacent pixels, preventing color mixing and displaying a clear image without bleeding. In this method, when the thickness of the photosensitive resin layer after curing by exposure (the thickness from the transparent substrate 3) is S and the thickness of the black matrix is T, (S
−T) = 0 to 3 μm, more preferably 0.1 to 0.5 μm. If (ST) exceeds 3 μm, the distance between the color layer and the black matrix increases, light leaks from the edges of the pixels, and good image display may not be obtained.

[0053]

The present invention will be described below by way of examples.

Example 1 According to the composition shown in Table 1, a uniformly dissolved coating liquid was obtained. The obtained coating liquid was applied on film 1 (film A) in Table 2 in a uniform film thickness and dried for 2 minutes in a dryer at 100 ° C.
Film 1 (film B) was laminated thereon to obtain a transparent photosensitive film having a photosensitive resin layer thickness of 3.0 μm.

Black matrix (thickness: 1.3 μm)
m, line width: 23 μm, lattice size: 100 μm × 300
μm) was heated at 80 ° C. for 10 minutes, and while the resulting photosensitive film was peeled off the film B, the photosensitive resin layer was turned toward the surface of the black matrix substrate where the black matrix was formed. The laminate was laminated on a matrix substrate under the following conditions. Roll temperature: 80 ° C., roll pressure: 4.0 kgf / cm ² , roll speed: 1.5 m / min Then, from the top of film A, an exposure machine (Oak Manufacturing Co., Ltd., HMW-201B, 3k)
W, an ultra-high pressure mercury lamp), and the whole surface was exposed at 50 mJ / cm ² . Next, when the film A was removed, the thickness of the photosensitive resin layer was 1.5 μm from the glass substrate surface of the black matrix substrate, and had a flat surface as shown in FIG. The obtained black matrix substrate had R _a = 0.05 μm and R _max = 0.05 μm, and had excellent flatness and no surface roughness.

On the obtained black matrix substrate,
Pixels were formed using a printing method to obtain a color filter.

A liquid crystal display device was manufactured using the obtained color filter, and an image was displayed. The image was clear without blur.

Comparative Example 1 A black matrix substrate was prepared in the same manner as in Example 1 except that the film 3 in Table 2 was used as the photosensitive film B. The surface of the obtained black matrix substrate was rough with R _a = 0.1 μm and R _max = 0.4 μm.

Using this black matrix substrate, a liquid crystal display device was manufactured in the same manner as in Example 1, and an image was displayed. The image was blurred and was not practical.

Comparative Example 2 A black matrix substrate was produced in the same manner as in Example 1 except that the film A in Table 2 was used as the photosensitive film A. The surface of the obtained black matrix substrate was rough with R _a = 0.1 μm and R _max = 0.3 μm.

Using this black matrix substrate, a liquid crystal display device was produced in the same manner as in Example 1, and an image was displayed. The image was blurred and was not practical.

[0062]

[Table 1]

[0063]

[Table 2] * _Ra and _Rmax are surface roughness meters manufactured by Kosaka Laboratory Co., Ltd.
Probe (needle) by Surfcoder SE-30D
Was measured at a moving distance of 2.5 mm and a moving speed of 0.1 mm / sec.

PET (M5R): polyethylene terephthalate film PET (GS): polyethylene terephthalate film PE (N51P): polyethylene film

[0065]

By using the photosensitive film of the present invention for flattening a black matrix substrate for a color filter, unevenness due to the black matrix is eliminated.
Moreover, an excellent black matrix substrate having excellent surface flatness can be obtained.

The color filter produced by the production method of the present invention using a black matrix substrate flattened by using the above-mentioned photosensitive film has a clear image display without pixel defects, color mixing and image blur. Is what makes it possible.

[Brief description of the drawings]

FIG. 1 is a schematic view illustrating one embodiment of a method for manufacturing a color filter of the present invention.

FIG. 2 is a schematic view illustrating another embodiment of the method for producing a color filter of the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Film A 2 Photosensitive resin layer 3 Transparent substrate 4 Black matrix 5 Active ray R Red pixel G Green pixel B Blue pixel

 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Hiromi Kobayashi F-term (reference) in Hitachi Chemical Co., Ltd. Yamazaki Factory 4-13-1, Higashicho, Hitachi City, Ibaraki Prefecture 2H042 AA06 AA08 AA26 2H048 BA11 BB02 BB28 BB42 2H091 FA02Y FA35Y FC01 FC10 FD15 GA01 GA16 LA12

Claims (7)

[Claims] 1. A photosensitive film comprising a photosensitive resin layer containing a photosensitive resin composition sandwiched between a film A and a film B, wherein the film A and the film B have _Ra of 0.020 μm or less, _A photosensitive film for flattening a black matrix substrate for a color filter, having a surface smoothness having a _max of 0.06 μm or less. 2. The photosensitive resin composition is (A) a copolymer of acrylic acid or methacrylic acid and an ethylenically unsaturated compound, and has a weight average molecular weight of 20,000 to 150,000.
50 to 70 parts by weight of a film-imparting polymer of 00,
(B) 30 to 50 parts by weight of the ethylenically unsaturated compound (however, the total amount of the component (A) and the component (B) is 100 parts by weight) and the total amount of the component (C) (A) and the component (B) is 10
2. The photosensitive film according to claim 1, which contains 0.1 to 10 parts by weight of a photopolymerization initiator based on 0 parts by weight. 3. The photosensitive film according to claim 1, wherein the film A is a transparent film. 4. A black matrix substrate for a color filter, in which a photosensitive resin composition is applied to one side of a film A, dried to form a photosensitive resin layer, and a film B is laminated on the photosensitive resin layer. In the method for producing a photosensitive film for use, the film A and the film B have _Ra of 0.
A method for producing a photosensitive film for flattening a black matrix substrate for a color filter, wherein the photosensitive film has a surface smoothness of 020 μm or less and R _max of 0.06 μm or less. 5. The photosensitive film according to claim 3, wherein the photosensitive resin layer is brought into close contact with the surface on which the black matrix is formed while peeling off the film B on a transparent substrate having a black matrix on one surface. After laminating, exposing the photosensitive resin layer by irradiating with actinic rays through the transparent film A on the photosensitive resin layer and removing the film A,
A method for producing a color filter, wherein pixels are formed on a photosensitive resin layer. 6. The photosensitive film according to claim 1 or 2, wherein the photosensitive resin layer is adhered to the surface on which the black matrix is formed while peeling off the film B on a transparent substrate having a black matrix on one surface. The photosensitive resin layer was exposed to active light through a black matrix substrate to expose the photosensitive resin layer, the film A was removed, and a portion of the photosensitive resin layer on the black matrix was removed by development, followed by development. A method for producing a color filter, wherein pixels are formed on a photosensitive resin layer. 7. The method according to claim 6, wherein the pixels are formed by a printing method.
The described method.