ITTO920706D0 - A support for wafer - Google Patents

A support for wafer

Info

Publication number
ITTO920706D0
ITTO920706D0 ITTO920706A ITTO920706D0 IT TO920706 D0 ITTO920706 D0 IT TO920706D0 IT TO920706 A ITTO920706 A IT TO920706A IT TO920706 D0 ITTO920706 D0 IT TO920706D0
Authority
IT
Italy
Prior art keywords
wafer
support
Prior art date
Application number
Other languages
Italian (it)
Inventor
Robert D Kos
Original Assignee
Fluoroware Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US07/758,604 priority Critical patent/US5154301A/en
Application filed by Fluoroware Inc filed Critical Fluoroware Inc
Publication of ITTO920706D0 publication Critical patent/ITTO920706D0/en
Publication of ITTO920706A1 publication Critical patent/ITTO920706A1/en
Application granted granted Critical
Publication of IT1257076B publication Critical patent/IT1257076B/en

Links

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67326Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67326Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls
    • H01L21/6733Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls characterized by a material, a roughness, a coating or the like
ITTO920706 1991-09-12 1992-08-20 A support for wafer IT1257076B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US07/758,604 US5154301A (en) 1991-09-12 1991-09-12 Wafer carrier

Publications (3)

Publication Number Publication Date
ITTO920706D0 true ITTO920706D0 (en) 1992-08-20
ITTO920706A1 ITTO920706A1 (en) 1993-03-13
IT1257076B IT1257076B (en) 1996-01-05

Family

ID=25052373

Family Applications (1)

Application Number Title Priority Date Filing Date
ITTO920706 IT1257076B (en) 1991-09-12 1992-08-20 A support for wafer

Country Status (8)

Country Link
US (1) US5154301A (en)
JP (1) JP2574608B2 (en)
KR (1) KR0175681B1 (en)
DE (1) DE4223327C2 (en)
FR (1) FR2681473B1 (en)
GB (1) GB2259607B (en)
IT (1) IT1257076B (en)
MY (1) MY119191A (en)

Families Citing this family (58)

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DE69307035D1 (en) * 1992-07-08 1997-02-13 Daifuku Kk Container for disk-like objects
US5472086A (en) * 1994-03-11 1995-12-05 Holliday; James E. Enclosed sealable purgible semiconductor wafer holder
US5476176A (en) * 1994-05-23 1995-12-19 Empak, Inc. Reinforced semiconductor wafer holder
JP2791971B2 (en) * 1994-06-17 1998-08-27 信越ポリマー株式会社 Wafer basket in the wafer carrier
JP3145252B2 (en) * 1994-07-29 2001-03-12 淀川化成株式会社 Substrate supporting a side plate and the cassette using the same
JPH10509747A (en) * 1994-09-26 1998-09-22 エムパック インコーポレイテッド Milled carbon fiber reinforced polymer composition
US5706946A (en) * 1995-06-26 1998-01-13 Kakizaki Manufacturing Co., Ltd Thin-plate supporting container
TW296361B (en) * 1995-06-26 1997-01-21 Kakizaki Seisakusho Kk
JP3423512B2 (en) * 1995-11-27 2003-07-07 信越ポリマー株式会社 Manufacturing method and precision substrate cassette of the precision substrate cassette
DE19644255C1 (en) * 1996-10-24 1998-04-30 Steag Micro Tech Gmbh Apparatus for treating substrates, and using the apparatus
US6520191B1 (en) 1998-10-19 2003-02-18 Memc Electronic Materials, Inc. Carrier for cleaning silicon wafers
WO2000045391A1 (en) * 1999-01-29 2000-08-03 Sharper Image Corporation A rack for compact discs
US7175026B2 (en) 2002-05-03 2007-02-13 Maxtor Corporation Memory disk shipping container with improved contaminant control
US6955267B2 (en) * 2002-06-05 2005-10-18 Sharper Image Corporation Storage and display rack for DVDs
US20030226813A1 (en) * 2002-06-05 2003-12-11 Taylor Charles E. Storage and display rack for DVDs
US10378106B2 (en) 2008-11-14 2019-08-13 Asm Ip Holding B.V. Method of forming insulation film by modified PEALD
US9394608B2 (en) 2009-04-06 2016-07-19 Asm America, Inc. Semiconductor processing reactor and components thereof
US10364496B2 (en) 2011-06-27 2019-07-30 Asm Ip Holding B.V. Dual section module having shared and unshared mass flow controllers
US9589770B2 (en) 2013-03-08 2017-03-07 Asm Ip Holding B.V. Method and systems for in-situ formation of intermediate reactive species
US9484191B2 (en) 2013-03-08 2016-11-01 Asm Ip Holding B.V. Pulsed remote plasma method and system
US9240412B2 (en) 2013-09-27 2016-01-19 Asm Ip Holding B.V. Semiconductor structure and device and methods of forming same using selective epitaxial process
KR20160076208A (en) 2014-12-22 2016-06-30 에이에스엠 아이피 홀딩 비.브이. Semiconductor device and manufacuring method thereof
US10529542B2 (en) 2015-03-11 2020-01-07 Asm Ip Holdings B.V. Cross-flow reactor and method
US10276355B2 (en) 2015-03-12 2019-04-30 Asm Ip Holding B.V. Multi-zone reactor, system including the reactor, and method of using the same
US10458018B2 (en) 2015-06-26 2019-10-29 Asm Ip Holding B.V. Structures including metal carbide material, devices including the structures, and methods of forming same
US9960072B2 (en) 2015-09-29 2018-05-01 Asm Ip Holding B.V. Variable adjustment for precise matching of multiple chamber cavity housings
US10322384B2 (en) 2015-11-09 2019-06-18 Asm Ip Holding B.V. Counter flow mixer for process chamber
US10529554B2 (en) 2016-02-19 2020-01-07 Asm Ip Holding B.V. Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches
US10468251B2 (en) 2016-02-19 2019-11-05 Asm Ip Holding B.V. Method for forming spacers using silicon nitride film for spacer-defined multiple patterning
US10501866B2 (en) 2016-03-09 2019-12-10 Asm Ip Holding B.V. Gas distribution apparatus for improved film uniformity in an epitaxial system
US10343920B2 (en) 2016-03-18 2019-07-09 Asm Ip Holding B.V. Aligned carbon nanotubes
US9892913B2 (en) 2016-03-24 2018-02-13 Asm Ip Holding B.V. Radial and thickness control via biased multi-port injection settings
US10367080B2 (en) 2016-05-02 2019-07-30 Asm Ip Holding B.V. Method of forming a germanium oxynitride film
KR20170129475A (en) 2016-05-17 2017-11-27 에이에스엠 아이피 홀딩 비.브이. Method of forming metal interconnection and method of fabricating semiconductor device using the same
US10388509B2 (en) 2016-06-28 2019-08-20 Asm Ip Holding B.V. Formation of epitaxial layers via dislocation filtering
USD793352S1 (en) * 2016-07-11 2017-08-01 Asm Ip Holding B.V. Getter plate
KR20180012727A (en) 2016-07-27 2018-02-06 에이에스엠 아이피 홀딩 비.브이. Method of processing a substrate
US10395919B2 (en) 2016-07-28 2019-08-27 Asm Ip Holding B.V. Method and apparatus for filling a gap
KR20180023298A (en) 2016-08-25 2018-03-07 에이에스엠 아이피 홀딩 비.브이. Exhaust apparatus and substrate processing apparatus and thin film fabricating method using the same
US10410943B2 (en) 2016-10-13 2019-09-10 Asm Ip Holding B.V. Method for passivating a surface of a semiconductor and related systems
US10229833B2 (en) 2016-11-01 2019-03-12 Asm Ip Holding B.V. Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures
US10435790B2 (en) 2016-11-01 2019-10-08 Asm Ip Holding B.V. Method of subatmospheric plasma-enhanced ALD using capacitively coupled electrodes with narrow gap
US10340135B2 (en) 2016-11-28 2019-07-02 Asm Ip Holding B.V. Method of topologically restricted plasma-enhanced cyclic deposition of silicon or metal nitride
US10269558B2 (en) 2016-12-22 2019-04-23 Asm Ip Holding B.V. Method of forming a structure on a substrate
US10468261B2 (en) 2017-02-15 2019-11-05 Asm Ip Holding B.V. Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures
US10283353B2 (en) 2017-03-29 2019-05-07 Asm Ip Holding B.V. Method of reforming insulating film deposited on substrate with recess pattern
US10529563B2 (en) 2017-03-29 2020-01-07 Asm Ip Holdings B.V. Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures
US10446393B2 (en) 2017-05-08 2019-10-15 Asm Ip Holding B.V. Methods for forming silicon-containing epitaxial layers and related semiconductor device structures
US10504742B2 (en) 2017-05-31 2019-12-10 Asm Ip Holding B.V. Method of atomic layer etching using hydrogen plasma
US10312055B2 (en) 2017-07-26 2019-06-04 Asm Ip Holding B.V. Method of depositing film by PEALD using negative bias
US10249524B2 (en) 2017-08-09 2019-04-02 Asm Ip Holding B.V. Cassette holder assembly for a substrate cassette and holding member for use in such assembly
US10403504B2 (en) 2017-10-05 2019-09-03 Asm Ip Holding B.V. Method for selectively depositing a metallic film on a substrate
US10319588B2 (en) 2017-10-10 2019-06-11 Asm Ip Holding B.V. Method for depositing a metal chalcogenide on a substrate by cyclical deposition
US10290508B1 (en) 2017-12-05 2019-05-14 Asm Ip Holding B.V. Method for forming vertical spacers for spacer-defined patterning
US10510536B2 (en) 2018-03-29 2019-12-17 Asm Ip Holding B.V. Method of depositing a co-doped polysilicon film on a surface of a substrate within a reaction chamber
US10388513B1 (en) 2018-07-03 2019-08-20 Asm Ip Holding B.V. Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
US10483099B1 (en) 2018-07-26 2019-11-19 Asm Ip Holding B.V. Method for forming thermally stable organosilicon polymer film
US10381219B1 (en) 2018-10-25 2019-08-13 Asm Ip Holding B.V. Methods for forming a silicon nitride film

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4135625A (en) * 1976-07-12 1979-01-23 Merrill Kenneth V Multi-compartment container for fragile disks
US4619371A (en) * 1984-05-14 1986-10-28 Rehrig James B Three-sided, stackable material handling crate
US4687097A (en) * 1984-12-11 1987-08-18 Empak, Inc. Wafer processing cassette
US4724963A (en) * 1985-02-20 1988-02-16 Empak, Inc. Wafer processing cassette
US4949848A (en) * 1988-04-29 1990-08-21 Fluoroware, Inc. Wafer carrier
US5042671A (en) * 1989-09-20 1991-08-27 International Business Machines Corporation Versatile product carrier

Also Published As

Publication number Publication date
KR930006878A (en) 1993-04-22
GB9215590D0 (en) 1992-09-02
ITTO920706A1 (en) 1993-03-13
JPH05211229A (en) 1993-08-20
IT1257076B (en) 1996-01-05
MY119191A (en) 2005-04-30
GB2259607A (en) 1993-03-17
DE4223327C2 (en) 2001-12-06
JP2574608B2 (en) 1997-01-22
KR0175681B1 (en) 1999-04-15
DE4223327A1 (en) 1993-03-18
FR2681473B1 (en) 1994-08-19
FR2681473A1 (en) 1993-03-19
US5154301A (en) 1992-10-13
GB2259607B (en) 1995-05-03

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Legal Events

Date Code Title Description
0001 Granted
TA Fee payment date (situation as of prs-date), data collected since 19931001

Effective date: 19970828