IT7923215A0 - Dispositivo schottky e metodo di fabbricazione dello stesso,impiegando leghe intermetalliche di palladio e platino e una barriera di titanio - Google Patents

Dispositivo schottky e metodo di fabbricazione dello stesso,impiegando leghe intermetalliche di palladio e platino e una barriera di titanio

Info

Publication number
IT7923215A0
IT7923215A0 IT7923215A IT2321579A IT7923215A0 IT 7923215 A0 IT7923215 A0 IT 7923215A0 IT 7923215 A IT7923215 A IT 7923215A IT 2321579 A IT2321579 A IT 2321579A IT 7923215 A0 IT7923215 A0 IT 7923215A0
Authority
IT
Italy
Prior art keywords
palladium
platinum
manufacture
schottky device
intermetallic alloys
Prior art date
Application number
IT7923215A
Other languages
English (en)
Other versions
IT1165084B (it
Original Assignee
Int Rectifier Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Int Rectifier Corp filed Critical Int Rectifier Corp
Publication of IT7923215A0 publication Critical patent/IT7923215A0/it
Application granted granted Critical
Publication of IT1165084B publication Critical patent/IT1165084B/it

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D8/00—Diodes
    • H10D8/60—Schottky-barrier diodes 
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
    • H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
    • H01L21/28512—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table
    • H01L21/28537—Deposition of Schottky electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/60—Electrodes characterised by their materials
    • H10D64/64—Electrodes comprising a Schottky barrier to a semiconductor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/139—Schottky barrier

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electrodes Of Semiconductors (AREA)
IT23215/79A 1978-06-02 1979-06-01 Dispositivo schottky e metodo di fabbricazione dello stesso,impiegando leghe intermetalliche di palladio e platino e una barriera di titanio IT1165084B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/911,764 US4206540A (en) 1978-06-02 1978-06-02 Schottky device and method of manufacture using palladium and platinum intermetallic alloys and titanium barrier

Publications (2)

Publication Number Publication Date
IT7923215A0 true IT7923215A0 (it) 1979-06-01
IT1165084B IT1165084B (it) 1987-04-22

Family

ID=25430828

Family Applications (1)

Application Number Title Priority Date Filing Date
IT23215/79A IT1165084B (it) 1978-06-02 1979-06-01 Dispositivo schottky e metodo di fabbricazione dello stesso,impiegando leghe intermetalliche di palladio e platino e una barriera di titanio

Country Status (8)

Country Link
US (1) US4206540A (it)
JP (1) JPS54159183A (it)
DE (1) DE2921971C2 (it)
ES (1) ES481012A1 (it)
FR (1) FR2427688A1 (it)
GB (2) GB2022318B (it)
IT (1) IT1165084B (it)
SE (1) SE440293B (it)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4546374A (en) * 1981-03-23 1985-10-08 Motorola Inc. Semiconductor device including plateless package
US4398344A (en) * 1982-03-08 1983-08-16 International Rectifier Corporation Method of manufacture of a schottky using platinum encapsulated between layers of palladium sintered into silicon surface
US4638551A (en) * 1982-09-24 1987-01-27 General Instrument Corporation Schottky barrier device and method of manufacture
JPS59210642A (ja) * 1983-05-16 1984-11-29 Hitachi Ltd 半導体装置の製造方法
US4899199A (en) * 1983-09-30 1990-02-06 International Rectifier Corporation Schottky diode with titanium or like layer contacting the dielectric layer
US4742377A (en) * 1985-02-21 1988-05-03 General Instrument Corporation Schottky barrier device with doped composite guard ring
US4687537A (en) * 1986-04-15 1987-08-18 Rca Corporation Epitaxial metal silicide layers
JPS6373660A (ja) * 1986-09-17 1988-04-04 Fujitsu Ltd 半導体装置
US5130172A (en) * 1988-10-21 1992-07-14 The Regents Of The University Of California Low temperature organometallic deposition of metals
AT399419B (de) * 1989-09-21 1995-05-26 Int Rectifier Corp Verfahren zur einführung von platinatomen in eine siliziumscheibe zur verringerung der minoritätsträger-lebensdauer
US4925812A (en) * 1989-09-21 1990-05-15 International Rectifier Corporation Platinum diffusion process
GB2265636B (en) * 1989-09-21 1994-05-18 Int Rectifier Corp Platinum diffusion process
IT1247293B (it) * 1990-05-09 1994-12-12 Int Rectifier Corp Dispositivo transistore di potenza presentante una regione ultra-profonda, a maggior concentrazione
US5047367A (en) * 1990-06-08 1991-09-10 Intel Corporation Process for formation of a self aligned titanium nitride/cobalt silicide bilayer
US5536684A (en) * 1994-06-30 1996-07-16 Intel Corporation Process for formation of epitaxial cobalt silicide and shallow junction of silicon
US5888891A (en) * 1996-08-23 1999-03-30 International Rectifier Corporation Process for manufacturing a schottky diode with enhanced barrier height and high thermal stability
DE19939484A1 (de) * 1998-09-01 2000-03-09 Int Rectifier Corp Schottky-Diode
US6184564B1 (en) * 1998-12-28 2001-02-06 International Rectifier Corp. Schottky diode with adjusted barrier height and process for its manufacture
US6690037B1 (en) 2000-08-31 2004-02-10 Agere Systems Inc. Field plated Schottky diode
JP2002353182A (ja) * 2001-05-25 2002-12-06 Mitsubishi Electric Corp 半導体装置の洗浄方法および洗浄装置、ならびに半導体装置の製造方法
US7061067B2 (en) * 2003-07-04 2006-06-13 Matsushita Electric Industrial Co., Ltd. Schottky barrier diode
TWI278090B (en) * 2004-10-21 2007-04-01 Int Rectifier Corp Solderable top metal for SiC device
US7812441B2 (en) * 2004-10-21 2010-10-12 Siliconix Technology C.V. Schottky diode with improved surge capability
US7834376B2 (en) 2005-03-04 2010-11-16 Siliconix Technology C. V. Power semiconductor switch
US9419092B2 (en) * 2005-03-04 2016-08-16 Vishay-Siliconix Termination for SiC trench devices
US7923362B2 (en) * 2005-06-08 2011-04-12 Telefunken Semiconductors Gmbh & Co. Kg Method for manufacturing a metal-semiconductor contact in semiconductor components
DE102005026301B3 (de) * 2005-06-08 2007-01-11 Atmel Germany Gmbh Verfahren zum Herstellen eines Metall- Halbleiter-Kontakts bei Halbleiterbauelementen
CN101223638A (zh) * 2005-07-05 2008-07-16 国际整流器公司 具有改进的浪涌能力的肖特基二极管
US8368165B2 (en) 2005-10-20 2013-02-05 Siliconix Technology C. V. Silicon carbide Schottky diode
US7749877B2 (en) * 2006-03-07 2010-07-06 Siliconix Technology C. V. Process for forming Schottky rectifier with PtNi silicide Schottky barrier
US9627552B2 (en) 2006-07-31 2017-04-18 Vishay-Siliconix Molybdenum barrier metal for SiC Schottky diode and process of manufacture
DE102009018971A1 (de) * 2009-04-25 2010-11-04 Secos Halbleitertechnologie Gmbh Konstruktion einer Schottkydiode mit verbessertem Hochstromverhalten und Verfahren zu deren Herstellung
US8784572B2 (en) * 2011-10-19 2014-07-22 Intermolecular, Inc. Method for cleaning platinum residues on a semiconductor substrate
RU2683377C1 (ru) 2015-06-02 2019-03-28 Диотек Семикондактор Аг Усовершенствованный полупроводниковый прибор с диодом шоттки
CN109585570A (zh) * 2018-12-19 2019-04-05 吉林麦吉柯半导体有限公司 肖特基二极管、nipt95合金及肖特基二极管的制造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1107700A (en) * 1966-03-29 1968-03-27 Matsushita Electronics Corp A method for manufacturing semiconductor devices
NL6911534A (it) * 1968-08-01 1970-02-03
US3669730A (en) * 1970-04-24 1972-06-13 Bell Telephone Labor Inc Modifying barrier layer devices
IT1002232B (it) * 1972-12-26 1976-05-20 Gen Electric Contatti a barriera schottky e metodi per fare i medesimi
US3938243A (en) * 1973-02-20 1976-02-17 Signetics Corporation Schottky barrier diode semiconductor structure and method
US3906540A (en) * 1973-04-02 1975-09-16 Nat Semiconductor Corp Metal-silicide Schottky diode employing an aluminum connector
US3968272A (en) * 1974-01-25 1976-07-06 Microwave Associates, Inc. Zero-bias Schottky barrier detector diodes
US4110488A (en) * 1976-04-09 1978-08-29 Rca Corporation Method for making schottky barrier diodes
US4063964A (en) * 1976-12-27 1977-12-20 International Business Machines Corporation Method for forming a self-aligned schottky barrier device guardring

Also Published As

Publication number Publication date
FR2427688A1 (fr) 1979-12-28
JPS54159183A (en) 1979-12-15
GB2044534B (en) 1982-09-08
ES481012A1 (es) 1980-07-16
GB2022318A (en) 1979-12-12
IT1165084B (it) 1987-04-22
GB2022318B (en) 1982-09-15
JPS6226593B2 (it) 1987-06-09
FR2427688B1 (it) 1984-10-26
SE7904305L (sv) 1979-12-03
GB2044534A (en) 1980-10-15
SE440293B (sv) 1985-07-22
DE2921971C2 (de) 1983-09-29
DE2921971A1 (de) 1979-12-06
US4206540A (en) 1980-06-10

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