IT649689A - - Google Patents

Info

Publication number
IT649689A
IT649689A IT649689DA IT649689A IT 649689 A IT649689 A IT 649689A IT 649689D A IT649689D A IT 649689DA IT 649689 A IT649689 A IT 649689A
Authority
IT
Italy
Application number
Other languages
Italian (it)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of IT649689A publication Critical patent/IT649689A/it

Links

Classifications

    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00Control of flow
    • G05D7/06Control of flow characterised by the use of electric means
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/542Controlling the film thickness or evaporation rate
    • C23C14/545Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0683Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D5/00Control of dimensions of material
    • G05D5/02Control of dimensions of material of thickness, e.g. of rolled material
    • G05D5/03Control of dimensions of material of thickness, e.g. of rolled material characterised by the use of electric means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Automation & Control Theory (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Length Measuring Devices By Optical Means (AREA)
IT649689D 1960-07-05 IT649689A (US07534539-20090519-C00280.png)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US40707A US3059611A (en) 1960-07-05 1960-07-05 Monitoring apparatus

Publications (1)

Publication Number Publication Date
IT649689A true IT649689A (US07534539-20090519-C00280.png)

Family

ID=21912481

Family Applications (1)

Application Number Title Priority Date Filing Date
IT649689D IT649689A (US07534539-20090519-C00280.png) 1960-07-05

Country Status (3)

Country Link
US (1) US3059611A (US07534539-20090519-C00280.png)
GB (1) GB901390A (US07534539-20090519-C00280.png)
IT (1) IT649689A (US07534539-20090519-C00280.png)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3211570A (en) * 1961-12-21 1965-10-12 Winfield W Salisbury Process of making sine wave gratings
US3238918A (en) * 1961-12-26 1966-03-08 Lear Siegler Inc Vacuum deposition chamber for multiple operations
US3526460A (en) * 1967-06-27 1970-09-01 Webb James E Optical characteristics measuring apparatus
FR2088376B3 (US07534539-20090519-C00280.png) * 1970-05-06 1974-03-08 Metal Lux Spa
US3709192A (en) * 1970-06-01 1973-01-09 Sierracin Corp Coating control system
US3664295A (en) * 1970-11-02 1972-05-23 Gte Sylvania Inc Means for achieving a controlled gradient density coating on a light attenuation medium
US3732846A (en) * 1972-01-07 1973-05-15 Us Army Crystal plating monitoring system
US3804532A (en) * 1972-08-03 1974-04-16 Us Navy Transparent film uniformity gauge
US4024291A (en) * 1975-06-17 1977-05-17 Leybold-Heraeus Gmbh & Co. Kg Control of vapor deposition
DE10141522C1 (de) * 2001-08-24 2003-03-06 Siemens Ag Verfahren zur Herstellung einer Leuchtstoffschicht
JP5949252B2 (ja) * 2011-12-02 2016-07-06 株式会社島津製作所 Maldi用試料作成装置および試料作成方法
US9059038B2 (en) 2012-07-18 2015-06-16 Tokyo Electron Limited System for in-situ film stack measurement during etching and etch control method
CN104736744B (zh) 2012-10-17 2017-06-06 东京毅力科创株式会社 使用多变量分析的等离子体蚀刻终点检测
WO2017087378A1 (en) 2015-11-16 2017-05-26 Tokyo Electron Limited Advanced optical sensor and method for plasma chamber
CN109075066B (zh) 2016-03-31 2023-08-04 东京毅力科创株式会社 使用无晶片干式清洗发射光谱来控制干式蚀刻过程的方法
US10453653B2 (en) 2016-09-02 2019-10-22 Tokyo Electron Limited Endpoint detection algorithm for atomic layer etching (ALE)
WO2018094219A1 (en) 2016-11-18 2018-05-24 Tokyo Electron Limited Compositional optical emission spectroscopy for detection of particle induced arcs in a fabrication process
SG11201908533PA (en) 2017-03-17 2019-10-30 Tokyo Electron Ltd Surface modification control for etch metric enhancement
US10978278B2 (en) 2018-07-31 2021-04-13 Tokyo Electron Limited Normal-incident in-situ process monitor sensor
JP2022533246A (ja) 2019-05-23 2022-07-21 東京エレクトロン株式会社 ハイパースペクトルイメージングを使用する半導体プロセスの光学的診断
US10910201B1 (en) 2019-08-22 2021-02-02 Tokyo Electron Limited Synthetic wavelengths for endpoint detection in plasma etching

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2674973A (en) * 1954-04-13 Apparatus for coating incandescent
US2239452A (en) * 1937-03-13 1941-04-22 Robley C Williams Method and apparatus for producing semitransparent coatings
US2877418A (en) * 1955-02-03 1959-03-10 Arthur J Eldridge Vacuum tube voltmeter
US2840707A (en) * 1955-03-07 1958-06-24 Gilfillan Bros Inc Fast-acting sampling circuit
US2833922A (en) * 1955-10-21 1958-05-06 Collins Radio Co Stepped electrical feedback servo means
US2939083A (en) * 1958-06-23 1960-05-31 John D Hague Double integration memory circuit responding to bi-polar pulse video input signal

Also Published As

Publication number Publication date
US3059611A (en) 1962-10-23
GB901390A (en) 1962-07-18

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