IT1162420B - Processi per la deposizione di ramesenza elettrica' aventi ritmi piu veloci di placcatura - Google Patents

Processi per la deposizione di ramesenza elettrica' aventi ritmi piu veloci di placcatura

Info

Publication number
IT1162420B
IT1162420B IT50227/79A IT5022779A IT1162420B IT 1162420 B IT1162420 B IT 1162420B IT 50227/79 A IT50227/79 A IT 50227/79A IT 5022779 A IT5022779 A IT 5022779A IT 1162420 B IT1162420 B IT 1162420B
Authority
IT
Italy
Prior art keywords
rames
rhythms
deposition
processes
electric
Prior art date
Application number
IT50227/79A
Other languages
English (en)
Italian (it)
Other versions
IT7950227A0 (it
Inventor
John F Mccormack
Francis J Nuzzi
Original Assignee
Kollmorgen Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kollmorgen Tech Corp filed Critical Kollmorgen Tech Corp
Publication of IT7950227A0 publication Critical patent/IT7950227A0/it
Application granted granted Critical
Publication of IT1162420B publication Critical patent/IT1162420B/it

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/38Coating with copper
    • C23C18/40Coating with copper using reducing agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
IT50227/79A 1978-09-13 1979-09-11 Processi per la deposizione di ramesenza elettrica' aventi ritmi piu veloci di placcatura IT1162420B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US94191278A 1978-09-13 1978-09-13

Publications (2)

Publication Number Publication Date
IT7950227A0 IT7950227A0 (it) 1979-09-11
IT1162420B true IT1162420B (it) 1987-04-01

Family

ID=25477278

Family Applications (1)

Application Number Title Priority Date Filing Date
IT50227/79A IT1162420B (it) 1978-09-13 1979-09-11 Processi per la deposizione di ramesenza elettrica' aventi ritmi piu veloci di placcatura

Country Status (17)

Country Link
JP (2) JPS5927379B2 (de)
AT (1) AT366105B (de)
AU (1) AU532144B2 (de)
BR (1) BR7905066A (de)
CA (1) CA1135903A (de)
CH (1) CH646200A5 (de)
DE (1) DE2937297C2 (de)
DK (1) DK148920C (de)
ES (1) ES484158A1 (de)
FR (1) FR2436192A1 (de)
GB (1) GB2032462B (de)
IL (1) IL58202A (de)
IT (1) IT1162420B (de)
MX (1) MX152657A (de)
NL (1) NL189523C (de)
SE (1) SE7907531L (de)
ZA (1) ZA793786B (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8005024A (nl) * 1980-09-05 1982-04-01 Philips Nv Werkwijze voor de vervaardiging van koperlegeringslagen en -patronen op substraten en de aldus vervaardigde produkten.
EP0179212B1 (de) * 1984-09-27 1991-12-27 Kabushiki Kaisha Toshiba Stromlose Kupferplattierlösung
EP0265895B1 (de) * 1986-10-31 1993-02-10 AMP-AKZO CORPORATION (a Delaware corp.) Verfahren zum stromlosen Abscheiden von hochwertigem Kupfer
JPH0723539B2 (ja) * 1986-11-06 1995-03-15 日本電装株式会社 化学銅めっき液及びそれを用いた銅めっき皮膜の形成方法
JP2615682B2 (ja) * 1986-11-14 1997-06-04 株式会社デンソー 化学銅めっき液
US4814009A (en) * 1986-11-14 1989-03-21 Nippondenso Co., Ltd. Electroless copper plating solution
AU3304389A (en) * 1988-04-29 1989-11-02 Kollmorgen Corporation Method of consistently producing a copper deposit on a substrate by electroless deposition which deposit is essentially free of fissures
JP2595319B2 (ja) * 1988-07-20 1997-04-02 日本電装株式会社 化学銅めっき液及びそれを用いた銅めっき皮膜の形成方法
JPH036383A (ja) * 1989-06-02 1991-01-11 Nippondenso Co Ltd 化学銅めっき液
JPH0448100A (ja) * 1990-06-15 1992-02-18 Nkk Corp 洗浄設備
US7905994B2 (en) 2007-10-03 2011-03-15 Moses Lake Industries, Inc. Substrate holder and electroplating system
US8262894B2 (en) 2009-04-30 2012-09-11 Moses Lake Industries, Inc. High speed copper plating bath
JP5255015B2 (ja) * 2010-04-28 2013-08-07 名古屋メッキ工業株式会社 高分子繊維の無電解銅めっき方法
JP5780920B2 (ja) * 2011-10-31 2015-09-16 新光電気工業株式会社 無電解銅めっき浴
US10590541B2 (en) * 2018-06-15 2020-03-17 Rohm And Haas Electronic Materials Llc Electroless copper plating compositions and methods for electroless plating copper on substrates
US20190382901A1 (en) * 2018-06-15 2019-12-19 Rohm And Haas Electronic Materials Llc Electroless copper plating compositions and methods for electroless plating copper on substrates
CN113881984B (zh) * 2021-10-21 2022-09-16 深圳市励高表面处理材料有限公司 一种脉冲电镀整平剂及制备方法和应用该整平液的电镀液

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3222195A (en) * 1962-02-23 1965-12-07 Pearlstein Fred Stabilized electroless copper solution
US3361580A (en) * 1963-06-18 1968-01-02 Day Company Electroless copper plating
US3377174A (en) * 1963-10-24 1968-04-09 Torigai Eiichi Method and bath for chemically plating copper
DE1621307B2 (de) * 1966-02-01 1972-01-05 Photocircuits Corp , Glen Cove, N Y (V St A ) Reduktives metallisierungsbad insbesondere verkupferungsbad
US3720525A (en) * 1971-08-16 1973-03-13 Rca Corp Electroless copper plating solutions with accelerated plating rates
US3708329A (en) * 1971-09-10 1973-01-02 Bell Telephone Labor Inc Electroless copper plating
US3915718A (en) * 1972-10-04 1975-10-28 Schering Ag Chemical silver bath
US3793038A (en) * 1973-01-02 1974-02-19 Crown City Plating Co Process for electroless plating
JPS5173933A (ja) * 1974-12-25 1976-06-26 Mitsubishi Rayon Co Mudenkaidometsukyoku
JPS5746448B2 (de) * 1975-03-14 1982-10-04
JPS5217335A (en) * 1975-08-01 1977-02-09 Hitachi Ltd Chemical copper plating solution
JPS5288227A (en) * 1976-01-19 1977-07-23 Hitachi Ltd Chemical copper plating solution
IT1059950B (it) * 1976-04-30 1982-06-21 Alfachimici Spa Composizione per la ramatura anelettrica autocatalitica
JPS56156749A (en) * 1980-05-08 1981-12-03 Toshiba Corp Chemical copper plating solution

Also Published As

Publication number Publication date
BR7905066A (pt) 1980-04-29
ATA600879A (de) 1981-07-15
MX152657A (es) 1985-10-07
AT366105B (de) 1982-03-10
JPS5925965A (ja) 1984-02-10
ZA793786B (en) 1980-07-30
CA1135903A (en) 1982-11-23
JPS5565355A (en) 1980-05-16
JPS5927379B2 (ja) 1984-07-05
FR2436192A1 (fr) 1980-04-11
CH646200A5 (de) 1984-11-15
NL189523C (nl) 1993-05-03
DK148920C (da) 1986-05-05
IL58202A (en) 1982-08-31
GB2032462A (en) 1980-05-08
JPS5915981B2 (ja) 1984-04-12
DE2937297A1 (de) 1980-03-20
ES484158A1 (es) 1980-09-01
DK381979A (da) 1980-03-14
IL58202A0 (en) 1979-12-30
AU532144B2 (en) 1983-09-22
IT7950227A0 (it) 1979-09-11
AU4956779A (en) 1980-03-20
DE2937297C2 (de) 1982-04-08
FR2436192B1 (de) 1983-08-26
GB2032462B (en) 1983-05-18
SE7907531L (sv) 1980-03-14
DK148920B (da) 1985-11-18
NL7906856A (nl) 1980-03-17

Similar Documents

Publication Publication Date Title
IT1162420B (it) Processi per la deposizione di ramesenza elettrica' aventi ritmi piu veloci di placcatura
IT1088267B (it) Processo per la preparazione di leganti per la elettroverniciatura a immersione
IT1160882B (it) Gruppo elaboratore centrale per l'esecuzione di istruzioni di lunghezza vatiabile
IT1126457B (it) Bagno per deposizione senza impiego di corrente elettrica di stagno su substrati
FR2440960B1 (fr) Procede de preparation d'une solution de polyimide
BE861362A (fr) Procede d'electrodeposition cathodique de peintures
GB2031461B (en) Electrodeposition coating apparatus
BE840594A (fr) Procede d'enduction de surfaces
IT1165082B (it) Processo perfezionato per la produzione di depositi epitassiali
IT1061812B (it) Processo per la preparazione di i fenil 3 ammino pirazoli
IT1088996B (it) Procedimento per rimuovere impurita' da bagni fusi di alluminio
IT1095462B (it) Processo per la isomerizzazione di cicloesan bis(metilamina)per l'ottenimento di stereoisomeri
IT1089704B (it) Procedimento per rimuovere impurita' da bagni fusi di alluminio
GB2018825B (en) Aqueous brightzinc electroplating baths
IT7909451A0 (it) Bagno elettrogalvanico per stagnatura brillante
IT1156173B (it) Processo e dispositivo per la produzione di composti metallo-complessi adatti per deposizione di metallo senza eletttricita' e per funzionamento di bagni di metallizzazione chimica
IT1202862B (it) Procedimento per la depurazione di salamoie
AT345407B (de) Kathodisch abscheidbares ueberzugsmittel fuer das elektrotauchlackierverfahren
IT1065395B (it) Processo per la preparazione di 1,1-dialogeno-4-metil-1,3-pentadieni
IT1064754B (it) Processo per la preparazione di cicloesandioni-(1,3)
IT1114767B (it) Processo per la preparazione di 2,5-diosso-1,2-ossa-fosfolani
FR2352775A1 (fr) Procede catalytique perfectionne de production de l'ethylene-glycol
JPS54152632A (en) Electroplating solution for aluminum electrodeposition
FR2342991A1 (fr) Procede pour la purification de l'heparine
IT1124716B (it) Processo per la preparazione di 6,10,14-trimetilpentadeca-2-one