IN2013CH04103A - - Google Patents

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Publication number
IN2013CH04103A
IN2013CH04103A IN4103CH2013A IN2013CH04103A IN 2013CH04103 A IN2013CH04103 A IN 2013CH04103A IN 4103CH2013 A IN4103CH2013 A IN 4103CH2013A IN 2013CH04103 A IN2013CH04103 A IN 2013CH04103A
Authority
IN
India
Prior art keywords
ceria
lanthanum
abrasive
wafers
particle
Prior art date
Application number
Inventor
Venkata Sesha Praveen Bulusu
Manivannan Ramachandran
Dwarakanathan Umashankar Trilicane
Cho Byoung-Jun
Goo Park Jin
Ramanathan Srinivasan
Original Assignee
Indian Inst Technology Madras
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Indian Inst Technology Madras filed Critical Indian Inst Technology Madras
Priority to IN4103CH2013 priority Critical patent/IN2013CH04103A/en
Publication of IN2013CH04103A publication Critical patent/IN2013CH04103A/en

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  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

This invention relates to a method of chemical mechanical planarization for silicon abrasive pads are fixed on wafers, which contains ceria and lanthanum and/or polishing slurry of 7 PH having abrasive which is ceria and containing lanthanum and further the ceria may be of nano particle, or micro particle.
IN4103CH2013 2013-09-12 2013-09-12 IN2013CH04103A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
IN4103CH2013 IN2013CH04103A (en) 2013-09-12 2013-09-12

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IN4103CH2013 IN2013CH04103A (en) 2013-09-12 2013-09-12

Publications (1)

Publication Number Publication Date
IN2013CH04103A true IN2013CH04103A (en) 2015-08-28

Family

ID=54398220

Family Applications (1)

Application Number Title Priority Date Filing Date
IN4103CH2013 IN2013CH04103A (en) 2013-09-12 2013-09-12

Country Status (1)

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IN (1) IN2013CH04103A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018229005A1 (en) * 2017-06-15 2018-12-20 Rhodia Operations Cerium based particles
US11161751B2 (en) 2017-11-15 2021-11-02 Saint-Gobain Ceramics & Plastics, Inc. Composition for conducting material removal operations and method for forming same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018229005A1 (en) * 2017-06-15 2018-12-20 Rhodia Operations Cerium based particles
US11578235B2 (en) 2017-06-15 2023-02-14 Rhodia Operations Cerium based particles
US11161751B2 (en) 2017-11-15 2021-11-02 Saint-Gobain Ceramics & Plastics, Inc. Composition for conducting material removal operations and method for forming same

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