IL258838D0 - Exposure equipment, exposure method and device manufacturing method - Google Patents

Exposure equipment, exposure method and device manufacturing method

Info

Publication number
IL258838D0
IL258838D0 IL258838A IL25883818A IL258838D0 IL 258838 D0 IL258838 D0 IL 258838D0 IL 258838 A IL258838 A IL 258838A IL 25883818 A IL25883818 A IL 25883818A IL 258838 D0 IL258838 D0 IL 258838D0
Authority
IL
Israel
Prior art keywords
exposure
method
device manufacturing
manufacturing method
equipment
Prior art date
Application number
IL258838A
Other languages
Hebrew (he)
Inventor
Nagasaka Hiroyuki
Okuyama Takeshi
Original Assignee
Nikon Corp
Nikon Eng Co Ltd
Nagasaka Hiroyuki
Okuyama Takeshi
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2004172569 priority Critical
Priority to JP2004245260 priority
Priority to JP2004330582 priority
Priority to PCT/JP2005/010576 priority patent/WO2005122221A1/en
Application filed by Nikon Corp, Nikon Eng Co Ltd, Nagasaka Hiroyuki, Okuyama Takeshi filed Critical Nikon Corp
Publication of IL258838D0 publication Critical patent/IL258838D0/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/70858Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70341Immersion
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/70808Construction details, e.g. housing, load-lock, seals, windows for passing light in- and out of apparatus
    • G03F7/70833Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/7085Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
IL258838A 2004-06-10 2018-04-22 Exposure equipment, exposure method and device manufacturing method IL258838D0 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2004172569 2004-06-10
JP2004245260 2004-08-25
JP2004330582 2004-11-15
PCT/JP2005/010576 WO2005122221A1 (en) 2004-06-10 2005-06-09 Exposure equipment, exposure method and device manufacturing method

Publications (1)

Publication Number Publication Date
IL258838D0 true IL258838D0 (en) 2018-06-28

Family

ID=35503358

Family Applications (4)

Application Number Title Priority Date Filing Date
IL179787A IL179787A (en) 2004-06-10 2006-12-03 Exposure equipment, exposure method and device manufacturing method
IL240860A IL240860A (en) 2004-06-10 2015-08-26 Exposure equipment, exposure method and device manufacturing method
IL240857A IL240857A (en) 2004-06-10 2015-08-26 Exposure equipment, exposure method and device manufacturing method
IL258838A IL258838D0 (en) 2004-06-10 2018-04-22 Exposure equipment, exposure method and device manufacturing method

Family Applications Before (3)

Application Number Title Priority Date Filing Date
IL179787A IL179787A (en) 2004-06-10 2006-12-03 Exposure equipment, exposure method and device manufacturing method
IL240860A IL240860A (en) 2004-06-10 2015-08-26 Exposure equipment, exposure method and device manufacturing method
IL240857A IL240857A (en) 2004-06-10 2015-08-26 Exposure equipment, exposure method and device manufacturing method

Country Status (10)

Country Link
US (7) US8482716B2 (en)
EP (4) EP2605068A3 (en)
JP (10) JP5295165B2 (en)
KR (8) KR101612656B1 (en)
CN (1) CN102736446B (en)
HK (2) HK1105243A1 (en)
IL (4) IL179787A (en)
SG (3) SG188877A1 (en)
TW (6) TWI612393B (en)
WO (1) WO2005122221A1 (en)

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Also Published As

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IL179787D0 (en) 2007-05-15
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