IL256895D0 - Apparatus of plural charged-particle beams - Google Patents

Apparatus of plural charged-particle beams

Info

Publication number
IL256895D0
IL256895D0 IL256895A IL25689518A IL256895D0 IL 256895 D0 IL256895 D0 IL 256895D0 IL 256895 A IL256895 A IL 256895A IL 25689518 A IL25689518 A IL 25689518A IL 256895 D0 IL256895 D0 IL 256895D0
Authority
IL
Israel
Prior art keywords
particle beams
plural charged
plural
charged
beams
Prior art date
Application number
IL256895A
Other languages
Hebrew (he)
Original Assignee
Asml Netherlands Bv
Hermes Microvision Inc
Hermes Microvision Incorporated B V
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US201562195353P priority Critical
Priority to PCT/US2016/043375 priority patent/WO2017015483A1/en
Application filed by Asml Netherlands Bv, Hermes Microvision Inc, Hermes Microvision Incorporated B V filed Critical Asml Netherlands Bv
Publication of IL256895D0 publication Critical patent/IL256895D0/en

Links

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472Deflecting along given lines
    • H01J37/1474Scanning means
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06Electron sources; Electron guns
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10Lenses
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472Deflecting along given lines
    • H01J37/1474Scanning means
    • H01J37/1477Scanning means electrostatic
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1478Beam tilting means, i.e. for stereoscopy or for beam channelling
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02Details
    • H01J2237/024Moving components not otherwise provided for
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04Means for controlling the discharge
    • H01J2237/045Diaphragms
    • H01J2237/0451Diaphragms with fixed aperture
    • H01J2237/0453Diaphragms with fixed aperture multiple apertures
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04Means for controlling the discharge
    • H01J2237/049Focusing means
    • H01J2237/0492Lens systems
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10Lenses
    • H01J2237/103Lenses characterised by lens type
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10Lenses
    • H01J2237/12Lenses electrostatic
    • H01J2237/1205Microlenses
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15Means for deflecting or directing discharge
    • H01J2237/151Electrostatic means
    • H01J2237/1516Multipoles
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153Correcting image defects, e.g. stigmators
    • H01J2237/1534Aberrations
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153Correcting image defects, e.g. stigmators
    • H01J2237/1536Image distortions due to scanning
IL256895A 2015-07-22 2018-01-14 Apparatus of plural charged-particle beams IL256895D0 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US201562195353P true 2015-07-22 2015-07-22
PCT/US2016/043375 WO2017015483A1 (en) 2015-07-22 2016-07-21 Apparatus of plural charged-particle beams

Publications (1)

Publication Number Publication Date
IL256895D0 true IL256895D0 (en) 2018-03-29

Family

ID=57834634

Family Applications (1)

Application Number Title Priority Date Filing Date
IL256895A IL256895D0 (en) 2015-07-22 2018-01-14 Apparatus of plural charged-particle beams

Country Status (7)

Country Link
US (2) US10395886B2 (en)
EP (1) EP3325950B1 (en)
JP (1) JP6703092B2 (en)
KR (2) KR20190091577A (en)
CN (2) CN108738363B (en)
IL (1) IL256895D0 (en)
WO (1) WO2017015483A1 (en)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190091577A (en) * 2015-07-22 2019-08-06 에이에스엠엘 네델란즈 비.브이. Apparatus of plural charged-particle beams
KR20180108720A (en) * 2016-01-27 2018-10-04 헤르메스 마이크로비젼, 인코포레이티드 A plurality of charged particle beam devices
US10157727B2 (en) * 2017-03-02 2018-12-18 Fei Company Aberration measurement in a charged particle microscope
KR20200003064A (en) 2017-04-28 2020-01-08 에이에스엠엘 네델란즈 비.브이. Apparatus using multiple charged particle beams
US10242839B2 (en) * 2017-05-05 2019-03-26 Kla-Tencor Corporation Reduced Coulomb interactions in a multi-beam column
US10176965B1 (en) 2017-07-05 2019-01-08 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Aberration-corrected multibeam source, charged particle beam device and method of imaging or illuminating a specimen with an array of primary charged particle beamlets
KR20200032750A (en) 2017-09-07 2020-03-26 에이에스엠엘 네델란즈 비.브이. Sample inspection method using a plurality of charged particle beams
KR20200043460A (en) 2017-09-29 2020-04-27 에이에스엠엘 네델란즈 비.브이. How to inspect samples with multiple charged particle beams
US20200286710A1 (en) 2017-09-29 2020-09-10 Asml Netherlands B.V. Dynamic determination of a sample inspection recipe of charged particle beam inspection
CN111433881A (en) 2017-09-29 2020-07-17 Asml荷兰有限公司 Image contrast enhancement in sample inspection
US10741354B1 (en) 2018-02-14 2020-08-11 Kla-Tencor Corporation Photocathode emitter system that generates multiple electron beams
WO2019211072A1 (en) 2018-05-01 2019-11-07 Asml Netherlands B.V. Multi-beam inspection apparatus
WO2019233991A1 (en) 2018-06-08 2019-12-12 Asml Netherlands B.V. Semiconductor charged particle detector for microscopy
WO2020030483A1 (en) 2018-08-09 2020-02-13 Asml Netherlands B.V. An apparatus for multiple charged-particle beams
WO2020052943A1 (en) 2018-09-13 2020-03-19 Asml Netherlands B.V. Method and apparatus for monitoring beam profile and power
WO2020099095A1 (en) 2018-11-16 2020-05-22 Asml Netherlands B.V. Electromagnetic compound lens and charged particle optical system with such a lens
DE102018133703B4 (en) 2018-12-29 2020-08-06 Carl Zeiss Multisem Gmbh Device for generating a plurality of particle beams and multi-beam particle beam systems
WO2020141030A1 (en) 2018-12-31 2020-07-09 Asml Netherlands B.V. In-lens wafer pre-charging and inspection with multiple beams
WO2020141091A2 (en) 2018-12-31 2020-07-09 Asml Netherlands B.V. Apparatus for obtaining optical measurements in a charged particle apparatus
WO2020164951A1 (en) 2019-02-13 2020-08-20 Asml Netherlands B.V. Apparatus for and method of controlling an energy spread of a charged-particle beam
EP3696846A1 (en) 2019-02-13 2020-08-19 ASML Netherlands B.V. Apparatus for and method of producing a monochromatic charged particle beam
WO2020173681A1 (en) 2019-02-26 2020-09-03 Asml Netherlands B.V. Charged particle detector with gain element

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1150327B1 (en) * 2000-04-27 2018-02-14 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Multi beam charged particle device
US6750455B2 (en) 2001-07-02 2004-06-15 Applied Materials, Inc. Method and apparatus for multiple charged particle beams
JP2003203857A (en) * 2001-10-22 2003-07-18 Nikon Corp Electron beam exposure system
EP1602121B1 (en) * 2003-03-10 2012-06-27 Mapper Lithography Ip B.V. Apparatus for generating a plurality of beamlets
JP4794444B2 (en) 2003-09-05 2011-10-19 アプライド マテリアルズ イスラエル Particle optical system and apparatus, and particle optical component for such system and apparatus
JP2005175169A (en) * 2003-12-10 2005-06-30 Sony Corp Exposure device and mask defect monitor method
US8134135B2 (en) 2006-07-25 2012-03-13 Mapper Lithography Ip B.V. Multiple beam charged particle optical system
JP5227512B2 (en) * 2006-12-27 2013-07-03 株式会社日立ハイテクノロジーズ Electron beam application equipment
EP2110844A1 (en) 2008-04-15 2009-10-21 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh Contactless measurement of beam current in charged partical beam system
US8445869B2 (en) * 2008-04-15 2013-05-21 Mapper Lithography Ip B.V. Projection lens arrangement
US8129693B2 (en) * 2009-06-26 2012-03-06 Carl Zeiss Nts Gmbh Charged particle beam column and method of operating same
US9184024B2 (en) * 2010-02-05 2015-11-10 Hermes-Microvision, Inc. Selectable coulomb aperture in E-beam system
EP2385542B1 (en) * 2010-05-07 2013-01-02 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electron beam device with dispersion compensation, and method of operating same
CN103238202B (en) * 2010-09-28 2016-11-09 以色列实用材料有限公司 Particle optical system and layout, and for this system and the particle-optical component of layout
US8294095B2 (en) 2010-12-14 2012-10-23 Hermes Microvision, Inc. Apparatus of plural charged particle beams with multi-axis magnetic lens
US8362425B2 (en) * 2011-03-23 2013-01-29 Kla-Tencor Corporation Multiple-beam system for high-speed electron-beam inspection
JP2014229481A (en) * 2013-05-22 2014-12-08 株式会社日立ハイテクノロジーズ Charged particle ray application device
US9082577B1 (en) * 2014-08-14 2015-07-14 Shimadzu Corporation Adjustment method for electron beam device, and the electron beam device thus adjusted
CN108292583B (en) 2016-04-13 2020-03-20 Asml 荷兰有限公司 Arrangement of a plurality of charged particle beams
KR20190091577A (en) * 2015-07-22 2019-08-06 에이에스엠엘 네델란즈 비.브이. Apparatus of plural charged-particle beams

Also Published As

Publication number Publication date
WO2017015483A1 (en) 2017-01-26
CN111681939A (en) 2020-09-18
EP3325950B1 (en) 2020-11-04
KR20190091577A (en) 2019-08-06
CN108738363B (en) 2020-08-07
JP6703092B2 (en) 2020-06-03
JP2018520495A (en) 2018-07-26
KR102007497B1 (en) 2019-08-05
EP3325950A1 (en) 2018-05-30
US20200152412A1 (en) 2020-05-14
CN108738363A (en) 2018-11-02
EP3325950A4 (en) 2019-04-17
US10395886B2 (en) 2019-08-27
KR20180030605A (en) 2018-03-23
US20170025243A1 (en) 2017-01-26

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