IL252377D0 - Metrology method, computer product and system - Google Patents

Metrology method, computer product and system

Info

Publication number
IL252377D0
IL252377D0 IL252377A IL25237717A IL252377D0 IL 252377 D0 IL252377 D0 IL 252377D0 IL 252377 A IL252377 A IL 252377A IL 25237717 A IL25237717 A IL 25237717A IL 252377 D0 IL252377 D0 IL 252377D0
Authority
IL
Israel
Prior art keywords
metrology
computer
Prior art date
Application number
IL252377A
Other languages
Hebrew (he)
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to EP14195009 priority Critical
Priority to PCT/EP2015/075308 priority patent/WO2016083076A1/en
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of IL252377D0 publication Critical patent/IL252377D0/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
    • G03F7/70616Wafer pattern monitoring, i.e. measuring printed patterns or the aerial image at the wafer plane
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical means
    • G01B11/24Measuring arrangements characterised by the use of optical means for measuring contours or curvatures
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical means
    • G01B11/26Measuring arrangements characterised by the use of optical means for measuring angles or tapers; for testing the alignment of axes
    • G01B11/27Measuring arrangements characterised by the use of optical means for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
    • G03F7/70491Information management and control, including software
    • G03F7/705Modelling and simulation from physical phenomena up to complete wafer process or whole workflow in wafer fabrication
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
    • G03F7/70616Wafer pattern monitoring, i.e. measuring printed patterns or the aerial image at the wafer plane
    • G03F7/70633Overlay
IL252377A 2014-11-26 2017-05-18 Metrology method, computer product and system IL252377D0 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP14195009 2014-11-26
PCT/EP2015/075308 WO2016083076A1 (en) 2014-11-26 2015-10-30 Metrology method, computer product and system

Publications (1)

Publication Number Publication Date
IL252377D0 true IL252377D0 (en) 2017-07-31

Family

ID=51982454

Family Applications (1)

Application Number Title Priority Date Filing Date
IL252377A IL252377D0 (en) 2014-11-26 2017-05-18 Metrology method, computer product and system

Country Status (9)

Country Link
US (1) US10527949B2 (en)
EP (1) EP3224676A1 (en)
JP (2) JP6616416B2 (en)
KR (2) KR20200050478A (en)
CN (2) CN110553602A (en)
IL (1) IL252377D0 (en)
SG (1) SG11201704036UA (en)
TW (3) TW201835691A (en)
WO (1) WO2016083076A1 (en)

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WO2017029110A1 (en) 2015-08-20 2017-02-23 Asml Netherlands B.V. Metrology method and apparatus, substrates for use in such methods, lithographic system and device manufacturing method
NL2017300A (en) * 2015-08-27 2017-03-01 Asml Netherlands Bv Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
US9631979B2 (en) * 2015-09-25 2017-04-25 Benchmark Technologies Phase-shift reticle for characterizing a beam
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JP6697560B2 (en) 2015-12-23 2020-05-20 エーエスエムエル ネザーランズ ビー.ブイ. Metrology method and apparatus
CN109478021A (en) * 2016-07-11 2019-03-15 Asml荷兰有限公司 Method and apparatus for determining the fingerprint of performance parameter
CN109478023A (en) 2016-07-15 2019-03-15 Asml荷兰有限公司 Method and apparatus for measuring the design of target field
CN109564391A (en) 2016-07-21 2019-04-02 Asml荷兰有限公司 Measure mesh calibration method, substrate, measurement equipment and lithographic equipment
KR20190043167A (en) * 2016-09-01 2019-04-25 에이에스엠엘 네델란즈 비.브이. Automatic selection of measurement target measurement recipes
EP3299890A1 (en) * 2016-09-27 2018-03-28 ASML Netherlands B.V. Metrology recipe selection
CN109791367A (en) 2016-09-27 2019-05-21 Asml荷兰有限公司 Measure matingplan selection
KR20190076049A (en) 2016-11-10 2019-07-01 에이에스엠엘 네델란즈 비.브이. Design and calibration using stack differences
WO2018095705A1 (en) * 2016-11-23 2018-05-31 Asml Netherlands B.V. Metrology using a plurality of metrology target measurement recipes
WO2018114152A1 (en) * 2016-12-19 2018-06-28 Asml Netherlands B.V. Metrology sensor, lithographic apparatus and method for manufacturing devices
US10496781B2 (en) * 2016-12-19 2019-12-03 Kla Tencor Corporation Metrology recipe generation using predicted metrology images
KR20190112787A (en) 2017-02-02 2019-10-07 에이에스엠엘 네델란즈 비.브이. Metrology methods and devices and associated computer products
EP3358413A1 (en) 2017-02-02 2018-08-08 ASML Netherlands B.V. Metrology method, apparatus and computer program
CN110462523A (en) * 2017-03-23 2019-11-15 Asml荷兰有限公司 The asymmetry of structure monitors
WO2018233947A1 (en) 2017-06-20 2018-12-27 Asml Netherlands B.V. Determining edge roughness parameters
WO2019010325A1 (en) * 2017-07-06 2019-01-10 Kla-Tencor Corporation Estimating amplitude and phase asymmetry in imaging technology for achieving high accuracy in overlay metrology
CN110945436A (en) 2017-07-25 2020-03-31 Asml荷兰有限公司 Method for parameter determination and apparatus therefor
EP3435162A1 (en) * 2017-07-28 2019-01-30 ASML Netherlands B.V. Metrology method and apparatus and computer program
CN111066096A (en) 2017-09-01 2020-04-24 Asml荷兰有限公司 Optical system, metrology apparatus and associated methods
KR20200035307A (en) 2017-09-11 2020-04-02 에이에스엠엘 네델란즈 비.브이. Metrology in lithography processes
EP3457211A1 (en) 2017-09-13 2019-03-20 ASML Netherlands B.V. A method of aligning a pair of complementary diffraction patterns and associated metrology method and apparatus
EP3462239A1 (en) 2017-09-27 2019-04-03 ASML Netherlands B.V. Metrology in lithographic processes
KR20200052355A (en) 2017-10-05 2020-05-14 에이에스엠엘 네델란즈 비.브이. Metrology systems and methods for determining the properties of one or more structures on a substrate
EP3467589A1 (en) 2017-10-06 2019-04-10 ASML Netherlands B.V. Determining edge roughness parameters
EP3470923A1 (en) * 2017-10-10 2019-04-17 ASML Netherlands B.V. Metrology method
TW201923332A (en) 2017-10-10 2019-06-16 荷蘭商Asml荷蘭公司 Metrology method and apparatus, computer program and lithographic system
EP3474074A1 (en) 2017-10-17 2019-04-24 ASML Netherlands B.V. Scatterometer and method of scatterometry using acoustic radiation
EP3480659A1 (en) 2017-11-01 2019-05-08 ASML Netherlands B.V. Estimation of data in metrology
EP3480554A1 (en) 2017-11-02 2019-05-08 ASML Netherlands B.V. Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
KR20200059301A (en) 2017-11-07 2020-05-28 에이에스엠엘 네델란즈 비.브이. Measuring device and method for determining characteristics of interest
EP3499312A1 (en) 2017-12-15 2019-06-19 ASML Netherlands B.V. Metrology apparatus and a method of determining a characteristic of interest
WO2019129465A1 (en) 2017-12-28 2019-07-04 Asml Netherlands B.V. A metrology apparatus for and a method of determining a characteristic of interest of a structure on a substrate
CN111615667A (en) 2018-01-17 2020-09-01 Asml荷兰有限公司 Method of measuring a target and metrology apparatus
EP3514628A1 (en) 2018-01-18 2019-07-24 ASML Netherlands B.V. Method of measuring a target, and metrology apparatus
WO2019149586A1 (en) 2018-01-30 2019-08-08 Asml Netherlands B.V. Method of patterning at least a layer of a semiconductor device
EP3518040A1 (en) 2018-01-30 2019-07-31 ASML Netherlands B.V. A measurement apparatus and a method for determining a substrate grid
EP3528048A1 (en) 2018-02-15 2019-08-21 ASML Netherlands B.V. A metrology apparatus for and a method of determining a characteristic of interest of a structure on a substrate
WO2019166190A1 (en) 2018-02-27 2019-09-06 Stichting Vu Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
EP3531191A1 (en) 2018-02-27 2019-08-28 Stichting VU Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
EP3570109A1 (en) 2018-05-14 2019-11-20 ASML Netherlands B.V. Illumination source for an inspection apparatus, inspection apparatus and inspection method
EP3575874A1 (en) * 2018-05-29 2019-12-04 ASML Netherlands B.V. Metrology method, apparatus and computer program
WO2019233738A1 (en) 2018-06-08 2019-12-12 Asml Netherlands B.V. Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
EP3579052A1 (en) 2018-06-08 2019-12-11 ASML Netherlands B.V. Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
WO2019238363A1 (en) 2018-06-13 2019-12-19 Asml Netherlands B.V. Metrology apparatus
EP3582009A1 (en) 2018-06-15 2019-12-18 ASML Netherlands B.V. Reflector and method of manufacturing a reflector
CN108897196A (en) * 2018-07-11 2018-11-27 中国科学院微电子研究所 The selection method of wavelength is measured in overlay error measurement based on diffraction
EP3605230A1 (en) 2018-08-01 2020-02-05 Stichting VU Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
NL2021852A (en) 2018-08-01 2018-11-09 Asml Netherlands Bv Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
EP3611569A1 (en) 2018-08-16 2020-02-19 ASML Netherlands B.V. Metrology apparatus and photonic crystal fiber
EP3614207A1 (en) 2018-08-21 2020-02-26 ASML Netherlands B.V. Metrology apparatus
WO2020038642A1 (en) 2018-08-22 2020-02-27 Asml Netherlands B.V. Metrology apparatus
WO2020048692A1 (en) 2018-09-04 2020-03-12 Asml Netherlands B.V. Metrology apparatus
EP3620857A1 (en) 2018-09-04 2020-03-11 ASML Netherlands B.V. Metrology apparatus
EP3623868A1 (en) 2018-09-12 2020-03-18 ASML Netherlands B.V. Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
EP3627226A1 (en) 2018-09-20 2020-03-25 ASML Netherlands B.V. Optical system, metrology apparatus and associated method
EP3629086A1 (en) 2018-09-25 2020-04-01 ASML Netherlands B.V. Method and apparatus for determining a radiation beam intensity profile
EP3629087A1 (en) 2018-09-26 2020-04-01 ASML Netherlands B.V. Method of manufacturing devices
WO2020083624A1 (en) 2018-10-24 2020-04-30 Asml Netherlands B.V. Optical fibers and production methods therefor
EP3647874A1 (en) 2018-11-05 2020-05-06 ASML Netherlands B.V. Optical fibers and production methods therefor
EP3650941A1 (en) 2018-11-12 2020-05-13 ASML Netherlands B.V. Method of determining the contribution of a processing apparatus to a substrate parameter
EP3654104A1 (en) 2018-11-16 2020-05-20 ASML Netherlands B.V. Method for monitoring lithographic apparatus
WO2020099050A1 (en) 2018-11-16 2020-05-22 Asml Netherlands B.V. Method for monitoring lithographic apparatus
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EP3696606A1 (en) 2019-02-15 2020-08-19 ASML Netherlands B.V. A metrology apparatus with radiation source having multiple broadband outputs
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Also Published As

Publication number Publication date
US20160161863A1 (en) 2016-06-09
US10527949B2 (en) 2020-01-07
TW201631404A (en) 2016-09-01
TWI631431B (en) 2018-08-01
SG11201704036UA (en) 2017-06-29
KR20200050478A (en) 2020-05-11
EP3224676A1 (en) 2017-10-04
CN107111250A (en) 2017-08-29
CN107111250B (en) 2019-10-11
JP6616416B2 (en) 2019-12-04
JP2020038384A (en) 2020-03-12
US20200103762A1 (en) 2020-04-02
JP2017537352A (en) 2017-12-14
TW201736981A (en) 2017-10-16
KR102109059B1 (en) 2020-05-12
CN110553602A (en) 2019-12-10
TW201835691A (en) 2018-10-01
KR20170085116A (en) 2017-07-21
TWI576675B (en) 2017-04-01
WO2016083076A1 (en) 2016-06-02

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