IL231261D0 - Method of manufacturing a high definition heater system - Google Patents

Method of manufacturing a high definition heater system

Info

Publication number
IL231261D0
IL231261D0 IL23126114A IL23126114A IL231261D0 IL 231261 D0 IL231261 D0 IL 231261D0 IL 23126114 A IL23126114 A IL 23126114A IL 23126114 A IL23126114 A IL 23126114A IL 231261 D0 IL231261 D0 IL 231261D0
Authority
IL
Israel
Prior art keywords
manufacturing
method
high definition
heater system
definition heater
Prior art date
Application number
IL23126114A
Other languages
Hebrew (he)
Other versions
IL231261A (en
Original Assignee
Watlow Electric Mfg
Mohammad Nosrati
Kevin Robert Smith
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US201161528939P priority Critical
Priority to US201261635310P priority
Priority to PCT/US2012/053148 priority patent/WO2013033402A1/en
Application filed by Watlow Electric Mfg, Mohammad Nosrati, Kevin Robert Smith filed Critical Watlow Electric Mfg
Publication of IL231261D0 publication Critical patent/IL231261D0/en
Publication of IL231261A publication Critical patent/IL231261A/en

Links

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • H01L21/67103Apparatus for thermal treatment mainly by conduction
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • H01L21/67109Apparatus for thermal treatment mainly by convection
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67248Temperature monitoring
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H01L21/6833Details of electrostatic chucks
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
    • H05B1/00Details of electric heating devices
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
    • H05B1/00Details of electric heating devices
    • H05B1/02Automatic switching arrangements specially adapted to apparatus ; Control of heating devices
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
    • H05B1/00Details of electric heating devices
    • H05B1/02Automatic switching arrangements specially adapted to apparatus ; Control of heating devices
    • H05B1/0202Switches
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
    • H05B1/00Details of electric heating devices
    • H05B1/02Automatic switching arrangements specially adapted to apparatus ; Control of heating devices
    • H05B1/0227Applications
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
    • H05B1/00Details of electric heating devices
    • H05B1/02Automatic switching arrangements specially adapted to apparatus ; Control of heating devices
    • H05B1/0227Applications
    • H05B1/023Industrial applications
    • H05B1/0233Industrial applications for semiconductors manufacturing
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
    • H05B3/00Ohmic-resistance heating
    • H05B3/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
    • H05B3/00Ohmic-resistance heating
    • H05B3/02Details
    • H05B3/06Heater elements structurally combined with coupling elements or holders
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
    • H05B3/00Ohmic-resistance heating
    • H05B3/20Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
    • H05B2203/00Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/002Heaters using a particular layout for the resistive material or resistive elements
    • H05B2203/005Heaters using a particular layout for the resistive material or resistive elements using multiple resistive elements or resistive zones isolated from each other
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
    • H05B2203/00Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/013Heaters using resistive films or coatings
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
    • H05B2213/00Aspects relating both to resistive heating and to induction heating, covered by H05B3/00 and H05B6/00
    • H05B2213/03Heating plates made out of a matrix of heating elements that can define heating areas adapted to cookware randomly placed on the heating plate
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10Methods of surface bonding and/or assembly therefor
IL231261A 2011-08-30 2014-03-02 High definition heater system IL231261A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US201161528939P true 2011-08-30 2011-08-30
US201261635310P true 2012-04-19 2012-04-19
PCT/US2012/053148 WO2013033402A1 (en) 2011-08-30 2012-08-30 Method of manufacturing a high definition heater system

Publications (2)

Publication Number Publication Date
IL231261D0 true IL231261D0 (en) 2014-04-30
IL231261A IL231261A (en) 2017-06-29

Family

ID=47003204

Family Applications (8)

Application Number Title Priority Date Filing Date
IL231255A IL231255A (en) 2011-08-30 2014-03-02 System and method for controlling a thermal array
IL231254A IL231254A (en) 2011-08-30 2014-03-02 System and method for controlling a thermal array
IL231257A IL231257A (en) 2011-08-30 2014-03-02 Thermal array system
IL231256A IL231256A (en) 2011-08-30 2014-03-02 Thermal array system
IL231260A IL231260A (en) 2011-08-30 2014-03-02 High definition heater system having a fluid medium
IL231258A IL231258A (en) 2011-08-30 2014-03-02 Thermal array system
IL231259A IL231259A (en) 2011-08-30 2014-03-02 High definition heater and method of operation
IL231261A IL231261A (en) 2011-08-30 2014-03-02 High definition heater system

Family Applications Before (7)

Application Number Title Priority Date Filing Date
IL231255A IL231255A (en) 2011-08-30 2014-03-02 System and method for controlling a thermal array
IL231254A IL231254A (en) 2011-08-30 2014-03-02 System and method for controlling a thermal array
IL231257A IL231257A (en) 2011-08-30 2014-03-02 Thermal array system
IL231256A IL231256A (en) 2011-08-30 2014-03-02 Thermal array system
IL231260A IL231260A (en) 2011-08-30 2014-03-02 High definition heater system having a fluid medium
IL231258A IL231258A (en) 2011-08-30 2014-03-02 Thermal array system
IL231259A IL231259A (en) 2011-08-30 2014-03-02 High definition heater and method of operation

Country Status (11)

Country Link
US (12) US9123755B2 (en)
EP (8) EP2752085B1 (en)
JP (13) JP6133868B2 (en)
KR (10) KR101831439B1 (en)
CN (9) CN103947287B (en)
AU (8) AU2012301903B2 (en)
BR (8) BR112014004909A2 (en)
CA (9) CA2991157A1 (en)
IL (8) IL231255A (en)
MX (8) MX337204B (en)
WO (8) WO2013033348A1 (en)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120154974A1 (en) * 2010-12-16 2012-06-21 Applied Materials, Inc. High efficiency electrostatic chuck assembly for semiconductor wafer processing
US10163668B2 (en) 2011-08-30 2018-12-25 Watlow Electric Manufacturing Company Thermal dynamic response sensing systems for heaters
JP6133868B2 (en) * 2011-08-30 2017-05-24 ワトロウ エレクトリック マニュファクチュアリング カンパニー Thermal Array System
JP5973731B2 (en) * 2012-01-13 2016-08-23 東京エレクトロン株式会社 Temperature control method of a plasma processing apparatus and a heater
US8937800B2 (en) * 2012-04-24 2015-01-20 Applied Materials, Inc. Electrostatic chuck with advanced RF and temperature uniformity
US9345068B2 (en) 2012-07-26 2016-05-17 Hewlett-Packard Development Company, L.P. Electrical resistor heating
US10049948B2 (en) * 2012-11-30 2018-08-14 Lam Research Corporation Power switching system for ESC with array of thermal control elements
WO2014164910A1 (en) 2013-03-12 2014-10-09 Applied Materials, Inc. Multi zone heating and cooling esc for plasma process chamber
WO2014164449A1 (en) 2013-03-13 2014-10-09 Applied Materials, Inc. Multi-zone heated esc with independent edge zones
US20150016083A1 (en) * 2013-07-05 2015-01-15 Stephen P. Nootens Thermocompression bonding apparatus and method
JP6100672B2 (en) * 2013-10-25 2017-03-22 東京エレクトロン株式会社 Temperature control mechanism, temperature control method and a substrate processing apparatus
US9716022B2 (en) 2013-12-17 2017-07-25 Lam Research Corporation Method of determining thermal stability of a substrate support assembly
US9622375B2 (en) 2013-12-31 2017-04-11 Applied Materials, Inc. Electrostatic chuck with external flow adjustments for improved temperature distribution
US9520315B2 (en) 2013-12-31 2016-12-13 Applied Materials, Inc. Electrostatic chuck with internal flow adjustments for improved temperature distribution
US20150228513A1 (en) * 2014-02-07 2015-08-13 Applied Materials, Inc. Pixilated temperature controlled substrate support assembly
US9472410B2 (en) 2014-03-05 2016-10-18 Applied Materials, Inc. Pixelated capacitance controlled ESC
JP6219227B2 (en) * 2014-05-12 2017-10-25 東京エレクトロン株式会社 Temperature control method of the heater power supply mechanism and the stage
US9543171B2 (en) 2014-06-17 2017-01-10 Lam Research Corporation Auto-correction of malfunctioning thermal control element in a temperature control plate of a semiconductor substrate support assembly that includes deactivating the malfunctioning thermal control element and modifying a power level of at least one functioning thermal control element
KR20170028387A (en) 2014-07-08 2017-03-13 와틀로 일렉트릭 매뉴팩츄어링 컴파니 Bonded assembly with integrated temperature sensing in bond layer
WO2016014138A1 (en) * 2014-07-23 2016-01-28 Applied Materials, Inc. Tunable temperature controlled substrate support assembly
CN104466840B (en) * 2014-11-18 2017-01-18 河南省通信电缆有限公司 House wiring structure and use of the wiring system house wiring structure
JP6513938B2 (en) * 2014-11-21 2019-05-15 日本特殊陶業株式会社 Method of manufacturing electrostatic chuck
JP6325424B2 (en) * 2014-11-21 2018-05-16 日本特殊陶業株式会社 An electrostatic chuck
JP6530220B2 (en) * 2015-03-30 2019-06-12 日本特殊陶業株式会社 Ceramic heater and control method thereof, and electrostatic chuck and control method thereof
WO2016190905A1 (en) * 2015-05-22 2016-12-01 Applied Materials, Inc. Azimuthally tunable multi-zone electrostatic chuck
US9779974B2 (en) 2015-06-22 2017-10-03 Lam Research Corporation System and method for reducing temperature transition in an electrostatic chuck
US10074512B2 (en) * 2015-07-09 2018-09-11 Applied Materials Israel Ltd. System and method for setting a temperature of an object within a chamber
US10186437B2 (en) * 2015-10-05 2019-01-22 Lam Research Corporation Substrate holder having integrated temperature measurement electrical devices
US9826574B2 (en) * 2015-10-28 2017-11-21 Watlow Electric Manufacturing Company Integrated heater and sensor system
US9623679B1 (en) * 2015-11-18 2017-04-18 Xerox Corporation Electrostatic platen for conductive pet film printing
US9812342B2 (en) * 2015-12-08 2017-11-07 Watlow Electric Manufacturing Company Reduced wire count heater array block
US20170167790A1 (en) * 2015-12-11 2017-06-15 Lam Research Corporation Multi-plane heater for semiconductor substrate support
US20170215230A1 (en) * 2016-01-22 2017-07-27 Applied Materials, Inc. Sensor system for multi-zone electrostatic chuck
CN108886835A (en) 2016-03-02 2018-11-23 沃特洛电气制造公司 Heater element as sensor for temperature control in transient systems
US10247445B2 (en) 2016-03-02 2019-04-02 Watlow Electric Manufacturing Company Heater bundle for adaptive control
TW201811107A (en) 2016-07-07 2018-03-16 Watlow Electric Mfg Heater bundle for adaptive control and method of reducing current leakage
US20180124870A1 (en) 2016-10-21 2018-05-03 Watlow Electric Manufacturing Company Electric heaters with low drift resistance feedback
ES2673130B1 (en) * 2016-12-19 2019-03-28 Bsh Electrodomesticos Espana Sa Domestic cooking device for induction with a matrix of heating elements
ES2673131B1 (en) * 2016-12-19 2019-03-28 Bsh Electrodomesticos Espana Sa Domestic cooking device for induction with a matrix of heating elements
CN107300426B (en) * 2017-06-23 2019-06-25 北京金风科创风电设备有限公司 System for detecting temperature and temperature checking method
US20190154605A1 (en) * 2017-11-21 2019-05-23 Watlow Electric Manufacturing Company Multi-parallel sensor array system
US20190159291A1 (en) 2017-11-21 2019-05-23 Watlow Electric Manufacturing Company Multi-zone pedestal heater having a routing layer

Family Cites Families (154)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1631484A (en) * 1925-03-30 1927-06-07 Hudson Heating Systems Inc Electric heater
US2008541A (en) * 1933-02-28 1935-07-16 Drury T Boyd Electric heating device
US2108964A (en) * 1936-02-03 1938-02-22 Nestle Lemur Company Electrical circuit for hair waving machines
US2237808A (en) * 1939-09-07 1941-04-08 Edison General Elec Appliance Water heater and control therefor
GB1256694A (en) * 1968-03-18 1971-12-15
US3659155A (en) * 1969-03-03 1972-04-25 Robertshaw Controls Co Current sensing apparatus
US3584291A (en) * 1969-07-30 1971-06-08 Powers Regulator Co Proportional electric heat control system
US3745308A (en) * 1971-07-01 1973-07-10 Heinemann Electric Co Temperature control circuits
US3774151A (en) * 1971-09-02 1973-11-20 Allied Chem Diagnostic firing circuit adapted for use with inflatable restraint systems in vehicles
US3752956A (en) * 1972-05-03 1973-08-14 Du Pont Electrical resistance heating control circuit
SE373963B (en) * 1973-06-14 1975-02-17 Janson Sven Olof
DE2355412B2 (en) * 1973-11-06 1975-11-20 Bosch-Siemens Hausgeraete Gmbh, 7000 Stuttgart
SE7806238A (en) * 1977-07-02 1979-01-03 Fischer Karl Electric stralningsvermeelement, serskilt for glaskeramikkokhell
US4316078A (en) * 1978-01-09 1982-02-16 Sweetheart Plastics, Inc. Food serving system
DE2844650A1 (en) * 1978-10-13 1980-04-17 Schickedanz Willi toaster
US4320285A (en) * 1979-05-10 1982-03-16 Koether Bernard G Primary thermostat using cooking computer temperature probe with control transfer upon probe failure
US4339649A (en) * 1980-06-03 1982-07-13 Emhart Industries, Inc. Apparatus and method for R-C time constant circuit
JPS58145084A (en) * 1981-09-18 1983-08-29 Kokusai Gijutsu Kaihatsu Kk Temperature control system for heater
DE3204598C2 (en) * 1982-02-10 1988-04-07 Bosch-Siemens Hausgeraete Gmbh, 7000 Stuttgart, De
DE3303449A1 (en) * 1983-02-02 1984-08-02 Siemens Ag Protection device for a superconducting magnetic coil assembly
US4748445A (en) * 1983-07-13 1988-05-31 Citizen Watch Co., Ltd. Matrix display panel having a diode ring structure as a resistive element
EP0176027B1 (en) * 1984-09-22 1989-02-01 E.G.O. Elektro-Geräte Blanc u. Fischer Radiative heating body for a cooking apparatus
EP0205669B1 (en) * 1985-06-18 1990-04-04 AGFA-GEVAERT naamloze vennootschap Electric heating circuit
US4713525A (en) * 1986-07-23 1987-12-15 Kowah, Inc. Microcomputer controlled instant electric water heating and delivery system
JP2659363B2 (en) * 1986-09-09 1997-09-30 三菱電機株式会社 Emergency degaussing equipment with superconducting Magunetsuto equipment
JP2587233B2 (en) 1987-04-24 1997-03-05 四国化工機株式会社 Branding equipment
WO1988009054A1 (en) * 1987-05-06 1988-11-17 Labtam Limited Electrostatic chuck using ac field excitation
JP2779950B2 (en) * 1989-04-25 1998-07-23 東陶機器株式会社 Voltage application method and the voltage application device of the electrostatic chuck
US5001594A (en) * 1989-09-06 1991-03-19 Mcnc Electrostatic handling device
US5023430A (en) * 1989-09-08 1991-06-11 Environwear, Inc. Hybrid electronic control system and method for cold weather garment
US5105067A (en) * 1989-09-08 1992-04-14 Environwear, Inc. Electronic control system and method for cold weather garment
US5280422A (en) * 1990-11-05 1994-01-18 Watlow/Winona, Inc. Method and apparatus for calibrating and controlling multiple heaters
US5446576A (en) * 1990-11-26 1995-08-29 Donnelly Corporation Electrochromic mirror for vehicles with illumination and heating control
US5325261A (en) * 1991-05-17 1994-06-28 Unisearch Limited Electrostatic chuck with improved release
US5280434A (en) * 1991-07-01 1994-01-18 Thermoforming Technologies, Inc. Heating system for thermoforming
JPH05326112A (en) * 1992-05-21 1993-12-10 Shin Etsu Chem Co Ltd Layered ceramic heater
US5493101A (en) * 1993-12-15 1996-02-20 Eaton Corporation Positive temperature coefficient transition sensor
JP2651793B2 (en) * 1993-12-20 1997-09-10 坂口電熱株式会社 Ceramic fiber heater
JPH07199722A (en) * 1993-12-29 1995-08-04 Nippon Dennetsu Co Ltd Temperature controller utilizing resistance change
US5459632A (en) * 1994-03-07 1995-10-17 Applied Materials, Inc. Releasing a workpiece from an electrostatic chuck
US5684669A (en) * 1995-06-07 1997-11-04 Applied Materials, Inc. Method for dechucking a workpiece from an electrostatic chuck
JP3364063B2 (en) * 1995-08-25 2003-01-08 本田技研工業株式会社 Vehicle electrical load abnormality detection device
US5796074A (en) * 1995-11-28 1998-08-18 Applied Materials, Inc. Wafer heater assembly
JPH09270454A (en) * 1996-04-01 1997-10-14 Kyocera Corp Wafer holding apparatus
AT1469U1 (en) * 1996-04-10 1997-05-26 E & E Elektronik Gmbh Method for determining the absolute humidity
US6108189A (en) * 1996-04-26 2000-08-22 Applied Materials, Inc. Electrostatic chuck having improved gas conduits
JPH09326555A (en) * 1996-06-05 1997-12-16 Nippon Avionics Co Ltd Junction device
US5802856A (en) 1996-07-31 1998-09-08 Stanford University Multizone bake/chill thermal cycling module
JPH10116887A (en) * 1996-08-26 1998-05-06 Applied Materials Inc Method and apparatus for cooling workpiece
DE19650038A1 (en) * 1996-12-03 1998-06-04 Bosch Gmbh Robert A method of operating a resistive heating element and means for carrying out the method
JP3502233B2 (en) * 1997-03-10 2004-03-02 シャープ株式会社 Heater control device
JP3437410B2 (en) * 1997-06-02 2003-08-18 シャープ株式会社 Heater control device
JPH11111823A (en) * 1997-10-06 1999-04-23 Dainippon Screen Mfg Co Ltd Heat treatment device for substrate
CA2310583C (en) * 1997-11-07 2004-12-28 Shell Oil Company Heater control
US5880924A (en) * 1997-12-01 1999-03-09 Applied Materials, Inc. Electrostatic chuck capable of rapidly dechucking a substrate
US6342997B1 (en) * 1998-02-11 2002-01-29 Therm-O-Disc, Incorporated High sensitivity diode temperature sensor with adjustable current source
US6073577A (en) 1998-06-30 2000-06-13 Lam Research Corporation Electrode for plasma processes and method for manufacture and use thereof
US7218503B2 (en) * 1998-09-30 2007-05-15 Lam Research Corporation Method of determining the correct average bias compensation voltage during a plasma process
US6361645B1 (en) * 1998-10-08 2002-03-26 Lam Research Corporation Method and device for compensating wafer bias in a plasma processing chamber
JP4040814B2 (en) 1998-11-30 2008-01-30 株式会社小松製作所 Discoid heater and temperature controller
JP2000235886A (en) * 1998-12-14 2000-08-29 Tokyo Electron Ltd Temperature controlling device and temperature controlling method for heating means
US20020036881A1 (en) * 1999-05-07 2002-03-28 Shamouil Shamouilian Electrostatic chuck having composite base and method
US6490146B2 (en) * 1999-05-07 2002-12-03 Applied Materials Inc. Electrostatic chuck bonded to base with a bond layer and method
JP2001059694A (en) 1999-08-20 2001-03-06 Zexel Valeo Climate Control Corp Heat exchanger
DE60045384D1 (en) * 1999-09-29 2011-01-27 Tokyo Electron Ltd Multi-zone resistance heater
JP2001126851A (en) * 1999-10-26 2001-05-11 Keihin Sokki Kk Heater unit for semiconductor wafer and 1t3 manufacturing method
WO2002091457A1 (en) * 1999-12-09 2002-11-14 Ibiden Co., Ltd. Ceramic plate for semiconductor producing/inspecting apparatus
US6307728B1 (en) * 2000-01-21 2001-10-23 Applied Materials, Inc. Method and apparatus for dechucking a workpiece from an electrostatic chuck
US6444957B1 (en) * 2000-04-26 2002-09-03 Sumitomo Osaka Cement Co., Ltd Heating apparatus
US20020105009A1 (en) * 2000-07-13 2002-08-08 Eden Richard C. Power semiconductor switching devices, power converters, integrated circuit assemblies, integrated circuitry, power current switching methods, methods of forming a power semiconductor switching device, power conversion methods, power semiconductor switching device packaging methods, and methods of forming a power transistor
JP4415467B2 (en) * 2000-09-06 2010-02-17 株式会社日立製作所 Image display device
US6581275B2 (en) * 2001-01-22 2003-06-24 Applied Materials Inc. Fabricating an electrostatic chuck having plasma resistant gas conduits
US20050211385A1 (en) * 2001-04-30 2005-09-29 Lam Research Corporation, A Delaware Corporation Method and apparatus for controlling spatial temperature distribution
JP3713220B2 (en) * 2001-06-15 2005-11-09 日本特殊陶業株式会社 Ceramic heater
KR100431658B1 (en) 2001-10-05 2004-05-17 삼성전자주식회사 Apparatus for heating a substrate and apparatus having the same
EP1303168B1 (en) * 2001-10-12 2016-03-16 Whirlpool Corporation Cooking hob with discrete distributed heating elements
JP3856293B2 (en) * 2001-10-17 2006-12-13 日本碍子株式会社 Heating equipment
JP3982674B2 (en) * 2001-11-19 2007-09-26 日本碍子株式会社 A ceramic heater, its manufacturing method and a semiconductor manufacturing device for the heating device
WO2003047312A1 (en) * 2001-11-30 2003-06-05 Ibiden Co., Ltd. Ceramic heater
AT430401T (en) * 2001-11-30 2009-05-15 Nxp Bv switched frequency modulator using capacities
DE10392293T5 (en) 2002-02-15 2005-09-22 Lm Glasfiber A/S Method and apparatus for detecting the presence of polymer in a wind turbine blade
JP2003258065A (en) * 2002-02-27 2003-09-12 Kyocera Corp Wafer-mounting stage
EP1497392B1 (en) * 2002-04-10 2013-05-29 Flexcon Company Inc. Hydro-insensitive electroluminescent devices and methods of manufacture thereof
US7060991B2 (en) 2002-04-11 2006-06-13 Reilly Thomas L Method and apparatus for the portable identification of material thickness and defects along uneven surfaces using spatially controlled heat application
US6884973B2 (en) * 2002-08-09 2005-04-26 Sunbeam Products, Inc. Heating pad controller with multiple position switch and diodes
JP3833974B2 (en) * 2002-08-21 2006-10-18 日本碍子株式会社 Manufacturing method of the heating device
JP4323232B2 (en) * 2002-12-04 2009-09-02 芝浦メカトロニクス株式会社 Electrostatic adsorption method, an electrostatic adsorption device and bonding equipment
DE60329364D1 (en) * 2003-01-20 2009-11-05 Whirlpool Co Electric hot plate and method for determining the place of about ruptured cooking devices
KR100890493B1 (en) * 2003-04-18 2009-03-26 가부시키가이샤 히다치 고쿠사이 덴키 Semiconductor producing device
JP2005012172A (en) 2003-05-23 2005-01-13 Dainippon Screen Mfg Co Ltd Heat-treating apparatus
CN2634776Y (en) * 2003-08-12 2004-08-18 刘键 Electric heating blanket
US7053560B1 (en) * 2003-11-17 2006-05-30 Dr. Led (Holdings), Inc. Bi-directional LED-based light
US7196295B2 (en) * 2003-11-21 2007-03-27 Watlow Electric Manufacturing Company Two-wire layered heater system
US8680443B2 (en) * 2004-01-06 2014-03-25 Watlow Electric Manufacturing Company Combined material layering technologies for electric heaters
US7178353B2 (en) 2004-02-19 2007-02-20 Advanced Thermal Sciences Corp. Thermal control system and method
US7697260B2 (en) * 2004-03-31 2010-04-13 Applied Materials, Inc. Detachable electrostatic chuck
JP4761723B2 (en) * 2004-04-12 2011-08-31 日本碍子株式会社 Substrate heating apparatus
US7116535B2 (en) * 2004-04-16 2006-10-03 General Electric Company Methods and apparatus for protecting an MR imaging system
US7460604B2 (en) * 2004-06-03 2008-12-02 Silicon Laboratories Inc. RF isolator for isolating voltage sensing and gate drivers
JP2005347612A (en) * 2004-06-04 2005-12-15 Matsushita Electric Ind Co Ltd Wafer tray, wafer burn-in unit, wafer-level burn-in apparatus using same unit, and temperature controlling method of semiconductor wafer
WO2006006391A1 (en) * 2004-06-28 2006-01-19 Kyocera Corporation Wafer heating equipment and semiconductor manufacturing equipment
US20060000551A1 (en) * 2004-06-30 2006-01-05 Saldana Miguel A Methods and apparatus for optimal temperature control in a plasma processing system
JP4319602B2 (en) * 2004-08-31 2009-08-26 株式会社日立製作所 Superconducting magnet device provided with a quench protection circuit
US7544251B2 (en) * 2004-10-07 2009-06-09 Applied Materials, Inc. Method and apparatus for controlling temperature of a substrate
US8038796B2 (en) * 2004-12-30 2011-10-18 Lam Research Corporation Apparatus for spatial and temporal control of temperature on a substrate
US7126092B2 (en) * 2005-01-13 2006-10-24 Watlow Electric Manufacturing Company Heater for wafer processing and methods of operating and manufacturing the same
KR20060103864A (en) * 2005-03-28 2006-10-04 타이코 일렉트로닉스 코포레이션 Surface mount multi-layer electrical circuit protection device with active element between pptc layers
US7332692B2 (en) * 2005-05-06 2008-02-19 Illinois Tool Works Inc. Redundant control circuit for hot melt adhesive assembly heater circuits and temperature sensors
US7287902B2 (en) 2005-06-07 2007-10-30 The Boeing Company Systems and methods for thermographic inspection of composite structures
US20060289447A1 (en) * 2005-06-20 2006-12-28 Mohamed Zakaria A Heating chuck assembly
CN101243727B (en) * 2005-06-29 2011-05-11 沃特洛电气制造公司 Smart layered heater surfaces
JP4763380B2 (en) * 2005-08-25 2011-08-31 株式会社アルバック Method of manufacturing a suction device
US7551960B2 (en) * 2005-09-08 2009-06-23 Medtronic, Inc. External presentation of electrical stimulation parameters
EP1931473A2 (en) * 2005-09-23 2008-06-18 Philips Electronics N.V. A micro-fluidic device based upon active matrix principles
US8519566B2 (en) * 2006-03-28 2013-08-27 Wireless Environment, Llc Remote switch sensing in lighting devices
US7669426B2 (en) * 2006-05-11 2010-03-02 Bio-Rad Laboratories, Inc. Shared switching for multiple loads
NL1031878C2 (en) 2006-05-24 2007-11-27 Netherlands Inst For Metals Re Non-destructive testing.
JP2007317772A (en) * 2006-05-24 2007-12-06 Shinko Electric Ind Co Ltd Electrostatic chuck device
JP2007329008A (en) * 2006-06-07 2007-12-20 Tokyo Electron Ltd Hot plate and its manufacturing method
US7501605B2 (en) * 2006-08-29 2009-03-10 Lam Research Corporation Method of tuning thermal conductivity of electrostatic chuck support assembly
JP2008085283A (en) * 2006-09-26 2008-04-10 Momentive Performance Materials Inc Heating apparatus with enhanced thermal uniformity, and method for making thereof
US7901509B2 (en) * 2006-09-19 2011-03-08 Momentive Performance Materials Inc. Heating apparatus with enhanced thermal uniformity and method for making thereof
US7445446B2 (en) * 2006-09-29 2008-11-04 Tokyo Electron Limited Method for in-line monitoring and controlling in heat-treating of resist coated wafers
JP2008118052A (en) * 2006-11-07 2008-05-22 Shinko Electric Ind Co Ltd Substrate heating device
CN101269790B (en) * 2007-03-21 2010-08-25 台达电子工业股份有限公司 Surface discharge element and method for manufacturing same
US8049112B2 (en) * 2007-04-13 2011-11-01 3M Innovative Properties Company Flexible circuit with cover layer
JP4898556B2 (en) * 2007-05-23 2012-03-14 株式会社日立ハイテクノロジーズ The plasma processing apparatus
JP2009054932A (en) 2007-08-29 2009-03-12 Shinko Electric Ind Co Ltd Electrostatic chuck
JP2009087928A (en) * 2007-09-13 2009-04-23 Semiconductor Energy Lab Co Ltd Semiconductor device and manufacturing method therefor
WO2009036440A1 (en) * 2007-09-14 2009-03-19 T-Ink, Inc. Controller and associated method
CN101903996B (en) * 2007-12-21 2013-04-03 应用材料公司 Method and apparatus for controlling temperature of a substrate
JP5426892B2 (en) * 2008-02-08 2014-02-26 日本碍子株式会社 Substrate heating apparatus
US8092637B2 (en) * 2008-02-28 2012-01-10 Hitachi High-Technologies Corporation Manufacturing method in plasma processing apparatus
CN101572850A (en) * 2008-04-11 2009-11-04 文 王 Capacitance type microphone with stress release membrane prepared at a low temperature and preparation method thereof
JP5163349B2 (en) * 2008-08-01 2013-03-13 住友大阪セメント株式会社 Electrostatic chucking device
JP5037465B2 (en) * 2008-09-12 2012-09-26 住友電気工業株式会社 Glow plug control unit, control method, and computer program
US8532832B2 (en) 2008-09-23 2013-09-10 Be Aerospace, Inc. Method and apparatus for thermal exchange with two-phase media
US20110229837A1 (en) * 2008-11-25 2011-09-22 Kyocera Corporation Wafer Heating Apparatus, Electrostatic Chuck, and Method for Manufacturing Wafer Heating Apparatus
JP5185790B2 (en) * 2008-11-27 2013-04-17 株式会社日立ハイテクノロジーズ The plasma processing apparatus
JP5250408B2 (en) * 2008-12-24 2013-07-31 新光電気工業株式会社 Substrate temperature adjusting-fixing device
JP2010153730A (en) * 2008-12-26 2010-07-08 Omron Corp Wiring structure, heater driving device, measuring device, and control system
US8092000B2 (en) * 2009-01-19 2012-01-10 Xerox Corporation Heat element configuration for a reservoir heater
US7956653B1 (en) * 2009-05-04 2011-06-07 Supertex, Inc. Complementary high voltage switched current source integrated circuit
US8785821B2 (en) 2009-07-06 2014-07-22 Sokudo Co., Ltd. Substrate processing apparatus with heater element held by vacuum
CN101662888B (en) 2009-09-28 2011-02-16 深南电路有限公司 Preparation method for PCB plate with step trough
US8637794B2 (en) * 2009-10-21 2014-01-28 Lam Research Corporation Heating plate with planar heating zones for semiconductor processing
US20120247641A1 (en) * 2009-10-22 2012-10-04 Datec Coating Corporation Method of melt bonding high-temperature thermoplastic based heating element to a substrate
WO2011081645A2 (en) * 2009-12-15 2011-07-07 Lam Research Corporation Adjusting substrate temperature to improve cd uniformity
US8791392B2 (en) * 2010-10-22 2014-07-29 Lam Research Corporation Methods of fault detection for multiplexed heater array
US8546732B2 (en) * 2010-11-10 2013-10-01 Lam Research Corporation Heating plate with planar heater zones for semiconductor processing
JP6133868B2 (en) * 2011-08-30 2017-05-24 ワトロウ エレクトリック マニュファクチュアリング カンパニー Thermal Array System
US9324589B2 (en) * 2012-02-28 2016-04-26 Lam Research Corporation Multiplexed heater array using AC drive for semiconductor processing
US8809747B2 (en) * 2012-04-13 2014-08-19 Lam Research Corporation Current peak spreading schemes for multiplexed heated array
US20150016083A1 (en) * 2013-07-05 2015-01-15 Stephen P. Nootens Thermocompression bonding apparatus and method

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