HK47794A - Positive-working photosensitive composition and photosensitive recording material prepared therefrom - Google Patents

Positive-working photosensitive composition and photosensitive recording material prepared therefrom

Info

Publication number
HK47794A
HK47794A HK47794A HK47794A HK47794A HK 47794 A HK47794 A HK 47794A HK 47794 A HK47794 A HK 47794A HK 47794 A HK47794 A HK 47794A HK 47794 A HK47794 A HK 47794A
Authority
HK
Hong Kong
Prior art keywords
positive
recording material
material prepared
prepared therefrom
photosensitive
Prior art date
Application number
HK47794A
Other languages
English (en)
Inventor
Robert E Potvin
Alban Jonas O St
Chester J Sobodacha
Original Assignee
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Celanese Corp filed Critical Hoechst Celanese Corp
Publication of HK47794A publication Critical patent/HK47794A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
HK47794A 1986-05-02 1994-05-12 Positive-working photosensitive composition and photosensitive recording material prepared therefrom HK47794A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US85861686A 1986-05-02 1986-05-02

Publications (1)

Publication Number Publication Date
HK47794A true HK47794A (en) 1994-05-20

Family

ID=25328731

Family Applications (1)

Application Number Title Priority Date Filing Date
HK47794A HK47794A (en) 1986-05-02 1994-05-12 Positive-working photosensitive composition and photosensitive recording material prepared therefrom

Country Status (5)

Country Link
EP (1) EP0244763B1 (xx)
JP (1) JPH0727202B2 (xx)
KR (1) KR960010424B1 (xx)
DE (1) DE3784549D1 (xx)
HK (1) HK47794A (xx)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2618947B2 (ja) * 1988-01-08 1997-06-11 東京応化工業株式会社 ポジ型ホトレジスト組成物
JP2568883B2 (ja) * 1988-04-28 1997-01-08 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
EP0358871B1 (en) * 1988-07-07 1998-09-30 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition
JP2629990B2 (ja) * 1989-12-20 1997-07-16 住友化学工業株式会社 ポジ型レジスト用組成物
JPH061377B2 (ja) * 1989-12-28 1994-01-05 日本ゼオン株式会社 ポジ型レジスト組成物
DE4111444A1 (de) * 1991-04-09 1992-10-15 Hoechst Ag Naphthochinondiazid-sulfonsaeure-mischester enthaltendes gemisch und damit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE4111443A1 (de) * 1991-04-09 1992-10-15 Hoechst Ag Strahlungsempfindlicher ester sowie verfahren zu dessen herstellung
US5362599A (en) * 1991-11-14 1994-11-08 International Business Machines Corporations Fast diazoquinone positive resists comprising mixed esters of 4-sulfonate and 5-sulfonate compounds
JP2935223B2 (ja) * 1992-04-14 1999-08-16 東京応化工業株式会社 レジストパターン形成用材料の製造方法及びタンタルのパターン形成方法
JP3278306B2 (ja) 1994-10-31 2002-04-30 富士写真フイルム株式会社 ポジ型フォトレジスト組成物
RU2552461C1 (ru) * 2014-04-24 2015-06-10 федеральное государственное автономное образовательное учреждение высшего образования "Нижегородский государственный университет им. Н.И. Лобачевского" Способ формирования фоторезистной маски позитивного типа (варианты)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE879203C (de) * 1949-07-23 1953-04-23 Kalle & Co Ag Verfahren zur Herstellung von Kopien, besonders Druckformen, mit Hilfe von Diazoverbindungen
AU9012082A (en) * 1981-11-06 1983-05-12 Polychrome Corp. Light sensitive composition
JPS60133446A (ja) * 1983-12-22 1985-07-16 Fuji Photo Film Co Ltd 感光性組成物
JPS617835A (ja) * 1984-06-22 1986-01-14 Nippon Telegr & Teleph Corp <Ntt> レジスト材料

Also Published As

Publication number Publication date
EP0244763A2 (de) 1987-11-11
JPH0727202B2 (ja) 1995-03-29
EP0244763A3 (en) 1988-09-14
EP0244763B1 (de) 1993-03-10
DE3784549D1 (de) 1993-04-15
KR960010424B1 (ko) 1996-07-31
KR870011502A (ko) 1987-12-23
JPS62284354A (ja) 1987-12-10

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)