HK1245417B - 基板處理方法和基板處理裝置 - Google Patents

基板處理方法和基板處理裝置

Info

Publication number
HK1245417B
HK1245417B HK18104840.4A HK18104840A HK1245417B HK 1245417 B HK1245417 B HK 1245417B HK 18104840 A HK18104840 A HK 18104840A HK 1245417 B HK1245417 B HK 1245417B
Authority
HK
Hong Kong
Prior art keywords
substrate
processing apparatus
processing method
processing
substrate processing
Prior art date
Application number
HK18104840.4A
Other languages
English (en)
Chinese (zh)
Inventor
加藤正紀
奈良圭
鈴木智也
渡邊智行
鬼頭義昭
堀正和
Original Assignee
株式會社尼康
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式會社尼康 filed Critical 株式會社尼康
Priority to HK18107244.9A priority Critical patent/HK1247996A1/zh
Publication of HK1245417B publication Critical patent/HK1245417B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
HK18104840.4A 2014-04-01 2017-04-06 基板處理方法和基板處理裝置 HK1245417B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
HK18107244.9A HK1247996A1 (zh) 2014-04-01 2017-04-06 圖案描繪裝置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014075841 2014-04-01

Publications (1)

Publication Number Publication Date
HK1245417B true HK1245417B (zh) 2020-03-27

Family

ID=54240539

Family Applications (3)

Application Number Title Priority Date Filing Date
HK18107244.9A HK1247996A1 (zh) 2014-04-01 2017-04-06 圖案描繪裝置
HK18104876.1A HK1245420A1 (zh) 2014-04-01 2017-04-06 基板處理方法
HK18104840.4A HK1245417B (zh) 2014-04-01 2017-04-06 基板處理方法和基板處理裝置

Family Applications Before (2)

Application Number Title Priority Date Filing Date
HK18107244.9A HK1247996A1 (zh) 2014-04-01 2017-04-06 圖案描繪裝置
HK18104876.1A HK1245420A1 (zh) 2014-04-01 2017-04-06 基板處理方法

Country Status (6)

Country Link
JP (3) JP6597602B2 (ko)
KR (2) KR102430139B1 (ko)
CN (4) CN107272353B (ko)
HK (3) HK1247996A1 (ko)
TW (6) TWI684836B (ko)
WO (1) WO2015152218A1 (ko)

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KR102377751B1 (ko) * 2014-04-01 2022-03-24 가부시키가이샤 니콘 기판 처리 장치, 및 디바이스 제조 방법
WO2017073608A1 (ja) * 2015-10-30 2017-05-04 株式会社ニコン 基板処理装置、基板処理装置の調整方法、デバイス製造システム及びデバイス製造方法
JP6607002B2 (ja) * 2015-11-30 2019-11-20 株式会社ニコン パターン描画装置
JP6690214B2 (ja) * 2015-12-09 2020-04-28 株式会社ニコン パターン描画装置
WO2017104717A1 (ja) * 2015-12-17 2017-06-22 株式会社ニコン パターン描画装置
TWI782698B (zh) * 2016-03-30 2022-11-01 日商尼康股份有限公司 圖案描繪裝置、圖案描繪方法、以及元件製造方法
CN109804314B (zh) * 2016-09-29 2022-04-01 株式会社尼康 光束扫描装置
TWI736621B (zh) * 2016-10-04 2021-08-21 日商尼康股份有限公司 圖案描繪裝置及圖案描繪方法
JP7070542B2 (ja) * 2017-03-10 2022-05-18 株式会社ニコン パターン描画装置、及びパターン露光装置
JP7070581B2 (ja) * 2017-09-26 2022-05-18 株式会社ニコン パターン描画装置
JP7136601B2 (ja) * 2018-06-25 2022-09-13 川崎重工業株式会社 導光装置及びレーザ加工装置
JP2020021079A (ja) * 2019-09-04 2020-02-06 株式会社ニコン パターン描画装置
JP2020024443A (ja) * 2019-10-17 2020-02-13 株式会社ニコン パターン描画装置
KR20220150942A (ko) * 2020-04-06 2022-11-11 가부시키가이샤 니콘 패턴 형성 장치 및 패턴 형성 방법
JP7521988B2 (ja) * 2020-09-23 2024-07-24 株式会社Ｓｃｒｅｅｎホールディングス 基板位置検出方法、描画方法、基板位置検出装置および描画装置
JP7334708B2 (ja) * 2020-10-20 2023-08-29 株式会社豊田自動織機 自律移動体

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CN104204956B (zh) * 2012-03-26 2017-03-08 株式会社尼康 基板处理装置、处理装置以及元件制造方法
CN104380204B (zh) * 2012-06-21 2016-10-19 株式会社尼康 照明装置、处理装置、及元件制造方法
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JP6245174B2 (ja) * 2012-08-28 2017-12-13 株式会社ニコン 基板支持装置、及び露光装置
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KR101973349B1 (ko) * 2012-09-14 2019-04-26 가부시키가이샤 니콘 기판 처리 장치 및 디바이스 제조 방법

Also Published As

Publication number Publication date
TWI684836B (zh) 2020-02-11
KR20170002375A (ko) 2017-01-06
KR102430139B1 (ko) 2022-08-08
TW202018436A (zh) 2020-05-16
JP2019023764A (ja) 2019-02-14
CN107957660B (zh) 2020-10-23
CN107272353A (zh) 2017-10-20
CN107957660A (zh) 2018-04-24
JP2019215588A (ja) 2019-12-19
KR20220038545A (ko) 2022-03-28
JP6597602B2 (ja) 2019-10-30
TW201842419A (zh) 2018-12-01
CN107272353B (zh) 2019-06-14
TWI674484B (zh) 2019-10-11
CN106133610A (zh) 2016-11-16
TW202004368A (zh) 2020-01-16
CN107255913B (zh) 2019-10-11
TW201842420A (zh) 2018-12-01
HK1245420A1 (zh) 2018-08-24
WO2015152218A1 (ja) 2015-10-08
JPWO2015152218A1 (ja) 2017-04-13
HK1247996A1 (zh) 2018-10-05
TWI709006B (zh) 2020-11-01
KR102377752B1 (ko) 2022-03-24
CN107255913A (zh) 2017-10-17
TW201600941A (zh) 2016-01-01
TWI639064B (zh) 2018-10-21
TWI661280B (zh) 2019-06-01
TW201932996A (zh) 2019-08-16
CN106133610B (zh) 2017-12-29
TWI695235B (zh) 2020-06-01

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20230329