HK1204506A1 - 半導體裝置以及半導體裝置的製造方法 - Google Patents
半導體裝置以及半導體裝置的製造方法Info
- Publication number
- HK1204506A1 HK1204506A1 HK15102537.9A HK15102537A HK1204506A1 HK 1204506 A1 HK1204506 A1 HK 1204506A1 HK 15102537 A HK15102537 A HK 15102537A HK 1204506 A1 HK1204506 A1 HK 1204506A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- semiconductor device
- manufacturing
- semiconductor
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title 2
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
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- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
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- H01L2224/854—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
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- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
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- H01L2224/854—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/85438—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
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- H01L2224/91—Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
- H01L2224/92—Specific sequence of method steps
- H01L2224/922—Connecting different surfaces of the semiconductor or solid-state body with connectors of different types
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- H01L2224/93—Batch processes
- H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
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- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L24/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
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- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
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- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L24/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
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- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
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- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
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- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
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- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
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- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/73—Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
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- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/156—Material
- H01L2924/157—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2924/15738—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950 C and less than 1550 C
- H01L2924/15747—Copper [Cu] as principal constituent
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- H—ELECTRICITY
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- H01L2924/181—Encapsulation
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Geometry (AREA)
- Manufacturing & Machinery (AREA)
- Lead Frames For Integrated Circuits (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Wire Bonding (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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JP2013113337A JP6129645B2 (ja) | 2013-05-29 | 2013-05-29 | 半導体装置および半導体装置の製造方法 |
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HK1204506A1 true HK1204506A1 (zh) | 2015-11-20 |
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US (1) | US9368432B2 (zh) |
JP (1) | JP6129645B2 (zh) |
KR (1) | KR20140140486A (zh) |
CN (2) | CN104218013B (zh) |
HK (1) | HK1204506A1 (zh) |
TW (1) | TWI639214B (zh) |
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US11325828B2 (en) * | 2013-02-22 | 2022-05-10 | Vibrant Composites Inc. | High-volume millimeter scale manufacturing |
CN104576411A (zh) * | 2013-10-25 | 2015-04-29 | 飞思卡尔半导体公司 | 双角部顶部闸道模制 |
KR101631558B1 (ko) * | 2014-12-05 | 2016-06-24 | 주식회사 에스에프에이반도체 | 라우터블 qfn 패키지 및 그 제조 방법 |
US9972557B2 (en) | 2014-12-11 | 2018-05-15 | Stmicroelectronics Pte Ltd | Integrated circuit (IC) package with a solder receiving area and associated methods |
CN107431060B (zh) * | 2015-06-24 | 2021-01-05 | 瑞萨电子株式会社 | 半导体器件的制造方法 |
JP2017147272A (ja) * | 2016-02-15 | 2017-08-24 | ローム株式会社 | 半導体装置およびその製造方法、ならびに、半導体装置の製造に使用されるリードフレーム中間体 |
JP2017168703A (ja) * | 2016-03-17 | 2017-09-21 | 東芝メモリ株式会社 | 半導体装置の製造方法および半導体装置 |
JP2018107296A (ja) * | 2016-12-27 | 2018-07-05 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
JP6788509B2 (ja) * | 2017-01-17 | 2020-11-25 | 株式会社三井ハイテック | リードフレームの製造方法およびリードフレーム |
US10132504B1 (en) | 2017-05-15 | 2018-11-20 | Backer Ehp Inc. | Dual coil electric heating element |
US11067288B2 (en) | 2017-05-15 | 2021-07-20 | Backer Ehp Inc. | Dual coil electric heating element |
JP6922674B2 (ja) * | 2017-11-09 | 2021-08-18 | トヨタ自動車株式会社 | 半導体装置 |
US10777489B2 (en) * | 2018-05-29 | 2020-09-15 | Katoh Electric Co., Ltd. | Semiconductor module |
JP7057727B2 (ja) * | 2018-07-12 | 2022-04-20 | 株式会社三井ハイテック | リードフレームおよび半導体装置 |
JP7134137B2 (ja) * | 2019-05-31 | 2022-09-09 | 三菱電機株式会社 | 半導体装置 |
USD955168S1 (en) | 2019-07-03 | 2022-06-21 | Backer Ehp Inc. | Electric heating element |
US11581156B2 (en) | 2019-07-03 | 2023-02-14 | Backer Ehp Inc. | Dual coil electric heating element |
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JPH02308563A (ja) * | 1989-05-23 | 1990-12-21 | Shinko Electric Ind Co Ltd | リードフレーム |
JPH0529529A (ja) * | 1991-07-24 | 1993-02-05 | Matsushita Electron Corp | 樹脂封止型半導体装置 |
JP2971449B2 (ja) * | 1997-07-31 | 1999-11-08 | 松下電子工業株式会社 | 半導体装置、その製造方法及び半導体装置のリードフレーム |
EP0895287A3 (en) * | 1997-07-31 | 2006-04-05 | Matsushita Electric Industrial Co., Ltd. | Semiconductor device and lead frame for the same |
US6831352B1 (en) * | 1998-10-22 | 2004-12-14 | Azimuth Industrial Company, Inc. | Semiconductor package for high frequency performance |
KR100335480B1 (ko) | 1999-08-24 | 2002-05-04 | 김덕중 | 칩 패드가 방열 통로로 사용되는 리드프레임 및 이를 포함하는반도체 패키지 |
JP4417541B2 (ja) * | 2000-10-23 | 2010-02-17 | ローム株式会社 | 半導体装置およびその製造方法 |
JP3436253B2 (ja) * | 2001-03-01 | 2003-08-11 | 松下電器産業株式会社 | 樹脂封止型半導体装置およびその製造方法 |
JP2003142636A (ja) * | 2001-08-02 | 2003-05-16 | Nec Kyushu Ltd | 封止用樹脂、樹脂封止型半導体及びシステムインパッケージ |
TWI338358B (en) * | 2003-11-19 | 2011-03-01 | Rohm Co Ltd | Method of fabricating lead frame and method of fabricating semiconductor device using the same, and lead frame and semiconductor device using the same |
JP4511278B2 (ja) * | 2004-08-11 | 2010-07-28 | 三洋電機株式会社 | セラミックパッケージ |
JP4767277B2 (ja) | 2008-04-08 | 2011-09-07 | パナソニック株式会社 | リードフレームおよび樹脂封止型半導体装置 |
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CN104218013B (zh) | 2018-11-23 |
US9368432B2 (en) | 2016-06-14 |
CN104218013A (zh) | 2014-12-17 |
TW201507071A (zh) | 2015-02-16 |
CN203932042U (zh) | 2014-11-05 |
KR20140140486A (ko) | 2014-12-09 |
US20140353809A1 (en) | 2014-12-04 |
TWI639214B (zh) | 2018-10-21 |
JP6129645B2 (ja) | 2017-05-17 |
JP2014232811A (ja) | 2014-12-11 |
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