HK1153848A1 - Xrf system having multiple excitation energy bands in highly aligned package xrf - Google Patents

Xrf system having multiple excitation energy bands in highly aligned package xrf

Info

Publication number
HK1153848A1
HK1153848A1 HK11108104.3A HK11108104A HK1153848A1 HK 1153848 A1 HK1153848 A1 HK 1153848A1 HK 11108104 A HK11108104 A HK 11108104A HK 1153848 A1 HK1153848 A1 HK 1153848A1
Authority
HK
Hong Kong
Prior art keywords
xrf
excitation energy
energy bands
multiple excitation
highly aligned
Prior art date
Application number
HK11108104.3A
Other languages
English (en)
Chinese (zh)
Inventor
陳澤武
‧吉布森
‧伯德特
‧貝利
‧塞姆肯
辛凱
Original Assignee
射線光學系統公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 射線光學系統公司 filed Critical 射線光學系統公司
Publication of HK1153848A1 publication Critical patent/HK1153848A1/xx

Links

Classifications

    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05GX-RAY TECHNIQUE
    • H05G1/00X-ray apparatus involving X-ray tubes; Circuits therefor
    • H05G1/02Constructional details
    • H05G1/04Mounting the X-ray tube within a closed housing
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/07Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076X-ray fluorescence
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/10Different kinds of radiation or particles
    • G01N2223/1003Different kinds of radiation or particles monochromatic
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/30Accessories, mechanical or electrical features
    • G01N2223/315Accessories, mechanical or electrical features monochromators
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/40Imaging
    • G01N2223/423Imaging multispectral imaging-multiple energy imaging
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00Arrangements for handling radiation or particles
    • G21K2201/06Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/062Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00Arrangements for handling radiation or particles
    • G21K2201/06Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
HK11108104.3A 2008-03-05 2011-08-04 Xrf system having multiple excitation energy bands in highly aligned package xrf HK1153848A1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US3389908P 2008-03-05 2008-03-05
US3922008P 2008-03-25 2008-03-25
US4297408P 2008-04-07 2008-04-07
PCT/US2009/035847 WO2009111454A1 (en) 2008-03-05 2009-03-03 Xrf system having multiple excitation energy bands in highly aligned package

Publications (1)

Publication Number Publication Date
HK1153848A1 true HK1153848A1 (en) 2012-04-05

Family

ID=41056347

Family Applications (1)

Application Number Title Priority Date Filing Date
HK11108104.3A HK1153848A1 (en) 2008-03-05 2011-08-04 Xrf system having multiple excitation energy bands in highly aligned package xrf

Country Status (8)

Country Link
US (4) US8559597B2 (es)
EP (1) EP2260501B1 (es)
JP (1) JP5539906B2 (es)
CN (2) CN105044139B (es)
CA (1) CA2753990C (es)
HK (1) HK1153848A1 (es)
MX (1) MX2010009713A (es)
WO (1) WO2009111454A1 (es)

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Also Published As

Publication number Publication date
US8559597B2 (en) 2013-10-15
MX2010009713A (es) 2011-03-29
US20150262722A1 (en) 2015-09-17
EP2260501A1 (en) 2010-12-15
WO2009111454A1 (en) 2009-09-11
CA2753990C (en) 2017-11-21
US20160260514A1 (en) 2016-09-08
US9343193B2 (en) 2016-05-17
JP5539906B2 (ja) 2014-07-02
JP2011513751A (ja) 2011-04-28
CN105044139A (zh) 2015-11-11
EP2260501B1 (en) 2021-08-25
EP2260501A4 (en) 2014-03-19
US20110170666A1 (en) 2011-07-14
CA2753990A1 (en) 2009-09-11
CN101981651A (zh) 2011-02-23
CN105044139B (zh) 2019-04-23
US9048001B2 (en) 2015-06-02
CN101981651B (zh) 2015-07-08
US20140105363A1 (en) 2014-04-17

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PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20230306