GB9701928D0 - Method of fabricating a semiconductor memory device having tree-type capacitor - Google Patents
Method of fabricating a semiconductor memory device having tree-type capacitorInfo
- Publication number
- GB9701928D0 GB9701928D0 GBGB9701928.5A GB9701928A GB9701928D0 GB 9701928 D0 GB9701928 D0 GB 9701928D0 GB 9701928 A GB9701928 A GB 9701928A GB 9701928 D0 GB9701928 D0 GB 9701928D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- fabricating
- tree
- memory device
- semiconductor memory
- type capacitor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/60—Electrodes
- H01L28/82—Electrodes with an enlarged surface, e.g. formed by texturisation
- H01L28/86—Electrodes with an enlarged surface, e.g. formed by texturisation having horizontal extensions
- H01L28/88—Electrodes with an enlarged surface, e.g. formed by texturisation having horizontal extensions made by patterning layers, e.g. by etching conductive layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/60—Electrodes
- H01L28/82—Electrodes with an enlarged surface, e.g. formed by texturisation
- H01L28/90—Electrodes with an enlarged surface, e.g. formed by texturisation having vertical extensions
- H01L28/92—Electrodes with an enlarged surface, e.g. formed by texturisation having vertical extensions made by patterning layers, e.g. by etching conductive layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/01—Manufacture or treatment
- H10B12/02—Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
- H10B12/03—Making the capacitor or connections thereto
- H10B12/033—Making the capacitor or connections thereto the capacitor extending over the transistor
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9701928A GB2323470A (en) | 1997-01-30 | 1997-01-30 | Method of fabricating a stacked capacitor |
NL1005631A NL1005631C2 (en) | 1997-01-30 | 1997-03-25 | Semiconductor memory device. |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9701928A GB2323470A (en) | 1997-01-30 | 1997-01-30 | Method of fabricating a stacked capacitor |
NL1005631A NL1005631C2 (en) | 1997-01-30 | 1997-03-25 | Semiconductor memory device. |
Publications (2)
Publication Number | Publication Date |
---|---|
GB9701928D0 true GB9701928D0 (en) | 1997-03-19 |
GB2323470A GB2323470A (en) | 1998-09-23 |
Family
ID=26310896
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9701928A Withdrawn GB2323470A (en) | 1997-01-30 | 1997-01-30 | Method of fabricating a stacked capacitor |
Country Status (2)
Country | Link |
---|---|
GB (1) | GB2323470A (en) |
NL (1) | NL1005631C2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10105686A1 (en) * | 2001-02-08 | 2002-09-05 | Infineon Technologies Ag | Method for producing a capacitor arrangement for a semiconductor memory device |
US10559568B1 (en) * | 2018-09-10 | 2020-02-11 | Nanya Technology Corporation | Method for preparing semiconductor capacitor structure |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0338061A (en) * | 1989-07-05 | 1991-02-19 | Fujitsu Ltd | Semiconductor memory |
JP2886280B2 (en) * | 1990-06-29 | 1999-04-26 | 宮城沖電気株式会社 | Method for manufacturing semiconductor memory device |
US5053351A (en) * | 1991-03-19 | 1991-10-01 | Micron Technology, Inc. | Method of making stacked E-cell capacitor DRAM cell |
KR0126623B1 (en) * | 1994-08-03 | 1997-12-26 | 김주용 | Method for fabricating capacitors of semiconductor device |
-
1997
- 1997-01-30 GB GB9701928A patent/GB2323470A/en not_active Withdrawn
- 1997-03-25 NL NL1005631A patent/NL1005631C2/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
GB2323470A (en) | 1998-09-23 |
NL1005631C2 (en) | 1998-09-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |