GB2603043B - A variable inlet conductance vacuum pump, vacuum pump arrangement and method - Google Patents

A variable inlet conductance vacuum pump, vacuum pump arrangement and method Download PDF

Info

Publication number
GB2603043B
GB2603043B GB2117588.0A GB202117588A GB2603043B GB 2603043 B GB2603043 B GB 2603043B GB 202117588 A GB202117588 A GB 202117588A GB 2603043 B GB2603043 B GB 2603043B
Authority
GB
United Kingdom
Prior art keywords
vacuum pump
variable inlet
inlet conductance
arrangement
pump arrangement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
GB2117588.0A
Other versions
GB2603043A (en
GB202117588D0 (en
Inventor
David Stones Ian
Mark Bailey Christopher
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Edwards Ltd
Original Assignee
Edwards Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Edwards Ltd filed Critical Edwards Ltd
Priority to GB2117588.0A priority Critical patent/GB2603043B/en
Priority claimed from GB1811228.4A external-priority patent/GB2575450B/en
Publication of GB202117588D0 publication Critical patent/GB202117588D0/en
Publication of GB2603043A publication Critical patent/GB2603043A/en
Application granted granted Critical
Publication of GB2603043B publication Critical patent/GB2603043B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D19/00—Axial-flow pumps
    • F04D19/02—Multi-stage pumps
    • F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D19/00—Axial-flow pumps
    • F04D19/02—Multi-stage pumps
    • F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
    • F04D19/042—Turbomolecular vacuum pumps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D17/00—Radial-flow pumps, e.g. centrifugal pumps; Helico-centrifugal pumps
    • F04D17/08—Centrifugal pumps
    • F04D17/16—Centrifugal pumps for displacing without appreciable compression
    • F04D17/168—Pumps specially adapted to produce a vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D27/00—Control, e.g. regulation, of pumps, pumping installations or pumping systems specially adapted for elastic fluids
    • F04D27/002—Control, e.g. regulation, of pumps, pumping installations or pumping systems specially adapted for elastic fluids by varying geometry within the pumps, e.g. by adjusting vanes
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D27/00—Control, e.g. regulation, of pumps, pumping installations or pumping systems specially adapted for elastic fluids
    • F04D27/02—Surge control
    • F04D27/0253—Surge control by throttling
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D29/00—Details, component parts, or accessories
    • F04D29/05—Shafts or bearings, or assemblies thereof, specially adapted for elastic fluid pumps
    • F04D29/052—Axially shiftable rotors
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
    • F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
    • F05D2250/00—Geometry
    • F05D2250/50—Inlet or outlet
    • F05D2250/51—Inlet
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Non-Positive Displacement Air Blowers (AREA)
GB2117588.0A 2018-07-09 2018-07-09 A variable inlet conductance vacuum pump, vacuum pump arrangement and method Active GB2603043B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB2117588.0A GB2603043B (en) 2018-07-09 2018-07-09 A variable inlet conductance vacuum pump, vacuum pump arrangement and method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB1811228.4A GB2575450B (en) 2018-07-09 2018-07-09 A variable inlet conductance vacuum pump, vacuum pump arrangement and method
GB2117588.0A GB2603043B (en) 2018-07-09 2018-07-09 A variable inlet conductance vacuum pump, vacuum pump arrangement and method

Publications (3)

Publication Number Publication Date
GB202117588D0 GB202117588D0 (en) 2022-01-19
GB2603043A GB2603043A (en) 2022-07-27
GB2603043B true GB2603043B (en) 2023-05-03

Family

ID=82261161

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2117588.0A Active GB2603043B (en) 2018-07-09 2018-07-09 A variable inlet conductance vacuum pump, vacuum pump arrangement and method

Country Status (1)

Country Link
GB (1) GB2603043B (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0898081A1 (en) * 1997-08-15 1999-02-24 Ebara Corporation Turbomolecular Pump

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0898081A1 (en) * 1997-08-15 1999-02-24 Ebara Corporation Turbomolecular Pump

Also Published As

Publication number Publication date
GB2603043A (en) 2022-07-27
GB202117588D0 (en) 2022-01-19

Similar Documents

Publication Publication Date Title
HK1245165A1 (en) Rotor for a fluid pump, and method and mold for manufacturing same
EP3726055A4 (en) Vacuum pump vent pipe silencer and refrigerator having same
EP3415766A4 (en) Vacuum pump, and flexible cover and rotor used in said vacuum pump
LT3631835T (en) Feedback system and vacuum deposition system with the same, and associated method
EP3536964A4 (en) Vacuum pump control device, vacuum pump, and method for assembling vacuum pump control device
GB201721671D0 (en) A vacuum pumping arrangement and method of cleaning the vacuum pumping arrangement
GB201917007D0 (en) Variable inlet diameter unit
CA188020S (en) Vacuum pump
GB201818459D0 (en) Vacuum pump
EP3581801A4 (en) Vacuum pump, rotary portion provided in vacuum pump, and unbalance correction method
GB201700462D0 (en) A multiple stage vacuum pump and pump configuring method
PL3360998T3 (en) Water-conducting domestic appliance and pump device for a water-conducting domestic appliance, method for operating such a pump device
GB2603043B (en) A variable inlet conductance vacuum pump, vacuum pump arrangement and method
GB2575450B (en) A variable inlet conductance vacuum pump, vacuum pump arrangement and method
GB2579665B (en) Multi-stage turbomolecular pump
GB2575451B (en) Vacuum pump with through channel and vacuum chamber
EP4180669A4 (en) Vacuum pump, and control apparatus
EP3875769A4 (en) Vacuum pump, and vacuum pump constituent component
GB201811229D0 (en) A variable pumping capacity vacuum pump, vacuum pump arrangement and method
EP3882469A4 (en) Impeller, pump provided with impeller, and method for manufacturing impeller
CA188489S (en) Vacuum pump
EP3734077A4 (en) Vacuum pump and stationary parts, exhaust port, and control means used therewith
EP3633203A4 (en) Vacuum pump and heating device thereof
GB201801435D0 (en) Scroll vacuum pump
EP3561483C0 (en) A flow cell, assembly and method