GB2423523A - Process for etching metal and alloy surfaces - Google Patents

Process for etching metal and alloy surfaces Download PDF

Info

Publication number
GB2423523A
GB2423523A GB0607674A GB0607674A GB2423523A GB 2423523 A GB2423523 A GB 2423523A GB 0607674 A GB0607674 A GB 0607674A GB 0607674 A GB0607674 A GB 0607674A GB 2423523 A GB2423523 A GB 2423523A
Authority
GB
United Kingdom
Prior art keywords
parts
metal
etch
alloy
ink
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB0607674A
Other versions
GB0607674D0 (en
GB2423523B (en
Inventor
David John Cottrell
Mark Robert James
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Imaging Colorants Ltd
Original Assignee
Fujifilm Imaging Colorants Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Imaging Colorants Ltd filed Critical Fujifilm Imaging Colorants Ltd
Publication of GB0607674D0 publication Critical patent/GB0607674D0/en
Publication of GB2423523A publication Critical patent/GB2423523A/en
Application granted granted Critical
Publication of GB2423523B publication Critical patent/GB2423523B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C09D11/34—Hot-melt inks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/09—Treatments involving charged particles
    • H05K2203/092—Particle beam, e.g. using an electron beam or an ion beam
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12—Using specific substances
    • H05K2203/121—Metallo-organic compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12—Using specific substances
    • H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax, thiol
    • H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12993—Surface feature [e.g., rough, mirror]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer

Abstract

A process for etching a metal or alloy surface which comprises applying an etch-resist ink by ink jet printing to selected areas of the metal or alloy, solidifying the etch-resist ink without the use of actinic light and/or particle beam radiation and then removing the exposed metal or alloy by a chemical etching process wherein the etch-resist ink comprises the components: A) 60 to 100 parts carrier vehicle comprising one or more components which contain at least one metal chelating group; D) 0 to 40 parts colorant; and E) 0 to 5 parts surfactant; wherein the ink has a viscosity of not greater than 30 cPs (mPa.s) at the firing temperature, all parts are by weight and the total number of parts A)+B)+C)=100.

Description

GB 2423523 A continuation (74) Agent and/or Address for Service: Fujifilm
Imaging Colorants Limited P0 Box 42, Intellectual Property Group, Hexagon Tower, Blackley, MANCHESTER, M9 8ZS, United Kingdom
GB0607674A 2003-10-25 2004-10-01 Process for etching metal and alloy surfaces Expired - Fee Related GB2423523B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0324947.1A GB0324947D0 (en) 2003-10-25 2003-10-25 Process
PCT/GB2004/004186 WO2005045098A1 (en) 2003-10-25 2004-10-01 Process for etching metal and alloy surfaces

Publications (3)

Publication Number Publication Date
GB0607674D0 GB0607674D0 (en) 2006-05-31
GB2423523A true GB2423523A (en) 2006-08-30
GB2423523B GB2423523B (en) 2008-08-20

Family

ID=29595835

Family Applications (2)

Application Number Title Priority Date Filing Date
GBGB0324947.1A Ceased GB0324947D0 (en) 2003-10-25 2003-10-25 Process
GB0607674A Expired - Fee Related GB2423523B (en) 2003-10-25 2004-10-01 Process for etching metal and alloy surfaces

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GBGB0324947.1A Ceased GB0324947D0 (en) 2003-10-25 2003-10-25 Process

Country Status (3)

Country Link
US (1) US7758759B2 (en)
GB (2) GB0324947D0 (en)
WO (1) WO2005045098A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2441983A (en) * 2006-07-14 2008-03-26 Aea Technology Plc Catalytic structures for use in catalytic reactors

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0615651D0 (en) * 2006-08-07 2006-09-13 Sun Chemical Bv A process for manufacturing solar cells
GB0615650D0 (en) * 2006-08-07 2006-09-13 Sun Chemical Bv An etching or plating process and resist ink
US7993729B2 (en) * 2008-10-27 2011-08-09 Ronald Wise Substrate for artificial turf
KR101100110B1 (en) * 2010-03-15 2011-12-29 한국철강 주식회사 Photovoltaic device including a substrate or a flexible substrate and method for manufacturing the same
CN102303461A (en) * 2011-07-11 2012-01-04 广州南鸥卫浴用品有限公司 Metal surface pattern printing process
JP5472950B2 (en) * 2012-06-19 2014-04-16 Ｊｅインターナショナル株式会社 Masking agent and method for producing surface-treated substrate
US9812042B2 (en) 2012-10-29 2017-11-07 Innotec Corp. Lighted trim assembly and perforated member therefor
TW201520837A (en) * 2013-11-22 2015-06-01 Eturbotouch Technology Inc Touch panel and manufacturing method of the same
ES2666820T3 (en) * 2013-11-25 2018-05-08 Akk Gmbh Template for surface structuring by acid etching
EP2915856B1 (en) * 2014-03-03 2019-10-16 Agfa-Gevaert Etch-resistant inkjet inks for manufacturing conductive patterns
CN107710070B (en) 2015-06-04 2021-07-13 科迪华公司 Method for producing etch-resistant patterns on metal surfaces and composition set thereof
CN108027553B (en) 2015-08-13 2021-12-31 柯狄公司 Method for producing etch-resistant patterns on metal surfaces
US10429733B2 (en) * 2015-10-27 2019-10-01 Dic Graphics Corporation Low temperature baking adapted resist ink
CN106142968A (en) * 2016-08-31 2016-11-23 青岛伟健金属饰品有限公司 A kind of engraving mark preparation method
US10337959B2 (en) * 2016-09-01 2019-07-02 Ford Global Technologies, Llc System, method and apparatus for making evident diesel exhaust fluid contamination
US10398034B2 (en) 2016-12-12 2019-08-27 Kateeva, Inc. Methods of etching conductive features, and related devices and systems
CN110485192A (en) * 2019-08-23 2019-11-22 苏州华滤节能科技有限公司 A kind of filter paper containing bamboo fibre
CN113488385B (en) * 2021-05-21 2022-10-28 刘军 Gas-ionization type etching process for conductive film
US11826775B2 (en) * 2022-03-07 2023-11-28 CatMarks Manufacturing, LLC Automotive part identification marking system
CN115029701B (en) * 2022-07-08 2023-02-21 四川新远宏机械设备有限公司 Zirconium alloy metal plate etching processing method and formed plate
CN116732518A (en) * 2023-06-06 2023-09-12 上海奢藏科技有限公司 Etching treatment process for surface patterns of special-shaped multi-surface aluminum material

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4536468A (en) * 1983-05-06 1985-08-20 Dainippon Ink And Chemicals, Inc. Method of forming resist pattern
US4767489A (en) * 1987-03-25 1988-08-30 Pc Proto, Inc. Computer aided printer-etcher
EP0659038A2 (en) * 1993-12-14 1995-06-21 Canon Kabushiki Kaisha Etching resist composition, pattern forming method making use of the same, printed-wiring board and its production
WO1995023244A1 (en) * 1994-02-25 1995-08-31 The University Of Edinburgh Surface treatment of an object

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4933209A (en) * 1989-06-28 1990-06-12 Hewlett-Packard Company Method of making a thin film recording head apparatus utilizing polyimide films
US6444140B2 (en) * 1999-03-17 2002-09-03 Morton International Inc. Micro-etch solution for producing metal surface topography
GB0221891D0 (en) * 2002-09-20 2002-10-30 Avecia Ltd Process

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4536468A (en) * 1983-05-06 1985-08-20 Dainippon Ink And Chemicals, Inc. Method of forming resist pattern
US4767489A (en) * 1987-03-25 1988-08-30 Pc Proto, Inc. Computer aided printer-etcher
EP0659038A2 (en) * 1993-12-14 1995-06-21 Canon Kabushiki Kaisha Etching resist composition, pattern forming method making use of the same, printed-wiring board and its production
WO1995023244A1 (en) * 1994-02-25 1995-08-31 The University Of Edinburgh Surface treatment of an object

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2441983A (en) * 2006-07-14 2008-03-26 Aea Technology Plc Catalytic structures for use in catalytic reactors

Also Published As

Publication number Publication date
US7758759B2 (en) 2010-07-20
GB0607674D0 (en) 2006-05-31
US20080245768A1 (en) 2008-10-09
GB2423523B (en) 2008-08-20
WO2005045098A1 (en) 2005-05-19
GB0324947D0 (en) 2003-11-26

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20111001