GB2404454B - Micromachining process for forming microstructures having sloping and/or profiled side walls or substructures. - Google Patents

Micromachining process for forming microstructures having sloping and/or profiled side walls or substructures.

Info

Publication number
GB2404454B
GB2404454B GB0408169A GB0408169A GB2404454B GB 2404454 B GB2404454 B GB 2404454B GB 0408169 A GB0408169 A GB 0408169A GB 0408169 A GB0408169 A GB 0408169A GB 2404454 B GB2404454 B GB 2404454B
Authority
GB
United Kingdom
Prior art keywords
substructures
sloping
side walls
micromachining process
profiled side
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB0408169A
Other versions
GB0408169D0 (en
GB2404454A (en
Inventor
Wai Yip Liu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of GB0408169D0 publication Critical patent/GB0408169D0/en
Publication of GB2404454A publication Critical patent/GB2404454A/en
Application granted granted Critical
Publication of GB2404454B publication Critical patent/GB2404454B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
    • B81C1/0046—Surface micromachining, i.e. structuring layers on the substrate using stamping, e.g. imprinting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
GB0408169A 2003-07-30 2004-04-13 Micromachining process for forming microstructures having sloping and/or profiled side walls or substructures. Expired - Fee Related GB2404454B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB0317830.8A GB0317830D0 (en) 2003-07-30 2003-07-30 Micromachining process and apparatus

Publications (3)

Publication Number Publication Date
GB0408169D0 GB0408169D0 (en) 2004-05-19
GB2404454A GB2404454A (en) 2005-02-02
GB2404454B true GB2404454B (en) 2005-06-22

Family

ID=27799474

Family Applications (4)

Application Number Title Priority Date Filing Date
GBGB0317830.8A Ceased GB0317830D0 (en) 2003-07-30 2003-07-30 Micromachining process and apparatus
GBGB0406058.8A Ceased GB0406058D0 (en) 2003-07-30 2004-03-18 Micromachining process and apparatus
GBGB0406725.2A Ceased GB0406725D0 (en) 2003-07-30 2004-03-25 A system for fabrication of microstructures with non-vertical sidewalls
GB0408169A Expired - Fee Related GB2404454B (en) 2003-07-30 2004-04-13 Micromachining process for forming microstructures having sloping and/or profiled side walls or substructures.

Family Applications Before (3)

Application Number Title Priority Date Filing Date
GBGB0317830.8A Ceased GB0317830D0 (en) 2003-07-30 2003-07-30 Micromachining process and apparatus
GBGB0406058.8A Ceased GB0406058D0 (en) 2003-07-30 2004-03-18 Micromachining process and apparatus
GBGB0406725.2A Ceased GB0406725D0 (en) 2003-07-30 2004-03-25 A system for fabrication of microstructures with non-vertical sidewalls

Country Status (2)

Country Link
GB (4) GB0317830D0 (en)
HK (1) HK1068690A1 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000065408A1 (en) * 1999-04-21 2000-11-02 Minuta Technology Co., Ltd. Method for forming a micro-pattern on a substrate
US20020042027A1 (en) * 1998-10-09 2002-04-11 Chou Stephen Y. Microscale patterning and articles formed thereby

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020042027A1 (en) * 1998-10-09 2002-04-11 Chou Stephen Y. Microscale patterning and articles formed thereby
WO2000065408A1 (en) * 1999-04-21 2000-11-02 Minuta Technology Co., Ltd. Method for forming a micro-pattern on a substrate

Also Published As

Publication number Publication date
HK1068690A1 (en) 2005-04-29
GB0406058D0 (en) 2004-04-21
GB0408169D0 (en) 2004-05-19
GB0406725D0 (en) 2004-04-28
GB0317830D0 (en) 2003-09-03
GB2404454A (en) 2005-02-02

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Effective date: 20090413