GB2245553A - Improved vitreous silica products - Google Patents

Improved vitreous silica products

Info

Publication number
GB2245553A
GB2245553A GB9117060A GB9117060A GB2245553A GB 2245553 A GB2245553 A GB 2245553A GB 9117060 A GB9117060 A GB 9117060A GB 9117060 A GB9117060 A GB 9117060A GB 2245553 A GB2245553 A GB 2245553A
Authority
GB
United Kingdom
Prior art keywords
silica
vitreous silica
general formula
silica products
silicon compounds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB9117060A
Other versions
GB2245553B (en
GB9117060D0 (en
Inventor
Ian George Sayce
Alan Smithson
Peter John Wells
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Quartz Ltd
Original Assignee
TSL Group PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=10653383&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=GB2245553(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by TSL Group PLC filed Critical TSL Group PLC
Publication of GB9117060D0 publication Critical patent/GB9117060D0/en
Publication of GB2245553A publication Critical patent/GB2245553A/en
Application granted granted Critical
Publication of GB2245553B publication Critical patent/GB2245553B/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/50—Solid solutions
    • C01P2002/52—Solid solutions containing elements as dopants
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/50—Solid solutions
    • C01P2002/52—Solid solutions containing elements as dopants
    • C01P2002/54—Solid solutions containing elements as dopants one element only
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/10—Particle morphology extending in one dimension, e.g. needle-like
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/10—Particle morphology extending in one dimension, e.g. needle-like
    • C01P2004/12—Particle morphology extending in one dimension, e.g. needle-like with a cylindrical shape
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/50—Agglomerated particles
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/10—Solid density
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/28—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with phosphorus
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/31—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with germanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/32—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/36—Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives
    • C03B2207/38—Fuel combinations or non-standard fuels, e.g. H2+CH4, ethane
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/02—Pure silica glass, e.g. pure fused quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/10—Doped silica-based glasses containing boron or halide containing boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/14—Doped silica-based glasses containing boron or halide containing boron and fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/32—Doped silica-based glasses containing metals containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes

Abstract

A process for the manufacture of a synthetic silica product by vapour-phase oxidation of a silica precursor material in a flame not less than 60 % of the silica in the deposited product being derived by oxidation of: (A) one or more straight chain volatile silicon compounds of the general formula: R3Si.O(SiR2O)n.SiR3 and/or (B) one or more cyclic volatile silicon compounds of the general formula: SinOn(R)2n. Doped or undoped fume powder, porous silica soot or fully densified bodies made by the process are also claimed.
GB9117060A 1989-03-15 1991-08-07 Improved vitreous silica products Expired - Lifetime GB2245553B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB898905966A GB8905966D0 (en) 1989-03-15 1989-03-15 Improved vitreous silica products
PCT/GB1990/000384 WO1990010596A1 (en) 1989-03-15 1990-03-14 Improved vitreous silica products

Publications (3)

Publication Number Publication Date
GB9117060D0 GB9117060D0 (en) 1991-09-18
GB2245553A true GB2245553A (en) 1992-01-08
GB2245553B GB2245553B (en) 1992-08-19

Family

ID=10653383

Family Applications (2)

Application Number Title Priority Date Filing Date
GB898905966A Pending GB8905966D0 (en) 1989-03-15 1989-03-15 Improved vitreous silica products
GB9117060A Expired - Lifetime GB2245553B (en) 1989-03-15 1991-08-07 Improved vitreous silica products

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB898905966A Pending GB8905966D0 (en) 1989-03-15 1989-03-15 Improved vitreous silica products

Country Status (11)

Country Link
EP (1) EP0463045B1 (en)
JP (1) JP2744695B2 (en)
KR (1) KR0130007B1 (en)
AT (1) ATE141901T1 (en)
CA (1) CA2047187C (en)
DE (1) DE69028300T2 (en)
DK (1) DK0463045T3 (en)
ES (1) ES2092505T3 (en)
FI (1) FI93822C (en)
GB (2) GB8905966D0 (en)
WO (1) WO1990010596A1 (en)

Cited By (3)

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US5703191A (en) * 1995-09-01 1997-12-30 Corning Incorporated Method for purifying polyalkylsiloxanes and the resulting products
US5827342A (en) * 1996-04-30 1998-10-27 Corning Incorporated Treatment of glass substrates to compensate for warpage and distortion
US5879649A (en) * 1995-12-19 1999-03-09 Corning Incorporated Method for purifying polyalkylsiloxanes and the resulting products

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US5242866A (en) * 1987-01-09 1993-09-07 Allied-Signal Inc. Carbon-containing black glass monoliths
US5152819A (en) * 1990-08-16 1992-10-06 Corning Incorporated Method of making fused silica
US5043002A (en) 1990-08-16 1991-08-27 Corning Incorporated Method of making fused silica by decomposing siloxanes
WO1994017003A1 (en) * 1990-09-21 1994-08-04 Allied-Signal Inc. Ceramic fiber reinforced silicon carboxide composite with adjustable dielectric properties
GB2266302B (en) * 1991-03-06 1995-01-18 Allied Signal Inc Ceramic fiber reinforced silicon carboxide composite
US5266533A (en) * 1991-04-12 1993-11-30 Allied-Signal Inc. Black glass ceramic from rapid pyrolysis in oxygen-containing atmospheres
DE69222953D1 (en) * 1991-04-12 1997-12-04 Allied Signal Inc BLACK GLASS CERAMICS MADE BY FAST PYROLYSIS IN OXYGENOUS ATMOSPHERES
JP2588447B2 (en) * 1991-06-29 1997-03-05 信越石英株式会社 Method of manufacturing quartz glass member for excimer laser
US5322825A (en) * 1992-05-29 1994-06-21 Allied-Signal Inc. Silicon oxycarbonitride by pyrolysis of polycyclosiloxanes in ammonia
US6312656B1 (en) * 1995-12-19 2001-11-06 Corning Incorporated Method for forming silica by combustion of liquid reactants using oxygen
BR9611969A (en) * 1995-12-19 1999-02-17 Corning Inc Process and apparatus for forming fused silica by combustion of liquid reagents
US6322765B1 (en) 1996-02-15 2001-11-27 Wacker-Chemie Gmbh Process for preparing silicon dioxide
DE19605672C1 (en) * 1996-02-15 1997-09-25 Wacker Chemie Gmbh Process for the production of silicon dioxide
AU5798798A (en) 1996-12-16 1998-07-15 Corning Incorporated Germanium doped silica forming feedstock and method
WO1998039496A1 (en) 1997-03-07 1998-09-11 Corning Incorporated Method of making titania-doped fused silica
TW440548B (en) * 1997-05-14 2001-06-16 Nippon Kogaku Kk Synthetic silica glass optical member and method of manufacturing the same
CA2288769A1 (en) * 1997-07-08 1999-01-21 Corning Incorporated Germanium chloride and siloxane feedstock for forming silica glass and method
GB9722020D0 (en) * 1997-10-17 1997-12-17 Tsl Group Plc Production of quartz glass articles having high surface purity
DE19841932A1 (en) * 1998-09-14 2000-03-16 Heraeus Quarzglas UV transmitting optical component, e.g. a microlithography component used in chip production, consists of flame hydrolyzed and directly vitrified quartz glass of extremely low hydrogen content
US6672111B2 (en) * 2001-12-21 2004-01-06 Corning Incorporated Method and apparatus for adding metals to fused silica
JP5230051B2 (en) * 2002-09-11 2013-07-10 株式会社トクヤマ Fine fused silica particles
EP1565400B1 (en) 2002-11-26 2019-04-10 Cabot Corporation Fumed metal oxide particles and process for producing the same
DE10302914B4 (en) * 2003-01-24 2005-12-29 Heraeus Quarzglas Gmbh & Co. Kg Process for the production of synthetic quartz glass
US8414970B2 (en) 2008-02-15 2013-04-09 Guardian Industries Corp. Organosiloxane inclusive precursors having ring and/or cage-like structures for use in combustion deposition
US8729158B2 (en) 2008-09-05 2014-05-20 Cabot Corporation Fumed silica of controlled aggregate size and processes for manufacturing the same
US8038971B2 (en) 2008-09-05 2011-10-18 Cabot Corporation Fumed silica of controlled aggregate size and processes for manufacturing the same
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DE102010052685A1 (en) 2010-11-26 2012-05-31 J-Fiber Gmbh Process for the production of radiation-resistant quartz glass material and quartz glass body produced therefrom
DE102011119373A1 (en) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Process for the production of synthetic quartz glass
DE102011119339A1 (en) * 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Sputtering process for the production of synthetic quartz glass
DE102011119374A1 (en) * 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Process for the production of synthetic quartz glass
DE102011119341A1 (en) * 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Process for the production of synthetic quartz glass using the soot method
DE102011121153B3 (en) 2011-12-15 2013-03-21 Heraeus Quarzglas Gmbh & Co. Kg Process for the production of synthetic quartz glass and quartz glass for use as cladding material of an optical fiber
DE102011121190A1 (en) 2011-12-16 2013-06-20 Heraeus Quarzglas Gmbh & Co. Kg OMCTS evaporation method
JP5906929B2 (en) * 2012-05-07 2016-04-20 住友電気工業株式会社 GLASS TUBE, ITS MANUFACTURING METHOD, AND FLUID SEPARATION MATERIAL USING GLASS TUBE
JP5906930B2 (en) * 2012-05-07 2016-04-20 住友電気工業株式会社 Glass tube and manufacturing method thereof
EP3059212A1 (en) 2015-02-18 2016-08-24 Heraeus Quarzglas GmbH & Co. KG Method and apparatus for making silica glass from polymerisable polyalkylsiloxane with membrane filter as cleaning device
EP3390296A2 (en) 2015-12-18 2018-10-24 Heraeus Quarzglas GmbH & Co. KG Production of a silica glass article in a multichamber furnace
KR20180095622A (en) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 Manufacture of Silica Glass Products from Molten Crucibles Made of Refractory Metals
WO2017103125A1 (en) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Spray granulation of silica during the production of silica glass
CN108698890A (en) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 Quartz glass body is prepared using the dew point monitoring in melting baking oven
US11339076B2 (en) 2015-12-18 2022-05-24 Heraeus Quarzglas Gmbh & Co. Kg Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass
EP3390308A1 (en) 2015-12-18 2018-10-24 Heraeus Quarzglas GmbH & Co. KG Glass fibers and preforms made of quartz glass having low oh, cl, and al content
EP3390290B1 (en) 2015-12-18 2023-03-15 Heraeus Quarzglas GmbH & Co. KG Production of an opaque quartz glass body
CN109153593A (en) 2015-12-18 2019-01-04 贺利氏石英玻璃有限两合公司 The preparation of synthetic quartz glass powder
WO2017103160A1 (en) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Production of silica glass articles from silica granluate
US11952303B2 (en) 2015-12-18 2024-04-09 Heraeus Quarzglas Gmbh & Co. Kg Increase in silicon content in the preparation of quartz glass
KR102388688B1 (en) * 2020-10-23 2022-04-20 비씨엔씨 주식회사 Synthetic quartz manufacturing method
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US4113844A (en) * 1975-11-20 1978-09-12 Komatsu Electronci Metals, Co., Ltd. Method of producing high-purity transparent vitreous silica body
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DE3016010A1 (en) * 1980-04-25 1981-10-29 Degussa Ag, 6000 Frankfurt PYROGEN-PRODUCED SILICA AND METHOD FOR THE PRODUCTION THEREOF
DE2909815C2 (en) * 1979-03-13 1984-11-22 Wacker-Chemie GmbH, 8000 München Process for the production of fumed silica

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DE2313204B2 (en) * 1972-03-30 1977-12-08 Corning Glass Works, Corning, N.Y. (V.StA.) METHOD OF MANUFACTURING OPTICAL WAVE GUIDES FROM GLASS
US4113844A (en) * 1975-11-20 1978-09-12 Komatsu Electronci Metals, Co., Ltd. Method of producing high-purity transparent vitreous silica body
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US5703191A (en) * 1995-09-01 1997-12-30 Corning Incorporated Method for purifying polyalkylsiloxanes and the resulting products
US5879649A (en) * 1995-12-19 1999-03-09 Corning Incorporated Method for purifying polyalkylsiloxanes and the resulting products
US5827342A (en) * 1996-04-30 1998-10-27 Corning Incorporated Treatment of glass substrates to compensate for warpage and distortion

Also Published As

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EP0463045A1 (en) 1992-01-02
FI93822C (en) 1995-06-12
DE69028300T2 (en) 1997-03-06
CA2047187A1 (en) 1990-09-16
DE69028300D1 (en) 1996-10-02
GB8905966D0 (en) 1989-04-26
ATE141901T1 (en) 1996-09-15
EP0463045B1 (en) 1996-08-28
GB2245553B (en) 1992-08-19
AU5286490A (en) 1990-10-09
KR0130007B1 (en) 1998-04-06
JPH04505149A (en) 1992-09-10
FI93822B (en) 1995-02-28
GB9117060D0 (en) 1991-09-18
JP2744695B2 (en) 1998-04-28
ES2092505T3 (en) 1996-12-01
CA2047187C (en) 1999-05-25
FI914317A0 (en) 1991-09-13
AU638702B2 (en) 1993-07-08
DK0463045T3 (en) 1997-02-10
KR920701044A (en) 1992-08-11
WO1990010596A1 (en) 1990-09-20

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Legal Events

Date Code Title Description
727 Application made for amendment of specification (sect. 27/1977)
727 Application made for amendment of specification (sect. 27/1977)

Free format text: ERRATUM: TSL GROUP PLC IMPROVED VITREOUS SILICA PRODUCTS. THE ABOVE ENTRY WHICH APPEARED IN PDJ DATED 10 DECEMBER 1997 UNDER THE ABOVE HEADING WAS MADE IN ERROR.

773G Specification amended ** no order for revocation made (sect. 73(2)/1977)
PE20 Patent expired after termination of 20 years

Expiry date: 20100313