GB2147460A - Printed circuit board manufacture - Google Patents

Printed circuit board manufacture Download PDF

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Publication number
GB2147460A
GB2147460A GB08424755A GB8424755A GB2147460A GB 2147460 A GB2147460 A GB 2147460A GB 08424755 A GB08424755 A GB 08424755A GB 8424755 A GB8424755 A GB 8424755A GB 2147460 A GB2147460 A GB 2147460A
Authority
GB
United Kingdom
Prior art keywords
pattern
particulate material
layer
wiring pattern
conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB08424755A
Other versions
GB8424755D0 (en
GB2147460B (en
Inventor
Roderick Wilson Froud
Howard Terence Mills
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Research and Development Co Ltd
Original Assignee
International Research and Development Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Research and Development Co Ltd filed Critical International Research and Development Co Ltd
Publication of GB8424755D0 publication Critical patent/GB8424755D0/en
Publication of GB2147460A publication Critical patent/GB2147460A/en
Application granted granted Critical
Publication of GB2147460B publication Critical patent/GB2147460B/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G13/00Electrographic processes using a charge pattern
    • G03G13/26Electrographic processes using a charge pattern for the production of printing plates for non-xerographic printing processes
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061Etching masks
    • H05K3/065Etching masks applied by electrographic, electrophotographic or magnetographic methods
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05Patterning and lithography; Masks; Details of resist
    • H05K2203/0502Patterning and lithography
    • H05K2203/0517Electrographic patterning
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05Patterning and lithography; Masks; Details of resist
    • H05K2203/0502Patterning and lithography
    • H05K2203/0537Transfer of pre-fabricated insulating pattern

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

A method of forming a wiring pattern in a conductive layer 15 involves charging a photo- conductive surface of a drum 2 at a charging station 4, and turning the drum to an imaging station 6, where an image representing the wiring pattern is projected onto the surface to discharge illuminated portions, to a development station 8, where charged masking material deposits on the remaining charged areas of the surface, and to a transfer station 10 where a bias voltage is applied to transfer the material to the conductive layer 15. The masking material is fixed to the layer by heater 10 and the layer is etched. <IMAGE>

Description

SPECIFICATION Printed circuit board manufacture This invention relates to the formation of a conductive wiring pattern of a printed circuit board.
According to the present invention there is provided a method of forming a wiring pattern in a layer of conductive material, comprising: forming a pattern on a surface in charged particulate material, the particulate material depositing on the surface under the influence of an electric field; Bring the surface into engagement with the layer of conductive material; applying an electric field between the surface and the layer of conductive material to transfer the particulate material to the layer; fixing the material to the layer of conductive material; and subjecting the layer to an etching step, the pattern of the fixed material defining the areas to be etched.
In one embodiment the surface is a photoconductive surface and the step of forming the pattern on it involves electrically charging it, projecting onto it an image representing the wiring pattern to discharge illuminated portions, and applying the charged particulate material to it. The image may be so projected using a lamp, a cathode ray tube with a fibre optic face plate, a scanning laser or a light gate array. Thus the required circuit pattern may be generated electronically from a computer or computer assisted design system.
In an alternative embodiment the steps of charging a photoconductive surface and then projecting onto it an image representing the wiring pattern to discharge illuminated portions may be replaced by a single step whereby an uncharged, dielectric surface is charged directly in a representation of the pattern using, for example, a cathode ray tube with an electrode faceplate, an electrode array, or an ion deposition array. The required pattern or charge may be generated using data fromn a computer or a computer assisted design system.
In another alternative embodiment the surface is a photoconductive surface carrying a representation of the wiring pattern, and the step of forming the pattern on the surface in transferable particulate material involves electrically charging the surface, illuminating it to discharge exposed portions of the surface and applying charged particulate material to the surface, to deposit on the permanent representation of the wiring pattern.
It is preferred, in this further alternative embodiment, that the permanent representation of the wiring pattern is formed on the photoconductive surface as a result of the deposition of charged particulate material thereon under electrical influence and the permanent fixing of that material on the surface.
It is desirable, in each of the alternative embodiments of the invention, though not essential, that the particulate material, which forms a pattern on the surface representing the wiring pattern, serves, after the fixing step, as masking material during the etching step. An alternative would be to lay down a second material after the fixing step, and then to remove the originally transferred material The second material would then serve as the masking material during the subsequent etching step.
Preferably the surface on which the wiring pattern is represented as a charge pattern is on an endless belt or a drum, the surface moving from apparatus at which the pattern is formed to apparatus at which the surface is brought into engagement with the layer of conductive material.
The invention will now be further described, by way of example, with reference to the accompanying drawing.
The apparatus shown comprises a revolvable drum 2 which has a resilient surface coated with a layer of photoconductive material such as zinc oxide, with a conductive backing. Processing stations are disposed around the drum, adjacent its surface. These are, in the order in which they operate in the printing cycle: a charging station 4; an imaging station 6; a mask developing station 8; a transfer station 10; and a cleaning station 12.
A master copy 14 of a wiring pattern to be formed is placed on a plate 16 which forms part of the imaging station. The printing cycle is initiated and the drum turns. As it does so the charging station 4, a corotron, applies a uniform surface charge to the photoconductive drum surface as it passes beneath it. The drum continues to turn and at the imaging station 6 an image is projected onto the charged section of the drum surface, from the master copy 14. The illuminated areas of the surface are thereby discharged, and the remaining charge on the surface is in a pattern corresponding to the wiring pattern. The drum continues to turn and charged surface moves to the developing station, where the charged pattern is developed by a charged, high resistivity powder (which is to serve as masking material), being resistant to the solution which is to be used as the etching solution.
The masking material may, for example, be a one or two component magnetic powder, a one component non-magnetic powder or a polymer dispersed in a liquid.
The surface then passes on, to the transfer station 10. At the transfer station the image of the wiring pattern, defined in masking material, is transferred to a copper surface on an insulating board 15. The board 15 is mounted on a conveyor belt 16, or, in an alternative embodiment, on a belt between reels, which runs in synchrony with the drum 2, such that at the transfer station 10 the copper surface engages the image in masking material on the surface of the drum 2. A transfer roller 18 is provided on the underside of the conveyor belt 16 at the transfer station 10 to ensure intimate contact between the board and the drum surface. A bias voltage is applied between the conductive backing of the photoconductor surface on the drum and the copper layer on the board to bias the charged masking material to transfer to the copper surface.
The board, with its copper surface now carrying the wiring pattern in masking material, is conveyed through a radiant heater 20, to pre-heat the board, and then through a hot roller unit 22, to fuse the masking material. The board then passes automatically to a copper etching machine. The masking material is not dissolved by the etchant but is removed thereafter, leaving the wiring pattern in the remaining copper, on the insulating substrate. Whilst the board 35 passes to the heating apparatus 20 and 22 the drum continues to turn and the portion of the surface on which the image in masking material was defined passes through the cleaning station 12, where it is electrically discharged and cleaned, and thence back to the charging station 4, for the start of the next cycle.
An alternative embodiment uses a different technique to form the pattern in masking material on the transfer surface. A 'master sheet' is formed, comprising a photoconductive layer with a conductive backing and, on the photoconductive layer, a permanent representation corresponding to the wiring pattern.
The permanent representation is in fixed material, formed by charging the photoconductive layer, illuminating the layer with a negative image of the wiring pattern, to leave a charge pattern which is a positive representation of the wiring pattern, applying charged particulate material to develop the remaining charged areas, and fixing the material, using heat.
The master sheet is used as follows: the photoconductive surface is charged and the sheet is then subjected to flood illumination.
The charge on exposed portions of the master sheet is dissipated leaving only those areas carrying fixed material charged. Charged particulate material (which is to serve as masking material during etching) is then applied and this material is transferred to the conductive surface in which the wiring pattern is to be formed. The master sheet carrying the permanent, fixed material passes on for the next cycle.
Thus, in this embodiment the cycle involves charging, flood illumination, development and transfer without the need for exposure to the light image of the pattern at the imaging station 6, and the cycle time can be reduced.
When it is required to change the pattern the master sheet is discarded and replaced with an 'unused' master sheet, comprising the layer of conductive material with the conductive backing. Again the first cycle is used to form the permanent represention of the wiring pattern on the photoconductive surface, without transfer, and subsequent cycles involve the transfer of further particulate material which is to serve as masking material.
The embodiments described above involve the formation of a positive representation of the pattern, in particulate material which is to serve as masking material, on the transfer surface. It will be appreciated that a negative representation could be formed in a charged material, and transferred to the conductive board, and a subsequent negative-to-positive processing stage employed before etching.

Claims (8)

CLAIMS:
1. A method of forming a wiring pattern in a layer of conductive material, comprising: forming a pattern on a surface in charged particulate material, the particulate material depositing on the surface under the influence of an electric field; bringing the surface into engagement with the layer of conductive material: applying an electric field between the surface and the layer of conductive material to transfer the particulate material to the layer; fixing the material to the layer of conductive material; and subjecting the layer to an etching step, the pattern of the fixed material defining the areas to be etched.
2. A method according to claim 1 wherein the particulate material serves, after the fixing step, as masking material during the etching step.
3. A method according to claim 1 or 2 wherein the surface is a photo-conductive surface and the step of forming the pattern on it involves electrically charging it, projecting onto it an image representing the wiring pattern to discharge illuminated portions, and applying the charged particulate material to it.
4. A method according to claim 1 or 2, wherein the surface is a photo-conductive surface carrying a permanent representation of the wiring pattern, and the step of forming the pattern on the surface in transferable particulate material involves electrically charging the surface, illuminating it to discharge exposed portions of the surface and applying charged particulate material to the surface, to deposit on the permanent representation of the wiring pattern.
5. A method according to claim 3 wherein the permanent representation of the wiring pattern is formed on the photoconductive surface as a result of the deposition of charged particulate material thereon under electrical influence and the permanent fixing of that material on the surface.
6. A method according to claim 1 or 2 wherein the step of forming a pattern on the surface in particulate material involves charging a dielectric surface in a charge pattern representing the wiring pattern and applying the charged particulate material to the dielectric surface.
7. A method according to any of claims 1 to 6 wherein the surface on which the wiring pattern is represented in particulate material is on an endless belt or a drum, the surface moving during an operating cycle from apparatus at which the pattern is formed in transferable particulate material to apparatus at which the surface is brought into engagement with the layer of conductive material.
8. A method substantially as hereinbefore described with reference to the accompanying drawing.
GB08424755A 1983-09-29 1984-10-01 Printed circuit board manufacture Expired GB2147460B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB838326169A GB8326169D0 (en) 1983-09-29 1983-09-29 Printed circuit board

Publications (3)

Publication Number Publication Date
GB8424755D0 GB8424755D0 (en) 1984-11-07
GB2147460A true GB2147460A (en) 1985-05-09
GB2147460B GB2147460B (en) 1987-02-18

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Family Applications (2)

Application Number Title Priority Date Filing Date
GB838326169A Pending GB8326169D0 (en) 1983-09-29 1983-09-29 Printed circuit board
GB08424755A Expired GB2147460B (en) 1983-09-29 1984-10-01 Printed circuit board manufacture

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB838326169A Pending GB8326169D0 (en) 1983-09-29 1983-09-29 Printed circuit board

Country Status (1)

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GB (2) GB8326169D0 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0226399A2 (en) * 1985-12-06 1987-06-24 E.I. Du Pont De Nemours And Company Process for preparation of a stencil or resist image
EP0252735A2 (en) * 1986-07-09 1988-01-13 Olin Hunt Specialty Products, Inc. yethod of high resolution electrostatic transfer of a high density image to a nonporous and nonabsorbent conductive substrate
EP0306156A2 (en) * 1987-08-31 1989-03-08 Olin Hunt Specialty Products, Inc. Transfer roller
WO2006041583A2 (en) * 2004-10-04 2006-04-20 Hewlett-Packard Development Company, L.P. Printed circuit board printing system and method

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NONE *

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0226399A2 (en) * 1985-12-06 1987-06-24 E.I. Du Pont De Nemours And Company Process for preparation of a stencil or resist image
EP0226399A3 (en) * 1985-12-06 1989-01-25 E.I. Du Pont De Nemours And Company Process for preparation of a stencil or resist image
EP0252735A2 (en) * 1986-07-09 1988-01-13 Olin Hunt Specialty Products, Inc. yethod of high resolution electrostatic transfer of a high density image to a nonporous and nonabsorbent conductive substrate
EP0252735A3 (en) * 1986-07-09 1990-04-11 Olin Hunt Specialty Products, Inc. Method of high resolution electrostatic transfer of a high densitiy image to a nonporous and nonabsorbent conductive substrate
EP0306156A2 (en) * 1987-08-31 1989-03-08 Olin Hunt Specialty Products, Inc. Transfer roller
EP0306156A3 (en) * 1987-08-31 1989-10-04 Olin Hunt Specialty Products, Inc. Transfer roller
WO2006041583A2 (en) * 2004-10-04 2006-04-20 Hewlett-Packard Development Company, L.P. Printed circuit board printing system and method
WO2006041583A3 (en) * 2004-10-04 2006-06-22 Hewlett Packard Development Co Printed circuit board printing system and method
US7560215B2 (en) 2004-10-04 2009-07-14 Hewlett-Packard Development Company, L.P. Printed circuit board printing system and method using liquid electrophotographic printing

Also Published As

Publication number Publication date
GB8424755D0 (en) 1984-11-07
GB8326169D0 (en) 1983-11-02
GB2147460B (en) 1987-02-18

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Legal Events

Date Code Title Description
732 Registration of transactions, instruments or events in the register (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee