GB2146427B - Semiconductor manufacture - Google Patents

Semiconductor manufacture

Info

Publication number
GB2146427B
GB2146427B GB08418927A GB8418927A GB2146427B GB 2146427 B GB2146427 B GB 2146427B GB 08418927 A GB08418927 A GB 08418927A GB 8418927 A GB8418927 A GB 8418927A GB 2146427 B GB2146427 B GB 2146427B
Authority
GB
United Kingdom
Prior art keywords
semiconductor manufacture
semiconductor
manufacture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08418927A
Other languages
English (en)
Other versions
GB2146427A (en
GB8418927D0 (en
Inventor
Naoki Ayata
Tadashi Konuki
Masao Kosugi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP58140896A external-priority patent/JPS6032320A/ja
Priority claimed from JP58151024A external-priority patent/JPS6042763A/ja
Priority claimed from JP58209940A external-priority patent/JPS60102738A/ja
Priority claimed from JP58209941A external-priority patent/JPS60102739A/ja
Application filed by Canon Inc filed Critical Canon Inc
Publication of GB8418927D0 publication Critical patent/GB8418927D0/en
Publication of GB2146427A publication Critical patent/GB2146427A/en
Application granted granted Critical
Publication of GB2146427B publication Critical patent/GB2146427B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7069—Alignment mark illumination, e.g. darkfield, dual focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7092—Signal processing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
GB08418927A 1983-08-01 1984-07-25 Semiconductor manufacture Expired GB2146427B (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP58140896A JPS6032320A (ja) 1983-08-01 1983-08-01 ステップアンドリピート露光装置
JP58151024A JPS6042763A (ja) 1983-08-18 1983-08-18 アライメント装置と方法
JP58209940A JPS60102738A (ja) 1983-11-10 1983-11-10 ステップアンドリピート露光装置
JP58209941A JPS60102739A (ja) 1983-11-10 1983-11-10 ステップアンドリピート露光装置

Publications (3)

Publication Number Publication Date
GB8418927D0 GB8418927D0 (en) 1984-08-30
GB2146427A GB2146427A (en) 1985-04-17
GB2146427B true GB2146427B (en) 1987-10-21

Family

ID=27472338

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08418927A Expired GB2146427B (en) 1983-08-01 1984-07-25 Semiconductor manufacture

Country Status (3)

Country Link
US (1) US4719357A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3428225A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB2146427B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4780615A (en) * 1985-02-01 1988-10-25 Canon Kabushiki Kaisha Alignment system for use in pattern transfer apparatus
DE3542514A1 (de) * 1985-12-02 1987-06-04 Zeiss Carl Fa Wegmesseinrichtung
US4881100A (en) * 1985-12-10 1989-11-14 Canon Kabushiki Kaisha Alignment method
JPS63125292A (ja) * 1986-11-15 1988-05-28 ブラザー工業株式会社 ミシンの柄合わせ装置
JP2517637B2 (ja) * 1988-02-15 1996-07-24 キヤノン株式会社 マ―ク位置検出方法及びそれが適用される装置
US6185324B1 (en) 1989-07-12 2001-02-06 Hitachi, Ltd. Semiconductor failure analysis system
JP2941308B2 (ja) 1989-07-12 1999-08-25 株式会社日立製作所 検査システムおよび電子デバイスの製造方法
EP0824225A3 (en) * 1989-09-26 1998-03-04 Canon Kabushiki Kaisha Alignment method
US5206820A (en) * 1990-08-31 1993-04-27 At&T Bell Laboratories Metrology system for analyzing panel misregistration in a panel manufacturing process and providing appropriate information for adjusting panel manufacturing processes
JP3303551B2 (ja) * 1994-08-22 2002-07-22 ソニー株式会社 半導体装置の露光方法におけるアライメント法
EP1091256A1 (en) * 1994-11-29 2001-04-11 Canon Kabushiki Kaisha Alignment method and semiconductor exposure method
JP3450509B2 (ja) * 1995-04-13 2003-09-29 キヤノン株式会社 投影露光装置及び該装置を用いて素子を製造する方法
US5920396A (en) * 1996-10-16 1999-07-06 Svg Lithography Systems, Inc. Line width insensitive wafer target detection
JPH10199784A (ja) * 1997-01-06 1998-07-31 Mitsubishi Electric Corp アライメント補正方法及び半導体装置
US9182358B2 (en) * 2013-03-15 2015-11-10 Kla-Tencor Corporation Multi-spot defect inspection system

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1022111A (en) * 1961-06-05 1966-03-09 Fermat Ltd Improvements in or relating to mensuration and registration
JPS52140278A (en) * 1976-05-19 1977-11-22 Hitachi Ltd Position detector
US4328553A (en) * 1976-12-07 1982-05-04 Computervision Corporation Method and apparatus for targetless wafer alignment
JPS53111280A (en) * 1977-03-10 1978-09-28 Canon Inc Mask or wafer for production of semiconductor elements and device for aligning these
DD135138A1 (de) * 1978-03-31 1979-04-11 Emil Haeussler Alphanumerische anzeigeanordnung
JPS5534490A (en) * 1978-09-01 1980-03-11 Canon Inc Alignment device
IT1125000B (it) * 1978-12-08 1986-05-14 Rca Corp Sistema automatico per l'allineamento di fotomaschere in processi di stampa a proiezione
DE2905636C2 (de) * 1979-02-14 1985-06-20 Censor Patent- Und Versuchs-Anstalt, Vaduz Verfahren zum Kopieren von Masken auf ein Werkstück
US4353087A (en) * 1979-03-12 1982-10-05 The Perkin-Elmer Corporation Automatic mask alignment
EP0020832A1 (en) * 1979-06-26 1981-01-07 Excellon Industries Pattern recognition system and method for using this system
JPS56132505A (en) * 1980-03-24 1981-10-16 Hitachi Ltd Position detecting method
US4326805A (en) * 1980-04-11 1982-04-27 Bell Telephone Laboratories, Incorporated Method and apparatus for aligning mask and wafer members
EP0041870B1 (en) * 1980-06-10 1986-12-30 Fujitsu Limited Pattern position recognition apparatus
JPS57157378A (en) * 1981-03-25 1982-09-28 Hitachi Ltd Setting method of binary-coded threshold level
US4441205A (en) * 1981-05-18 1984-04-03 Kulicke & Soffa Industries, Inc. Pattern recognition system
JPS5852825A (ja) * 1981-09-24 1983-03-29 Canon Inc 位置合わせ信号処理装置
DE3245315A1 (de) * 1981-12-14 1983-07-07 GCA Corp., 01730 Bedford, Mass. Positioniervorrichtung fuer halbleiterchips
GB2139348B (en) * 1983-03-26 1986-10-01 Disco Abrasive Systems Ltd Automatic aligment system
JPS6010730A (ja) * 1983-06-30 1985-01-19 Toshiba Corp 半導体ウエハの位置合わせ方法

Also Published As

Publication number Publication date
GB2146427A (en) 1985-04-17
DE3428225C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-01-09
US4719357A (en) 1988-01-12
GB8418927D0 (en) 1984-08-30
DE3428225A1 (de) 1985-02-21

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Legal Events

Date Code Title Description
PE20 Patent expired after termination of 20 years

Effective date: 20040724