GB210862A - A new or improved light sensitive film or layer and process for making same - Google Patents
A new or improved light sensitive film or layer and process for making sameInfo
- Publication number
- GB210862A GB210862A GB30451/22A GB3045122A GB210862A GB 210862 A GB210862 A GB 210862A GB 30451/22 A GB30451/22 A GB 30451/22A GB 3045122 A GB3045122 A GB 3045122A GB 210862 A GB210862 A GB 210862A
- Authority
- GB
- United Kingdom
- Prior art keywords
- layer
- diazo
- alkali
- positive
- picture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000003513 alkali Substances 0.000 abstract 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 abstract 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 abstract 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract 2
- 239000002253 acid Substances 0.000 abstract 2
- 150000007513 acids Chemical class 0.000 abstract 2
- 150000008064 anhydrides Chemical class 0.000 abstract 2
- 230000008878 coupling Effects 0.000 abstract 2
- 238000010168 coupling process Methods 0.000 abstract 2
- 238000005859 coupling reaction Methods 0.000 abstract 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
- UPMCPCKLOMBYLN-UHFFFAOYSA-N (1e)-1-diazo-2h-naphthalen-2-ol Chemical compound C1=CC=C2C(=[N+]=[N-])C(O)C=CC2=C1 UPMCPCKLOMBYLN-UHFFFAOYSA-N 0.000 abstract 1
- JVNKYYGQNQJOEN-UHFFFAOYSA-N 2-diazo-1h-naphthalen-1-ol Chemical compound C1=CC=C2C(O)C(=[N+]=[N-])C=CC2=C1 JVNKYYGQNQJOEN-UHFFFAOYSA-N 0.000 abstract 1
- WUBBRNOQWQTFEX-UHFFFAOYSA-N 4-aminosalicylic acid Chemical compound NC1=CC=C(C(O)=O)C(O)=C1 WUBBRNOQWQTFEX-UHFFFAOYSA-N 0.000 abstract 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 abstract 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
- 208000006558 Dental Calculus Diseases 0.000 abstract 1
- JPYHHZQJCSQRJY-UHFFFAOYSA-N Phloroglucinol Natural products CCC=CCC=CCC=CCC=CCCCCC(=O)C1=C(O)C=C(O)C=C1O JPYHHZQJCSQRJY-UHFFFAOYSA-N 0.000 abstract 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 abstract 1
- DQMUIWDLYCCOBR-UHFFFAOYSA-N [N+](=[N-])(O)O.N1N=CC2=CC=CC=C12 Chemical compound [N+](=[N-])(O)O.N1N=CC2=CC=CC=C12 DQMUIWDLYCCOBR-UHFFFAOYSA-N 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229960004909 aminosalicylic acid Drugs 0.000 abstract 1
- 229910021529 ammonia Inorganic materials 0.000 abstract 1
- 239000003086 colorant Substances 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 239000010949 copper Substances 0.000 abstract 1
- 150000008049 diazo compounds Chemical class 0.000 abstract 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 abstract 1
- 239000000975 dye Substances 0.000 abstract 1
- QELUYTUMUWHWMC-UHFFFAOYSA-N edaravone Chemical compound O=C1CC(C)=NN1C1=CC=CC=C1 QELUYTUMUWHWMC-UHFFFAOYSA-N 0.000 abstract 1
- 239000003517 fume Substances 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 229910052742 iron Inorganic materials 0.000 abstract 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 abstract 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 abstract 1
- 229910052753 mercury Inorganic materials 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 229910052759 nickel Inorganic materials 0.000 abstract 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 abstract 1
- 239000007800 oxidant agent Substances 0.000 abstract 1
- -1 oxydiazo compounds Chemical class 0.000 abstract 1
- QCDYQQDYXPDABM-UHFFFAOYSA-N phloroglucinol Chemical compound OC1=CC(O)=CC(O)=C1 QCDYQQDYXPDABM-UHFFFAOYSA-N 0.000 abstract 1
- 229960001553 phloroglucinol Drugs 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
- 238000000926 separation method Methods 0.000 abstract 1
- 229910052725 zinc Inorganic materials 0.000 abstract 1
- 239000011701 zinc Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
- G03C1/54—Diazonium salts or diazo anhydrides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
- G03C1/60—Compositions containing diazo compounds as photosensitive substances with macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE234818X | 1924-05-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB210862A true GB210862A (en) | 1924-02-07 |
Family
ID=5893589
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB30451/22A Expired GB210862A (en) | 1924-05-28 | 1922-11-07 | A new or improved light sensitive film or layer and process for making same |
| GB13879/25A Expired GB234818A (en) | 1924-05-28 | 1925-05-27 | Process of preparing light-sensitive layers |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB13879/25A Expired GB234818A (en) | 1924-05-28 | 1925-05-27 | Process of preparing light-sensitive layers |
Country Status (3)
| Country | Link |
|---|---|
| FR (1) | FR558465A (enrdf_load_stackoverflow) |
| GB (2) | GB210862A (enrdf_load_stackoverflow) |
| NL (1) | NL14150C (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3173788A (en) * | 1960-02-10 | 1965-03-16 | Gen Aniline & Film Corp | Developing positive working photolitho-graphic printing plates containing diazo oxides |
| US3526503A (en) * | 1967-03-08 | 1970-09-01 | Eastman Kodak Co | Photoresist composition |
-
1922
- 1922-11-07 NL NL23163A patent/NL14150C/xx active
- 1922-11-07 GB GB30451/22A patent/GB210862A/en not_active Expired
- 1922-11-09 FR FR558465D patent/FR558465A/fr not_active Expired
-
1925
- 1925-05-27 GB GB13879/25A patent/GB234818A/en not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3173788A (en) * | 1960-02-10 | 1965-03-16 | Gen Aniline & Film Corp | Developing positive working photolitho-graphic printing plates containing diazo oxides |
| US3526503A (en) * | 1967-03-08 | 1970-09-01 | Eastman Kodak Co | Photoresist composition |
Also Published As
| Publication number | Publication date |
|---|---|
| GB234818A (en) | 1926-06-10 |
| NL14150C (enrdf_load_stackoverflow) | 1926-01-15 |
| FR558465A (fr) | 1923-08-28 |
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