GB202213149D0 - Method of separating a semiconductor device from a substrate - Google Patents

Method of separating a semiconductor device from a substrate

Info

Publication number
GB202213149D0
GB202213149D0 GBGB2213149.4A GB202213149A GB202213149D0 GB 202213149 D0 GB202213149 D0 GB 202213149D0 GB 202213149 A GB202213149 A GB 202213149A GB 202213149 D0 GB202213149 D0 GB 202213149D0
Authority
GB
United Kingdom
Prior art keywords
separating
substrate
semiconductor device
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
GBGB2213149.4A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Poro Technologies Ltd
Original Assignee
Poro Technologies Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Poro Technologies Ltd filed Critical Poro Technologies Ltd
Priority to GBGB2213149.4A priority Critical patent/GB202213149D0/en
Publication of GB202213149D0 publication Critical patent/GB202213149D0/en
Priority to PCT/GB2023/052330 priority patent/WO2024052695A1/en
Ceased legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/005Processes
    • H01L33/0093Wafer bonding; Removal of the growth substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/7806Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices involving the separation of the active layers from a substrate
    • H01L21/7813Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices involving the separation of the active layers from a substrate leaving a reusable substrate, e.g. epitaxial lift off
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/16Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Junction Field-Effect Transistors (AREA)
GBGB2213149.4A 2022-09-08 2022-09-08 Method of separating a semiconductor device from a substrate Ceased GB202213149D0 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GBGB2213149.4A GB202213149D0 (en) 2022-09-08 2022-09-08 Method of separating a semiconductor device from a substrate
PCT/GB2023/052330 WO2024052695A1 (en) 2022-09-08 2023-09-08 Method of separating a semiconductor device from a substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB2213149.4A GB202213149D0 (en) 2022-09-08 2022-09-08 Method of separating a semiconductor device from a substrate

Publications (1)

Publication Number Publication Date
GB202213149D0 true GB202213149D0 (en) 2022-10-26

Family

ID=83945299

Family Applications (1)

Application Number Title Priority Date Filing Date
GBGB2213149.4A Ceased GB202213149D0 (en) 2022-09-08 2022-09-08 Method of separating a semiconductor device from a substrate

Country Status (2)

Country Link
GB (1) GB202213149D0 (en)
WO (1) WO2024052695A1 (en)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG54593A1 (en) * 1996-11-15 1998-11-16 Canon Kk Method of manufacturing semiconductor article
US10147843B2 (en) * 2008-07-24 2018-12-04 Lumileds Llc Semiconductor light emitting device including a window layer and a light-directing structure
US9214353B2 (en) * 2012-02-26 2015-12-15 Solexel, Inc. Systems and methods for laser splitting and device layer transfer
KR101701041B1 (en) * 2015-05-27 2017-02-01 한양대학교 산학협력단 Light emitting diode formed on silicon polyhedron and method for fabricating the same
KR20230152152A (en) 2017-09-27 2023-11-02 캠브리지 엔터프라이즈 리미티드 Method for porosifying a material and semiconductor structure
GB201801337D0 (en) 2018-01-26 2018-03-14 Cambridge Entpr Ltd Method for etching a semiconductor structure
CN115244717A (en) 2020-01-22 2022-10-25 波拉科技有限公司 Semiconductor structure and method of manufacture
TW202221938A (en) 2020-08-04 2022-06-01 英商普羅科技有限公司 Led and method of manufacture

Also Published As

Publication number Publication date
WO2024052695A1 (en) 2024-03-14

Similar Documents

Publication Publication Date Title
IL261357A (en) Etching solution for selectively removing silicon over silicon-germanium alloy from a silicon-germanium/ silicon stack during manufacture of a semiconductor device
IL261351B (en) Etching solution for selectively removing silicon-germanium alloy from a silicon-germanium/ silicon stack during manufacture of a semiconductor device
EP3871258A4 (en) Method for removing a bulk substrate from a bonded assembly of wafers
IL265202A (en) Etching solution for selectively removing silicon-germanium alloy from a silicon-germanium/ germanium stack during manufacture of a semiconductor device
IL259799B1 (en) Etching solution for selectively removing silicon nitride during manufacture of a semiconductor device
IL206256A0 (en) Method of, and apparatus for separating wafers from a wafer stack
SG11202109515QA (en) Etching solution and method for selectively removing silicon nitride during manufacture of a semiconductor device
EP3803980A4 (en) Method of removing semiconducting layers from a semiconducting substrate
SG11202113089RA (en) Method for slicing off a multiplicity of wafers from workpieces during a number of slicing operations by means of a wire saw, and semiconductor wafer of monocrystalline silicon
SG11202106432SA (en) Method for producing semiconductor wafers by means of a wire saw, wire saw and semiconductor wafer of monocrystalline silicon
PL3940122T3 (en) Method of manufacturing sic wafer
GB202213149D0 (en) Method of separating a semiconductor device from a substrate
EP4139951A4 (en) Method for processing semiconductor wafers
EP4145494A4 (en) Semiconductor wafer cleaning method
SG11202109726TA (en) Semiconductor wafer and method of manufacturing semiconductor apparatus
SG11202106437RA (en) Method for producing semiconductor wafers by means of a wire saw
GB201918333D0 (en) A semiconductor wafer dicing process
IL290312A (en) Etching method for silicon nitride and production method for semiconductor element
GB202018676D0 (en) Controlling warpage of a substrate for mounting a semiconductor die
GB202001403D0 (en) Processing a wafer of a semiconductor material
GB2600230B (en) Method of forming graphene on a silicon substrate
GB202212686D0 (en) Method of providing a wafer
TWI853209B (en) Method for producing wafers from a cylindrical ingot of semiconductor material
TWI853433B (en) Method of manufacturing semiconductor device
SG10202002668VA (en) Reaction tube, substrate processing apparatus and method of manufacturing semiconductor device

Legal Events

Date Code Title Description
AT Applications terminated before publication under section 16(1)