GB1513640A - Process for manufacturing a hybrid oxide - Google Patents

Process for manufacturing a hybrid oxide

Info

Publication number
GB1513640A
GB1513640A GB53813/76A GB5381376A GB1513640A GB 1513640 A GB1513640 A GB 1513640A GB 53813/76 A GB53813/76 A GB 53813/76A GB 5381376 A GB5381376 A GB 5381376A GB 1513640 A GB1513640 A GB 1513640A
Authority
GB
United Kingdom
Prior art keywords
manufacturing
grow
oxide layer
silicon
hybrid oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB53813/76A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RCA Corp filed Critical RCA Corp
Publication of GB1513640A publication Critical patent/GB1513640A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
    • H01L21/02233—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
    • H01L21/02236—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor
    • H01L21/02238—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor silicon in uncombined form, i.e. pure silicon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/02255—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by thermal treatment

Abstract

1513640 Silicon oxide layers on silicon wafers RCA CORPORATION 23 Dec 1976[12 Jan 1976] 53813/76 Heading C1A Hybrid oxides for semiconductor devices are prepared by passing O 2 and H 2 , at rates selected to avoid turbulence, into a furnace at 800‹C.-1200‹C. containing a silicon wafer, to grow a pyrogenic oxide layer, and then turning off the flow of H 2 to grow a dry oxide layer.
GB53813/76A 1976-01-12 1976-12-23 Process for manufacturing a hybrid oxide Expired GB1513640A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US64845576A 1976-01-12 1976-01-12

Publications (1)

Publication Number Publication Date
GB1513640A true GB1513640A (en) 1978-06-07

Family

ID=24600841

Family Applications (1)

Application Number Title Priority Date Filing Date
GB53813/76A Expired GB1513640A (en) 1976-01-12 1976-12-23 Process for manufacturing a hybrid oxide

Country Status (9)

Country Link
JP (1) JPS5286070A (en)
AU (1) AU502350B2 (en)
DE (1) DE2700094A1 (en)
FR (1) FR2337941A1 (en)
GB (1) GB1513640A (en)
IN (1) IN145547B (en)
IT (1) IT1064328B (en)
SE (1) SE7614145L (en)
YU (1) YU301876A (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58188162A (en) * 1982-04-28 1983-11-02 Agency Of Ind Science & Technol Formation of gate insulation film
DE3425531A1 (en) * 1984-07-11 1986-01-16 Siemens AG, 1000 Berlin und 8000 München Process for making doped SiO2 layers fuse in fabricating integrated MOS semiconductor circuits
JPS61193456A (en) * 1985-02-21 1986-08-27 Toshiba Corp Manufacture of semiconductor element
NL8603111A (en) * 1986-12-08 1988-07-01 Philips Nv METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE APPLYING A SILICONE SURFACE ON ITS SURFACE WITH FIELD OXIDE AREAS.
JP3310386B2 (en) * 1993-05-25 2002-08-05 忠弘 大見 Method of forming insulating oxide film and semiconductor device
EP1014432A1 (en) * 1998-12-23 2000-06-28 Infineon Technologies North America Corp. Method for forming the gate oxide of metal-oxide-semiconductor devices

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2014382B1 (en) * 1968-06-28 1974-03-15 Motorola Inc
JPS4913909B1 (en) * 1970-05-04 1974-04-03

Also Published As

Publication number Publication date
IN145547B (en) 1978-11-04
DE2700094A1 (en) 1977-07-21
YU301876A (en) 1982-06-30
IT1064328B (en) 1985-02-18
AU2108877A (en) 1978-07-13
FR2337941A1 (en) 1977-08-05
JPS5615573B2 (en) 1981-04-10
FR2337941B1 (en) 1982-05-28
JPS5286070A (en) 1977-07-16
AU502350B2 (en) 1979-07-19
SE7614145L (en) 1977-07-13

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee