GB1384630A - Processing composition for a photosensitive lithographic printing material - Google Patents
Processing composition for a photosensitive lithographic printing materialInfo
- Publication number
- GB1384630A GB1384630A GB1573672A GB1573672A GB1384630A GB 1384630 A GB1384630 A GB 1384630A GB 1573672 A GB1573672 A GB 1573672A GB 1573672 A GB1573672 A GB 1573672A GB 1384630 A GB1384630 A GB 1384630A
- Authority
- GB
- United Kingdom
- Prior art keywords
- specified
- hydrophobic
- developer
- photo
- hydrophilic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 title abstract 7
- 230000002209 hydrophobic effect Effects 0.000 abstract 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 abstract 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 abstract 2
- 239000000084 colloidal system Substances 0.000 abstract 2
- 150000002148 esters Chemical class 0.000 abstract 2
- 239000003960 organic solvent Substances 0.000 abstract 2
- IXPNQXFRVYWDDI-UHFFFAOYSA-N 1-methyl-2,4-dioxo-1,3-diazinane-5-carboximidamide Chemical compound CN1CC(C(N)=N)C(=O)NC1=O IXPNQXFRVYWDDI-UHFFFAOYSA-N 0.000 abstract 1
- UIFVCPMLQXKEEU-UHFFFAOYSA-N 2,3-dimethylbenzaldehyde Chemical compound CC1=CC=CC(C=O)=C1C UIFVCPMLQXKEEU-UHFFFAOYSA-N 0.000 abstract 1
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 abstract 1
- PXRKCOCTEMYUEG-UHFFFAOYSA-N 5-aminoisoindole-1,3-dione Chemical compound NC1=CC=C2C(=O)NC(=O)C2=C1 PXRKCOCTEMYUEG-UHFFFAOYSA-N 0.000 abstract 1
- 229920000178 Acrylic resin Polymers 0.000 abstract 1
- 239000004925 Acrylic resin Substances 0.000 abstract 1
- 229920000084 Gum arabic Polymers 0.000 abstract 1
- 239000004952 Polyamide Substances 0.000 abstract 1
- 241000978776 Senegalia senegal Species 0.000 abstract 1
- 229920001800 Shellac Polymers 0.000 abstract 1
- 229920002472 Starch Polymers 0.000 abstract 1
- 235000010724 Wisteria floribunda Nutrition 0.000 abstract 1
- 235000010489 acacia gum Nutrition 0.000 abstract 1
- 239000000205 acacia gum Substances 0.000 abstract 1
- 150000001298 alcohols Chemical class 0.000 abstract 1
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 abstract 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 abstract 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 abstract 1
- 125000004432 carbon atom Chemical group C* 0.000 abstract 1
- 229920003086 cellulose ether Polymers 0.000 abstract 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Substances OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 abstract 1
- 239000012954 diazonium Substances 0.000 abstract 1
- 150000001989 diazonium salts Chemical class 0.000 abstract 1
- 235000014113 dietary fatty acids Nutrition 0.000 abstract 1
- 239000003822 epoxy resin Substances 0.000 abstract 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 abstract 1
- 239000000194 fatty acid Substances 0.000 abstract 1
- 229930195729 fatty acid Natural products 0.000 abstract 1
- 150000004665 fatty acids Chemical class 0.000 abstract 1
- -1 glycol alkyl ethers Chemical class 0.000 abstract 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 abstract 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 abstract 1
- 150000002576 ketones Chemical class 0.000 abstract 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract 1
- 229920001568 phenolic resin Polymers 0.000 abstract 1
- 239000005011 phenolic resin Substances 0.000 abstract 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 abstract 1
- 229920002647 polyamide Polymers 0.000 abstract 1
- 229920000647 polyepoxide Polymers 0.000 abstract 1
- ODGAOXROABLFNM-UHFFFAOYSA-N polynoxylin Chemical compound O=C.NC(N)=O ODGAOXROABLFNM-UHFFFAOYSA-N 0.000 abstract 1
- 229920006395 saturated elastomer Polymers 0.000 abstract 1
- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 abstract 1
- 229940113147 shellac Drugs 0.000 abstract 1
- 239000004208 shellac Substances 0.000 abstract 1
- 235000013874 shellac Nutrition 0.000 abstract 1
- 239000000661 sodium alginate Substances 0.000 abstract 1
- 235000010413 sodium alginate Nutrition 0.000 abstract 1
- 229940005550 sodium alginate Drugs 0.000 abstract 1
- 239000008107 starch Substances 0.000 abstract 1
- 235000019698 starch Nutrition 0.000 abstract 1
- 239000004094 surface-active agent Substances 0.000 abstract 1
- 229920002554 vinyl polymer Polymers 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP46020890A JPS5023324B1 (enrdf_load_stackoverflow) | 1971-04-05 | 1971-04-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1384630A true GB1384630A (en) | 1975-02-19 |
Family
ID=12039797
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1573672A Expired GB1384630A (en) | 1971-04-05 | 1972-04-05 | Processing composition for a photosensitive lithographic printing material |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS5023324B1 (enrdf_load_stackoverflow) |
| DE (1) | DE2216419A1 (enrdf_load_stackoverflow) |
| GB (1) | GB1384630A (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2530502C2 (de) * | 1974-07-22 | 1985-07-18 | American Hoechst Corp., Bridgewater, N.J. | Verfahren zum gleichzeitigen Entwickeln und Konservieren von Druckplatten sowie dafür geeignete Behandlungslösung |
| CA1228204A (en) * | 1982-03-29 | 1987-10-20 | Richard J. Burns | Fountain solution |
| JP7413808B2 (ja) | 2020-02-07 | 2024-01-16 | Ｔｏｐｐａｎホールディングス株式会社 | 光学デバイス、および、光学デバイスの製造方法 |
-
1971
- 1971-04-05 JP JP46020890A patent/JPS5023324B1/ja active Pending
-
1972
- 1972-04-05 DE DE19722216419 patent/DE2216419A1/de active Pending
- 1972-04-05 GB GB1573672A patent/GB1384630A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2216419A1 (de) | 1972-10-12 |
| JPS5023324B1 (enrdf_load_stackoverflow) | 1975-08-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |