GB1334811A - Photosensitive compositions - Google Patents
Photosensitive compositionsInfo
- Publication number
- GB1334811A GB1334811A GB1130772A GB1130772A GB1334811A GB 1334811 A GB1334811 A GB 1334811A GB 1130772 A GB1130772 A GB 1130772A GB 1130772 A GB1130772 A GB 1130772A GB 1334811 A GB1334811 A GB 1334811A
- Authority
- GB
- United Kingdom
- Prior art keywords
- cyclohexanone
- optionally
- valeric acid
- dihydroxybenzoic
- march
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000203 mixture Substances 0.000 title 1
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 abstract 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 abstract 6
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 abstract 4
- -1 1,2 - epoxyvinyl Chemical group 0.000 abstract 2
- OMNHTTWQSSUZHO-UHFFFAOYSA-N 4-hydroxy-3,5-dimethylbenzoic acid Chemical compound CC1=CC(C(O)=O)=CC(C)=C1O OMNHTTWQSSUZHO-UHFFFAOYSA-N 0.000 abstract 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 abstract 2
- 229920000647 polyepoxide Polymers 0.000 abstract 2
- 229920005989 resin Polymers 0.000 abstract 2
- 239000011347 resin Substances 0.000 abstract 2
- 239000002904 solvent Substances 0.000 abstract 2
- 229940005605 valeric acid Drugs 0.000 abstract 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 1
- 239000012300 argon atmosphere Substances 0.000 abstract 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 abstract 1
- 239000003822 epoxy resin Substances 0.000 abstract 1
- 150000002148 esters Chemical class 0.000 abstract 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 abstract 1
- 230000008018 melting Effects 0.000 abstract 1
- 238000002844 melting Methods 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 239000012299 nitrogen atmosphere Substances 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 239000001294 propane Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Epoxy Resins (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7103379A NL7103379A (enExample) | 1971-03-13 | 1971-03-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1334811A true GB1334811A (en) | 1973-10-24 |
Family
ID=19812677
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1130772A Expired GB1334811A (en) | 1971-03-13 | 1972-03-10 | Photosensitive compositions |
Country Status (8)
| Country | Link |
|---|---|
| JP (1) | JPS5423572B1 (enExample) |
| BE (1) | BE780621A (enExample) |
| CA (1) | CA978013A (enExample) |
| DE (1) | DE2208421A1 (enExample) |
| FR (1) | FR2130167B1 (enExample) |
| GB (1) | GB1334811A (enExample) |
| IT (1) | IT952955B (enExample) |
| NL (1) | NL7103379A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112654928A (zh) * | 2018-09-05 | 2021-04-13 | 默克专利股份有限公司 | 正型光敏材料 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0302941B1 (en) * | 1987-02-02 | 1993-12-29 | Nippon Paint Co., Ltd. | Positive photosensitive resin composition and process for its production |
-
1971
- 1971-03-13 NL NL7103379A patent/NL7103379A/xx unknown
-
1972
- 1972-02-23 DE DE19722208421 patent/DE2208421A1/de active Pending
- 1972-03-10 CA CA136,774A patent/CA978013A/en not_active Expired
- 1972-03-10 GB GB1130772A patent/GB1334811A/en not_active Expired
- 1972-03-10 JP JP2403872A patent/JPS5423572B1/ja active Pending
- 1972-03-10 IT IT6776972A patent/IT952955B/it active
- 1972-03-13 BE BE780621A patent/BE780621A/xx unknown
- 1972-03-13 FR FR7208631A patent/FR2130167B1/fr not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112654928A (zh) * | 2018-09-05 | 2021-04-13 | 默克专利股份有限公司 | 正型光敏材料 |
| CN112654928B (zh) * | 2018-09-05 | 2024-09-24 | 默克专利股份有限公司 | 正型光敏材料 |
| US12393115B2 (en) | 2018-09-05 | 2025-08-19 | Merck Patent Gmbh | Positive working photosensitive material |
Also Published As
| Publication number | Publication date |
|---|---|
| CA978013A (en) | 1975-11-18 |
| DE2208421A1 (de) | 1972-09-21 |
| IT952955B (it) | 1973-07-30 |
| FR2130167B1 (enExample) | 1977-01-14 |
| FR2130167A1 (enExample) | 1972-11-03 |
| NL7103379A (enExample) | 1972-09-15 |
| BE780621A (fr) | 1972-09-13 |
| JPS5423572B1 (enExample) | 1979-08-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |