GB1325974A - Photosensitive compositions - Google Patents

Photosensitive compositions

Info

Publication number
GB1325974A
GB1325974A GB1130672A GB1130672A GB1325974A GB 1325974 A GB1325974 A GB 1325974A GB 1130672 A GB1130672 A GB 1130672A GB 1130672 A GB1130672 A GB 1130672A GB 1325974 A GB1325974 A GB 1325974A
Authority
GB
United Kingdom
Prior art keywords
resin
examples
group
resins
phenolic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1130672A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of GB1325974A publication Critical patent/GB1325974A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/0163—Non ionic diazonium compounds, e.g. diazosulphonates; Precursors thereof, e.g. triazenes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
GB1130672A 1971-03-13 1972-03-10 Photosensitive compositions Expired GB1325974A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7103380A NL7103380A (enrdf_load_stackoverflow) 1971-03-13 1971-03-13

Publications (1)

Publication Number Publication Date
GB1325974A true GB1325974A (en) 1973-08-08

Family

ID=19812678

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1130672A Expired GB1325974A (en) 1971-03-13 1972-03-10 Photosensitive compositions

Country Status (4)

Country Link
DE (1) DE2209749A1 (enrdf_load_stackoverflow)
FR (1) FR2130168A1 (enrdf_load_stackoverflow)
GB (1) GB1325974A (enrdf_load_stackoverflow)
NL (1) NL7103380A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4308195A (en) 1979-04-26 1981-12-29 Hoechst Aktiengesellschaft Epoxide resins containing phenol groups, their manufacture and their use
US5356746A (en) * 1991-10-15 1994-10-18 Canon Kabushiki Kaisha Electrophotographic photosensitive member, electrophotographic apparatus, device unit and facsimile machine
US20100221657A1 (en) * 2007-10-31 2010-09-02 Nissan Chemical Industries, Ltd. Resist underlayer film forming composition and method of forming resist pattern using the same
US12393115B2 (en) 2018-09-05 2025-08-19 Merck Patent Gmbh Positive working photosensitive material

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4055425A (en) * 1975-03-10 1977-10-25 Gaf Corporation Diazotype material and graphic reproduction processes employing the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4308195A (en) 1979-04-26 1981-12-29 Hoechst Aktiengesellschaft Epoxide resins containing phenol groups, their manufacture and their use
US5356746A (en) * 1991-10-15 1994-10-18 Canon Kabushiki Kaisha Electrophotographic photosensitive member, electrophotographic apparatus, device unit and facsimile machine
US20100221657A1 (en) * 2007-10-31 2010-09-02 Nissan Chemical Industries, Ltd. Resist underlayer film forming composition and method of forming resist pattern using the same
US8383320B2 (en) * 2007-10-31 2013-02-26 Nissan Chemical Industries, Ltd. Resist underlayer film forming composition and method of forming resist pattern using the same
US12393115B2 (en) 2018-09-05 2025-08-19 Merck Patent Gmbh Positive working photosensitive material

Also Published As

Publication number Publication date
NL7103380A (enrdf_load_stackoverflow) 1972-09-15
FR2130168A1 (enrdf_load_stackoverflow) 1972-11-03
DE2209749A1 (de) 1972-11-09

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees