GB1317697A - Covering of areas of the surface of a semiconductor body with a protective mask - Google Patents

Covering of areas of the surface of a semiconductor body with a protective mask

Info

Publication number
GB1317697A
GB1317697A GB5647171A GB5647171A GB1317697A GB 1317697 A GB1317697 A GB 1317697A GB 5647171 A GB5647171 A GB 5647171A GB 5647171 A GB5647171 A GB 5647171A GB 1317697 A GB1317697 A GB 1317697A
Authority
GB
United Kingdom
Prior art keywords
photolacquer
metallization
mask
multiple reflections
areas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5647171A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens Corp
Original Assignee
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Corp filed Critical Siemens Corp
Publication of GB1317697A publication Critical patent/GB1317697A/en
Expired legal-status Critical Current

Links

Classifications

    • H10W74/47—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • H10P95/00—
    • H10W20/40—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • ing And Chemical Polishing (AREA)
  • Materials For Photolithography (AREA)
  • Electrodes Of Semiconductors (AREA)
GB5647171A 1970-12-11 1971-12-06 Covering of areas of the surface of a semiconductor body with a protective mask Expired GB1317697A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2061202A DE2061202C3 (de) 1970-12-11 1970-12-11 Verfahren zur selbstjustierenden Abdeckung von Flächenteilen auf der Oberfläche eines Halbleiterkörpers mit fotoempfindlichem Abdecklack

Publications (1)

Publication Number Publication Date
GB1317697A true GB1317697A (en) 1973-05-23

Family

ID=5790759

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5647171A Expired GB1317697A (en) 1970-12-11 1971-12-06 Covering of areas of the surface of a semiconductor body with a protective mask

Country Status (10)

Country Link
US (1) US3816270A (enExample)
JP (1) JPS5145475B1 (enExample)
BE (1) BE776538A (enExample)
CA (1) CA949230A (enExample)
DE (1) DE2061202C3 (enExample)
FR (1) FR2117915B1 (enExample)
GB (1) GB1317697A (enExample)
IT (1) IT943816B (enExample)
LU (1) LU64425A1 (enExample)
NL (1) NL7117001A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4142893A (en) * 1977-09-14 1979-03-06 Raytheon Company Spray etch dicing method
US4179802A (en) * 1978-03-27 1979-12-25 International Business Machines Corporation Studded chip attachment process
JPS59124722A (ja) * 1982-12-30 1984-07-18 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション レジスト・マスクの形成方法

Also Published As

Publication number Publication date
DE2061202C3 (de) 1974-05-09
JPS5145475B1 (enExample) 1976-12-03
LU64425A1 (enExample) 1972-06-20
IT943816B (it) 1973-04-10
DE2061202B2 (de) 1973-10-11
FR2117915B1 (enExample) 1977-04-22
CA949230A (en) 1974-06-11
FR2117915A1 (enExample) 1972-07-28
DE2061202A1 (de) 1972-06-22
NL7117001A (enExample) 1972-06-13
US3816270A (en) 1974-06-11
BE776538A (fr) 1972-04-04

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee