GB1287221A - Semiconductor device and method of producing the same - Google Patents
Semiconductor device and method of producing the sameInfo
- Publication number
- GB1287221A GB1287221A GB387670A GB387670A GB1287221A GB 1287221 A GB1287221 A GB 1287221A GB 387670 A GB387670 A GB 387670A GB 387670 A GB387670 A GB 387670A GB 1287221 A GB1287221 A GB 1287221A
- Authority
- GB
- United Kingdom
- Prior art keywords
- aqueous solution
- silicon
- type
- jan
- etched
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title abstract 3
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 239000007864 aqueous solution Substances 0.000 abstract 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 abstract 2
- 229910021426 porous silicon Inorganic materials 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 238000009792 diffusion process Methods 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 239000012212 insulator Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 229910052697 platinum Inorganic materials 0.000 abstract 1
- 238000009877 rendering Methods 0.000 abstract 1
- 239000000243 solution Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
- H01L21/76245—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using full isolation by porous oxide silicon, i.e. FIPOS techniques
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Element Separation (AREA)
- Formation Of Insulating Films (AREA)
- Bipolar Transistors (AREA)
- Weting (AREA)
- Electrodes Of Semiconductors (AREA)
- Local Oxidation Of Silicon (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP44005975A JPS4919030B1 (enrdf_load_stackoverflow) | 1969-01-29 | 1969-01-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1287221A true GB1287221A (en) | 1972-08-31 |
Family
ID=11625834
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB387670A Expired GB1287221A (en) | 1969-01-29 | 1970-01-27 | Semiconductor device and method of producing the same |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS4919030B1 (enrdf_load_stackoverflow) |
| DE (1) | DE2003952C3 (enrdf_load_stackoverflow) |
| FR (1) | FR2029636B1 (enrdf_load_stackoverflow) |
| GB (1) | GB1287221A (enrdf_load_stackoverflow) |
| NL (1) | NL142825B (enrdf_load_stackoverflow) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3961353A (en) * | 1974-10-21 | 1976-06-01 | International Business Machines Corporation | High power semiconductor device |
| US4016017A (en) * | 1975-11-28 | 1977-04-05 | International Business Machines Corporation | Integrated circuit isolation structure and method for producing the isolation structure |
| US4111720A (en) * | 1977-03-31 | 1978-09-05 | International Business Machines Corporation | Method for forming a non-epitaxial bipolar integrated circuit |
| GB2038548B (en) * | 1978-10-27 | 1983-03-23 | Nippon Telegraph & Telephone | Isolating semiconductor device by porous silicon oxide |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE671953A (enrdf_load_stackoverflow) * | 1964-11-05 |
-
1969
- 1969-01-29 JP JP44005975A patent/JPS4919030B1/ja active Pending
-
1970
- 1970-01-27 GB GB387670A patent/GB1287221A/en not_active Expired
- 1970-01-28 NL NL7001170A patent/NL142825B/xx not_active IP Right Cessation
- 1970-01-28 FR FR7003022A patent/FR2029636B1/fr not_active Expired
- 1970-01-29 DE DE19702003952 patent/DE2003952C3/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2003952B2 (de) | 1974-08-01 |
| DE2003952C3 (de) | 1975-03-20 |
| NL7001170A (enrdf_load_stackoverflow) | 1970-07-31 |
| JPS4919030B1 (enrdf_load_stackoverflow) | 1974-05-14 |
| NL142825B (nl) | 1974-07-15 |
| FR2029636A1 (enrdf_load_stackoverflow) | 1970-10-23 |
| DE2003952A1 (de) | 1972-02-03 |
| FR2029636B1 (enrdf_load_stackoverflow) | 1973-10-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| 732 | Registration of transactions, instruments or events in the register (sect. 32/1977) | ||
| PE20 | Patent expired after termination of 20 years |