GB1280305A - Ion implantation apparatus - Google Patents

Ion implantation apparatus

Info

Publication number
GB1280305A
GB1280305A GB48058/69A GB4805869A GB1280305A GB 1280305 A GB1280305 A GB 1280305A GB 48058/69 A GB48058/69 A GB 48058/69A GB 4805869 A GB4805869 A GB 4805869A GB 1280305 A GB1280305 A GB 1280305A
Authority
GB
United Kingdom
Prior art keywords
ion beam
deflection system
ion
deflection
accelerator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB48058/69A
Other languages
English (en)
Inventor
George Raymond Brewer
Charles Raymond Buckey
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Raytheon Co
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of GB1280305A publication Critical patent/GB1280305A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Particle Accelerators (AREA)
  • Physical Vapour Deposition (AREA)
GB48058/69A 1968-10-04 1969-09-30 Ion implantation apparatus Expired GB1280305A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US76512568A 1968-10-04 1968-10-04

Publications (1)

Publication Number Publication Date
GB1280305A true GB1280305A (en) 1972-07-05

Family

ID=25072714

Family Applications (1)

Application Number Title Priority Date Filing Date
GB48058/69A Expired GB1280305A (en) 1968-10-04 1969-09-30 Ion implantation apparatus

Country Status (4)

Country Link
US (1) US3569757A (de)
DE (1) DE1948396A1 (de)
GB (1) GB1280305A (de)
NL (1) NL6914944A (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2045238A5 (de) * 1969-06-26 1971-02-26 Commissariat Energie Atomique
JPS521399A (en) * 1975-06-24 1977-01-07 Toshiba Corp The fixation treatment method of a radioactive gas and its device
US4117339A (en) * 1977-07-01 1978-09-26 Burroughs Corporation Double deflection electron beam generator for employment in the fabrication of semiconductor and other devices
NL183553C (nl) * 1978-05-12 1988-11-16 Philips Nv Inrichting voor het richten van elektrisch geladen deeltjes naar een trefplaats.
NL182924C (nl) * 1978-05-12 1988-06-01 Philips Nv Inrichting voor het implanteren van ionen in een trefplaat.
GB2052146B (en) * 1979-06-04 1983-06-22 Varian Associates Unitary electromagnet for double deflection scanning of charged particle beam
US4276477A (en) * 1979-09-17 1981-06-30 Varian Associates, Inc. Focusing apparatus for uniform application of charged particle beam
DE2942045A1 (de) * 1979-10-17 1981-04-30 Siemens AG, 1000 Berlin und 8000 München Verfahren zur gleichmaessigen ausleuchtung von flaechen mittels eines strahles
US4283631A (en) * 1980-02-22 1981-08-11 Varian Associates, Inc. Bean scanning and method of use for ion implantation
JPS56156662A (en) * 1980-05-02 1981-12-03 Hitachi Ltd Device for ion implantation
AU8124082A (en) * 1981-03-09 1982-09-16 Unisearch Limited Charged particle beam focussing device
US4922106A (en) * 1986-04-09 1990-05-01 Varian Associates, Inc. Ion beam scanning method and apparatus
US4980562A (en) * 1986-04-09 1990-12-25 Varian Associates, Inc. Method and apparatus for high efficiency scanning in an ion implanter
GB2216714B (en) * 1988-03-11 1992-10-14 Ulvac Corp Ion implanter system
GB9005204D0 (en) * 1990-03-08 1990-05-02 Superion Ltd Apparatus and methods relating to scanning ion beams
US5132544A (en) * 1990-08-29 1992-07-21 Nissin Electric Company Ltd. System for irradiating a surface with atomic and molecular ions using two dimensional magnetic scanning
EP0515352A1 (de) * 1991-05-24 1992-11-25 IMS Ionen Mikrofabrikations Systeme Gesellschaft m.b.H. Ionenquelle
US5481116A (en) * 1994-06-10 1996-01-02 Ibis Technology Corporation Magnetic system and method for uniformly scanning heavy ion beams
US5438203A (en) * 1994-06-10 1995-08-01 Nissin Electric Company System and method for unipolar magnetic scanning of heavy ion beams
US5672879A (en) * 1995-06-12 1997-09-30 Glavish; Hilton F. System and method for producing superimposed static and time-varying magnetic fields
US6441382B1 (en) * 1999-05-21 2002-08-27 Axcelis Technologies, Inc. Deceleration electrode configuration for ultra-low energy ion implanter
US6677599B2 (en) * 2000-03-27 2004-01-13 Applied Materials, Inc. System and method for uniformly implanting a wafer with an ion beam
AU2001270133A1 (en) 2000-06-22 2002-01-02 Proteros, Llc Ion implantation uniformity correction using beam current control

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2570124A (en) * 1949-10-20 1951-10-02 Rca Corp Positive ion beam gun
US2925507A (en) * 1955-07-21 1960-02-16 Royal V Keeran Code sorter tube
US2947868A (en) * 1959-07-27 1960-08-02 Geophysics Corp Of America Mass spectrometer
US3230362A (en) * 1963-12-03 1966-01-18 Gen Electric Bakeable mass spectrometer with means to precisely align the ion source, analyzer and detector subassemblies
US3313969A (en) * 1966-03-25 1967-04-11 Boeing Co Charged particle deflecting apparatus having hemispherical electrodes

Also Published As

Publication number Publication date
DE1948396A1 (de) 1970-06-04
NL6914944A (de) 1970-04-07
US3569757A (en) 1971-03-09

Similar Documents

Publication Publication Date Title
GB1280305A (en) Ion implantation apparatus
US6313475B1 (en) Acceleration and analysis architecture for ion implanter
US4661712A (en) Apparatus for scanning a high current ion beam with a constant angle of incidence
US4011449A (en) Apparatus for measuring the beam current of charged particle beam
GB1211618A (en) Charged particle beam fabrication of microelectronic circuit patterns
GB1175647A (en) Surface Ionization Ion Source Apparatus
ES475316A1 (es) Un tubo de rayos catodicos perfeccionado
ES8401676A1 (es) Un dispositivo para registrar o visualizar imagenes.
US3585397A (en) Programmed fine ion implantation beam system
DE3782240D1 (de) Schnelle parallelabtastung mit ionenstrahlen mit einer bipolaren magnetischen linse mit uneinheitlichem feld.
US3705320A (en) Ion beam sources with tiltable firing angle
GB761008A (en) Improvements in or relating to cathode ray tubes
GB1458908A (en) Apparatus for ion implantation
EP0104818A3 (de) Ionenimplantationsvorrichtung
EP0378970A3 (de) Universelle Kaltkathoden-Ionenerzeugungs- und -beschleunigungsvorrichtung
GB1303136A (de)
GB1518282A (en) Ion beam separators
US3163752A (en) Ion acceleration apparatus for coincidence time-of-flight mass specrometers
US4486687A (en) Electron gun for convergent beam, and a device, particularly a vidicon tube, equipped with such a gun
NL256978A (de)
SU1018173A1 (ru) Электронно-лучева трубка
US5107110A (en) Simultaneous detection type mass spectrometer
Slodzian et al. The emission objective lens working as an electron mirror: self regulated potential at the surface of an insulating sample
GB928168A (en) Improvements in or relating to mass filters including an electron impact source of ions
JPS6419665A (en) Ion beam device

Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees