GB1269408A - Sputter deposition on an irregular surface - Google Patents

Sputter deposition on an irregular surface

Info

Publication number
GB1269408A
GB1269408A GB3330069A GB3330069A GB1269408A GB 1269408 A GB1269408 A GB 1269408A GB 3330069 A GB3330069 A GB 3330069A GB 3330069 A GB3330069 A GB 3330069A GB 1269408 A GB1269408 A GB 1269408A
Authority
GB
United Kingdom
Prior art keywords
substrate
dielectric
target
inert gas
july
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3330069A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1269408A publication Critical patent/GB1269408A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Electrodes Of Semiconductors (AREA)
GB3330069A 1968-07-03 1969-07-02 Sputter deposition on an irregular surface Expired GB1269408A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US74229768A 1968-07-03 1968-07-03

Publications (1)

Publication Number Publication Date
GB1269408A true GB1269408A (en) 1972-04-06

Family

ID=24984258

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3330069A Expired GB1269408A (en) 1968-07-03 1969-07-02 Sputter deposition on an irregular surface

Country Status (3)

Country Link
JP (1) JPS4817592B1 (enrdf_load_stackoverflow)
FR (1) FR2014490A1 (enrdf_load_stackoverflow)
GB (1) GB1269408A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5660671A (en) * 1990-09-29 1997-08-26 Tokyo Electron Limited Magnetron plasma processing apparatus and processing method

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56133884A (en) * 1980-03-24 1981-10-20 Hitachi Ltd Manufacture of photoelectric transducer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5660671A (en) * 1990-09-29 1997-08-26 Tokyo Electron Limited Magnetron plasma processing apparatus and processing method

Also Published As

Publication number Publication date
JPS4817592B1 (enrdf_load_stackoverflow) 1973-05-30
DE1933467A1 (de) 1970-03-05
DE1933467B2 (de) 1973-07-19
FR2014490A1 (enrdf_load_stackoverflow) 1970-04-17

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