GB1259537A - - Google Patents

Info

Publication number
GB1259537A
GB1259537A GB4508569A GB1259537DA GB1259537A GB 1259537 A GB1259537 A GB 1259537A GB 4508569 A GB4508569 A GB 4508569A GB 1259537D A GB1259537D A GB 1259537DA GB 1259537 A GB1259537 A GB 1259537A
Authority
GB
United Kingdom
Prior art keywords
pattern
patterns
photo
plate
array
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4508569A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GB1259537A publication Critical patent/GB1259537A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
GB4508569A 1969-09-12 1969-09-12 Expired GB1259537A (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB4508569 1969-09-12

Publications (1)

Publication Number Publication Date
GB1259537A true GB1259537A (https=) 1972-01-05

Family

ID=10435825

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4508569A Expired GB1259537A (https=) 1969-09-12 1969-09-12

Country Status (1)

Country Link
GB (1) GB1259537A (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4408875A (en) * 1980-12-29 1983-10-11 Fujitsu Limited Method of projecting circuit patterns
US4603974A (en) * 1984-03-05 1986-08-05 Fujitsu Limited Reticle used in semiconductor device fabrication and a method for inspecting a reticle pattern thereon
US4869998A (en) * 1986-05-01 1989-09-26 Smiths Industries Public Limited Company Intergrated circuit substrates

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4408875A (en) * 1980-12-29 1983-10-11 Fujitsu Limited Method of projecting circuit patterns
US4603974A (en) * 1984-03-05 1986-08-05 Fujitsu Limited Reticle used in semiconductor device fabrication and a method for inspecting a reticle pattern thereon
US4869998A (en) * 1986-05-01 1989-09-26 Smiths Industries Public Limited Company Intergrated circuit substrates

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees