GB1060474A - The production of monocrystalline semiconductor bodies of silicon or germanium - Google Patents
The production of monocrystalline semiconductor bodies of silicon or germaniumInfo
- Publication number
- GB1060474A GB1060474A GB9211/64A GB921164A GB1060474A GB 1060474 A GB1060474 A GB 1060474A GB 9211/64 A GB9211/64 A GB 9211/64A GB 921164 A GB921164 A GB 921164A GB 1060474 A GB1060474 A GB 1060474A
- Authority
- GB
- United Kingdom
- Prior art keywords
- rod
- cut
- core
- hexagonal
- cores
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 229910052732 germanium Inorganic materials 0.000 title 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 title 1
- 229910052710 silicon Inorganic materials 0.000 title 1
- 239000010703 silicon Substances 0.000 title 1
- 238000000034 method Methods 0.000 abstract 4
- 239000013078 crystal Substances 0.000 abstract 2
- 238000000151 deposition Methods 0.000 abstract 2
- 239000007789 gas Substances 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 235000012431 wafers Nutrition 0.000 abstract 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DES0084388 | 1963-03-27 | ||
| CH50264A CH405775A (de) | 1963-05-24 | 1964-01-17 | Digitale Drehzahlmessanordnung |
| CH50164 | 1964-01-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1060474A true GB1060474A (en) | 1967-03-01 |
Family
ID=27172156
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB9211/64A Expired GB1060474A (en) | 1963-03-27 | 1964-03-04 | The production of monocrystalline semiconductor bodies of silicon or germanium |
Country Status (4)
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2181104C2 (ru) * | 2000-02-03 | 2002-04-10 | Государственное унитарное предприятие Государственный научный центр Российской Федерации Физико-энергетический институт имени академика А.И. Лейпунского | Способ выделения кремния |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1614410B2 (de) * | 1967-01-25 | 1973-12-13 | Siemens Ag, 1000 Berlin U. 8000 Muenchen | Halbleiterbauelement |
| US3603848A (en) * | 1969-02-27 | 1971-09-07 | Tokyo Shibaura Electric Co | Complementary field-effect-type semiconductor device |
| US3579057A (en) * | 1969-08-18 | 1971-05-18 | Rca Corp | Method of making a semiconductor article and the article produced thereby |
| US4482422A (en) * | 1982-02-26 | 1984-11-13 | Rca Corporation | Method for growing a low defect monocrystalline layer on a mask |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL104644C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1959-09-18 | |||
| US3168422A (en) * | 1960-05-09 | 1965-02-02 | Merck & Co Inc | Process of flushing unwanted residue from a vapor deposition system in which silicon is being deposited |
| BE624959A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1961-11-20 | |||
| US3152022A (en) * | 1962-05-25 | 1964-10-06 | Bell Telephone Labor Inc | Epitaxial deposition on the surface of a freshly grown dendrite |
| NL295293A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1962-07-13 |
-
1964
- 1964-03-04 GB GB9211/64A patent/GB1060474A/en not_active Expired
- 1964-03-09 NL NL6402396A patent/NL6402396A/xx unknown
- 1964-03-11 BE BE645005D patent/BE645005A/xx unknown
- 1964-03-26 US US354862A patent/US3377182A/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2181104C2 (ru) * | 2000-02-03 | 2002-04-10 | Государственное унитарное предприятие Государственный научный центр Российской Федерации Физико-энергетический институт имени академика А.И. Лейпунского | Способ выделения кремния |
Also Published As
| Publication number | Publication date |
|---|---|
| US3377182A (en) | 1968-04-09 |
| BE645005A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1964-07-01 |
| NL6402396A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1965-06-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ES345702A1 (es) | Un metodo de fabricar un dispositivo semiconductor. | |
| GB945742A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
| FR1233420A (fr) | Dispositif semi-conducteur en carbure de silicium et son procédé de fabrication | |
| GB1056919A (en) | Process for growing semiconductor crystals | |
| GB931992A (en) | Improvements in or relating to methods of manufacturing crystalline semi-conductor material | |
| GB1060474A (en) | The production of monocrystalline semiconductor bodies of silicon or germanium | |
| GB919837A (en) | Improvements in or relating to the production of semi-conductor rods | |
| FR1419372A (fr) | Procédé pour faire croître des couches semi-conductrices cristallines, en particulier monocristallines, et dopées, sur des cristaux semi-conducteurs | |
| FR1362634A (fr) | Procédé de fabrication par épitaxie de plaques minces semiconductrices sur support métallique et plaques semiconductrices ainsi fabriquées | |
| CH411065A (de) | Verfahren zur Herstellung eines nicht gleichrichtenden Überganges zwischen einer Elektrode und einem thermoelektrischen Halbleiter und nach dem Verfahren hergestellter Übergang | |
| FR1515916A (fr) | Procédé de fabrication de cristaux semi-conducteurs en forme de tiges de diamètre uniforme | |
| GB1214238A (en) | A process for manufacturing a semiconductor device | |
| FR1313672A (fr) | Procédé de fabrication de tiges-semi-conductrices monocristallines par tirage sans creuset | |
| CH425736A (de) | Verfahren zum Herstellen einkristalliner Halbleiterstäbe | |
| CH354858A (de) | Verfahren zur Herstellung eines elektrischen Halbleitergerätes mit einkristallinem Halbleiterkörper | |
| CH398797A (de) | Verfahren zur Herstellung eines p-dotierten Bereiches in Körpern aus einkristallinem Halbleitermaterial | |
| CH372385A (de) | Verfahren zur Herstellung einer Halbleiteranordnung aus Silizium | |
| CH374773A (de) | Verfahren zur Herstellung von pn-Übergängen in einem Grundkörper aus einkristallinem Halbleitermaterial | |
| CH409885A (de) | Verfahren zum tiegellosen Ziehen von einkristallinen Halbleiterstäben | |
| CH375451A (de) | Verfahren zur Herstellung einer Halbleiteranordnung, insbesondere eines Transistors, mit einem einkristallinen Grundkörper aus Silizium | |
| CH373471A (de) | Verfahren zur Herstellung elektrischer Halbleitergeräte mit einkristallinem Halbleiterkörper, insbesondere aus Silizium | |
| CH435457A (de) | Verfahren zum Herstellen einer p-dotierten Zone in einem einkristallinen Halbleiterkörper, insbesondere aus Silizium | |
| FR2148166A1 (en) | Semiconductor wafers - cut perpendicular to the 115 directions | |
| AU241601B2 (en) | Method for preparing junctions in semiconductors and semiconductor devices obtained by means ofthese methods | |
| AU5534259A (en) | Method for preparing junctions in semiconductors and semiconductor devices obtained by means ofthese methods |