FR864663A - Verre perfectionné à coefficient de dilatation inférieur à celui de la silice et procédé de fabrication de ce verre - Google Patents
Verre perfectionné à coefficient de dilatation inférieur à celui de la silice et procédé de fabrication de ce verreInfo
- Publication number
- FR864663A FR864663A FR864663DA FR864663A FR 864663 A FR864663 A FR 864663A FR 864663D A FR864663D A FR 864663DA FR 864663 A FR864663 A FR 864663A
- Authority
- FR
- France
- Prior art keywords
- glass
- silica
- coefficient
- making
- advanced
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title 2
- 239000011521 glass Substances 0.000 title 2
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000377 silicon dioxide Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1484—Means for supporting, rotating or translating the article being formed
- C03B19/1492—Deposition substrates, e.g. targets
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/005—Compositions for glass with special properties for opaline glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
- C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/80—Feeding the burner or the burner-heated deposition site
- C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
- C03B2207/87—Controlling the temperature
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/80—Feeding the burner or the burner-heated deposition site
- C03B2207/90—Feeding the burner or the burner-heated deposition site with vapour generated from solid glass precursors, i.e. by sublimation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S425/00—Plastic article or earthenware shaping or treating: apparatus
- Y10S425/121—Projection
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US269497A US2326059A (en) | 1939-04-22 | 1939-04-22 | Glass having an expansion lower than that of silica |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| FR864663A true FR864663A (fr) | 1941-05-02 |
Family
ID=23027507
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR864663D Expired FR864663A (fr) | 1939-04-22 | 1940-04-05 | Verre perfectionné à coefficient de dilatation inférieur à celui de la silice et procédé de fabrication de ce verre |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US2326059A (enEXAMPLES) |
| BE (1) | BE438752A (enEXAMPLES) |
| FR (1) | FR864663A (enEXAMPLES) |
| GB (1) | GB538891A (enEXAMPLES) |
Families Citing this family (66)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2434281A (en) * | 1942-05-15 | 1948-01-13 | American Optical Corp | Glass and method of making same |
| BE547007A (enEXAMPLES) * | 1955-05-26 | |||
| US3007806A (en) * | 1957-12-30 | 1961-11-07 | Babcock & Wilcox Co | High silica refractory wools |
| US3942991A (en) * | 1965-06-21 | 1976-03-09 | Owens-Illinois, Inc. | SiO2 -AlPO4 Glass batch compositions |
| US3779781A (en) * | 1965-06-21 | 1973-12-18 | Owens Illinois Inc | Copper aluminosilicate glass compositions |
| FR2002589A1 (enEXAMPLES) | 1968-02-26 | 1969-10-31 | Corning Glass Works | |
| US3650781A (en) * | 1969-08-28 | 1972-03-21 | Owens Illinois Inc | Silica-cadmia glass batches for producing low-to-medium expansion glasses |
| US3711262A (en) * | 1970-05-11 | 1973-01-16 | Corning Glass Works | Method of producing optical waveguide fibers |
| US3775075A (en) * | 1972-01-03 | 1973-11-27 | Corning Glass Works | Method of forming optical waveguide fibers |
| US3806570A (en) * | 1972-03-30 | 1974-04-23 | Corning Glass Works | Method for producing high quality fused silica |
| US3934061A (en) * | 1972-03-30 | 1976-01-20 | Corning Glass Works | Method of forming planar optical waveguides |
| US3826560A (en) * | 1972-03-30 | 1974-07-30 | Corning Glass Works | Method of forming a light focusing fiber waveguide |
| US3873339A (en) * | 1972-03-30 | 1975-03-25 | Corning Glass Works | Method of forming optical waveguide circuit path |
| US3868170A (en) * | 1972-03-30 | 1975-02-25 | Corning Glass Works | Method of removing entrapped gas and/or residual water from glass |
| GB1427327A (en) * | 1972-06-08 | 1976-03-10 | Standard Telephones Cables Ltd | Glass optical fibres |
| US3785722A (en) * | 1972-06-20 | 1974-01-15 | Corning Glass Works | USE OF SiO{11 -NB{11 O{11 {11 AND/OR Ta{11 O{11 {11 GLASSES AS ULTRAVIOLET FILTERS |
| DE2247425B2 (de) * | 1972-09-27 | 1981-07-16 | Siemens AG, 1000 Berlin und 8000 München | Grundmaterial für Lichtleitfasern |
| JPS4983453A (enEXAMPLES) * | 1972-12-14 | 1974-08-10 | ||
| US3880632A (en) * | 1973-08-30 | 1975-04-29 | Galina Yakovlevna Podvigalkina | Method of joining optical glass parts |
| US3859073A (en) * | 1973-10-19 | 1975-01-07 | Corning Glass Works | Method of producing glass by flame hydrolysis |
| US3933454A (en) * | 1974-04-22 | 1976-01-20 | Corning Glass Works | Method of making optical waveguides |
| US3962515A (en) * | 1974-07-29 | 1976-06-08 | Corning Glass Works | Strengthened composite glass article and method of production |
| US4220461A (en) * | 1978-04-06 | 1980-09-02 | Mrinmay Samanta | Low temperature synthesis of vitreous bodies and their intermediates |
| US4304583A (en) * | 1980-06-02 | 1981-12-08 | Corning Glass Works | Process for drying optical waveguide preforms |
| US4659477A (en) * | 1982-08-16 | 1987-04-21 | Pedro B. Macedo | Fixation of anionic materials with a complexing agent |
| US4659512A (en) * | 1983-12-21 | 1987-04-21 | Pedro B. Macedo | Fixation of dissolved metal species with a complexing agent |
| US4687581A (en) * | 1984-01-30 | 1987-08-18 | Pedro B. Macedo | Method of separating and purifying cations by ion exchange with regenerable porous glass |
| US4940675A (en) * | 1988-06-17 | 1990-07-10 | Corning Incorporated | Method for making low-expansion glass article of complex shape |
| US5043002A (en) | 1990-08-16 | 1991-08-27 | Corning Incorporated | Method of making fused silica by decomposing siloxanes |
| US5118552A (en) * | 1991-03-04 | 1992-06-02 | Corning Incorporated | Composite article and method |
| US5755850A (en) * | 1992-09-24 | 1998-05-26 | Iowa State University Research Foundation | Method of making a surgical laser fiber from a monolithic silica titania glass rod |
| US5703191A (en) * | 1995-09-01 | 1997-12-30 | Corning Incorporated | Method for purifying polyalkylsiloxanes and the resulting products |
| US5868734A (en) * | 1995-11-29 | 1999-02-09 | Iowa State University Research Foundation, Inc. | Methods of using silica-titania clad fibers |
| US6312656B1 (en) | 1995-12-19 | 2001-11-06 | Corning Incorporated | Method for forming silica by combustion of liquid reactants using oxygen |
| US5879649A (en) * | 1995-12-19 | 1999-03-09 | Corning Incorporated | Method for purifying polyalkylsiloxanes and the resulting products |
| EP0868401B1 (en) | 1995-12-19 | 2004-08-04 | Corning Incorporated | Method and apparatus for forming fused silica by combustion of liquid reactants |
| KR20000076000A (ko) | 1997-03-07 | 2000-12-26 | 알프레드 엘. 미첼슨 | 티타니아-도핑 용융 실리카의 제조 방법 |
| US5979185A (en) * | 1997-07-16 | 1999-11-09 | Corning Incorporated | Method and apparatus for forming silica by combustion of liquid reactants using a heater |
| US5970751A (en) * | 1998-09-22 | 1999-10-26 | Corning Incorporated | Fused SiO2 -TiO2 glass method |
| WO2001007967A1 (en) | 1999-07-22 | 2001-02-01 | Corning Incorporated | Extreme ultraviolet soft x-ray projection lithographic method and mask devices |
| JP3766802B2 (ja) | 1999-07-22 | 2006-04-19 | コーニング インコーポレイテッド | 遠紫外軟x線投影リソグラフィー法システムおよびリソグラフィーエレメント |
| US6176588B1 (en) | 1999-12-14 | 2001-01-23 | Corning Incorporated | Low cost light weight mirror blank |
| EP1138386A1 (de) * | 2000-03-29 | 2001-10-04 | Degussa AG | Verfahren zur Herstellung eines Titansilicalitformkörpers |
| US6368942B1 (en) * | 2000-03-31 | 2002-04-09 | Euv Llc | Method for fabricating an ultra-low expansion mask blank having a crystalline silicon layer |
| JP2004509041A (ja) * | 2000-05-25 | 2004-03-25 | コーニング インコーポレイテッド | チタニアドープ石英ガラスプリフォームの作成方法 |
| EP1195360A1 (de) * | 2000-09-01 | 2002-04-10 | Degussa AG | Verfahren zur Herstellung von SiO2-TiO2-Gläsern mit geringem thermischen Ausdehnungskoeffizient |
| US6776006B2 (en) * | 2000-10-13 | 2004-08-17 | Corning Incorporated | Method to avoid striae in EUV lithography mirrors |
| US8047023B2 (en) | 2001-04-27 | 2011-11-01 | Corning Incorporated | Method for producing titania-doped fused silica glass |
| DE10139188A1 (de) * | 2001-08-16 | 2003-03-06 | Schott Glas | Glaskeramik für röntgenoptische Komponenten |
| WO2003070640A1 (en) * | 2002-02-19 | 2003-08-28 | Tal Materials | Mixed-metal oxide particles by liquid feed flame spray pyrolysis of oxide precursors in oxygenated solvents |
| US7428037B2 (en) * | 2002-07-24 | 2008-09-23 | Carl Zeiss Smt Ag | Optical component that includes a material having a thermal longitudinal expansion with a zero crossing |
| JP2004131373A (ja) * | 2002-09-09 | 2004-04-30 | Corning Inc | シリカ・チタニア極端紫外線光学素子の製造方法 |
| JP4792706B2 (ja) * | 2003-04-03 | 2011-10-12 | 旭硝子株式会社 | TiO2を含有するシリカガラスおよびその製造方法 |
| JP4792705B2 (ja) * | 2003-04-03 | 2011-10-12 | 旭硝子株式会社 | TiO2を含有するシリカガラスおよびその製造法 |
| DE10319596A1 (de) * | 2003-05-02 | 2004-11-25 | Degussa Ag | Mehrkomponentenglas |
| FI116567B (fi) * | 2003-09-29 | 2005-12-30 | Liekki Oy | Menetelmä sekä järjestelmä seostetun lasimateriaalin lähtöaineiden kaasuvirtauksen muodostamiseksi |
| DE102004060600A1 (de) * | 2003-12-18 | 2005-07-14 | Schott Ag | Mit Fluor dotiertes Silicatglas und Verwendung eines solchen |
| KR101160861B1 (ko) * | 2004-07-01 | 2012-07-02 | 아사히 가라스 가부시키가이샤 | TiO₂를 함유한 실리카계 유리 및 그 제조 공정 |
| JP4513486B2 (ja) * | 2004-10-01 | 2010-07-28 | 旭硝子株式会社 | TiO2を含有するシリカガラスの製造方法 |
| JP4487783B2 (ja) * | 2005-01-25 | 2010-06-23 | 旭硝子株式会社 | TiO2を含有するシリカガラスの製造方法およびTiO2を含有するシリカガラスを用いたEUVリソグラフィ用光学部材 |
| US7427577B2 (en) * | 2006-04-06 | 2008-09-23 | Nanocerox Inc | Sintered polycrystalline terbium aluminum garnet and use thereof in magneto-optical devices |
| JP2011505318A (ja) * | 2007-11-30 | 2011-02-24 | コーニング インコーポレイテッド | 低い膨張係数勾配を有する低膨張性ガラス材料 |
| TW200940472A (en) * | 2007-12-27 | 2009-10-01 | Asahi Glass Co Ltd | TiO2-containing silica glass |
| JP2013502372A (ja) * | 2009-08-21 | 2013-01-24 | モーメンティブ・パフォーマンス・マテリアルズ・インク | 医薬品包装用の溶融石英チュービング |
| US20120026473A1 (en) | 2010-07-29 | 2012-02-02 | Michael Lucien Genier | Highly reflective, hardened silica titania article and method of making |
| GB201106015D0 (en) | 2011-04-08 | 2011-05-25 | Heraeus Quartz Uk Ltd | Production of silica soot bodies |
-
0
- BE BE438752D patent/BE438752A/xx unknown
-
1939
- 1939-04-22 US US269497A patent/US2326059A/en not_active Expired - Lifetime
-
1940
- 1940-03-07 GB GB4290/40A patent/GB538891A/en not_active Expired
- 1940-04-05 FR FR864663D patent/FR864663A/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| US2326059A (en) | 1943-08-03 |
| GB538891A (en) | 1941-08-20 |
| BE438752A (enEXAMPLES) |
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