FR3158454B3 - Dispositif de traitement sous vide - Google Patents

Dispositif de traitement sous vide

Info

Publication number
FR3158454B3
FR3158454B3 FR2500212A FR2500212A FR3158454B3 FR 3158454 B3 FR3158454 B3 FR 3158454B3 FR 2500212 A FR2500212 A FR 2500212A FR 2500212 A FR2500212 A FR 2500212A FR 3158454 B3 FR3158454 B3 FR 3158454B3
Authority
FR
France
Prior art keywords
chamber
processing
vacuum
discharge
feed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR2500212A
Other languages
English (en)
Other versions
FR3158454A3 (fr
Inventor
Shu-Hsiang Chang
Chien-Hsing Lu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Prologium Technology Co Ltd
Original Assignee
Prologium Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Prologium Technology Co Ltd filed Critical Prologium Technology Co Ltd
Publication of FR3158454A3 publication Critical patent/FR3158454A3/fr
Application granted granted Critical
Publication of FR3158454B3 publication Critical patent/FR3158454B3/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/04—Processes of manufacture in general
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0486—Operating the coating or treatment in a controlled atmosphere
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B26—HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26D—CUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
    • B26D7/00—Details of apparatus for cutting, cutting-out, stamping-out, punching, perforating, or severing by means other than cutting
    • B26D7/27—Means for performing other operations combined with cutting
    • B26D7/32—Means for performing other operations combined with cutting for conveying or stacking cut product
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
    • F16K51/02—Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/04—Processes of manufacture in general
    • H01M4/0402—Methods of deposition of the material
    • H01M4/0404—Methods of deposition of the material by coating on electrode collectors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B26—HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26D—CUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
    • B26D7/00—Details of apparatus for cutting, cutting-out, stamping-out, punching, perforating, or severing by means other than cutting
    • B26D7/27—Means for performing other operations combined with cutting
    • B26D7/32—Means for performing other operations combined with cutting for conveying or stacking cut product
    • B26D2007/322—Means for performing other operations combined with cutting for conveying or stacking cut product the cut products being sheets, e.g. sheets of paper
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/04—Processes of manufacture in general
    • H01M4/0402—Methods of deposition of the material
    • H01M4/0421—Methods of deposition of the material involving vapour deposition
    • H01M4/0423—Physical vapour deposition

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Forests & Forestry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

Dispositif de traitement sous vide L’invention concerne un dispositif de traitement sous vide conçu pour comporter plusieurs chambres telles qu'une chambre de traitement (20), une chambre d’amenée (10) et une chambre de sortie (30), dans lequel, lorsque les première et deuxième soupapes internes (42, 43) situées entre les chambres sont fermées, le degré de vide dans la chambre de traitement (20) est supérieur à celui dans la chambre d’amenée (10) et dans la première chambre de sortie (30), de sorte que l'alimentation et la sortie de matériau peuvent être effectuées par la chambre d’amenée (10) et la chambre de sortie (30). Comme, en même temps, le degré de vide dans la chambre de traitement (20) reste toujours dans l'état requis pour le traitement, le processus de traitement sous vide peut se poursuivre pendant l'opération d’amenée ou sortie afin de garantir un traitement continu sans interruption dans le processus sous vide. Figure à publier : Fig. 1
FR2500212A 2024-01-24 2025-01-09 Dispositif de traitement sous vide Active FR3158454B3 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
TW113200851 2024-01-24
TW113200851U TWM657460U (zh) 2024-01-24 2024-01-24 真空製程裝置

Publications (2)

Publication Number Publication Date
FR3158454A3 FR3158454A3 (fr) 2025-07-25
FR3158454B3 true FR3158454B3 (fr) 2026-02-06

Family

ID=92929781

Family Applications (1)

Application Number Title Priority Date Filing Date
FR2500212A Active FR3158454B3 (fr) 2024-01-24 2025-01-09 Dispositif de traitement sous vide

Country Status (5)

Country Link
JP (1) JP3250254U (fr)
KR (1) KR20250001190U (fr)
DE (1) DE202024106856U1 (fr)
FR (1) FR3158454B3 (fr)
TW (1) TWM657460U (fr)

Also Published As

Publication number Publication date
KR20250001190U (ko) 2025-07-31
DE202024106856U1 (de) 2025-03-13
TWM657460U (zh) 2024-07-01
JP3250254U (ja) 2025-02-19
FR3158454A3 (fr) 2025-07-25

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