FR3100381B1 - Procédé de fabrication d’une cellule photovoltaïque - Google Patents

Procédé de fabrication d’une cellule photovoltaïque Download PDF

Info

Publication number
FR3100381B1
FR3100381B1 FR1909500A FR1909500A FR3100381B1 FR 3100381 B1 FR3100381 B1 FR 3100381B1 FR 1909500 A FR1909500 A FR 1909500A FR 1909500 A FR1909500 A FR 1909500A FR 3100381 B1 FR3100381 B1 FR 3100381B1
Authority
FR
France
Prior art keywords
substrate
layer
manufacturing process
photovoltaic cell
polysilicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1909500A
Other languages
English (en)
Other versions
FR3100381A1 (fr
Inventor
RAPHAëL CABAL
Bernadette Grange
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA, Commissariat a lEnergie Atomique et aux Energies Alternatives CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR1909500A priority Critical patent/FR3100381B1/fr
Priority to PCT/EP2020/073739 priority patent/WO2021037846A1/fr
Priority to EP20757928.5A priority patent/EP4022688A1/fr
Priority to CN202080060011.2A priority patent/CN114303252B/zh
Publication of FR3100381A1 publication Critical patent/FR3100381A1/fr
Application granted granted Critical
Publication of FR3100381B1 publication Critical patent/FR3100381B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
    • H01L31/0264Inorganic materials
    • H01L31/028Inorganic materials including, apart from doping material or other impurities, only elements of Group IV of the Periodic Table
    • H01L31/0288Inorganic materials including, apart from doping material or other impurities, only elements of Group IV of the Periodic Table characterised by the doping material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0368Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including polycrystalline semiconductors
    • H01L31/03682Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including polycrystalline semiconductors including only elements of Group IV of the Periodic Table
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
    • H01L31/068Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/186Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
    • H01L31/1864Annealing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/225Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
    • H01L21/2251Diffusion into or out of group IV semiconductors
    • H01L21/2254Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0216Coatings
    • H01L31/02161Coatings for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/02167Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/546Polycrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Inorganic Chemistry (AREA)
  • Photovoltaic Devices (AREA)
  • Formation Of Insulating Films (AREA)

Abstract

Ce procédé comporte les étapes : a) prévoir une structure comprenant : - un substrat (1) à base de silicium cristallin ; - une première couche diélectrique (2), comprenant des atomes de bore, et formée sur la première surface (10) du substrat (1) ; - un film d’oxyde tunnel (3), formé sur la seconde surface (11) du substrat ; - une couche de polysilicium (4), formée sur le film d’oxyde tunnel (3) ; - une deuxième couche diélectrique (5), comprenant des atomes de phosphore et/ou d’arsenic, et formée sur la couche de polysilicium (4) ; b) appliquer un traitement thermique à la structure de manière à : - diffuser les atomes de bore sous la première surface (10) du substrat (1), de manière à former une première région semi-conductrice dopée (100) ; - diffuser les atomes de phosphore et/ou d’arsenic dans la couche de polysilicium (4), de manière à doper la couche de polysilicium (4). Figure 3a-3d
FR1909500A 2019-08-29 2019-08-29 Procédé de fabrication d’une cellule photovoltaïque Active FR3100381B1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR1909500A FR3100381B1 (fr) 2019-08-29 2019-08-29 Procédé de fabrication d’une cellule photovoltaïque
PCT/EP2020/073739 WO2021037846A1 (fr) 2019-08-29 2020-08-25 Procédé de fabrication d'une cellule photovoltaïque
EP20757928.5A EP4022688A1 (fr) 2019-08-29 2020-08-25 Procédé de fabrication d'une cellule photovoltaïque
CN202080060011.2A CN114303252B (zh) 2019-08-29 2020-08-25 用于制造光伏电池的方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1909500 2019-08-29
FR1909500A FR3100381B1 (fr) 2019-08-29 2019-08-29 Procédé de fabrication d’une cellule photovoltaïque

Publications (2)

Publication Number Publication Date
FR3100381A1 FR3100381A1 (fr) 2021-03-05
FR3100381B1 true FR3100381B1 (fr) 2021-08-20

Family

ID=68281710

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1909500A Active FR3100381B1 (fr) 2019-08-29 2019-08-29 Procédé de fabrication d’une cellule photovoltaïque

Country Status (4)

Country Link
EP (1) EP4022688A1 (fr)
CN (1) CN114303252B (fr)
FR (1) FR3100381B1 (fr)
WO (1) WO2021037846A1 (fr)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53132275A (en) * 1977-04-25 1978-11-17 Nippon Telegr & Teleph Corp <Ntt> Semiconductor device and its production
EP2787541B1 (fr) * 2013-04-03 2022-08-31 LG Electronics, Inc. Cellule solaire
EP3026713B1 (fr) * 2014-11-28 2019-03-27 LG Electronics Inc. Cellule solaire et son procédé de fabrication
FR3035740B1 (fr) 2015-04-28 2017-05-12 Commissariat Energie Atomique Procede de fabrication d'une cellule photovoltaique.
CN105895738A (zh) * 2016-04-26 2016-08-24 泰州中来光电科技有限公司 一种钝化接触n型太阳能电池及制备方法和组件、系统
CN106784074A (zh) * 2017-01-24 2017-05-31 泰州乐叶光伏科技有限公司 N型双面电池结构
CN110148636A (zh) * 2018-11-27 2019-08-20 晶澳(扬州)太阳能科技有限公司 一种太阳能电池及其制备方法、光伏组件

Also Published As

Publication number Publication date
WO2021037846A1 (fr) 2021-03-04
EP4022688A1 (fr) 2022-07-06
CN114303252A (zh) 2022-04-08
FR3100381A1 (fr) 2021-03-05
CN114303252B (zh) 2024-07-16

Similar Documents

Publication Publication Date Title
CN104037086A (zh) 鳍式场效应晶体管装置的制造方法
US9343576B2 (en) Thin film forming method, semiconductor substrate and electronic device produced by employing same
CN102610634B (zh) 半导体装置和半导体装置的制造方法
US5897362A (en) Bonding silicon wafers
KR0148500B1 (ko) 반도체 디바이스 및 그 제조 방법
US10249499B2 (en) Method for manufacturing a semiconductor device comprising a thin semiconductor wafer
WO2022022214A1 (fr) Procédé de formation de structure semi-conductrice
FR3100381B1 (fr) Procédé de fabrication d’une cellule photovoltaïque
FR3059468B1 (fr) Procede de fabrication d’une cellule photovoltaique.
CN1638133B (zh) 半导体基片及其制造方法
CN102386132B (zh) 减少对准容差的方法及其在热处理工艺中的专用设备
CN104979161A (zh) 半导体器件的制作方法及ti-igbt的制作方法
CN109671620B (zh) 半导体器件制备过程中的杂质扩散工艺
US20080242067A1 (en) Semiconductor substrate and method of manufacture thereof
RU2546856C2 (ru) Способ изготовления полупроводниковых свч приборов
CN103311099B (zh) 降低激光峰值退火工艺缺陷的方法
TW395058B (en) Manufacturing method of Metal-Oxide Semiconductor (MOS) transistor with an elevate-type source and drain
FR3114442B1 (fr) Procédé de fabrication d’une cellule photovoltaïque à contacts passivés
WO2024089963A1 (fr) Procédé de production d&#39;élément semi-conducteur ayant une structure de super-jonction
Park et al. Analysis of lateral uniformity of ultrashallow junctions in polycrystalline silicon‐on‐single crystal silicon systems
JP2017157811A (ja) Soi基板及びその製造方法
RU165467U1 (ru) Кремниевая структура с диэлектрической изоляцией
KR850001097B1 (ko) 고주파 반도체 소자의 제조방법
CN118099199A (zh) 一种适用于igbt器件制造的三维半导体衬底晶圆和方法
CN111463119A (zh) 一种重金属Au掺杂工艺

Legal Events

Date Code Title Description
PLFP Fee payment

Year of fee payment: 2

PLSC Publication of the preliminary search report

Effective date: 20210305

PLFP Fee payment

Year of fee payment: 3

PLFP Fee payment

Year of fee payment: 4

PLFP Fee payment

Year of fee payment: 5