FR2858890B1 - MICROSYSTEM INCORPORATING AT LEAST ONE RESONANT STRUCTURE IN A CAVITY UNDER CONTROLLED ATMOSPHERE AND METHOD FOR MANUFACTURING THE SAME - Google Patents

MICROSYSTEM INCORPORATING AT LEAST ONE RESONANT STRUCTURE IN A CAVITY UNDER CONTROLLED ATMOSPHERE AND METHOD FOR MANUFACTURING THE SAME

Info

Publication number
FR2858890B1
FR2858890B1 FR0309956A FR0309956A FR2858890B1 FR 2858890 B1 FR2858890 B1 FR 2858890B1 FR 0309956 A FR0309956 A FR 0309956A FR 0309956 A FR0309956 A FR 0309956A FR 2858890 B1 FR2858890 B1 FR 2858890B1
Authority
FR
France
Prior art keywords
microsystem
incorporating
manufacturing
same
under controlled
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0309956A
Other languages
French (fr)
Other versions
FR2858890A1 (en
Inventor
David Ruffieux
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre Suisse dElectronique et Microtechnique SA CSEM
Original Assignee
Centre Suisse dElectronique et Microtechnique SA CSEM
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre Suisse dElectronique et Microtechnique SA CSEM filed Critical Centre Suisse dElectronique et Microtechnique SA CSEM
Priority to FR0309956A priority Critical patent/FR2858890B1/en
Priority to PCT/CH2004/000491 priority patent/WO2005018090A1/en
Publication of FR2858890A1 publication Critical patent/FR2858890A1/en
Application granted granted Critical
Publication of FR2858890B1 publication Critical patent/FR2858890B1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/05—Holders; Supports
    • H03H9/10—Mounting in enclosures
    • H03H9/1007—Mounting in enclosures for bulk acoustic wave [BAW] devices
    • H03H9/105—Mounting in enclosures for bulk acoustic wave [BAW] devices the enclosure being defined by a cover cap mounted on an element forming part of the BAW device
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H03H2003/027—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks the resonators or networks being of the microelectro-mechanical [MEMS] type
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/24—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive
    • H03H9/2405—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive of microelectro-mechanical resonators
    • H03H2009/241—Bulk-mode MEMS resonators
FR0309956A 2003-08-14 2003-08-14 MICROSYSTEM INCORPORATING AT LEAST ONE RESONANT STRUCTURE IN A CAVITY UNDER CONTROLLED ATMOSPHERE AND METHOD FOR MANUFACTURING THE SAME Expired - Fee Related FR2858890B1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR0309956A FR2858890B1 (en) 2003-08-14 2003-08-14 MICROSYSTEM INCORPORATING AT LEAST ONE RESONANT STRUCTURE IN A CAVITY UNDER CONTROLLED ATMOSPHERE AND METHOD FOR MANUFACTURING THE SAME
PCT/CH2004/000491 WO2005018090A1 (en) 2003-08-14 2004-08-05 Microsystem incorporating at least one resonant structure in a cavity under a controlled atmosphere, and method for producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0309956A FR2858890B1 (en) 2003-08-14 2003-08-14 MICROSYSTEM INCORPORATING AT LEAST ONE RESONANT STRUCTURE IN A CAVITY UNDER CONTROLLED ATMOSPHERE AND METHOD FOR MANUFACTURING THE SAME

Publications (2)

Publication Number Publication Date
FR2858890A1 FR2858890A1 (en) 2005-02-18
FR2858890B1 true FR2858890B1 (en) 2006-02-03

Family

ID=34112783

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0309956A Expired - Fee Related FR2858890B1 (en) 2003-08-14 2003-08-14 MICROSYSTEM INCORPORATING AT LEAST ONE RESONANT STRUCTURE IN A CAVITY UNDER CONTROLLED ATMOSPHERE AND METHOD FOR MANUFACTURING THE SAME

Country Status (2)

Country Link
FR (1) FR2858890B1 (en)
WO (1) WO2005018090A1 (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6275122B1 (en) * 1999-08-17 2001-08-14 International Business Machines Corporation Encapsulated MEMS band-pass filter for integrated circuits
EP1251577B1 (en) * 2001-04-19 2007-04-25 Interuniversitair Microelektronica Centrum Vzw Fabrication of integrated tunable/switchable passive microwave and millimeter wave modules
US6808954B2 (en) * 2001-09-07 2004-10-26 Intel Corporation Vacuum-cavity MEMS resonator

Also Published As

Publication number Publication date
WO2005018090A1 (en) 2005-02-24
FR2858890A1 (en) 2005-02-18

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Effective date: 20200406