FR2441582A1 - Procede pour preparer des cibles de vaporisation cathodique de grandes dimensions et de composition homogene en tellurure de mercure et de cadmium - Google Patents

Procede pour preparer des cibles de vaporisation cathodique de grandes dimensions et de composition homogene en tellurure de mercure et de cadmium

Info

Publication number
FR2441582A1
FR2441582A1 FR7927738A FR7927738A FR2441582A1 FR 2441582 A1 FR2441582 A1 FR 2441582A1 FR 7927738 A FR7927738 A FR 7927738A FR 7927738 A FR7927738 A FR 7927738A FR 2441582 A1 FR2441582 A1 FR 2441582A1
Authority
FR
France
Prior art keywords
mercury
particles
targets
cadmium
vaporization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7927738A
Other languages
English (en)
Other versions
FR2441582B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teck Metals Ltd
Original Assignee
Teck Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teck Metals Ltd filed Critical Teck Metals Ltd
Publication of FR2441582A1 publication Critical patent/FR2441582A1/fr
Application granted granted Critical
Publication of FR2441582B1 publication Critical patent/FR2441582B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B19/00—Selenium; Tellurium; Compounds thereof
    • C01B19/007—Tellurides or selenides of metals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/02—Compacting only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
    • H01L31/0264—Inorganic materials
    • H01L31/0296—Inorganic materials including, apart from doping material or other impurities, only AIIBVI compounds, e.g. CdS, ZnS, HgCdTe
    • H01L31/02966—Inorganic materials including, apart from doping material or other impurities, only AIIBVI compounds, e.g. CdS, ZnS, HgCdTe including ternary compounds, e.g. HgCdTe
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/10—Solid density

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Powder Metallurgy (AREA)
  • Bipolar Transistors (AREA)

Abstract

PROCEDE POUR PREPARER DES CIBLES DE VAPORISATION CATHODIQUE EN TELLURURE DE CADMIUM ET DE MERCURE REPONDANT A LA FORMULE GENERALE CDHGTE DANS LAQUELLE X A DES VALEURS COMPRISES DANS L'INTERVALLE D'ENVIRON 0,14 A 0,60. ON PREPARE DU TELLURURE DE CADMIUM ET DE MERCURE A L'ETAT DE FINE DIVISION, A SAVOIR A L'ETAT DE PARTICULES QUI ONT TOUTES DES DIMENSIONS INFERIEURES A 150MICRONS, ON MELANGE LES PARTICULES DE TELLURURE DE MERCURE ET DE CADMIUM FINEMENT DIVISE JUSQU'A REPARTITION PRATIQUEMENT UNIFORME DES DIMENSIONS DE PARTICULES, ON INTRODUIT UNE QUANTITE DETERMINEE DES PARTICULES MELANGEES DANS UNE MATRICE AUX DIMENSIONS VOULUES, ON APPLIQUE SUR CES PARTICULES UNE PRESSION SUFFISANTE POUR METTRE LE TELLURURE DE MERCURE ET DE CADMIUM FINEMENT DIVISE A L'ETAT D'OBJET COMPACT ET COHERENT PRESENTANT UNE DENSITE D'AU MOINS 97 DE LA DENSITE THEORIQUE, ON RELACHE LA PRESSION ET ON RETIRE L'OBJET COMPACT, AUX DIMENSIONS VOULUES, DE LA MATRICE, LA QUANTITE DE PARTICULES MELANGEES INTRODUITE DANS LE MOULE ETANT SUFFISANTE POUR PARVENIR A UN OBJET COMPACT AUX DIMENSIONS VOULUES. LE PROCEDE SELON L'INVENTION PERMET POUR LA PREMIERE FOIS DE PREPARER DES CIBLES DE VAPORISATION CATHODIQUE DE GRANDES DIMENSIONS.
FR7927738A 1978-11-09 1979-11-09 Procede pour preparer des cibles de vaporisation cathodique de grandes dimensions et de composition homogene en tellurure de mercure et de cadmium Granted FR2441582A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA316,105A CA1110421A (fr) 1978-11-09 1978-11-09 Cibles de pulverisation a tellurure de cadmium et de mercure

Publications (2)

Publication Number Publication Date
FR2441582A1 true FR2441582A1 (fr) 1980-06-13
FR2441582B1 FR2441582B1 (fr) 1985-04-19

Family

ID=4112934

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7927738A Granted FR2441582A1 (fr) 1978-11-09 1979-11-09 Procede pour preparer des cibles de vaporisation cathodique de grandes dimensions et de composition homogene en tellurure de mercure et de cadmium

Country Status (5)

Country Link
JP (1) JPS5565338A (fr)
CA (1) CA1110421A (fr)
DE (1) DE2944482A1 (fr)
FR (1) FR2441582A1 (fr)
GB (1) GB2037264B (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2464225A1 (fr) * 1979-08-30 1981-03-06 Hughes Aircraft Co Procede de production de tellurure de mercure et de cadmium monocristallin et ce produit
EP0115629A2 (fr) * 1983-01-10 1984-08-15 MERCK PATENT GmbH Cible pour pulvérisation cathodique

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3627775A1 (de) * 1986-08-16 1988-02-18 Demetron Verfahren zur herstellung von targets

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2265872B1 (fr) * 1974-03-27 1977-10-14 Anvar

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
THIN SOLID FILMS, vol. 13, 1972, Elsevier Sequoia S.A., LAUSANNE (CH) *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2464225A1 (fr) * 1979-08-30 1981-03-06 Hughes Aircraft Co Procede de production de tellurure de mercure et de cadmium monocristallin et ce produit
EP0115629A2 (fr) * 1983-01-10 1984-08-15 MERCK PATENT GmbH Cible pour pulvérisation cathodique
EP0115629A3 (en) * 1983-01-10 1985-12-04 Merck Patent Gesellschaft Mit Beschrankter Haftung Target for cathodic sputtering
US4690745A (en) * 1983-01-10 1987-09-01 Merck Patent Gesellschaft Mit Beschrankter Haftung Targets for cathode sputtering

Also Published As

Publication number Publication date
JPS5565338A (en) 1980-05-16
DE2944482C2 (fr) 1988-09-08
CA1110421A (fr) 1981-10-13
GB2037264B (en) 1982-09-29
FR2441582B1 (fr) 1985-04-19
GB2037264A (en) 1980-07-09
DE2944482A1 (de) 1980-05-29

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Legal Events

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