FR2434479B1 - - Google Patents
Info
- Publication number
- FR2434479B1 FR2434479B1 FR7909442A FR7909442A FR2434479B1 FR 2434479 B1 FR2434479 B1 FR 2434479B1 FR 7909442 A FR7909442 A FR 7909442A FR 7909442 A FR7909442 A FR 7909442A FR 2434479 B1 FR2434479 B1 FR 2434479B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
- H01J37/3494—Adaptation to extreme pressure conditions
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
- H01J37/3408—Planar magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
- H01J37/3458—Electromagnets in particular for cathodic sputtering apparatus
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/935,358 US4162954A (en) | 1978-08-21 | 1978-08-21 | Planar magnetron sputtering device |
US05/946,370 US4180450A (en) | 1978-08-21 | 1978-09-27 | Planar magnetron sputtering device |
US06/019,284 US4265729A (en) | 1978-09-27 | 1979-03-09 | Magnetically enhanced sputtering device |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2434479A1 FR2434479A1 (en) | 1980-03-21 |
FR2434479B1 true FR2434479B1 (en) | 1983-03-18 |
Family
ID=27361196
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7909442A Granted FR2434479A1 (en) | 1978-08-21 | 1979-04-13 | DEVICE FOR CATHODE SPRAYING OR METALLIZATION WITH IMPROVED MAGNETIC EFFECT |
Country Status (4)
Country | Link |
---|---|
CA (1) | CA1141704A (en) |
DE (1) | DE2920780C2 (en) |
FR (1) | FR2434479A1 (en) |
GB (1) | GB2028377B (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4461688A (en) * | 1980-06-23 | 1984-07-24 | Vac-Tec Systems, Inc. | Magnetically enhanced sputtering device having a plurality of magnetic field sources including improved plasma trapping device and method |
CH648690A5 (en) * | 1980-10-14 | 1985-03-29 | Balzers Hochvakuum | CATHODE ARRANGEMENT FOR SPRAYING MATERIAL FROM A TARGET IN A CATHODE SPRAYING SYSTEM. |
JPS58189372A (en) * | 1982-04-30 | 1983-11-05 | Toshiba Corp | Magnetron sputtering device |
FR2534276A1 (en) * | 1982-10-11 | 1984-04-13 | Commissariat Energie Atomique | Process and device for coating an article using cathodic sputtering. |
DE3727901A1 (en) * | 1987-08-21 | 1989-03-02 | Leybold Ag | SPRAYING CATHODE ACCORDING TO THE MAGNETRON PRINCIPLE |
DE19819785A1 (en) * | 1998-05-04 | 1999-11-11 | Leybold Systems Gmbh | Atomizing cathode based on the magnetron principle |
DE19836125C2 (en) | 1998-08-10 | 2001-12-06 | Leybold Systems Gmbh | Atomizing device with a cathode with permanent magnet arrangement |
DE10234858A1 (en) * | 2002-07-31 | 2004-02-12 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Device for producing a magnetron discharge, especially for magnetron sputtering, in the coating of substrates has a unit producing a magnetic field having a fixed position relative to the outer target limit in the region of the outer pole |
EA201101662A1 (en) * | 2006-07-13 | 2012-05-30 | Тиэр Коутингз Лимитед | COATING APPLICATION DEVICE AND COATING APPLICATION METHOD |
DE102013112861B4 (en) * | 2013-01-15 | 2018-11-15 | VON ARDENNE Asset GmbH & Co. KG | Magnetron arrangement and target for a magnetron arrangement |
US9328410B2 (en) | 2013-10-25 | 2016-05-03 | First Solar, Inc. | Physical vapor deposition tile arrangement and physical vapor deposition arrangement |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3884793A (en) * | 1971-09-07 | 1975-05-20 | Telic Corp | Electrode type glow discharge apparatus |
US3956093A (en) * | 1974-12-16 | 1976-05-11 | Airco, Inc. | Planar magnetron sputtering method and apparatus |
US4013532A (en) * | 1975-03-03 | 1977-03-22 | Airco, Inc. | Method for coating a substrate |
US4022947A (en) * | 1975-11-06 | 1977-05-10 | Airco, Inc. | Transparent panel having high reflectivity for solar radiation and a method for preparing same |
DE2707144A1 (en) * | 1976-02-19 | 1977-08-25 | Sloan Technology Corp | Cathode sputtering device with magnetic equipment - which can be displaced to move the area of sputtering over an extended surface by relative movement |
NL7607473A (en) * | 1976-07-07 | 1978-01-10 | Philips Nv | SPRAYING DEVICE AND METHOD FOR SPRAYING WITH SUCH A DEVICE |
DE2655942A1 (en) * | 1976-12-10 | 1978-06-15 | Tokuda Seisakusho Kawasaki Kk | Metals deposited by cathodic sputtering - in appts. using magnetic field to increase sputtering rate |
DE2735525A1 (en) * | 1977-08-06 | 1979-02-22 | Leybold Heraeus Gmbh & Co Kg | CATODE ARRANGEMENT WITH TARGET FOR SPRAYING SYSTEMS FOR DUSTING UP DIELECTRIC OR AMAGNETIC LAYERS ON SUBSTRATES |
-
1979
- 1979-04-09 GB GB7912472A patent/GB2028377B/en not_active Expired
- 1979-04-09 CA CA000325126A patent/CA1141704A/en not_active Expired
- 1979-04-13 FR FR7909442A patent/FR2434479A1/en active Granted
- 1979-05-22 DE DE19792920780 patent/DE2920780C2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DE2920780A1 (en) | 1980-03-06 |
FR2434479A1 (en) | 1980-03-21 |
GB2028377B (en) | 1982-12-08 |
GB2028377A (en) | 1980-03-05 |
CA1141704A (en) | 1983-02-22 |
DE2920780C2 (en) | 1990-06-21 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
TP | Transmission of property | ||
ST | Notification of lapse |