FR2329172A5 - Procede de fabrication d'une diode schottky et diode fabriquee selon un tel procede - Google Patents
Procede de fabrication d'une diode schottky et diode fabriquee selon un tel procedeInfo
- Publication number
- FR2329172A5 FR2329172A5 FR7324390A FR7324390A FR2329172A5 FR 2329172 A5 FR2329172 A5 FR 2329172A5 FR 7324390 A FR7324390 A FR 7324390A FR 7324390 A FR7324390 A FR 7324390A FR 2329172 A5 FR2329172 A5 FR 2329172A5
- Authority
- FR
- France
- Prior art keywords
- alumina
- cavity
- schottky diode
- followed
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title abstract 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 title abstract 3
- 239000000377 silicon dioxide Substances 0.000 title abstract 3
- 239000002253 acid Substances 0.000 title 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract 2
- 229910052682 stishovite Inorganic materials 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 229910052905 tridymite Inorganic materials 0.000 abstract 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 abstract 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 abstract 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 229960000583 acetic acid Drugs 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- -1 aluminium halide Chemical class 0.000 abstract 1
- 235000011089 carbon dioxide Nutrition 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 239000012362 glacial acetic acid Substances 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 229910017604 nitric acid Inorganic materials 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
- H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
- H01L21/28512—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table
- H01L21/28537—Deposition of Schottky electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/308—Chemical or electrical treatment, e.g. electrolytic etching using masks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66083—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by variation of the electric current supplied or the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. two-terminal devices
- H01L29/6609—Diodes
- H01L29/66143—Schottky diodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/861—Diodes
- H01L29/872—Schottky diodes
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7324390A FR2329172A5 (fr) | 1973-07-03 | 1973-07-03 | Procede de fabrication d'une diode schottky et diode fabriquee selon un tel procede |
BE146109A BE817199A (fr) | 1973-07-03 | 1974-07-03 | Procede de fabrication d'une diode schottky et diode fabriquee selon un tel procede |
DE19742432008 DE2432008A1 (de) | 1973-07-03 | 1974-07-03 | Schottky-diode und verfahren zu ihrer herstellung |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7324390A FR2329172A5 (fr) | 1973-07-03 | 1973-07-03 | Procede de fabrication d'une diode schottky et diode fabriquee selon un tel procede |
Publications (1)
Publication Number | Publication Date |
---|---|
FR2329172A5 true FR2329172A5 (fr) | 1977-05-20 |
Family
ID=9121987
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7324390A Expired FR2329172A5 (fr) | 1973-07-03 | 1973-07-03 | Procede de fabrication d'une diode schottky et diode fabriquee selon un tel procede |
Country Status (3)
Country | Link |
---|---|
BE (1) | BE817199A (fr) |
DE (1) | DE2432008A1 (fr) |
FR (1) | FR2329172A5 (fr) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5254369A (en) * | 1975-10-29 | 1977-05-02 | Mitsubishi Electric Corp | Schottky barrier semiconductor device |
-
1973
- 1973-07-03 FR FR7324390A patent/FR2329172A5/fr not_active Expired
-
1974
- 1974-07-03 DE DE19742432008 patent/DE2432008A1/de active Pending
- 1974-07-03 BE BE146109A patent/BE817199A/fr unknown
Also Published As
Publication number | Publication date |
---|---|
BE817199A (fr) | 1975-01-03 |
DE2432008A1 (de) | 1975-01-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB1398019A (en) | Process for preparing semiconductor | |
GB1314648A (en) | Method for manufacturing a semiconductor photosensitive device | |
GB1482616A (en) | Insulator substrate with a thin monocrystalline semiconductive layer and method of fabrication | |
EP0226091A3 (fr) | Structure d'isolation pour semi-conducteurs utilisant des rainures et oxydation d'une couche enterrée de silicium anodisé | |
GB1285778A (en) | Improvements in and relating to methods of etching | |
US3972770A (en) | Method of preparation of electron emissive materials | |
FR2329172A5 (fr) | Procede de fabrication d'une diode schottky et diode fabriquee selon un tel procede | |
JPS5254369A (en) | Schottky barrier semiconductor device | |
GB1514949A (en) | Method of fabricating stepped electrodes | |
GB1527106A (en) | Method of etching multilayered articles | |
JPS5530826A (en) | Method of manufacturing semiconductor device | |
GB1334345A (en) | Etching | |
JPS5763842A (en) | Preparation of semiconductor integrated circuit | |
US3935328A (en) | Method for providing dielectric isolation in an epitaxial layer of a compound semiconductor using the plasma oxidation | |
GB1416315A (en) | Humidity sensitive semiconductor device | |
GB1348811A (en) | Production of schottky contacts | |
GB1526425A (en) | Method of etching aluminium oxide | |
FR2177554A1 (en) | Etching bath - for thin silicon nitride film masked with photopolymerisable lacquer | |
KR790001587B1 (ko) | 알루미나 보호피막을 형성한 저잡음 반도체 소자 | |
EP0067738A3 (fr) | Procédé pour réduire les régions débordantes pour dispositif semiconducteur | |
GB1361357A (en) | Production of semiconductor devices | |
DE1807106B2 (en) | Passivating layer for silicon oxide coated substrates | |
JPS5629332A (en) | Etching of silicon nitride film | |
JPS54102869A (en) | Manufacture for semiconductor device | |
GB1475597A (en) | Electron emissive materials and methods of preparation |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |