FR2280924A1 - Procede de protection de masques de photogravure et masques obtenus - Google Patents

Procede de protection de masques de photogravure et masques obtenus

Info

Publication number
FR2280924A1
FR2280924A1 FR7426951A FR7426951A FR2280924A1 FR 2280924 A1 FR2280924 A1 FR 2280924A1 FR 7426951 A FR7426951 A FR 7426951A FR 7426951 A FR7426951 A FR 7426951A FR 2280924 A1 FR2280924 A1 FR 2280924A1
Authority
FR
France
Prior art keywords
mask
layer
protection
deposition
transparent layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7426951A
Other languages
English (en)
French (fr)
Other versions
FR2280924B3 (https=
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Silec Semi Conducteurs SA
Original Assignee
Silec Semi Conducteurs SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Silec Semi Conducteurs SA filed Critical Silec Semi Conducteurs SA
Priority to FR7426951A priority Critical patent/FR2280924A1/fr
Publication of FR2280924A1 publication Critical patent/FR2280924A1/fr
Application granted granted Critical
Publication of FR2280924B3 publication Critical patent/FR2280924B3/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
FR7426951A 1974-08-02 1974-08-02 Procede de protection de masques de photogravure et masques obtenus Granted FR2280924A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7426951A FR2280924A1 (fr) 1974-08-02 1974-08-02 Procede de protection de masques de photogravure et masques obtenus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7426951A FR2280924A1 (fr) 1974-08-02 1974-08-02 Procede de protection de masques de photogravure et masques obtenus

Publications (2)

Publication Number Publication Date
FR2280924A1 true FR2280924A1 (fr) 1976-02-27
FR2280924B3 FR2280924B3 (https=) 1977-06-03

Family

ID=9142054

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7426951A Granted FR2280924A1 (fr) 1974-08-02 1974-08-02 Procede de protection de masques de photogravure et masques obtenus

Country Status (1)

Country Link
FR (1) FR2280924A1 (https=)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2364495A1 (fr) * 1976-09-09 1978-04-07 Philips Nv Masques de projection d'images electroniques
EP0068012A4 (en) * 1981-01-05 1983-07-04 Western Electric Co PHOTOMASK AND METHOD FOR THE PRODUCTION THEREOF.
EP0107331A3 (en) * 1982-09-27 1985-07-03 Western Electric Company, Incorporated Photomask
EP1128211A1 (en) * 2000-02-21 2001-08-29 Motorola, Inc. Lithographic printing method using a low surface energy layer
US6300042B1 (en) 1998-11-24 2001-10-09 Motorola, Inc. Lithographic printing method using a low surface energy layer

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2364495A1 (fr) * 1976-09-09 1978-04-07 Philips Nv Masques de projection d'images electroniques
EP0068012A4 (en) * 1981-01-05 1983-07-04 Western Electric Co PHOTOMASK AND METHOD FOR THE PRODUCTION THEREOF.
EP0107331A3 (en) * 1982-09-27 1985-07-03 Western Electric Company, Incorporated Photomask
US4537813A (en) * 1982-09-27 1985-08-27 At&T Technologies, Inc. Photomask encapsulation
US6300042B1 (en) 1998-11-24 2001-10-09 Motorola, Inc. Lithographic printing method using a low surface energy layer
US6562553B2 (en) 1998-11-24 2003-05-13 Motorola, Inc. Lithographic printing method using a low surface energy layer
EP1128211A1 (en) * 2000-02-21 2001-08-29 Motorola, Inc. Lithographic printing method using a low surface energy layer

Also Published As

Publication number Publication date
FR2280924B3 (https=) 1977-06-03

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Legal Events

Date Code Title Description
ST Notification of lapse