FR2256511A1 - Non-volatile memory cell - has floating gate conductor layer between isolation layers - Google Patents

Non-volatile memory cell - has floating gate conductor layer between isolation layers

Info

Publication number
FR2256511A1
FR2256511A1 FR7400070A FR7400070A FR2256511A1 FR 2256511 A1 FR2256511 A1 FR 2256511A1 FR 7400070 A FR7400070 A FR 7400070A FR 7400070 A FR7400070 A FR 7400070A FR 2256511 A1 FR2256511 A1 FR 2256511A1
Authority
FR
France
Prior art keywords
floating gate
gate conductor
conductor layer
pockets
memory cell
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7400070A
Other languages
English (en)
French (fr)
Other versions
FR2256511B1 (enrdf_load_stackoverflow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Industries Inc
Original Assignee
Texas Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Texas Industries Inc filed Critical Texas Industries Inc
Priority to FR7400070A priority Critical patent/FR2256511A1/fr
Publication of FR2256511A1 publication Critical patent/FR2256511A1/fr
Application granted granted Critical
Publication of FR2256511B1 publication Critical patent/FR2256511B1/fr
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0466Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells with charge storage in an insulating layer, e.g. metal-nitride-oxide-silicon [MNOS], silicon-oxide-nitride-oxide-silicon [SONOS]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/68Floating-gate IGFETs
    • H10D30/681Floating-gate IGFETs having only two programming levels
    • H10D30/684Floating-gate IGFETs having only two programming levels programmed by hot carrier injection
    • H10D30/686Floating-gate IGFETs having only two programming levels programmed by hot carrier injection using hot carriers produced by avalanche breakdown of PN junctions, e.g. floating gate avalanche injection MOS [FAMOS]

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Non-Volatile Memory (AREA)
  • Semiconductor Memories (AREA)
FR7400070A 1974-01-02 1974-01-02 Non-volatile memory cell - has floating gate conductor layer between isolation layers Granted FR2256511A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7400070A FR2256511A1 (en) 1974-01-02 1974-01-02 Non-volatile memory cell - has floating gate conductor layer between isolation layers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7400070A FR2256511A1 (en) 1974-01-02 1974-01-02 Non-volatile memory cell - has floating gate conductor layer between isolation layers

Publications (2)

Publication Number Publication Date
FR2256511A1 true FR2256511A1 (en) 1975-07-25
FR2256511B1 FR2256511B1 (enrdf_load_stackoverflow) 1977-09-09

Family

ID=9133036

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7400070A Granted FR2256511A1 (en) 1974-01-02 1974-01-02 Non-volatile memory cell - has floating gate conductor layer between isolation layers

Country Status (1)

Country Link
FR (1) FR2256511A1 (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
FR2256511B1 (enrdf_load_stackoverflow) 1977-09-09

Similar Documents

Publication Publication Date Title
GB1425986A (en) Semiconductor devices comprising insulated-gate- field-effect transistors
NL154362B (nl) Werkwijze om een halfgeleiderinrichting, met een isolerende laag die een siliciumnitride bevat, te vervaardigen.
EP0025311A3 (en) Non-volatile semiconductor memory device
HK80692A (en) Nonvolatile semiconductor memory
ES321208A1 (es) Un metodo de producir un dispositivo semiconductor.
GB1339250A (en) Gate protective device for insulated gate field-effect transistors
ES374091A1 (es) Metodo para la fabricacion de un dispositivo semiconductor de barrera de potencial.
GB1501483A (en) Semiconductor device
GB1320778A (en) Semiconductor devices
FR2256511A1 (en) Non-volatile memory cell - has floating gate conductor layer between isolation layers
NL7317599A (en) Non-volatile memory cell - has floating gate conductor layer between isolation layers
GB1396807A (en) Semiconductor based thermoelements
GB1423449A (en) Semiconductor device
GB1275213A (en) Improvements in or relating to the manufacture of semiconductor components
GB1086856A (en) Improvements in or relating to methods of manufacturing semi-conductor devices
JPS5382277A (en) Schottky gate field effect transistor
GB1340350A (en) Surface controlled avalanche semiconductor device
JPS5381087A (en) Gallium aresenide field effect transistor
GB1007936A (en) Improvements in or relating to semiconductive devices
JPS5740967A (en) Integrated circuit device
ES421847A1 (es) Un dispositivo de memoria solo de lectura, semiconductor, reprogramable y no volatil, y un metodo de programarlo.
JPS5499531A (en) Semiconductor memory unit
JPS6435963A (en) Nonvolatile memory
GB1363190A (en) Semiconductor memory device
FR2183709A1 (en) Semiconductor resistance - in epitaxial layer buried below insulating layer, for high element density

Legal Events

Date Code Title Description
ST Notification of lapse