FR2232613B1 - - Google Patents
Info
- Publication number
- FR2232613B1 FR2232613B1 FR7320724A FR7320724A FR2232613B1 FR 2232613 B1 FR2232613 B1 FR 2232613B1 FR 7320724 A FR7320724 A FR 7320724A FR 7320724 A FR7320724 A FR 7320724A FR 2232613 B1 FR2232613 B1 FR 2232613B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/28—Deposition of only one other non-metal element
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using coherent light, UV to IR, e.g. lasers
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7320724A FR2232613A1 (en) | 1973-06-07 | 1973-06-07 | Deposition from vapour phase using laser heating - boron cpds. obtd. on silica, carbon or tungsten substrates |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7320724A FR2232613A1 (en) | 1973-06-07 | 1973-06-07 | Deposition from vapour phase using laser heating - boron cpds. obtd. on silica, carbon or tungsten substrates |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2232613A1 FR2232613A1 (en) | 1975-01-03 |
FR2232613B1 true FR2232613B1 (en) | 1976-04-23 |
Family
ID=9120641
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7320724A Granted FR2232613A1 (en) | 1973-06-07 | 1973-06-07 | Deposition from vapour phase using laser heating - boron cpds. obtd. on silica, carbon or tungsten substrates |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2232613A1 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4260649A (en) * | 1979-05-07 | 1981-04-07 | The Perkin-Elmer Corporation | Laser induced dissociative chemical gas phase processing of workpieces |
BR7908672A (en) * | 1979-11-30 | 1981-06-30 | Brasilia Telecom | FILM POSITIONING PROCESS FROM THE STEAM PHASE |
DD216604A3 (en) * | 1982-01-04 | 1984-12-12 | Karl Marx Stadt Tech Hochschul | METHOD FOR PRODUCING HARD COAT LAYERS |
FR2548218B1 (en) * | 1983-06-29 | 1987-03-06 | Pauleau Yves | METHOD FOR DEPOSITING THIN FILMS BY GAS PHASE CHEMICAL REACTION USING TWO DIFFERENT RADIATIONS |
WO1986004524A1 (en) * | 1985-02-12 | 1986-08-14 | The Dow Chemical Company | Process for the preparation of submicron-sized boron carbide powders |
EP0318506A4 (en) * | 1986-08-18 | 1992-02-26 | Ceramic Research, Inc. | Laser assisted fiber growth |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1401821A (en) * | 1963-07-18 | 1965-06-04 | Plessey Uk Ltd | Semiconductor device manufacturing process |
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1973
- 1973-06-07 FR FR7320724A patent/FR2232613A1/en active Granted
Also Published As
Publication number | Publication date |
---|---|
FR2232613A1 (en) | 1975-01-03 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |