FR2130168A1 - - Google Patents

Info

Publication number
FR2130168A1
FR2130168A1 FR7208632A FR7208632A FR2130168A1 FR 2130168 A1 FR2130168 A1 FR 2130168A1 FR 7208632 A FR7208632 A FR 7208632A FR 7208632 A FR7208632 A FR 7208632A FR 2130168 A1 FR2130168 A1 FR 2130168A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR7208632A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of FR2130168A1 publication Critical patent/FR2130168A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/0163—Non ionic diazonium compounds, e.g. diazosulphonates; Precursors thereof, e.g. triazenes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FR7208632A 1971-03-13 1972-03-13 Withdrawn FR2130168A1 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7103380A NL7103380A (enrdf_load_stackoverflow) 1971-03-13 1971-03-13

Publications (1)

Publication Number Publication Date
FR2130168A1 true FR2130168A1 (enrdf_load_stackoverflow) 1972-11-03

Family

ID=19812678

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7208632A Withdrawn FR2130168A1 (enrdf_load_stackoverflow) 1971-03-13 1972-03-13

Country Status (4)

Country Link
DE (1) DE2209749A1 (enrdf_load_stackoverflow)
FR (1) FR2130168A1 (enrdf_load_stackoverflow)
GB (1) GB1325974A (enrdf_load_stackoverflow)
NL (1) NL7103380A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0538112A1 (en) * 1991-10-15 1993-04-21 Canon Kabushiki Kaisha Electrophotographic photosensitive member, electrophotographic apparatus, device unit and facsimile machine

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4055425A (en) * 1975-03-10 1977-10-25 Gaf Corporation Diazotype material and graphic reproduction processes employing the same
DE2916877A1 (de) 1979-04-26 1980-11-06 Hoechst Ag Phenolgruppen enthaltende epoxidharze, ihre herstellung und verwendung
US8383320B2 (en) * 2007-10-31 2013-02-26 Nissan Chemical Industries, Ltd. Resist underlayer film forming composition and method of forming resist pattern using the same
SG11202100517VA (en) 2018-09-05 2021-02-25 Merck Patent Gmbh Positive working photosensitive material

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0538112A1 (en) * 1991-10-15 1993-04-21 Canon Kabushiki Kaisha Electrophotographic photosensitive member, electrophotographic apparatus, device unit and facsimile machine
US5356746A (en) * 1991-10-15 1994-10-18 Canon Kabushiki Kaisha Electrophotographic photosensitive member, electrophotographic apparatus, device unit and facsimile machine

Also Published As

Publication number Publication date
NL7103380A (enrdf_load_stackoverflow) 1972-09-15
GB1325974A (en) 1973-08-08
DE2209749A1 (de) 1972-11-09

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Legal Events

Date Code Title Description
ST Notification of lapse