FR1585727A - - Google Patents

Info

Publication number
FR1585727A
FR1585727A FR1585727DA FR1585727A FR 1585727 A FR1585727 A FR 1585727A FR 1585727D A FR1585727D A FR 1585727DA FR 1585727 A FR1585727 A FR 1585727A
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
French (fr)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Application granted granted Critical
Publication of FR1585727A publication Critical patent/FR1585727A/fr
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J31/00Cathode ray tubes; Electron beam tubes
    • H01J31/02Cathode ray tubes; Electron beam tubes having one or more output electrodes which may be impacted selectively by the ray or beam, and onto, from, or over which the ray or beam may be deflected or de-focused
    • H01J31/06Cathode ray tubes; Electron beam tubes having one or more output electrodes which may be impacted selectively by the ray or beam, and onto, from, or over which the ray or beam may be deflected or de-focused with more than two output electrodes, e.g. for multiple switching or counting
    • H01J31/065Cathode ray tubes; Electron beam tubes having one or more output electrodes which may be impacted selectively by the ray or beam, and onto, from, or over which the ray or beam may be deflected or de-focused with more than two output electrodes, e.g. for multiple switching or counting for electrography or electrophotography, for transferring a charge pattern through the faceplate
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00Apparatus for electrographic processes using a charge pattern
    • G03G15/22Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20
    • G03G15/32Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the charge pattern is formed dotwise, e.g. by a thermal head
    • G03G15/321Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the charge pattern is formed dotwise, e.g. by a thermal head by charge transfer onto the recording material in accordance with the image
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G9/00Developers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J5/00Details relating to vessels or to leading-in conductors common to two or more basic types of discharge tubes or lamps
    • H01J5/02Vessels; Containers; Shields associated therewith; Vacuum locks
    • H01J5/18Windows permeable to X-rays, gamma-rays, or particles

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Measurement Of Radiation (AREA)
  • Printing Plates And Materials Therefor (AREA)
FR1585727D 1967-10-03 1968-09-30 Expired FR1585727A (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6419367 1967-10-03

Publications (1)

Publication Number Publication Date
FR1585727A true FR1585727A (enrdf_load_stackoverflow) 1970-01-30

Family

ID=13250970

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1585727D Expired FR1585727A (enrdf_load_stackoverflow) 1967-10-03 1968-09-30

Country Status (5)

Country Link
US (1) US3607680A (enrdf_load_stackoverflow)
DE (1) DE1800663A1 (enrdf_load_stackoverflow)
FR (1) FR1585727A (enrdf_load_stackoverflow)
GB (1) GB1239296A (enrdf_load_stackoverflow)
NL (1) NL6814069A (enrdf_load_stackoverflow)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3715288A (en) * 1970-11-10 1973-02-06 Sensors Inc Method of fabricating film-type sensing structures
US3850762A (en) * 1973-08-13 1974-11-26 Boeing Co Process for producing an anodic aluminum oxide membrane
US4468282A (en) * 1982-11-22 1984-08-28 Hewlett-Packard Company Method of making an electron beam window
US4455561A (en) * 1982-11-22 1984-06-19 Hewlett-Packard Company Electron beam driven ink jet printer
US4494036A (en) * 1982-11-22 1985-01-15 Hewlett-Packard Company Electron beam window
US4659429A (en) * 1983-08-03 1987-04-21 Cornell Research Foundation, Inc. Method and apparatus for production and use of nanometer scale light beams
US4662747A (en) * 1983-08-03 1987-05-05 Cornell Research Foundation, Inc. Method and apparatus for production and use of nanometer scale light beams
US4917462A (en) * 1988-06-15 1990-04-17 Cornell Research Foundation, Inc. Near field scanning optical microscopy
FI885554L (fi) * 1988-11-30 1990-05-31 Outokumpu Oy Indikationsfoenster foer analysator och dess framstaellningsfoerfarande.
DE4219562C1 (enrdf_load_stackoverflow) * 1992-06-15 1993-07-15 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
US5612588A (en) * 1993-05-26 1997-03-18 American International Technologies, Inc. Electron beam device with single crystal window and expansion-matched anode
US5659223A (en) * 1995-07-14 1997-08-19 Science Research Laboratory, Inc. System for extracting a high power beam comprising air dynamic and foil windows
KR20000016521A (ko) 1996-06-12 2000-03-25 워칼로 푸로스 죠지 박막의 모노리틱형 실리콘 막에 의해 형성된 윈도우 영역을 포함하는 애노드를 갖는 화학 방사선 소스
US7030619B2 (en) * 2004-02-19 2006-04-18 Brooks Automation, Inc. Ionization gauge
US7295015B2 (en) * 2004-02-19 2007-11-13 Brooks Automation, Inc. Ionization gauge
US20090160309A1 (en) * 2005-10-15 2009-06-25 Dirk Burth Electron beam exit window
US7768267B2 (en) * 2007-07-11 2010-08-03 Brooks Automation, Inc. Ionization gauge with a cold electron source
WO2011011278A1 (en) * 2009-07-20 2011-01-27 Advanced Electron Beams, Inc. Emitter exit window
US8907554B2 (en) * 2010-02-08 2014-12-09 Tetra Laval Holdings & Finance S.A. Assembly and method for reducing foil wrinkles
US9384934B2 (en) * 2010-12-02 2016-07-05 Tetra Laval Holdings & Finance S.A. Electron exit window foil

Also Published As

Publication number Publication date
NL6814069A (enrdf_load_stackoverflow) 1969-04-09
DE1800663A1 (de) 1969-06-04
US3607680A (en) 1971-09-21
DE1800663B2 (enrdf_load_stackoverflow) 1970-11-19
GB1239296A (enrdf_load_stackoverflow) 1971-07-14

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Legal Events

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