ES8800432A1 - Un metodo de formacion de un patron de reflectancia. - Google Patents

Un metodo de formacion de un patron de reflectancia.

Info

Publication number
ES8800432A1
ES8800432A1 ES549581A ES549581A ES8800432A1 ES 8800432 A1 ES8800432 A1 ES 8800432A1 ES 549581 A ES549581 A ES 549581A ES 549581 A ES549581 A ES 549581A ES 8800432 A1 ES8800432 A1 ES 8800432A1
Authority
ES
Spain
Prior art keywords
reflectance
incorporating
resulting
polymer
acrylate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES549581A
Other languages
English (en)
Other versions
ES549581A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bayer Corp
Original Assignee
Miles Laboratories Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Miles Laboratories Inc filed Critical Miles Laboratories Inc
Publication of ES8800432A1 publication Critical patent/ES8800432A1/es
Publication of ES549581A0 publication Critical patent/ES549581A0/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4785—Standardising light scatter apparatus; Standards therefor
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/30—Sulfur-, selenium- or tellurium-containing compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)

Abstract

PROCEDIMIENTO PARA CONFORMAR UN PATRON DE REFLECTANCIA. COMPRENDE: A) CALENTAR UN POLIMERO ACRILICO A SU TEMPERATURA DE FUSION; B) COMBINAR AL POLIMERO ACRILICO FUNDIDO CON UN 40 POR CIEN EN PESO DE SULFATO BARICO EN POLVO; C) HOMOGENEIZAR LA COMBINACION DE B) MEDIANTE CALENTAMIENTO; D) CONFIGURAR A LA MASA HOMOGENEA EN LA FORMA DESEADA; E) DEJAR ENFRIAR LA MASA DE D) PARA OBTENER EL PATRON DE REFLECTANCIA. EL POLIMERO ACRILICO TIENE UNA TRANSMITANCIA SUPERIOR AL 90 POR CIEN DESDE 325 MM HASTA 1.000 MM PARA UNA MUESTRA DE 0,32 CM DE ESPESOR Y EL SULFATO BARICO EN FORMA DE POLVO TIENE UNA PUREZA EQUIVALENTE A LA FARMACOPEA USA Y ESTA PRESENTE EN FORMA DE PARTICULAS ESFERICAS U OBLONGAS CON UN TAMAÑO ENTRE 0,3 Y 2 MUM. SE EMPLEA PARA FABRICAR PATRONES DE REFLECTANCIAS EN DISPOSITIVOS DE MEDIDA, COLORIMETROS Y REFLECTOMETROS.
ES549581A 1984-12-04 1985-12-04 Un metodo de formacion de un patron de reflectancia. Expired ES8800432A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US67812084A 1984-12-04 1984-12-04

Publications (2)

Publication Number Publication Date
ES8800432A1 true ES8800432A1 (es) 1987-10-16
ES549581A0 ES549581A0 (es) 1987-10-16

Family

ID=24721487

Family Applications (1)

Application Number Title Priority Date Filing Date
ES549581A Expired ES8800432A1 (es) 1984-12-04 1985-12-04 Un metodo de formacion de un patron de reflectancia.

Country Status (6)

Country Link
EP (1) EP0184097B1 (es)
JP (1) JPS61134645A (es)
AU (1) AU556078B2 (es)
CA (1) CA1272340C (es)
DE (1) DE3582407D1 (es)
ES (1) ES8800432A1 (es)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19756141A1 (de) * 1997-12-17 1999-06-24 Bayer Ag Röntgenopake thermoplastische Formmasse
US20070009679A1 (en) * 2005-05-25 2007-01-11 Holcombe John D Infrared suppressive material
CN101631825A (zh) * 2006-08-25 2010-01-20 萨克特本化学有限责任公司 含硫酸钡的复合材料

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3512895A (en) * 1967-02-06 1970-05-19 Eastman Kodak Co Spectroreflectrometric reference standard and method
DE2251708C2 (de) * 1972-10-21 1983-01-27 Metallgesellschaft Ag, 6000 Frankfurt Trübungsmittel für Kunststoffe hoher Lichtdurchlässigkeit und starker Streuung

Also Published As

Publication number Publication date
JPH036458B2 (es) 1991-01-30
AU556078B2 (en) 1986-10-23
CA1272340A (en) 1990-07-31
EP0184097A2 (en) 1986-06-11
CA1272340C (en) 1990-07-31
EP0184097B1 (en) 1991-04-03
EP0184097A3 (en) 1988-01-20
JPS61134645A (ja) 1986-06-21
ES549581A0 (es) 1987-10-16
AU4918785A (en) 1986-06-19
DE3582407D1 (de) 1991-05-08

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Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 19970303