ES8505732A1 - Gas distribution system for reactive sputtering - Google Patents
Gas distribution system for reactive sputteringInfo
- Publication number
- ES8505732A1 ES8505732A1 ES528534A ES528534A ES8505732A1 ES 8505732 A1 ES8505732 A1 ES 8505732A1 ES 528534 A ES528534 A ES 528534A ES 528534 A ES528534 A ES 528534A ES 8505732 A1 ES8505732 A1 ES 8505732A1
- Authority
- ES
- Spain
- Prior art keywords
- target
- reactive
- gases
- distributor
- substrates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The system includes a distributor at each side of the cathode for introducing two separate gases into the vacuum chamber between the planar target and the substrates, the distributor comprising a pair of horizontal porous pipes located within a support and outlets in the support through which the gases enter the chamber and by which the gases are directed in divergent directions, one towards the target and the other towards the substrates. - The system is esp. useful in the reactive sputtering of metals or alloys, e.g. Ti or Ta, to produce metal oxide or nitride coatings. The target functions as it would in a non-reactive environment, while the sputtered material is acted on by the reactive gas, along its travel path or at the substrate surface, as it would in a reactive environment. Thus, deposition rates are increased, the required power levels are decreased spiking or arcing is eliminated, gas pulsing to keep the target clean is not required, and the usage of reactive gas is more efficient. (0/7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ES528534A ES528534A0 (en) | 1983-12-29 | 1983-12-29 | IMPROVEMENTS IN A GAS DISTRIBUTION SYSTEM FOR SUBLIMATION CATHODES |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ES528534A ES528534A0 (en) | 1983-12-29 | 1983-12-29 | IMPROVEMENTS IN A GAS DISTRIBUTION SYSTEM FOR SUBLIMATION CATHODES |
Publications (2)
Publication Number | Publication Date |
---|---|
ES8505732A1 true ES8505732A1 (en) | 1985-06-01 |
ES528534A0 ES528534A0 (en) | 1985-06-01 |
Family
ID=8486658
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES528534A Granted ES528534A0 (en) | 1983-12-29 | 1983-12-29 | IMPROVEMENTS IN A GAS DISTRIBUTION SYSTEM FOR SUBLIMATION CATHODES |
Country Status (1)
Country | Link |
---|---|
ES (1) | ES528534A0 (en) |
-
1983
- 1983-12-29 ES ES528534A patent/ES528534A0/en active Granted
Also Published As
Publication number | Publication date |
---|---|
ES528534A0 (en) | 1985-06-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FD1A | Patent lapsed |
Effective date: 19970203 |